Wafer processing deposition shielding components
    4.
    发明授权
    Wafer processing deposition shielding components 有权
    晶圆处理沉积屏蔽组件

    公开(公告)号:US09062379B2

    公开(公告)日:2015-06-23

    申请号:US13524859

    申请日:2012-06-15

    IPC分类号: C23C14/56 H01J37/34

    摘要: Embodiments described herein generally relate to components for a semiconductor processing chamber, a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a process kit. In one embodiment a lower shield for encircling a sputtering target and a substrate support is provided. The lower shield comprises a cylindrical outer band having a first diameter dimensioned to encircle the sputtering surface of the sputtering target and the substrate support, the cylindrical band comprising a top wall that surrounds a sputtering surface of a sputtering target and a bottom wall that surrounds the substrate support, a support ledge comprising a resting surface and extending radially outward from the cylindrical outer band, a base plate extending radially inward from the bottom wall of the cylindrical band, and a cylindrical inner band coupled with the base plate and partially surrounding a peripheral edge of the substrate support.

    摘要翻译: 本文描述的实施例通常涉及用于半导体处理室的部件,用于半导体处理室的处理套件和具有处理套件的半导体处理室。 在一个实施例中,提供了用于环绕溅射靶的底部屏蔽件和衬底支撑件。 下屏蔽包括具有第一直径的圆柱形外带,其尺寸被设计成围绕溅射靶的溅射表面和衬底支撑件,该圆柱形带包括围绕溅射靶的溅射表面的顶壁和围绕溅射靶的底壁 衬底支撑件,包括搁置表面并从圆柱形外带径向向外延伸的支撑凸缘,从圆柱形带的底壁径向向内延伸的底板,以及与基板耦合并部分围绕外围的圆柱形内带 基板支撑的边缘。

    Insertable Lighting Device
    5.
    发明申请
    Insertable Lighting Device 有权
    可插入照明设备

    公开(公告)号:US20150025325A1

    公开(公告)日:2015-01-22

    申请号:US14287306

    申请日:2014-05-27

    申请人: Meng-G Martin Lee

    发明人: Meng-G Martin Lee

    IPC分类号: A61B1/07 A61B19/00

    摘要: The present invention relates to an insertable lighting device that includes an optical fiber assembly 40 that resides slidably within the elongated interior cavity 58 of an introducer sheath 10 that includes an incision blade 12 on the first (or forward) end 49 thereof, which can be inserted through a cavity wall 32 and into an internal cavity 97. The introducer sheath 10 is also slidably positionable over and along the optical fiber assembly 40. The insertable lighting device also includes a light source assembly 22 which includes a light source 20 that introduces light into the optical fiber 18 of the optical fiber assembly 40. The first optical fiber assembly end 43 is adapted to emit light therefrom. The present invention also relates to a method of illuminating an internal cavity with the insertable lighting device.

    摘要翻译: 本发明涉及一种可插入照明装置,其包括光纤组件40,光纤组件40可滑动地位于引导器护套10的细长内部空腔58内,该引导器护套10在其第一(或向前)端部49上包括切割刀片12, 插入穿过腔壁32并进入内腔97.引导器护套10也可沿着光纤组件40滑动定位。可插入照明装置还包括光源组件22,光源组件22包括引入光的光源20 进入光纤组件40的光纤18.第一光纤组件端43适于从其发射光。 本发明还涉及利用可插入照明装置照亮内腔的方法。

    Lumen Depreciation Management
    6.
    发明申请
    Lumen Depreciation Management 有权
    流明折旧管理

    公开(公告)号:US20140062307A1

    公开(公告)日:2014-03-06

    申请号:US13599627

    申请日:2012-08-30

    IPC分类号: H05B37/03

    CPC分类号: H05B33/0893

    摘要: A monitoring system is configured to manage lumen depreciation in a lighting fixture and includes an optic housing, a light source with a light-emitting diode (LED), a processor, and a memory device. The memory device stores instructions that cause the monitoring system to measure elapsed time during which the LED light source emits the light and, based on the elapsed time, determine a current level of the emitted light. In response to the current level changing from an acceptable level to an unacceptable level, an alert is provided to show that the emitted light has reached the unacceptable level. A reset input is received to remove the alert for a predetermined period of time. Changes in status of the LED light source are indicated.

    摘要翻译: 监视系统被配置为管理照明器具中的流明折旧,并且包括光学外壳,具有发光二极管(LED)的光源,处理器和存储器件。 存储装置存储使监视系统测量LED光源发射光的经过时间的指令,并且基于经过的时间确定发射光的当前水平。 响应于当前水平从可接受水平变化到不可接受的水平,提供警报以示出发射的光已经达到不可接受的水平。 接收到复位输入以在预定时间段内消除警报。 指示LED光源的状态变化。

    WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS

    公开(公告)号:US20130334038A1

    公开(公告)日:2013-12-19

    申请号:US13524859

    申请日:2012-06-15

    IPC分类号: C23C14/34

    摘要: Embodiments described herein generally relate to components for a semiconductor processing chamber, a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a process kit. In one embodiment a lower shield for encircling a sputtering target and a substrate support is provided. The lower shield comprises a cylindrical outer band having a first diameter dimensioned to encircle the sputtering surface of the sputtering target and the substrate support, the cylindrical band comprising a top wall that surrounds a sputtering surface of a sputtering target and a bottom wall that surrounds the substrate support, a support ledge comprising a resting surface and extending radially outward from the cylindrical outer band, a base plate extending radially inward from the bottom wall of the cylindrical band, and a cylindrical inner band coupled with the base plate and partially surrounding a peripheral edge of the substrate support.

