公开(公告)号：US06515296B1

公开(公告)日：2003-02-04

申请号：US09570538

申请日：2000-05-12

申请人： Fumio Komatsu ,  Motosuke Miyoshi ,  Katsuya Okumura

发明人： Fumio Komatsu ,  Motosuke Miyoshi ,  Katsuya Okumura

IPC分类号： G01N2300

CPC分类号： G01N23/225

摘要： In an operation of a pattern dimension measuring system comprising a stage, an electron gun part, electron lens systems for scanning electron beam on a sample and having a MOL mechanism thereto, a secondary electron detector for detecting secondary electrons and so forth emitted from the sample, and a host computer having a pattern dimension measuring part, the stage is moved at a constant velocity, the coordinates of the stage is measured by a laser interferometer in real time, the variation in working distance of the electron beam is measured in real time by the optical lever system from a focal length measuring part to be fed back to a stage control part and an objective lens. When a pattern serving as an object to be measured reaches a region capable of scanning, the electron beam is scanned in the best focus while moving the scanning start position of the electron beam in synchronism with the constant velocity movement of the stage, so that the SEM image thereof is acquired.

摘要翻译： 在包括阶段，电子枪部分，用于在样品上扫描电子束并具有MOL机制的电子透镜系统的图案尺寸测量系统的操作中，用于检测从样品发射的二次电子等的二次电子检测器 和具有图形尺寸测量部件的主机，以等速移动平台，通过激光干涉仪实时测量舞台的坐标，实时测量电子束的工作距离的变化 通过光学杆系统从焦距测量部分反馈到舞台控制部分和物镜。 当作为被测量物体的图案到达能够扫描的区域时，电子束以最佳聚焦扫描，同时与舞台的等速运动同步地移动电子束的扫描开始位置， 获取其SEM图像。

公开(公告)号：US5315119A

公开(公告)日：1994-05-24

申请号：US983229

申请日：1992-11-19

申请人： Fumio Komatsu ,  Katsuya Okumura ,  Motosuke Miyoshi

发明人： Fumio Komatsu ,  Katsuya Okumura ,  Motosuke Miyoshi

IPC分类号： G21K5/04 ,  H01J37/02 ,  H01J37/147 ,  H01J37/302 ,  H01L21/66

CPC分类号： H01J37/3026 ,  H01J37/026

摘要： To prevent electric charge up from being accumulated on the plane scanned by an electron beam and further to improve the S/N ratio, an electron beam irradiating apparatus comprising: position information signal outputting section for outputting position information signals, in sequence to designate positions at which an electron beam is irradiated on a plane scanned by the electron beam, so as to designate the irradiation positions at random; and irradiation controller for controlling the electron beam to irradiate the electron beam at the irradiation positions in response to the outputted position information signals. Further, to integrate an photoelectric signal over a sufficient time interval within the period of the pixel clock signal, the electric signal detecting circuit comprises a plurality of sample hold circuits and a selecting circuit for selecting and activating the sample hold circuits in sequence.

摘要翻译： 为了防止电荷积累在由电子束扫描的平面上并进一步提高S / N比，电子束照射装置包括：位置信息信号输出部分，用于输出位置信息信号，以依次指定位置信息信号 电子束照射在由电子束扫描的平面上，以便随机地指定照射位置; 以及照射控制器，用于响应于输出的位置信息信号，控制电子束在照射位置照射电子束。 此外，为了在像素时钟信号的周期内在足够的时间间隔内积分光电信号，电信号检测电路包括多个采样保持电路和用于依次选择和激活采样保持电路的选择电路。

公开(公告)号：US5818217A

公开(公告)日：1998-10-06

申请号：US222392

申请日：1994-04-04

申请人： Fumio Komatsu ,  Katsuya Okumura ,  Motosuke Miyoshi

发明人： Fumio Komatsu ,  Katsuya Okumura ,  Motosuke Miyoshi

IPC分类号： G21K5/04 ,  H01J37/02 ,  H01J37/147 ,  H01J37/302 ,  H01L21/66 ,  G01R31/305

CPC分类号： H01J37/3026 ,  H01J37/026

摘要： To prevent electric charge up from being accumulated on the plane scanned by an electron beam and further to improve the S/N ratio, an electron beam irradiating apparatus comprising: position information signal outputting section for outputting position information signals, in sequence to designate positions at which an electron beam is irradiated on a plane scanned by the electron beam, so as to designate the irradiation positions at random; and irradiation controller for-controlling the electron beam to irradiate the electron beam at the irradiation positions in response to the outputted position information signals. Further, to integrate an photoelectric signal over a sufficient time interval within the period of the pixel clock signal, the electric signal detecting circuit comprises a plurality of sample hold circuits and a selecting circuit for selecting and activating the sample hold circuits in sequence.

