公开(公告)号：US20150364290A1

公开(公告)日：2015-12-17

申请号：US14741324

申请日：2015-06-16

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Momoyo ENYAMA ,  Akira IKEGAMI ,  Hideto DOHI ,  Hideyuki KAZUMI ,  Naomasa SUZUKI

IPC分类号： H01J37/147 ,  H01J37/06 ,  H01J37/141

CPC分类号： H01J37/1478 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1534

摘要： The charged particle beam application device is provided with a charged particle source and an objective lens that converges charged particle beam generated by the charged particle source onto a sample. In this case, the charged particle beam application device is further provided with an aberration generating element installed between the charged particle beam source and the objective lens, a tilt-use deflector installed between the aberration generating element and the objective lens, a deflection aberration control unit for controlling the aberration generating element, a first electromagnetic field superposing multipole installed between the aberration generating element and the objective lens, and an electromagnetic field superposing multipole control unit for controlling the first electromagnetic field superposing multipole. The aberration generating element has such a function that when the charged particle beam is tilted relative to the sample by the tilt-use deflector, a plurality of resulting aberrations are cancelled with one another. Moreover, the first electromagnetic field superposing multipole has a function to change the orbit of a charged particle beam having energy different from that of the main charged particle beam in the charged particle beam.

摘要翻译： 带电粒子束施加装置设置有带电粒子源和将由带电粒子源产生的带电粒子束会聚到样本上的物镜。 在这种情况下，带电粒子束施加装置还设置有安装在带电粒子束源和物镜之间的像差产生元件，安装在像差产生元件和物镜之间的倾斜用偏转器，偏转像差控制 用于控制像差产生元件的单元，安装在像差产生元件和物镜之间的第一电磁场叠加多极，以及用于控制第一电磁场叠加多极的电磁场叠加多极控制单元。 像差产生元件具有这样的功能：当通过倾斜使用偏转器使带电粒子束相对于样本倾斜时，多个得到的像差彼此抵消。 此外，第一电磁场叠加多极具有改变具有与带电粒子束中的主带电粒子束的能量不同的能量的带电粒子束的轨道的功能。

公开(公告)号：US20210125806A1

公开(公告)日：2021-04-29

申请号：US16617319

申请日：2018-03-30

申请人： Hitachi High-Technologies Corporation

发明人： Koichi HAMADA ,  Megumi KIMURA ,  Momoyo ENYAMA ,  Ryou YUMIBA ,  Makoto SAKAKIBARA ,  Kei SAKAI ,  Satoru YAMAGUCHI ,  Katsumi SETOGUCHI

IPC分类号： H01J37/22 ,  H01J37/10

摘要： Provided is an electron beam observation device that includes: an electron source; an objective lens concentrating an electron beam emitted from the electron source; and a control unit configured to perform control such that a plurality of images is generated by capturing images of a reference sample having a specific pattern, and a frequency characteristic is calculated for each of the plurality of images, in which an image is generated based on a secondary signal generated from a sample due to irradiation of the sample with the electron beam, and the control unit holds the plurality of frequency characteristics.

公开(公告)号：US20200303152A1

公开(公告)日：2020-09-24

申请号：US16089281

申请日：2016-03-29

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Takashi OHSHIMA ,  Hiroyuki MINEMURA ,  Yumiko ANZAI ,  Momoyo ENYAMA ,  Yoichi OSE ,  Toshihide AGEMURA

IPC分类号： H01J37/073 ,  H01J37/22

摘要： To provide an electron microscope capable of performing the switching-over between normal illumination and annular illumination, wide-area irradiation, an interference pattern as desired or normal illumination in an expeditious and readily manner or achieving a better S/N ratio, the electron microscope comprises a photocathode 101 with negative electron affinity in use; an excitation optical system to excite the photocathode; and an electron optics system to irradiate an electron beam 13 generated from the photocathode by excitation light 12 irradiated through the excitation optical system onto a sample, the excitation optical system including a light source device 107 for the excitation light; and an optical modulation means 108 which is disposed in an optical path of the excitation light to perform spatial phase modulation to the excitation light.