    Method, system and computer program product for management of roping contestant entries
    8.
    发明授权
    Method, system and computer program product for management of roping contestant entries 失效
    巡回赛选手管理方法,系统和计算机程序产品

    公开(公告)号:US08571693B2

    公开(公告)日:2013-10-29

    申请号:US13099373

    申请日:2011-05-03

    申请人: Martin Lee Meketi

    发明人: Martin Lee Meketi

    IPC分类号: G06F19/00

    CPC分类号: G06Q10/10

    摘要: A method is disclosed for collecting fees from, managing, and remunerating contestants in a livestock roping and/or rodeo competition. Contestants in a competition are remunerated after being eliminated in successive runs of the competition in accordance with a predetermined criteria. The remuneration may be monetary and based on total revenue generated, based on the entry price, based on the costs of travel, or in the form of commercial products, such as hardware, music productions, software and the like, as disclosed herein. The object of the present invention is to provide contestants with a way of mitigating the inherent risk of being eliminated from most roping competitions after one, two, or a short amount of runs and having to bear the complete loss of entry fees, travel, board and other incidental expenses. A further object of the present invention is to provide a way of recognizing the membership of contestants from multiple organizations in a single event provided they announce the intention of competing in an event open to all memberships before entering and winning qualifying competitions.

    摘要翻译: 披露了一种在牲畜抢劫和/或野牛竞赛中收取竞争对手的费用,管理和报酬的方法。 比赛中的参赛者根据预定的标准在连续比赛中被淘汰后获得报酬。 报酬可以是货币性的,并且基于入场价格,基于旅行费用,或以商业产品(例如硬件,音乐作品,软件等)的形式产生的总收入。 本发明的目的是为参赛者提供一种方法,以减轻一次,两次或少量运行后大多数赛车比赛中消除的固有风险,并且必须承担入场费,旅行,董事会的完全丧失 和其他附带费用。 本发明的另一个目的是提供一种在单个事件中识别来自多个组织的参赛者的成员资格的方式,只要他们在进入和赢得合格的比赛之前宣布在所有会员资格的比赛中进行竞争的意图。

    Electrostatic chuck and methods of use thereof
    9.
    发明授权
    Electrostatic chuck and methods of use thereof 有权
    静电吸盘及其使用方法

    公开(公告)号:US08559159B2

    公开(公告)日:2013-10-15

    申请号:US13198204

    申请日:2011-08-04

    IPC分类号: H01T23/00

    摘要: An electrostatic chuck and method of use thereof is provided herein. In some embodiments, an electrostatic chuck may include a disk having a first side to support a substrate thereon and a second side, opposing the first side, to provide an interface to selectively couple the disk to a thermal control plate, a first electrode disposed within the disk proximate the first side to electrostatically couple the substrate to the disk and a second electrode disposed within the disk proximate the opposing side of the disk to electrostatically couple the disk to the thermal control plate. In some embodiments, the second electrode may also be configured to heat the disk.

    摘要翻译: 本文提供了静电卡盘及其使用方法。 在一些实施例中,静电卡盘可以包括具有支撑其上的基板的第一侧的盘和与第一侧相对的第二侧,以提供用于选择性地将盘耦合到热控制板的界面,第一电极设置在 靠近第一侧的盘,以将衬底静电耦合到盘,以及设置在靠近盘的相对侧的盘内的第二电极,以将盘静电耦合到热控制板。 在一些实施例中,第二电极也可以被配置为加热盘。

    WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS
    10.
    发明申请
    WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS 有权
    波浪加工沉积屏蔽部件

    公开(公告)号:US20120211359A1

    公开(公告)日:2012-08-23

    申请号:US13457441

    申请日:2012-04-26

    IPC分类号: C23C14/34

    摘要: Embodiments described herein generally relate to components for a semiconductor processing chamber, a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a process kit. In one embodiment a lower shield for encircling a sputtering target and a substrate support is provided. The lower shield comprises a cylindrical outer band having a first diameter dimensioned to encircle the sputtering surface of the sputtering target and the substrate support, the cylindrical band comprising a top wall that surrounds a sputtering surface of a sputtering target and a bottom wall that surrounds the substrate support, a support ledge comprising a resting surface and extending radially outward from the cylindrical outer band, a base plate extending radially inward from the bottom wall of the cylindrical band, and a cylindrical inner band coupled with the base plate and partially surrounding a peripheral edge of the substrate support.

    摘要翻译: 本文描述的实施例通常涉及用于半导体处理室的部件,用于半导体处理室的处理套件和具有处理套件的半导体处理室。 在一个实施例中,提供了用于环绕溅射靶的底部屏蔽件和衬底支撑件。 下屏蔽包括具有第一直径的圆柱形外带,其尺寸被设计成围绕溅射靶的溅射表面和衬底支撑件,该圆柱形带包括围绕溅射靶的溅射表面的顶壁和围绕溅射靶的底壁 衬底支撑件,包括搁置表面并从圆柱形外带径向向外延伸的支撑凸缘,从圆柱形带的底壁径向向内延伸的底板,以及与基板耦合并部分围绕外围的圆柱形内带 基板支撑的边缘。