公开(公告)号：US4894540A

公开(公告)日：1990-01-16

申请号：US257557

申请日：1988-10-14

申请人： Fumio Komatsu

发明人： Fumio Komatsu

IPC分类号： H01J37/244 ,  G01B15/00 ,  G01N23/225 ,  H01J37/22 ,  H01J37/252 ,  H01J37/28 ,  H01L21/027 ,  H01L21/66 ,  H04N1/409

CPC分类号： H01J37/28

摘要： An image forming method includes a first step of irradiating a beam onto an object, and using an intensity corresponding to an image area onto which the beam was irradiated as an intensity of a pixel at the center of the image area, and scanning a beam throughout the inspection area of the object to obtain an image within the inspection area as a collection of pixels arranged at intervals smaller than a beam diameter; and a second step of assigning a pixel to be processed and neighboring pixels with coefficients in accordance with a beam intensity distribution, multiplying the intensity of each pixel by each assigned coefficient, determining a new intensity of the pixel to be processed in accordance with the sum of respective products, and repeating the new intensity determining process for all pixels necessary to be processed. In the second step, the value of the coefficients for those pixels except on the scanning direction may be reduced. Further, a third step may be provided for linearly-transforming the intensities so as to make the intensities of respective pixels to be distributed within a predetermined range.

公开(公告)号：US4807159A

公开(公告)日：1989-02-21

申请号：US897429

申请日：1986-08-18

申请人： Fumio Komatsu ,  Motosuke Miyoshi ,  Katsuya Okumura

发明人： Fumio Komatsu ,  Motosuke Miyoshi ,  Katsuya Okumura

IPC分类号： G21K5/04 ,  G01R31/26 ,  G01R31/305 ,  H01J37/04 ,  H01J37/28 ,  H01L21/027 ,  G01N23/00 ,  G21K1/08

CPC分类号： G01R31/305

摘要： Before detecting the surface state of specific patterns a sample by means of an electron beam tester system, patterns formed in a specified surface area of the sample, are detected by deflecting an electron beam by a deflection coil. Data representing current supplied to the deflection coil, data representing the position of the sample during the pattern-detecting operation, and image signals representing the patterns found in the specified surface area, are stored in a memory. While the specific patterns of a sample are being detected, the electron beam is used to perform a second pattern-detecting operation. Data representing current supplied to the deflection coil during the second pattern-detecting operation, such data representing the position of the sample, and image signals provided by the second pattern-detecting operation representing the patterns formed in the specified surface area, afe compared with those data items already stored in the memory. From the difference between the compared two sets of data items, any drift in the electron beam is calculated. In accordance with the drift thus calculated, the deflection coil is energized to deflec the electron beam such that the beam is applied onto the desired portion of the sample.

摘要翻译： 在通过电子束测试仪系统检测特定图案的表面状态之前，通过偏转线圈偏转电子束来检测在样品的规定表面积中形成的图案。 表示提供给偏转线圈的电流的数据，表示图案检测操作期间的样品的位置的数据和表示在指定表面积中发现的图案的图像信号被存储在存储器中。 当正在检测样品的特定图案时，电子束用于执行第二图案检测操作。 表示在第二图案检测操作期间提供给偏转线圈的电流的数据，表示样品位置的数据和表示在指定表面积中形成的图案的第二图案检测操作提供的图像信号 已存储在存储器中的数据项。 根据比较的两组数据项之间的差异，计算电子束中的任何漂移。 根据如此计算的漂移，偏转线圈被通电以使电子束分离，使得光束被施加到样品的期望部分上。

公开(公告)号：US06515296B1

公开(公告)日：2003-02-04

申请号：US09570538

申请日：2000-05-12

申请人： Fumio Komatsu ,  Motosuke Miyoshi ,  Katsuya Okumura

发明人： Fumio Komatsu ,  Motosuke Miyoshi ,  Katsuya Okumura

IPC分类号： G01N2300

CPC分类号： G01N23/225

摘要： In an operation of a pattern dimension measuring system comprising a stage, an electron gun part, electron lens systems for scanning electron beam on a sample and having a MOL mechanism thereto, a secondary electron detector for detecting secondary electrons and so forth emitted from the sample, and a host computer having a pattern dimension measuring part, the stage is moved at a constant velocity, the coordinates of the stage is measured by a laser interferometer in real time, the variation in working distance of the electron beam is measured in real time by the optical lever system from a focal length measuring part to be fed back to a stage control part and an objective lens. When a pattern serving as an object to be measured reaches a region capable of scanning, the electron beam is scanned in the best focus while moving the scanning start position of the electron beam in synchronism with the constant velocity movement of the stage, so that the SEM image thereof is acquired.

