公开(公告)号：US11183564B2

公开(公告)日：2021-11-23

申请号：US16015087

申请日：2018-06-21

Applicant: Intel Corporation

Inventor： Nicole K. Thomas ,  Ravi Pillarisetty ,  Payam Amin ,  Roza Kotlyar ,  Patrick H. Keys ,  Hubert C. George ,  Kanwaljit Singh ,  James S. Clarke ,  David J. Michalak ,  Lester Lampert ,  Zachary R. Yoscovits ,  Roman Caudillo ,  Jeanette M. Roberts

IPC: H01L29/12 ,  H01L29/66 ,  H01L29/76 ,  H01L29/423 ,  H01L29/165 ,  H01L27/18 ,  H01L21/8234 ,  H01L29/10 ,  G06N10/00 ,  H01L39/14 ,  H01L29/06 ,  B82Y10/00 ,  H01L29/82 ,  H01L29/40 ,  H01L21/321 ,  H01L21/02 ,  H01L29/778 ,  H01L29/43

Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include: a quantum well stack including a quantum well layer and a barrier layer; a first gate metal above the quantum well stack, wherein the barrier layer is between the first gate metal and the quantum well layer; and a second gate metal above the quantum well stack, wherein the barrier layer is between the second gate metal and the quantum well layer, and a material structure of the second gate metal is different from a material structure of the first gate metal.

公开(公告)号：US20190334020A1

公开(公告)日：2019-10-31

申请号：US16349955

申请日：2016-12-14

Applicant: Intel Corporation

Inventor： Payam Amin ,  Nicole K. Thomas ,  James S. Clarke ,  Jessica M. Torres ,  Ravi Pillarisetty ,  Hubert C. George ,  Kanwaljit Singh ,  Van H. Le ,  Jeanette M. Roberts ,  Roman Caudillo ,  Zachary R. Yoscovits ,  David J. Michalak

IPC: H01L29/775 ,  H01L29/12 ,  H01L29/165 ,  H01L29/66 ,  H01L21/02 ,  G06N10/00

Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum processing device may include: a quantum well stack having alternatingly arranged relaxed and strained layers; and a plurality of gates disposed above the quantum well stack to control quantum dot formation in the quantum well stack.

公开(公告)号：US20190043951A1

公开(公告)日：2019-02-07

申请号：US16015087

申请日：2018-06-21

Applicant: Intel Corporation

Inventor： Nicole K. Thomas ,  Ravi Pillarisetty ,  Payam Amin ,  Roza Kotlyar ,  Patrick H. Keys ,  Hubert C. George ,  Kanwaljit Singh ,  James S. Clarke ,  David J. Michalak ,  Lester Lampert ,  Zachary R. Yoscovits ,  Roman Caudillo ,  Jeanette M. Roberts

IPC: H01L29/12 ,  H01L29/10 ,  H01L29/423 ,  H01L29/165 ,  H01L21/02 ,  H01L29/66 ,  H01L29/778 ,  G06N99/00

Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include: a quantum well stack including a quantum well layer and a barrier layer; a first gate metal above the quantum well stack, wherein the barrier layer is between the first gate metal and the quantum well layer; and a second gate metal above the quantum well stack, wherein the barrier layer is between the second gate metal and the quantum well layer, and a material structure of the second gate metal is different from a material structure of the first gate metal.

公开(公告)号：US20230197833A1

公开(公告)日：2023-06-22

申请号：US17558207

申请日：2021-12-21

Applicant: Intel Corporation

Inventor： Nicole K. Thomas ,  Payam Amin ,  Ravi Pillarisetty ,  Hubert C. George ,  James S. Clarke

IPC: H01L29/66 ,  H01L29/15 ,  H01L29/786 ,  H03K17/92 ,  G06N10/40

CPC classification number: H01L29/66977 ,  H01L29/158 ,  H01L29/78645 ,  H03K17/92 ,  G06N10/40 ,  H01L29/0665

Abstract: Quantum dot devices and related methods and systems that use semiconductor nanoribbons arranged in a grid where a plurality of first nanoribbons, substantially parallel to one another, intersect a plurality of second nanoribbons, also substantially parallel to one another but at an angle with respect to the first nanoribbons, are disclosed. Different gates at least partially wrap around individual portions of the first and second nanoribbons, and at least some of the gates are provided at intersections of the first and second nanoribbons. Unlike previous approaches to quantum dot formation and manipulation, nanoribbon-based quantum dot devices provide strong spatial localization of the quantum dots, good scalability in the number of quantum dots included in the device, and/or design flexibility in making electrical connections to the quantum dot devices to integrate the quantum dot devices in larger computing devices.

公开(公告)号：US20220013658A1

公开(公告)日：2022-01-13

申请号：US17472015

申请日：2021-09-10

Applicant: Intel Corporation

Inventor： Ravi Pillarisetty ,  Van H. Le ,  Nicole K. Thomas ,  Hubert C. George ,  Jeanette M. Roberts ,  Payam Amin ,  Zachary R. Yoscovits ,  Roman Caudillo ,  James S. Clarke ,  Roza Kotlyar ,  Kanwaljit Singh

IPC: H01L29/66 ,  G06N10/00 ,  H01L21/8234 ,  H01L27/088 ,  H01L27/12 ,  H01L29/15 ,  H01L29/78 ,  H01L29/82

Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include a (111) silicon substrate, a (111) germanium quantum well layer above the substrate, and a plurality of gates above the quantum well layer. In some embodiments, a quantum dot device may include a silicon substrate, an insulating material above the silicon substrate, a quantum well layer above the insulating material, and a plurality of gates above the quantum well layer.