摘要翻译： 为了防止电荷积累在由电子束扫描的平面上并进一步提高S / N比，电子束照射装置包括：位置信息信号输出部分，用于输出位置信息信号，以依次指定位置信息信号 电子束照射在由电子束扫描的平面上，以便随机地指定照射位置; 以及照射控制器，用于响应于输出的位置信息信号，控制电子束在照射位置照射电子束。 此外，为了在像素时钟信号的周期内在足够的时间间隔内积分光电信号，电信号检测电路包括多个采样保持电路和用于依次选择和激活采样保持电路的选择电路。

公开(公告)号：US4807159A

公开(公告)日：1989-02-21

申请号：US897429

申请日：1986-08-18

申请人： Fumio Komatsu ,  Motosuke Miyoshi ,  Katsuya Okumura

发明人： Fumio Komatsu ,  Motosuke Miyoshi ,  Katsuya Okumura

IPC分类号： G21K5/04 ,  G01R31/26 ,  G01R31/305 ,  H01J37/04 ,  H01J37/28 ,  H01L21/027 ,  G01N23/00 ,  G21K1/08

CPC分类号： G01R31/305

摘要： Before detecting the surface state of specific patterns a sample by means of an electron beam tester system, patterns formed in a specified surface area of the sample, are detected by deflecting an electron beam by a deflection coil. Data representing current supplied to the deflection coil, data representing the position of the sample during the pattern-detecting operation, and image signals representing the patterns found in the specified surface area, are stored in a memory. While the specific patterns of a sample are being detected, the electron beam is used to perform a second pattern-detecting operation. Data representing current supplied to the deflection coil during the second pattern-detecting operation, such data representing the position of the sample, and image signals provided by the second pattern-detecting operation representing the patterns formed in the specified surface area, afe compared with those data items already stored in the memory. From the difference between the compared two sets of data items, any drift in the electron beam is calculated. In accordance with the drift thus calculated, the deflection coil is energized to deflec the electron beam such that the beam is applied onto the desired portion of the sample.

摘要翻译： 在通过电子束测试仪系统检测特定图案的表面状态之前，通过偏转线圈偏转电子束来检测在样品的规定表面积中形成的图案。 表示提供给偏转线圈的电流的数据，表示图案检测操作期间的样品的位置的数据和表示在指定表面积中发现的图案的图像信号被存储在存储器中。 当正在检测样品的特定图案时，电子束用于执行第二图案检测操作。 表示在第二图案检测操作期间提供给偏转线圈的电流的数据，表示样品位置的数据和表示在指定表面积中形成的图案的第二图案检测操作提供的图像信号 已存储在存储器中的数据项。 根据比较的两组数据项之间的差异，计算电子束中的任何漂移。 根据如此计算的漂移，偏转线圈被通电以使电子束分离，使得光束被施加到样品的期望部分上。

公开(公告)号：US07193221B2

公开(公告)日：2007-03-20

申请号：US10516827

申请日：2003-06-10

申请人： Katsuya Okumura ,  Motosuke Miyoshi

发明人： Katsuya Okumura ,  Motosuke Miyoshi

IPC分类号： H01J3/26 ,  H01J3/14 ,  G21K1/08

CPC分类号： H01J37/12 ,  H01J37/147 ,  H01J37/153 ,  H01J2237/1215

摘要： The present invention provides an electron optical lens column suitable for miniaturization, and provides the manufacturing method thereof. The column unit (1) comprises an inner column (11) and an outer column (12). The column unit is, as a whole, structured from a high-resistance electrically conductive ceramic. Electrostatic lenses (21, 22, 23, and 24) are affixed to the inner surface (111) of the inner column using a means such as plating or vapor deposition. Of the electrodes or electrode parts (211–213, 221, 231, 232, and 241–243) from which the lens is structured, those that share the same electric potential are connected by shared interconnections. This makes it possible to connect all of the electrodes or electrode parts with shared electric potentials as a group to the external interconnections.

