公开(公告)号：US20210125806A1

公开(公告)日：2021-04-29

申请号：US16617319

申请日：2018-03-30

申请人： Hitachi High-Technologies Corporation

发明人： Koichi HAMADA ,  Megumi KIMURA ,  Momoyo ENYAMA ,  Ryou YUMIBA ,  Makoto SAKAKIBARA ,  Kei SAKAI ,  Satoru YAMAGUCHI ,  Katsumi SETOGUCHI

IPC分类号： H01J37/22 ,  H01J37/10

摘要： Provided is an electron beam observation device that includes: an electron source; an objective lens concentrating an electron beam emitted from the electron source; and a control unit configured to perform control such that a plurality of images is generated by capturing images of a reference sample having a specific pattern, and a frequency characteristic is calculated for each of the plurality of images, in which an image is generated based on a secondary signal generated from a sample due to irradiation of the sample with the electron beam, and the control unit holds the plurality of frequency characteristics.