公开(公告)号：US11922274B1

公开(公告)日：2024-03-05

申请号：US17323487

申请日：2021-05-18

Applicant: Intel Corporation

Inventor： Hubert C. George ,  James S. Clarke ,  Ravi Pillarisetty ,  Brennen Karl Mueller ,  Stephanie A. Bojarski ,  Eric M. Henry ,  Roza Kotlyar ,  Thomas Francis Watson ,  Lester Lampert ,  Samuel Frederick Neyens

IPC: G06N10/00 ,  H01L29/775 ,  H01L29/12 ,  H01L27/088

CPC classification number: G06N10/00 ,  H01L27/088 ,  H01L29/122 ,  H01L29/775

Abstract: Quantum dot devices with three of more accumulation gates provided over a single row of a quantum dot formation region are disclosed. Each accumulation gate is electrically coupled to a respective doped region. In this manner, multiple single electron transistors (SETs) are provided along the row. Side and/or center screening gates may be used to apply microwave pulses for qubit control and to control electrostatics so that source and drain regions of the multiple SETs with quantum dots formed along the single row of a quantum dot formation region are sufficiently isolated from one another. Such quantum dot devices provide strong spatial localization of the quantum dots, good control over quantum dot interactions and manipulation, good scalability in the number of quantum dots included in the device, and/or design flexibility in making electrical connections to the quantum dot devices to integrate the quantum dot devices in larger computing devices.

公开(公告)号：US11367722B2

公开(公告)日：2022-06-21

申请号：US16138356

申请日：2018-09-21

Applicant: INTEL CORPORATION

Inventor： Aaron Lilak ,  Stephen Cea ,  Gilbert Dewey ,  Willy Rachmady ,  Roza Kotlyar ,  Rishabh Mehandru ,  Sean Ma ,  Ehren Mannebach ,  Anh Phan ,  Cheng-Ying Huang

IPC: H01L27/092 ,  H01L29/06 ,  H01L29/78 ,  H01L29/66 ,  H01L29/423 ,  H01L29/10 ,  H01L29/08 ,  H01L21/8238 ,  H01L29/16

Abstract: A nanowire transistor structure has a first device region with a first body of semiconductor material having a first cross-sectional shape. A second device region has a second body with a second cross-sectional shape different from the first cross-sectional shape. The first device section is vertically above or below the second device section with the bodies extending horizontally between a source and drain. A first gate structure is wrapped around the first body and a second gate structure is wrapped around the second body. Differences in the geometries of the nanowires can be used to optimize performance in the first device section independently of the second device section.

公开(公告)号：US20220013658A1

公开(公告)日：2022-01-13

申请号：US17472015

申请日：2021-09-10

Applicant: Intel Corporation

Inventor： Ravi Pillarisetty ,  Van H. Le ,  Nicole K. Thomas ,  Hubert C. George ,  Jeanette M. Roberts ,  Payam Amin ,  Zachary R. Yoscovits ,  Roman Caudillo ,  James S. Clarke ,  Roza Kotlyar ,  Kanwaljit Singh

IPC: H01L29/66 ,  G06N10/00 ,  H01L21/8234 ,  H01L27/088 ,  H01L27/12 ,  H01L29/15 ,  H01L29/78 ,  H01L29/82

Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include a (111) silicon substrate, a (111) germanium quantum well layer above the substrate, and a plurality of gates above the quantum well layer. In some embodiments, a quantum dot device may include a silicon substrate, an insulating material above the silicon substrate, a quantum well layer above the insulating material, and a plurality of gates above the quantum well layer.