摘要翻译： 在包括阶段，电子枪部分，用于在样品上扫描电子束并具有MOL机制的电子透镜系统的图案尺寸测量系统的操作中，用于检测从样品发射的二次电子等的二次电子检测器 和具有图形尺寸测量部件的主机，以等速移动平台，通过激光干涉仪实时测量舞台的坐标，实时测量电子束的工作距离的变化 通过光学杆系统从焦距测量部分反馈到舞台控制部分和物镜。 当作为被测量物体的图案到达能够扫描的区域时，电子束以最佳聚焦扫描，同时与舞台的等速运动同步地移动电子束的扫描开始位置， 获取其SEM图像。

公开(公告)号：US5315119A

公开(公告)日：1994-05-24

申请号：US983229

申请日：1992-11-19

申请人： Fumio Komatsu ,  Katsuya Okumura ,  Motosuke Miyoshi

发明人： Fumio Komatsu ,  Katsuya Okumura ,  Motosuke Miyoshi

IPC分类号： G21K5/04 ,  H01J37/02 ,  H01J37/147 ,  H01J37/302 ,  H01L21/66

CPC分类号： H01J37/3026 ,  H01J37/026

摘要： To prevent electric charge up from being accumulated on the plane scanned by an electron beam and further to improve the S/N ratio, an electron beam irradiating apparatus comprising: position information signal outputting section for outputting position information signals, in sequence to designate positions at which an electron beam is irradiated on a plane scanned by the electron beam, so as to designate the irradiation positions at random; and irradiation controller for controlling the electron beam to irradiate the electron beam at the irradiation positions in response to the outputted position information signals. Further, to integrate an photoelectric signal over a sufficient time interval within the period of the pixel clock signal, the electric signal detecting circuit comprises a plurality of sample hold circuits and a selecting circuit for selecting and activating the sample hold circuits in sequence.

摘要翻译： 为了防止电荷积累在由电子束扫描的平面上并进一步提高S / N比，电子束照射装置包括：位置信息信号输出部分，用于输出位置信息信号，以依次指定位置信息信号 电子束照射在由电子束扫描的平面上，以便随机地指定照射位置; 以及照射控制器，用于响应于输出的位置信息信号，控制电子束在照射位置照射电子束。 此外，为了在像素时钟信号的周期内在足够的时间间隔内积分光电信号，电信号检测电路包括多个采样保持电路和用于依次选择和激活采样保持电路的选择电路。

公开(公告)号：US5302829A

公开(公告)日：1994-04-12

申请号：US003472

申请日：1993-01-12

申请人： Fumio Komatsu ,  Yasuhiro Kaga

发明人： Fumio Komatsu ,  Yasuhiro Kaga

IPC分类号： H01J37/147 ,  H01J37/21 ,  H01J37/28 ,  H01J37/26

CPC分类号： H01J37/28 ,  H01J37/21

摘要： An automatic focusing method for scanning electron microscopy. A scanning electron microscope is set in a low magnification mode to detect a taper portion of an object to be observed. The beam scanning whose direction is perpendicular to the taper portion is effected whenever objective lens control condition is changed at a first pitch, and the secondary electron signals obtained under these conditions are converted into video signals. The video signals are differential smoothed to calculate a sum of video signal absolute values. On the basis of the sum of the absolute values, an optimum objective lens control condition in the low magnification mode can be obtained. Sequentially, the microscope is set to a high magnification mode, and the objective lens control condition is further changed at a second pitch within a predetermined range with the optimum control condition in the low magnification mode as the center of the range. The beam scanning whose direction is perpendicular to the taper portion is effected. In the same way as in the low magnification mode, the secondary electrons signal obtained under these conditions are converted into video signals to obtain the optimum objective lens control condition in the high magnification mode. The optimum control condition obtained in the high magnification mode is determined as the control condition to determine the focal distance of the objective lens.

摘要翻译： 一种扫描电子显微镜的自动对焦方法。 将扫描型电子显微镜设定为低倍率模式，以检测被观察物体的锥形部分。 当物镜控制条件以第一节距改变时，其方向垂直于锥形部分的光束扫描实现，并且在这些条件下获得的二次电子信号被转换为视频信号。 视频信号被差分平滑以计算视频信号绝对值之和。 基于绝对值的和，可以获得低倍率模式下的最佳物镜控制条件。 接着，将显微镜设定为高放大倍数模式，并且以低放大倍数模式的最佳控制条件为范围，以预定范围内的第二间距进一步改变物镜控制条件。 实现了与锥形部分垂直的光束扫描。 以与低倍率模式相同的方式，在这些条件下获得的二次电子信号被转换为视频信号，以在高倍率模式下获得最佳物镜控制条件。 确定在高倍率模式下获得的最佳控制条件作为确定物镜焦距的控制条件。

