发明申请
US20050231706A1 Feedforward control with reduced learning time for lithographic system to improve throughput and accuracy
审中-公开
前馈控制，减少光刻系统的学习时间，提高产量和精度
- 专利标题： Feedforward control with reduced learning time for lithographic system to improve throughput and accuracy
- 专利标题（中）： 前馈控制，减少光刻系统的学习时间，提高产量和精度
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申请号： US10825022申请日： 2004-04-14
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公开(公告)号： US20050231706A1公开(公告)日： 2005-10-20
- 发明人: Pai-Hsueh Yang , Hideyuki Hashimoto , Bausan Yuan , Atsushi Yamaguchi , Susumu Makinouchi
- 申请人： Pai-Hsueh Yang , Hideyuki Hashimoto , Bausan Yuan , Atsushi Yamaguchi , Susumu Makinouchi
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 主分类号： G03B27/58
- IPC分类号： G03B27/58 ; G03F7/20
摘要：
Embodiments of the present invention are directed to a control system and method for controlling the trajectory and alignment of one or more stages by incorporating a grouping method in the control methodology. In one embodiment, a method of controlling movement of one or more stages of a precision assembly to process a substrate having a plurality of process regions comprises dividing the substrate into blocks according to one or more preset criteria, each block of the substrate including one or more process regions; generating learning data for one or more representative process regions for each block of the substrate; and using the generated learning data of the one or more representative process regions of each block to control movement of the one or more stages to process the block of one or more process regions of the substrate.
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