知搜-全球专利检索

  1. 登录
  2. 注册

搜索结果

16 条记录 (耗时 0.018 秒)

    Surface displacement sensor with opening angle control
    2.
    发明授权
    Surface displacement sensor with opening angle control 失效
    表面位移传感器带开角控制

    公开(公告)号：US4748333A

    公开(公告)日：1988-05-31

    申请号：US30076

    申请日：1987-03-25

    申请人： Hideo Mizutani ,  Shoji Ishizaka ,  Takeshi Suto

    发明人： Hideo Mizutani ,  Shoji Ishizaka ,  Takeshi Suto

    IPC分类号： G01D5/30 ,  G01S17/46 ,  G03F9/00 ,  G01V9/04

    CPC分类号： G03F9/7026 ,  G01D5/30 ,  G01S17/46

    摘要： A surface displacement sensor is so designed that a stop or aperture for controlling an angle of opening is disposed at the position of a pupil of a detection optical system in which a slit image is focused on the surface to be detected and the light rays reflected from the surface to be detected are collected to re-focus the slit image on the light receiving surface of the sensor. When the height position of the surface to be detected is detected by such stop for controlling the angle of opening, the deviation of the distribution of intensity of light which tends to occur in the widthwise direction of the slit through which passes the light beam which in turn focuses a slit image, can be positively decreased by limiting the angle of opening N.A. in the widthwise direction of the slit for passing the light beam to focus a slit image to be narrow and consequently the degree of detection accuracy can be improved. The stop for controlling the angle of opening is so designed and constructed that in the case of detecting operation of the sensor, the angle of opening N.A. in the widthwise direction of the slit image is limited so that the slit image having a sufficiently narrow angle of opening can be obtained. Furthermore, in the case of the focal point adjustment of the optical system, the stop is so switched that a slit image having a sufficiently wide angle of opening N.A. in the widthwise direction thereof can be focused on a receiving slit. The focal point adjustment is further facilitated in the surface displacement sensor.

    摘要翻译： 表面位移传感器被设计成使得用于控制开口角度的止动件或开口设置在检测光学系统的光瞳的位置处，其中狭缝图像聚焦在待检测的表面上，并且光线从 收集要检测的表面以将狭缝图像重新聚焦在传感器的光接收表面上。 当通过这种停止来检测要检测的表面的高度位置以控制开口角度时，倾向于在通过光束的狭缝的宽度方向上发生的光强度分布的偏差 转动对狭缝图像进行聚焦，可以通过限制狭缝的宽度方向上的开口角度NA，使光束聚焦而使狭缝图像变窄，从而可以提高检测精度。 用于控制开口角度的止挡被设计和构造成使得在检测传感器的操作的情况下，狭缝图像的宽度方向上的开口角度NA受到限制，使得狭缝图像具有足够窄的角度 可以打开。 此外，在光学系统的焦点调整的情况下，停止被切换，使得具有足够宽的开口N.A.在其宽度方向上的狭缝图像可以聚焦在接收狭缝上。 在表面位移传感器中进一步促进了焦点调整。

    Semiconductor laser element and laser device using the same element
    6.
    发明授权
    Semiconductor laser element and laser device using the same element 失效
    半导体激光元件和使用相同元件的激光器件

    公开(公告)号：US5467364A

    公开(公告)日：1995-11-14

    申请号：US287802

    申请日：1994-08-09

    申请人： Kiyofumi Muro ,  Tsuyoshi Fujimoto ,  Yuji Yoshida ,  Yoshikazu Yamada ,  Shoji Ishizaka

    发明人： Kiyofumi Muro ,  Tsuyoshi Fujimoto ,  Yuji Yoshida ,  Yoshikazu Yamada ,  Shoji Ishizaka

    IPC分类号： H01S5/20 ,  H01S5/32 ,  H01S5/323 ,  H01S5/34 ,  H01S5/343 ,  H01S3/19

    CPC分类号： B82Y20/00 ,  H01S5/20 ,  H01S5/34 ,  H01S2301/18 ,  H01S5/2004 ,  H01S5/2009 ,  H01S5/3211 ,  H01S5/32308 ,  H01S5/3421 ,  H01S5/3428 ,  H01S5/3432

    摘要： A semiconductor laser of this invention, having a structure of an element composed of: carrier block layers, formed bilaterally externally of an active layer in section which is formed in the vertical direction from the surface of the element, for reducing a light guiding function of the active layer; wave guide layers provided bilaterally externally of said carrier block layers and clad layers provided so that the wave guide layers are sandwiched in between the clad layers. This invention overcomes a dilemma inherent in the conventional weakly guiding laser and LOC structured laser in terms of designing the device for controlling a guided mode. The present invention also solves the problems in terms of attaining higher outputting and a low dispersion of the radiation beams and improving a beam profile.