摘要翻译： 本发明提供一种适用于小型化的电子光学透镜柱，并提供其制造方法。 柱单元（1）包括内柱（11）和外柱（12）。 作为一个整体，柱单元由高电阻导电陶瓷构成。 静电透镜（21,22,23和24）使用电镀或气相沉积等方法固定在内柱的内表面（111）上。 在透镜构成的电极或电极部分（211-213,221,231,232和241-243）中，共享相同电位的电极或电极部分通过共享互连连接。 这使得可以将作为一组的共享电位的所有电极或电极部分连接到外部互连。

公开(公告)号：US20050173649A1

公开(公告)日：2005-08-11

申请号：US10516827

申请日：2003-06-10

申请人： Katsuya Okumura ,  Motosuke Miyoshi

发明人： Katsuya Okumura ,  Motosuke Miyoshi

IPC分类号： G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J37/12 ,  H01J37/147 ,  H01J37/153 ,  H01J37/16

CPC分类号： H01J37/12 ,  H01J37/147 ,  H01J37/153 ,  H01J2237/1215

摘要： The present invention provides an electron optical lens column suitable for miniaturization, and provides the manufacturing method thereof. The column unit (1) comprises an inner column (11) and an outer column (12). The column unit is, as a whole, structured from a high-resistance electrically conductive ceramic. Electrostatic lenses (21, 22, 23, and 24) are affixed to the inner surface (111) of the inner column using a means such as plating or vapor deposition. Of the electrodes or electrode parts (211-213, 221, 231, 232, and 241-243) from which the lens is structured, those that share the same electric potential are connected by shared interconnections. This makes it possible to connect all of the electrodes or electrode parts with shared electric potentials as a group to the external interconnections.

摘要翻译： 本发明提供一种适用于小型化的电子光学透镜柱，并提供其制造方法。 柱单元（1）包括内柱（11）和外柱（12）。 作为一个整体，柱单元由高电阻导电陶瓷构成。 静电透镜（21,22,23和24）使用电镀或气相沉积等方法固定在内柱的内表面（111）上。 在透镜构成的电极或电极部分（211-213,221,231,232和241-243）中，共享相同电位的电极或电极部分通过共用互连连接。 这使得可以将作为一组的共享电位的所有电极或电极部分连接到外部互连。

公开(公告)号：US5639308A

公开(公告)日：1997-06-17

申请号：US552673

申请日：1995-11-03

申请人： Yuichiro Yamazaki ,  Motosuke Miyoshi ,  Katsuya Okumura

发明人： Yuichiro Yamazaki ,  Motosuke Miyoshi ,  Katsuya Okumura

IPC分类号： C23F4/00 ,  C23F4/02 ,  H01J27/18 ,  H01J37/32 ,  H01L21/203 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H05H1/24 ,  C23C16/48 ,  C23F1/02 ,  H01J27/20 ,  H05H1/16

CPC分类号： H01J27/18 ,  H01J37/3233 ,  H01J37/32623 ,  H01J37/3266 ,  H05H1/24

摘要： A plasma apparatus generates plasma by introducing electron beams into a processing chamber filled with a reactive gas for irradiation of the reactive gas with the introduced electron beams, to process a substance by the generated plasma. The plasma apparatus has a sample base for mounting the substance to be processed so that a processing surface of the substance is not directed in a direction perpendicular to a travel direction of the electron beams introduced into the processing chamber; a suppressing section for suppressing divergence of the electron beams introduced into the processing chamber; and a control section for controlling current density distribution of the divergence-suppressed electron beams so that current density distribution of ions contained in the plasma can be uniformalized on the substance to be processed.

摘要翻译： 等离子体装置通过将电子束引入填充有用于用引入的电子束照射反应性气体的反应气体的处理室来产生等离子体，以通过产生的等离子体处理物质。 等离子体装置具有用于安装待处理物质的样品基底，使得物质的处理表面不指向与引入处理室的电子束的行进方向垂直的方向; 用于抑制引入到处理室中的电子束的发散的抑制部分; 以及用于控制发散抑制电子束的电流密度分布的控制部分，使得包含在等离子体中的离子的电流密度分布能够对被处理物质均匀化。