公开(公告)号：US20200279937A1

公开(公告)日：2020-09-03

申请号：US16645962

申请日：2017-12-23

Applicant: Intel Corporation

Inventor： Ravi Pillarisetty ,  Willy Rachmady ,  Kanwaljit Singh ,  Nicole K. Thomas ,  Hubert C. George ,  Zachary R. Yoscovits ,  Roman Caudillo ,  Payam Amin ,  Jeanette M. Roberts ,  James S. Clarke

IPC: H01L29/66 ,  H01L29/43 ,  H01L29/12 ,  H01L29/165 ,  G06N10/00 ,  H01L29/423 ,  H01L27/088

Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum processing device may include a quantum well stack, the quantum well stack includes a quantum well layer, the quantum processing device further includes a plurality of gates above the quantum well stack to control quantum dot formation in the quantum well stack, and (1) gate metal of individual gates of the array of gates is tapered so as to narrow farther from the quantum well stack or (2) top surfaces of gate metal of individual gates of the array of gates are dished.

公开(公告)号：US20190044050A1

公开(公告)日：2019-02-07

申请号：US15913799

申请日：2018-03-06

Applicant: Intel Corporation

Inventor： Ravi Pillarisetty ,  Kanwaljit Singh ,  Patrick H. Keys ,  Roman Caudillo ,  Hubert C. George ,  Zachary R. Yoscovits ,  Nicole K. Thomas ,  James S. Clarke ,  Roza Kotlyar ,  Payam Amin ,  Jeanette M. Roberts

IPC: H01L39/22 ,  H01L39/02 ,  H01L39/04 ,  H01L39/24 ,  G06N99/00

Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include: a base; a fin extending away from the base, wherein the fin includes a quantum well layer; a gate above the fin; and a material on side faces of the fin; wherein the fin has a width between its side faces, and the fin is strained in the direction of the width.

公开(公告)号：US20250006592A1

公开(公告)日：2025-01-02

申请号：US18217208

申请日：2023-06-30

Applicant: Intel Corporation

Inventor： Ming-Yi Shen ,  Chi-Hing Choi ,  Jaladhi Mehta ,  Tofizur Rahman ,  Payam Amin ,  Justin E. Mueller ,  Vincent Hipwell ,  Cortnie S. Vogelsberg ,  Shivani Falgun Patel

IPC: H01L23/48 ,  H01L21/768 ,  H01L27/088

Abstract: Techniques to form low-resistance vias are discussed. In an example, semiconductor devices of a given row each include a semiconductor region extending in a first direction between corresponding source or drain regions, and a gate structure extending in a second direction over the semiconductor regions. Any semiconductor device may be separated from an adjacent semiconductor device along the second direction by a dielectric structure, through which a via passes. The via may include a conductive portion that extends through a dielectric wall in a third direction along at least an entire thickness of the gate structure. The conductive portion includes a conductive liner directly on the dielectric wall and a conductive fill on the conductive liner. The conductive liner comprises a pure elemental metal, such as tungsten, molybdenum, ruthenium, or a nickel aluminum alloy, with no metal nitride or barrier layer present between the conductive liner and the dielectric wall.

公开(公告)号：US11444188B2

公开(公告)日：2022-09-13

申请号：US16648402

申请日：2017-12-21

Applicant: Intel Corporation

Inventor： Ravi Pillarisetty ,  Nicole K. Thomas ,  Hubert C. George ,  Jeanette M. Roberts ,  Payam Amin ,  Zachary R. Yoscovits ,  Roman Caudillo ,  James S. Clarke

IPC: H01L29/778 ,  H01L29/12 ,  H01L21/321 ,  H01L21/8234 ,  H01L29/165 ,  H01L29/66 ,  H01L29/76 ,  H01L29/82 ,  B82Y10/00 ,  B82Y40/00

Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include: a base; a fin extending away from the base, wherein the fin includes a quantum well layer; an insulating material at least partially above the fin, wherein the insulating material includes a trench above the fin; and a gate metal on the insulating material and extending into the trench.

公开(公告)号：US20210036110A1

公开(公告)日：2021-02-04

申请号：US16648442

申请日：2017-12-17

Applicant: Intel Corporation

Inventor： Nicole K. Thomas ,  James S. Clarke ,  Jessica M. Torres ,  Ravi Pillarisetty ,  Kanwaljit Singh ,  Payam Amin ,  Hubert C. George ,  Jeanette M. Roberts ,  Roman Caudillo ,  David J. Michalak ,  Zachary R. Yoscovits ,  Lester Lampert

IPC: H01L29/12 ,  H01L27/088 ,  H01L21/8234 ,  H01L29/66 ,  H01L29/82

Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include: a quantum well stack including a quantum well layer, wherein the quantum well layer includes an isotopically purified material; a gate dielectric above the quantum well stack; and a gate metal above the gate dielectric, wherein the gate dielectric is between the quantum well layer and the gate metal.