公开(公告)号：US20160300690A1

公开(公告)日：2016-10-13

申请号：US15035265

申请日：2014-11-05

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Akira IKEGAMI ,  Hideto DOHI ,  Hideyuki KAZUMI ,  Yoichi OSE ,  Naomasa SUZUKI ,  Momoyo ENYAMA ,  Ryuji NISHI ,  Akio TAKAOKA

IPC分类号： H01J37/28 ,  H01J37/153 ,  H01J3/12 ,  H01J37/14

CPC分类号： H01J37/28 ,  H01J3/12 ,  H01J37/14 ,  H01J37/147 ,  H01J37/153 ,  H01J2237/15 ,  H01J2237/2611 ,  H01J2237/2814

摘要： Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.

摘要翻译： 提供一种带电粒子束装置，其能够同时消除由打开角度的非均匀分布和带电粒子束的能量引起的多个像差。 带电粒子束装置设有像差产生透镜，用于产生由于穿过离轴的带电粒子束造成的像差，以及校正透镜，用于使带电粒子束的轨迹会聚在 物镜不管带电粒子束的能量如何。 校正透镜的主表面设置在交叉位置，在该交叉位置处，具有不同开口角度的多个带电粒子束在通过像差产生透镜之后会聚。

公开(公告)号：US20170025251A1

公开(公告)日：2017-01-26

申请号：US15217460

申请日：2016-07-22

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Momoyo ENYAMA ,  Muneyuki FUKUDA ,  Hideyuki KAZUMI ,  Koichi HAMADA ,  Sayaka TANIMOTO

IPC分类号： H01J37/26 ,  H01J37/22

CPC分类号： H01J37/265 ,  H01J37/153 ,  H01J37/21 ,  H01J37/222 ,  H01J37/226 ,  H01J2237/049 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/223 ,  H01J2237/24542 ,  H01J2237/24592 ,  H01J2237/2801

摘要： A charged particle beam apparatus with improved depth of focus and maintained/improved resolution has a charged particle source, an off-axis illumination aperture, a lens, a computer, and a memory unit. The apparatus acquires an image by detecting a signal generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture. The computer has a beam-computing-process unit to estimate a beam profile of the charged particle beam and an image-sharpening-process unit to sharpen the image using the estimated beam profile.

摘要翻译： 具有改善的聚焦深度和分辨率的改进的带电粒子束装置具有带电粒子源，离轴照明孔径，透镜，计算机和存储单元。 该装置通过检测通过从带电粒子源经由离轴照射孔引起的带电粒子束照射样品而产生的信号来获取图像。 计算机具有用于估计带电粒子束的束轮廓的波束计算处理单元和使用估计波束轮廓来锐化图像的图像锐化处理单元。

公开(公告)号：US20130248731A1

公开(公告)日：2013-09-26

申请号：US13733955

申请日：2013-01-04

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Sayaka TANIMOTO ,  Hiroya OHTA ,  Makoto SAKAKIBARA ,  Momoyo ENYAMA ,  Kenji TANIMOTO

IPC分类号： H01J37/10

CPC分类号： H01J37/10 ,  H01J37/153 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/1534

摘要： There is provided both an electron beam apparatus and a lens array, capable of correcting a curvature of field aberration under various optical conditions. The electron beam apparatus comprises the lens array having a plurality of electrodes, and multiple openings are formed in the respective electrodes. An opening diameter distribution with respect to the respective opening diameters of the plural openings formed in the respective electrodes are individually set, and voltages applied to the respective electrodes are independently controlled to thereby independently adjust an image forming position of a reference beam, and a curvature of the lens array image surface.

摘要翻译： 提供能够在各种光学条件下校正场像差曲率的电子束装置和透镜阵列。 电子束装置包括具有多个电极的透镜阵列，并且在各个电极中形成多个开口。 分别设置相对于形成在各个电极中的多个开口的开口直径的开口直径分布，并且独立地控制施加到各个电极的电压，从而独立地调整参考光束的图像形成位置和曲率 的透镜阵列图像表面。