公开(公告)号：US5548183A

公开(公告)日：1996-08-20

申请号：US364747

申请日：1994-12-27

申请人： Motosuke Miyoshi ,  Katsuya Okumura ,  Yuichiro Yamazaki

发明人： Motosuke Miyoshi ,  Katsuya Okumura ,  Yuichiro Yamazaki

IPC分类号： H01J37/143 ,  H01J37/06 ,  H01J37/065 ,  H01J37/073 ,  H01J37/18 ,  H01J41/12 ,  H01J41/18 ,  H01J3/20

CPC分类号： H01J37/065 ,  H01J37/18 ,  H01J41/18

摘要： In a magnetic field immersion type electron gun for controlling an electron beam emitted by an electron gun (51) with the use of an electric lens (56) and a magnetic field lens formed by permanent magnets (57, 58) of a coaxial ion pump (53), the ion pump magnets are a pair of cylindrical permanent magnets (57, 58) disposed coaxially with an optical axis (52) of the electron gun (51) in such a way as to sandwich a cylindrical ion pump anode (61) of the coaxial ion pump; the two permanent magnets are magnetized in a mutually opposing direction; a hollow cylindrical yoke (60) is disposed also coaxially with the optical axis (52) in such a way as to enclose the two permanent magnets (57, 58) within a hollow portion thereof; and the yoke (60) is formed with an annular yoke gap (63) in a radially inner circumferential surface of the yoke (60) to leak out a magnetic flux flowing through the yoke toward the optical axis. In the above-mentioned construction, the magnetic field lens can be formed efficiently with the use of the magnetic field generated by the permanent magnets for constituting the coaxial ion pump, and further the formed magnetic field lens can be superimposed upon the electron gun. Therefore, an electric field immersion type electron gun of high performance can be obtained, and further the electron gun chamber can be efficiently evacuated in the vicinity of the cathode tip of the electron gun.

摘要翻译： 在使用电镜（56）和同轴离子泵的永磁体（57,58）形成的磁场透镜的电磁枪（51）发射的电子束的磁场浸渍型电子枪中， （53）中，离子泵磁体是与电子枪（51）的光轴（52）同轴配置的一对筒状的永久磁铁（57,58），夹着圆筒状离子泵阳极 ）的同轴离子泵; 两个永磁体在相互相反的方向被磁化; 中空圆柱形磁轭（60）还与光轴（52）同轴设置，以便将两个永磁体（57,58）包围在其中空部分内; 并且轭（60）在轭（60）的径向内周面上形成有环形磁轭间隙（63），以使流过磁轭的磁通向光轴泄漏。 在上述结构中，可以通过使用由用于构成同轴离子泵的永久磁铁产生的磁场来有效地形成磁场透镜，并且还可以将形成的磁场透镜叠加在电子枪上。 因此，可以获得高性能的电场浸没型电子枪，并且可以在电子枪的阴极尖端附近有效地排出电子枪室。

公开(公告)号：US4912052A

公开(公告)日：1990-03-27

申请号：US248137

申请日：1988-09-23

申请人： Motosuke Miyoshi ,  Katsuya Okumura

发明人： Motosuke Miyoshi ,  Katsuya Okumura

IPC分类号： G01R19/00 ,  G01R31/26 ,  G01R31/302 ,  G01R31/305 ,  H01L21/66

CPC分类号： G01R31/305

摘要： This invention concerns a method and an apparatus for measuring and testing the electric characteristic of a semiconductor device in a non-contact fashion. For conducting measurement and testing in a non-contact fashion, an electron beam is used to induce a voltage, on a semiconductor device which is an object to be tested (an object to be measured.) By changes with lapse of time of the induced voltage, the electric characteristic, of the semiconductor device are determined. Thus, an electron beam is irradiated to an object to be tested to induce a voltage thereafter to examine changes in the induced voltage. Then, the electric characteristic of the semiconductor device is measured and tested from the voltage thus induced and the voltage measured thereafter.

公开(公告)号：US4800268A

公开(公告)日：1989-01-24

申请号：US91867

申请日：1987-09-01

申请人： Motosuke Miyoshi ,  Katsuya Okumura ,  Shigeru Ogawa

发明人： Motosuke Miyoshi ,  Katsuya Okumura ,  Shigeru Ogawa

IPC分类号： H01L21/66 ,  G01B11/30 ,  G01N21/88 ,  G01N21/89 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  H01J3/14

CPC分类号： G01N21/9501 ,  G01N2201/1045

摘要： An apparatus for scanning a laser beam to examine the surface of a semiconductor wafer comprises a stage onto which a semiconductor wafer is mounted and a laser beam scanning unit for repeatedly rectilinearly scanning a laser beam in a predetermined direction on the semiconductor wafer. This scanning apparatus further has a drive unit for rotating the semiconductor wafer and for moving the semiconductor wafer by only a predetermined distance in the predetermined direction every rotation of the wafer. The laser beam scanning unit rectilinearly scans the laser beam at a swing width of a predetermined amount.

摘要翻译： 用于扫描激光束以检查半导体晶片的表面的装置包括其上安装半导体晶片的台和用于在半导体晶片上沿预定方向重复地直线扫描激光束的激光束扫描单元。 该扫描装置还具有驱动单元，用于旋转半导体晶片，并且用于每半转晶圆使预定方向仅移动半导体晶片预定距离。 激光束扫描单元以预定量的摆动宽度直线地扫描激光束。