Abstract:
An electronic device and method of generating a Physically Unclonable Function (“PUF”) value is disclosed. An OTP memory with a plurality of OTP cells that can be reliably and deterministically programmed with a minimum and a maximum program voltage being selected for pre-conditioning. All OTP cells can be programmed at least once around the minimum program voltage to hide the program status. Data to be programmed into the OTP can be a fixed, time-varying voltage or data from an entropy source. The programmed OTP data can be masked for weak bits and further randomized to generate PUF output by compressing a bit stream into a single bit, e.g., single parity bit. The PUF output can be through a hash function and/or to generate keys.
Abstract:
A method of testing an OTP memory is disclosed. An OTP program mechanism that uses heat accelerated electromigration can be fully tested. In one embodiment, an OTP cell's programmability can be tested if an initial OTP element resistance is less than a predetermined resistance, as such insures that sufficient heat can be generated to be programmable. A non-destructive program state, or fake reading 1, can be created by low-voltage programming a cell while reading the same cell at the same time. Accordingly, alternative 0s and 1s patterns can be generated to fully test every functional block of an OTP memory.
Abstract:
Programmable resistive memory can be fabricated with a non-single-crystalline silicon formed on a flexible substrate. The non-single-crystalline silicon can be amorphous silicon, low-temperature polysilicon (LTPS), organic semiconductor, or metal oxide semiconductor. The flexible substrate can be glass, plastics, paper, metal, paper, or any kinds of flexible film. The programmable resistive memory can be PCRAM, RRAM, MRAM, or OTP. The OTP element can be a silicon, polysilicon, organic or metal oxide electrode. The selector in a programmable resistive memory can be a MOS or diode with top gate, bottom gate, inverted, staggered, or coplanar structures.
Abstract:
Junction diodes fabricated in standard CMOS logic processes can be used as program selectors with at least one heat sink or heater to assist programming for One-Time Programmable (OTP) devices, such as electrical fuse, contact/via fuse, contact/via anti-fuse, or gate-oxide breakdown anti-fuse, etc. The heat sink can be at least one thin oxide area, extended OTP element area, or other conductors coupled to the OTP element to assist programming. A heater can be at least one high resistance area such as an unsilicided polysilicon, unsilicided active region, contact, via, or combined in serial, or interconnect to generate heat to assist programming. The OTP device has at least one OTP element coupled to at least one diode in a memory cell. The diode can be constructed by P+ and N+ active regions in a CMOS N well, or on an isolated active region as the P and N terminals of the diode. The isolation between P+ and the N+ active regions of the diode in a cell or between cells can be provided by dummy MOS gate, SBL, or STI/LOCOS isolations. The OTP element can be polysilicon, silicided polysilicon, silicide, polymetal, metal, metal alloy, local interconnect, metal-0, thermally isolated active region, CMOS gate, or combination thereof.
Abstract:
An OTP with ultra-low power read can be programmed with a minimum and a maximum program voltage. When programming within the range, the post-program OTP to pre-program resistance ratio can be larger than N, where N>50, so that more sensing techniques, such as single-end sensing, can be used to reduce read current. At least one of the OTP cells can be coupled to a common bitline, which can be further coupled to a first supply voltage lines via a plurality of datalines. The resistance in the at least one OTP cell can be evaluated by strobing at least one comparator output of the discharging bitline/dataline.
Abstract:
An One-Time Programmable (OTP) memory is built in at least one of nano-wire structures. The OTP memory has a plurality of OTP cells. At least one of the OTP cells can have at least one resistive element and at least one nano-wires. The at least one resistive element can be built by an extended source/drain or a MOS gate. The at least one nano-wires can be built on a common well or on an isolated structure that has at least one MOS gate dividing nano-wires into at least one first active region and a second active region.
Abstract:
An One-Time Programmable (OTP) memory is built in at least one of semiconductor fin structures. The OTP memory has a plurality of OTP cells. At least one of the OTP cells can have at least one resistive element and at least one fin. The at least one resistive element can be built by an extended source/drain or a MOS gate. The at least one fin can be built on a common well or on an isolated structure that has at least one MOS gate dividing fins into at least one first active region and a second active region.
Abstract:
An OTP (One-Time Programmable) memory including OTP memory cells that utilize OTP elements fabricated in CMOS FinFET processes. The OTP memory cell can also include at least one selector built upon at least one fin structure that has at least one CMOS gate to divide the fin structure into at least a first and a second active region. The selector can be implemented as a MOS device, dummy-gate diode, or Schottky diode as selector such as by using different types of source/drain implants. The OTP element that can be implemented as polysilicon, silicided polysilicon, CMOS metal gate, any layers of metal as interconnect, or active region. In one embodiment, the OTP element can be a fin structure and can be built upon the same fin structure as the at least one of the selector. By using different source/drain implant schemes on the two active regions, the selector can be turned on as MOS device, MOS device and/or diode, dummy-gate diode, or Schottky diode.
Abstract:
A programmable resistive memory having a plurality of programmable resistive cells. At least one of the programmable resistive cell includes a programmable resistive element and at least one selector. The selector can be built in at least one fin structure and at least one active region divided by at least one MOS gate into a first active region and a second active region. The first active region can have a first type of dopant to provide a first terminal of the selector. The second active region can have a first or a second type of dopant to provide a second terminal of the selector. The MOS gate can provide a third terminal of the selector. The first terminal of the selector can be coupled to the first terminal of the programmable resistive element. The programmable resistive element can be programmed by conducting current flowing through the selector to thereby change the resistance state.
Abstract:
An OTP (One-Time Programmable) memory including OTP memory cells that utilize OTP elements fabricated in CMOS FinFET processes. The OTP memory cell can also include at least one selector built upon at least one fin structure that has at least one CMOS gate to divide the fin structure into at least a first and a second active region. The selector can be implemented as a MOS device, dummy-gate diode, or Schottky diode as selector such as by using different types of source/drain implants. The OTP element that can be implemented as polysilicon, silicided polysilicon, CMOS metal gate, any layers of metal as interconnect, or active region. In one embodiment, the OTP element can be a fin structure and can be built upon the same fin structure as the at least one of the selector. By using different source/drain implant schemes on the two active regions, the selector can be turned on as MOS device, MOS device and/or diode, dummy-gate diode, or Schottky diode.