公开(公告)号：US06363167B1

公开(公告)日：2002-03-26

申请号：US09260500

申请日：1999-03-02

申请人： Yumiko Miyano ,  Fumio Komatsu

发明人： Yumiko Miyano ,  Fumio Komatsu

IPC分类号： G06K900

CPC分类号： G06T7/62 ,  G06T2207/30148

摘要： A method for measuring a size of fine pattern wherein sizes of a plurality of fine patterns are measured using a scanning electron microscope is disclosed. The measuring method comprises the following procedures of obtaining a secondary electron image while scanning an electron beam on a fine pattern, determining whether or not the secondary electron image thus obtained meets a shape judgment criterion which has been set in advance, and, when the criterion is met as a result of determination processing, measuring a size of the fine pattern but, when the criterion is not met as a result of determination processing, moving to a next measurement area without measuring a size of the fine pattern.

摘要翻译： 公开了一种使用扫描电子显微镜测量多个精细图案的尺寸的精细图案尺寸的方法。 该测量方法包括在精细图案上扫描电子束时获得二次电子图像的步骤，确定如此获得的二次电子图像是否符合预先设定的形状判断标准，并且当标准 作为确定处理的结果，测量精细图案的尺寸，但是当作为确定处理的结果不满足标准时，移动到下一个测量区域而不测量精细图案的尺寸。

公开(公告)号：US6111981A

公开(公告)日：2000-08-29

申请号：US130522

申请日：1998-08-07

申请人： Koji Tsubusaki ,  Hiroshi Motoki ,  Fumio Komatsu

发明人： Koji Tsubusaki ,  Hiroshi Motoki ,  Fumio Komatsu

IPC分类号： G01B11/24 ,  G03F1/84 ,  G03F1/86 ,  G06K9/00 ,  G06T1/00 ,  G06T5/00 ,  G06T5/20 ,  G06T7/60

CPC分类号： G06T7/0081 ,  G06K9/0014 ,  G06K2209/19 ,  G06T2207/10061 ,  G06T2207/30148

摘要： Analog image data a SEM are converted into digital data, and are processed by a spatial filtering processing, histogram processing, threshold value setting, three-valued image data processing, noise reduction and the like. Area of a pattern in the three-valued image data is calculated by a labelling and calculation processing, and a pattern is sequentially detected by comparing the area of the pattern with a reference area value. The comparison and detection of the same or similar patterns repeated in the SEM image are performed by using the area of the pattern, and are not performed by a shape of the pattern, thereby resulting a precise detection at high speed by using a microprocessor. Since it is possible to perform a pattern recognition from the area value even though the pattern does not have a characteristic, it is possible to precisely detect and recognize a pattern image in high speed.

摘要翻译： 模拟图像数据，SEM被转换为数字数据，并通过空间滤波处理，直方图处理，阈值设置，三值图像数据处理，降噪等处理。 通过标记和计算处理计算三值图像数据中的图案的面积，并且通过将图案的面积与参考面积值进行比较来顺序地检测图案。 通过使用图案的区域来进行SEM图像中重复的相同或相似图案的比较和检测，并且不通过图案的形状进行，从而通过使用微处理器高速精确地检测。 由于即使图案不具有特征，也可以从区域值执行图案识别，因此可以高速精确地检测和识别图案图像。

公开(公告)号：US5528648A

公开(公告)日：1996-06-18

申请号：US348929

申请日：1994-11-25

申请人： Fumio Komatsu ,  Kunihiro Miyazaki ,  Ayako Shimazaki

发明人： Fumio Komatsu ,  Kunihiro Miyazaki ,  Ayako Shimazaki

IPC分类号： G01N23/223

CPC分类号： G01N23/223 ,  G01N2223/076

摘要： The fluorescent X-ray generated by elements when an X-ray is total reflected from a substrate surface is detected by a fluorescent X-ray detecting circuit; the fluorescent X-ray peak generated by the substrate element and the fluorescent X-ray peaks generated by contaminative elements are separated by a peak separating circuit; an integral intensity I.sub.0 of the fluorescent X-ray peak generated by the substrate element and integral intensities I of the fluorescent X-ray peaks generated by the contaminative elements are calculated by an integral intensity calculating circuit, respectively; and contaminative element concentrations N=N.sub.0 .multidot.(.eta..sub.0 / I.sub.0).multidot.(I / .eta.) (where N.sub.0 denotes the surface concentration of the substrate; .eta..sub.0 denotes the fluorescent yield of the substrate; and .eta. denotes the fluorescent yield of the contaminative elements) are calculated by a contaminative element concentration calculating circuit on the basis of the calculated integral intensities I.sub.0 and I. The contaminative elements can be analyzed non-destructively without use of any analytical curves, so that it is possible to save much labor required to prepare the analytical curves.