公开(公告)号：US11107891B2

公开(公告)日：2021-08-31

申请号：US16650299

申请日：2017-12-23

Applicant: Intel Corporation

Inventor： Ravi Pillarisetty ,  Hubert C. George ,  Nicole K. Thomas ,  Jeanette M. Roberts ,  Roman Caudillo ,  Zachary R. Yoscovits ,  Kanwaljit Singh ,  Roza Kotlyar ,  Patrick H. Keys ,  James S. Clarke

IPC: H01L29/15 ,  G06N10/00 ,  B82Y10/00

Abstract: Quantum dot devices, and related systems and methods, are disclosed herein. In some embodiments, a quantum dot device may include a quantum well stack; a plurality of first gates above the quantum well stack; and a plurality of second gates above the quantum well stack; wherein the plurality of first gates are arranged in electrically continuous first rows and the plurality of second gates are arranged in electrically continuous second rows parallel to the first rows. Quantum dot devices according to various embodiments of the present disclosure are based on arranging first and second gates in hexagonal/honeycomb arrays.

公开(公告)号：US20200098756A1

公开(公告)日：2020-03-26

申请号：US16138356

申请日：2018-09-21

Applicant: INTEL CORPORATION

Inventor： Aaron Lilak ,  Stephen Cea ,  Gilbert Dewey ,  Willy Rachmady ,  Roza Kotlyar ,  Rishabh Mehandru ,  Sean Ma ,  Ehren Mannebach ,  Anh Phan ,  Cheng-Ying Huang

IPC: H01L27/092 ,  H01L29/06 ,  H01L29/78 ,  H01L29/66 ,  H01L29/16 ,  H01L29/423 ,  H01L29/10 ,  H01L29/08 ,  H01L21/8238

Abstract: A nanowire transistor structure has a first device region with a first body of semiconductor material having a first cross-sectional shape. A second device region has a second body with a second cross-sectional shape different from the first cross-sectional shape. The first device section is vertically above or below the second device section with the bodies extending horizontally between a source and drain. A first gate structure is wrapped around the first body and a second gate structure is wrapped around the second body. Differences in the geometries of the nanowires can be used to optimize performance in the first device section independently of the second device section.

公开(公告)号：US20190044050A1

公开(公告)日：2019-02-07

申请号：US15913799

申请日：2018-03-06

Applicant: Intel Corporation

Inventor： Ravi Pillarisetty ,  Kanwaljit Singh ,  Patrick H. Keys ,  Roman Caudillo ,  Hubert C. George ,  Zachary R. Yoscovits ,  Nicole K. Thomas ,  James S. Clarke ,  Roza Kotlyar ,  Payam Amin ,  Jeanette M. Roberts

IPC: H01L39/22 ,  H01L39/02 ,  H01L39/04 ,  H01L39/24 ,  G06N99/00

Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include: a base; a fin extending away from the base, wherein the fin includes a quantum well layer; a gate above the fin; and a material on side faces of the fin; wherein the fin has a width between its side faces, and the fin is strained in the direction of the width.

公开(公告)号：US20180323195A1

公开(公告)日：2018-11-08

申请号：US15773325

申请日：2015-12-03

Applicant: Intel Corporation

Inventor： Rishabh Mehandru ,  Roza Kotlyar ,  Stephen M. Cea ,  Patrick H. Keys

IPC: H01L27/092 ,  H01L29/10 ,  H01L21/8238

Abstract: Disclosed herein are stacked channel structures for metal oxide semiconductor field effect transistors (MOSFETs) and related circuit elements, computing devices, and methods. For example, a stacked channel structure may include: a semiconductor substrate having a substrate lattice constant; a fin extending away from the semiconductor substrate, the fin having an upper region and a lower region; a first transistor in the lower region, wherein the first transistor has a first channel, the first channel has a first lattice constant, and the first lattice constant is different from the substrate lattice constant; and a second transistor in the upper region, wherein the second transistor has a second channel, the second channel has a second lattice constant, and the second lattice constant is different from the substrate lattice constant.

公开(公告)号：US09935107B2

公开(公告)日：2018-04-03

申请号：US15024347

申请日：2013-12-16

Applicant: INTEL CORPORATION

Inventor： Stephen M Cea ,  Roza Kotlyar ,  Harold W Kennel ,  Kelin J Kuhn ,  Tahir Ghani

IPC: H01L27/092 ,  H01L29/04 ,  H01L29/78 ,  H01L29/66 ,  H01L29/10 ,  H01L21/8238

CPC classification number: H01L27/0924 ,  H01L21/823807 ,  H01L21/823821 ,  H01L29/045 ,  H01L29/1054 ,  H01L29/66795 ,  H01L29/7842 ,  H01L29/785

Abstract: Techniques and methods related to dual strained cladding layers for semiconductor devices, and systems incorporating such semiconductor devices.