    摘要翻译： 本发明的半导体激光器具有由以下部分构成的元件的结构：载体块层，从在元件的表面沿垂直方向形成的截面中的双方形成的有源层的外侧形成，用于降低导光功能 活性层; 在所述载体块层和包层之间的外侧提供波导引导层，使得波导层夹在包层之间。 本发明克服了传统的弱引导激光和LOC结构激光器在设计用于控制引导模式的装置方面的困境。 本发明还解决了获得更高输出和辐射束的低色散并改善光束轮廓的问题。

    Projection optical apparatus
    7.
    发明授权
    Projection optical apparatus 失效
    投影光学仪器

    公开(公告)号：US4687322A

    公开(公告)日：1987-08-18

    申请号：US931013

    申请日：1986-11-17

    申请人： Akikazu Tanimoto ,  Shoji Ishizaka ,  Yutaka Endo ,  Hiroyuki Suzuki ,  Masamitsu Yanagihara

    发明人： Akikazu Tanimoto ,  Shoji Ishizaka ,  Yutaka Endo ,  Hiroyuki Suzuki ,  Masamitsu Yanagihara

    IPC分类号： H01L21/30 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

    CPC分类号： G03F9/7026

    摘要： An apparatus for forming the optical image of a photo-pattern placed on a first plane on a second plane comprises projection means having a projection optical system disposed between the first plane and the second plane to form the optical image, focus detecting means including means for detecting the position of the second plane relative to the projection optical system, the in-focus position corresponding to the position of the second plane when the imaging plane of the projection optical system and the second plane are coincident with each other being preset, the focus detecting means putting out a detection signal when the in-focus position is detected by the detecting means, fluctuation detecting means for determining the amount of fluctuation of the imaging plane of the projection optical system caused correspondingly to a variation in the refractive index of the atmosphere, and means responsive to the fluctuation detecting means to control the focus detecting means so that the in-focus position is re-set correspondingly to the amount of fluctuation of the imaging plane determined by the fluctuation detecting means.

    摘要翻译： 用于形成放置在第二平面上的第一平面上的光图案的光学图像的装置包括投影装置，其具有设置在第一平面和第二平面之间的投影光学系统以形成光学图像，焦点检测装置包括： 检测第二平面相对于投影光学系统的位置，当投影光学系统和第二平面的成像平面彼此一致时，对应于第二平面的位置的对焦位置被预设，焦点 检测装置，当由检测装置检测到对焦位置时，放出检测信号;波动检测装置，用于确定投影光学系统的成像面的波动量对应于大气折射率的变化 以及响应于所述波动检测装置来控制所述焦点检测装置的装置， n焦点位置对应于由波动检测装置确定的成像平面的波动量重新设定。

    Projection optical apparatus
    8.
    发明授权
    Projection optical apparatus 失效
    投影光学仪器

    公开(公告)号：US4801977A

    公开(公告)日：1989-01-31

    申请号：US198688

    申请日：1988-05-24

    申请人： Shoji Ishizaka ,  Hideo Mizutani ,  Susumu Makinouchi ,  Akikazu Tanimoto

    发明人： Shoji Ishizaka ,  Hideo Mizutani ,  Susumu Makinouchi ,  Akikazu Tanimoto

    IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G03B27/74 ,  G03B27/80

    CPC分类号： G03F7/706 ,  G03F7/70241 ,  G03F7/70858 ,  G03F7/70883

    摘要： A projection optical apparatus comprises a projection optical system for projecting the image of an object onto a substrate, data collecting means for obtaining data regarding a factor which causes a variation in the optical characteristic of the projection optical system, adjusting means for adjusting the relation between the substrate and the image of the object relative to the variation in the optical characteristic of the projection optical system, means for determining the amount of adjustment by the adjusting means in accordance with a model formula using a predetermined parameter on the basis of the data obtained by the data collecting means, means for independently measuring the variation in the optical characteristic of the projection optical system, and means for correcting the parameter of the model formula on the basis of the result measured by the measuring means.

    摘要翻译： 投影光学装置包括用于将物体的图像投影到基板上的投影光学系统，用于获得关于引起投影光学系统的光学特性变化的因素的数据的数据收集装置，用于调整投影光学系统的光学特性之间的关系的调整装置 基板和物体相对于投影光学系统的光学特性的变化的图像，用于根据获得的数据使用预定参数根据模型公式确定调节装置的调整量的装置 通过数据采集装置，用于独立地测量投影光学系统的光学特性的变化的装置，以及用于基于由测量装置测量的结果来校正模型公式的参数的装置。

    Projection optical apparatus
    9.
    发明授权
    Projection optical apparatus 失效
    投影光学仪器

    公开(公告)号：US4701606A

    公开(公告)日：1987-10-20

    申请号：US792764

    申请日：1985-10-30

    申请人： Akikazu Tanimoto ,  Shoji Ishizaka

    发明人： Akikazu Tanimoto ,  Shoji Ishizaka

    IPC分类号： H01L21/30 ,  G02B27/18 ,  G03F7/20 ,  G03F9/02 ,  H01L21/027 ,  H01J40/14

    CPC分类号： G03F7/70241 ,  G03F7/70883

    摘要： A projection optical apparatus adapted for use in lithographic apparatus for semiconductor device manufacturing purposes and the like. A monitoring light beam of a given polarization is introduced into an imaging optical system of the projection optical apparatus and a polarized component of the monitoring light beam transmitted through the imaging optical system is subjected to photoelectric conversion. A variation of an optical characteristic of the imaging optical system is detected in accordance with the photoelectrically converted output signal.

    摘要翻译： 适用于半导体装置制造用的光刻装置的投影光学装置等。 将给定极化的监视光束引入到投影光学装置的成像光学系统中，并且通过成像光学系统透射的监视光束的偏振分量进行光电转换。 根据光电转换的输出信号检测成像光学系统的光学特性的变化。