摘要翻译： 通过荧光X射线检测电路检测由X射线从基板表面全反射时由元件产生的荧光X射线; 由衬底元件产生的荧光X射线峰值和由污染元素产生的荧光X射线峰值由峰值分离电路分离; 通过积分强度计算电路分别计算由衬底元件产生的荧光X射线峰值和由污染元素产生的荧光X射线峰值的积分强度I的积分强度I0; 和污染元素浓度N = N0x（eta0 / I0）x（I / eta）（其中N0表示底物的表面浓度; eta 0表示底物的荧光产率; eta表示污染元素的荧光产率 ）通过污染元素浓度计算电路基于计算的积分强度I0和I计算。污染元素可以非破坏性地分析，而不使用任何分析曲线，使得可以节省准备所需的大量劳力 分析曲线。

公开(公告)号：US5490194A

公开(公告)日：1996-02-06

申请号：US348928

申请日：1994-11-25

申请人： Fumio Komatsu ,  Kunihiro Miyazaki ,  Ayako Shimazaki

发明人： Fumio Komatsu ,  Kunihiro Miyazaki ,  Ayako Shimazaki

IPC分类号： G01N23/223

CPC分类号： G01N23/223 ,  G01N2223/076

摘要： In the method and apparatus for analyzing contaminative element concentrations, a fluorescent X-ray generated by elements when an X-ray is total reflected from the surface of a substrate is detected by a fluorescent X-ray detector; a peak of the fluorescent X-ray generated by a substrate element and peaks of the fluorescent X-ray generated by other contaminative elements are separated from the detected fluorescent X-ray waveform by a peak separating circuit; and the concentrations of the detected contaminative elements are calculated on the basis of the separated peaks by a calculating circuit. In the peak detection, in particular, the peaks of the contaminative elements to be analyzed are detected from the waveform. When other peaks are present within a predetermed number of channels (energy eV) before and after each detected peak, the channel numbers and the signal intensities between the respective peaks are extracted. Further, the a true peak is determined after obtaining the evaluation values of the respective peaks, so that it is possible to separate peaks from the fluorescent X-ray waveform accurately, even if each peak is split in the observed waveform.

摘要翻译： 在用于分析污染元素浓度的方法和装置中，通过荧光X射线检测器检测当从基板的表面全反射X射线时由元件产生的荧光X射线; 由基板元件产生的荧光X射线的峰值和由其他污染元素产生的荧光X射线的峰值通过峰值分离电路与检测到的荧光X射线波形分离; 并且通过计算电路基于分离的峰值计算检测到的污染元素的浓度。 在峰值检测中，特别地，从波形检测要分析的污染元素的峰值。 当在每个检测到的峰之前和之后的预定数量的通道（能量eV）内存在其它峰时，提取各峰之间的通道数和信号强度。 此外，在获得各个峰值的评估值之后确定真正的峰值，使得即使每个峰值在观察波形中分裂，也可以精确地从荧光X射线波形分离峰值。

公开(公告)号：US5430786A

公开(公告)日：1995-07-04

申请号：US161270

申请日：1993-12-03

申请人： Fumio Komatsu ,  Kunihiro Miyazaki ,  Ayako Shimazaki

发明人： Fumio Komatsu ,  Kunihiro Miyazaki ,  Ayako Shimazaki

IPC分类号： G01N23/223 ,  G01N23/225

CPC分类号： G01N23/223 ,  G01N2223/076

摘要： Element identification and concentration calculation can be conducted with precision by correcting waveform distortion caused by the energy resolution of a detection system. A smoothing process is effected on a measured waveform of fluorescent X-rays obtained from an object to be measured. A device function of the detection system is obtained for each analytic element, based on the energy resolution of the detection system for a fluorescent X-ray energy value of each analytic element. A deconvolution process is effected on the measured waveform thus smoothed, by using the device functions of the detection system. Analytic elements are identified and concentrations of the analytic elements are obtained from the waveform data after the deconvolution process. The measured waveform is compensated for absorption in a beryllium window prior to smoothing.

摘要翻译： 可以通过校正由检测系统的能量分辨率引起的波形失真来精确地进行元件识别和浓度计算。 对从测量对象获得的荧光X射线的测量波形进行平滑处理。 基于每个分析元件的荧光X射线能量值的检测系统的能量分辨率，为每个分析元件获得检测系统的器件功能。 通过使用检测系统的设备功能，对所测量的波形进行去卷积处理。 识别分析元素，并且在去卷积处理之后从波形数据获得分析元素的浓度。 在平滑之前，测量的波形被补偿在铍窗口中的吸收。