公开(公告)号：US09818864B2

公开(公告)日：2017-11-14

申请号：US15040978

申请日：2016-02-10

Applicant: Intel Corporation

Inventor： Brian S. Doyle ,  Roza Kotlyar ,  Uday Shah ,  Charles C. Kuo

IPC: H01L29/06 ,  H01L29/78 ,  H01L29/66 ,  B82Y10/00 ,  H01L29/423 ,  H01L29/775 ,  H01L21/02 ,  H01L29/165 ,  H01L29/16

CPC classification number: H01L29/7827 ,  B82Y10/00 ,  H01L21/0237 ,  H01L21/02636 ,  H01L29/0669 ,  H01L29/0676 ,  H01L29/16 ,  H01L29/165 ,  H01L29/42376 ,  H01L29/42392 ,  H01L29/66431 ,  H01L29/66439 ,  H01L29/66666 ,  H01L29/775 ,  Y10S977/762

Abstract: Vertically oriented nanowire transistors including semiconductor layers or gate electrodes having compositions that vary over a length of the transistor. In embodiments, transistor channel regions are compositionally graded, or layered along a length of the channel to induce strain, and/or include a high mobility injection layer. In embodiments, a gate electrode stack including a plurality of gate electrode materials is deposited to modulate the gate electrode work function along the gate length.

公开(公告)号：US09412872B2

公开(公告)日：2016-08-09

申请号：US14521200

申请日：2014-10-22

Applicant: Intel Corporation

Inventor： Roza Kotlyar ,  Stephen M. Cea ,  Gilbert Dewey ,  Benjamin Chu-Kung ,  Uygar E. Avci ,  Rafael Rios ,  Anurag Chaudhry ,  Thomas D. Linton, Jr. ,  Ian A. Young ,  Kelin J. Kuhn

IPC: H01L29/78 ,  H01L29/739 ,  H01L29/16 ,  H01L29/161 ,  H01L29/06 ,  H01L29/24 ,  H01L29/267

CPC classification number: H01L29/66977 ,  H01L27/092 ,  H01L29/045 ,  H01L29/0676 ,  H01L29/068 ,  H01L29/1054 ,  H01L29/16 ,  H01L29/161 ,  H01L29/165 ,  H01L29/20 ,  H01L29/24 ,  H01L29/267 ,  H01L29/42392 ,  H01L29/7391 ,  H01L29/7842 ,  H01L29/785 ,  H01L29/78603 ,  H01L29/78642 ,  H01L29/78684 ,  H01L29/78696

Abstract: Tunneling field effect transistors (TFETs) for CMOS architectures and approaches to fabricating N-type and P-type TFETs are described. For example, a tunneling field effect transistor (TFET) includes a homojunction active region disposed above a substrate. The homojunction active region includes a relaxed Ge or GeSn body having an undoped channel region therein. The homojunction active region also includes doped source and drain regions disposed in the relaxed Ge or GeSn body, on either side of the channel region. The TFET also includes a gate stack disposed on the channel region, between the source and drain regions. The gate stack includes a gate dielectric portion and gate electrode portion.

Abstract translation: 描述了用于CMOS架构的隧道场效应晶体管（TFET）和制造N型和P型TFET的方法。 例如，隧道场效应晶体管（TFET）包括设置在衬底上方的均质有源区。 同质结有源区包括其中具有未掺杂沟道区的松弛Ge或GeSn体。 同质结有源区还包括设置在放大的Ge或GeSn体中，在沟道区两侧的掺杂源极和漏极区。 TFET还包括设置在沟道区域之间的源极和漏极区域之间的栅极堆叠。 栅极堆叠包括栅极电介质部分和栅极电极部分。