公开(公告)号：US09010270B2

公开(公告)日：2015-04-21

申请号：US13116941

申请日：2011-05-26

Applicant: Futoshi Shimai ,  Akihiko Sato ,  Tsutomu Sahoda ,  Kenji Maruyama

Inventor： Futoshi Shimai ,  Akihiko Sato ,  Tsutomu Sahoda ,  Kenji Maruyama

IPC: B05C5/00 ,  B05D3/00 ,  H01L21/67 ,  H01L21/677 ,  B05C5/02 ,  B05C9/04 ,  B05B13/02 ,  B05D1/00 ,  B05D1/26 ,  G11B5/842

CPC classification number: B05C5/02 ,  B05B13/02 ,  B05B13/0228 ,  B05B13/0278 ,  B05C9/04 ,  B05D1/002 ,  B05D1/26 ,  B05D3/007 ,  G11B5/842 ,  H01L21/67051 ,  H01L21/67155

Abstract: Provided is a coating device including: a substrate carrying unit which rotatably holds a substrate while the substrate is upright and is able to dispose the held substrate at a first position and a second position; an application unit which includes a liquid material nozzle ejecting a liquid material to each of first and second surfaces of the substrate disposed at the first position; and a removal unit which includes an accommodation mechanism accommodating a part of the peripheral edge portion of the substrate disposed at the second position and a cleaning liquid ejection mechanism ejecting a cleaning liquid to the peripheral edge portion and removes the liquid material of the peripheral edge portion.

Abstract translation: 本发明提供一种涂布装置，包括：基板承载单元，其在基板竖立时可旋转地保持基板，并且能够将保持的基板设置在第一位置和第二位置; 应用单元，其包括将液体材料喷射到布置在第一位置的基板的第一和第二表面中的液体材料喷嘴; 以及拆卸单元，其包括容纳机构，该容纳机构容纳设置在第二位置的基板的周缘部的一部分，以及清洗液喷出机构，其向周缘部喷射清洗液，除去周缘部的液体材料 。

公开(公告)号：US08919756B2

公开(公告)日：2014-12-30

申请号：US12877881

申请日：2010-09-08

Applicant: Tsutomu Sahoda ,  Futoshi Shimai ,  Akihiko Sato

Inventor： Tsutomu Sahoda ,  Futoshi Shimai ,  Akihiko Sato

IPC: B25B11/00 ,  H01L21/67 ,  H01L21/677

CPC classification number: H01L21/67051 ,  H01L21/67161 ,  H01L21/67196 ,  H01L21/67742 ,  H01L21/67751 ,  H01L21/67766 ,  H01L21/67778 ,  Y10S269/903

Abstract: A substrate processing system includes a processing unit, a substrate loading unit, a substrate unloading unit, and a carrying unit. A carrying device has a constitution in which a suction portion suctioning and holding a substrate is rotatable about an arm portion provided in a base portion and the substrate is rotated in the state where the substrate is held by a holding portion. A coating device has a constitution in which a liquid material is ejected from a nozzle to both surfaces of the substrate rotating in an upright state.

Abstract translation: 基板处理系统包括处理单元，基板装载单元，基板卸载单元和承载单元。 携带装置具有这样一种构造，其中吸引和保持基板的吸附部分可以围绕设置在基部中的臂部分旋转，并且基板在通过保持部保持基板的状态下旋转。 涂布装置具有液体材料从喷嘴喷射到以直立状态旋转的基板的两个表面的构造。

公开(公告)号：US08189169B2

公开(公告)日：2012-05-29

申请号：US12156896

申请日：2008-06-05

Applicant: Futoshi Shimai ,  Shigeru Kawata

Inventor： Futoshi Shimai ,  Shigeru Kawata

IPC: G03B27/42

CPC classification number: H01L21/67109

Abstract: The object of the present invention is to provide a cooling apparatus which makes it possible to cool a substrate uniformly in a short period of time even if the substrate has a large area. The cooling apparatus 3 comprises a flat-box-shaped body 10, a cooling medium supply tube 11 which is inserted into the body 10, a nozzle 12 which is attached to the cooling medium supply tube 11 so as to eject the cooling medium toward the internal surface of the body, a pipe 13 for withdrawing water (refrigerant) ejected from the nozzle 12 toward the body 10, a chiller 14 for cooling the water from the pipe 13 to a predetermined temperature, and a circulating pipe 15 for sending the water which has been cooled by the chiller 14 back to the cooling medium supply tube 11.

Abstract translation: 本发明的目的是提供一种能够在短时间内均匀地冷却基板，即使基板面积大的冷却装置。 冷却装置3包括平盒体10，插入主体10的冷却介质供给管11，安装在冷却介质供给管11上的喷嘴12，以将冷却介质朝向 主体的内表面，用于将从喷嘴12排出的水（制冷剂）向主体10排出的管道13，用于将水从管道13冷却到预定温度的冷却器14，以及用于将水 其被冷却器14冷却回冷却介质供应管11。

公开(公告)号：US07158039B2

公开(公告)日：2007-01-02

申请号：US10977553

申请日：2004-10-29

Applicant: Tatekazu Hayashida ,  Futoshi Shimai ,  Yohey Omata

Inventor： Tatekazu Hayashida ,  Futoshi Shimai ,  Yohey Omata

IPC: G08B21/00

CPC classification number: G01M3/16

Abstract: Among plural liquid leakage sensors placed at the lower most portion of a system such as a floor surface, a leaked liquid storing portion, etc., an error-activated location of the sensor can be easily identified uniquely when the sensor is detecting any abnormality. In a liquid leakage detecting system including at least one liquid leakage sensor having at least one detecting portion contactable with a leaking liquid through an air layer or a liquid permeable layer, a warning device including a sound producing is placed within a specified spatial distance from each installation position of the liquid leakage sensor, wherein after detecting any abnormal conditions of the liquid leakage sensor, a warning signal is issued at least in an audio frequency based on the warning device in order to discriminate the error-activated leakage sensor from other non-activated leakage sensors placed outside of the specified spatial distance and uniquely identify the installation position of the activated leakage sensor.

Abstract translation: 在传感器检测到任何异常情况下，在诸如地板表面，泄漏液体存储部分等系统的最下部的多个液体泄漏传感器中，可以容易地识别传感器的错误激活位置。 在液体泄漏检测系统中，包括至少一个液体泄漏传感器，其具有至少一个检测部分，该检测部分通过空气层或液体渗透层与泄漏的液体接触，包括产生声音的警告装置位于与每个 液体泄漏传感器的安装位置，其中在检测到液体泄漏传感器的任何异常状况之后，基于警告装置至少以音频的方式发出警告信号，以便将错误激活的泄漏传感器与其他非易失性传感器区分开， 激活的泄漏传感器放置在指定的空间距离之外，并唯一地识别激活的泄漏传感器的安装位置。

公开(公告)号：US20050162280A1

公开(公告)日：2005-07-28

申请号：US10977553

申请日：2004-10-29

Applicant: Tatekazu Hayashida ,  Futoshi Shimai ,  Yohey Omata

Inventor： Tatekazu Hayashida ,  Futoshi Shimai ,  Yohey Omata

IPC: G01M3/16 ,  G08B21/00

CPC classification number: G01M3/16

Abstract: Among plural liquid leakage sensors placed at the lowermost portion of a system such as a floor surface, a leaked liquid storing portion, etc., an error-activated location of the sensor can be easily identified uniquely when the sensor is detecting any abnormality. In a liquid leakage detecting system including at least one liquid leakage sensor having at least one detecting portion contactable with a leaking liquid through an air layer or a liquid permeable layer, a warning means including a sound producing means is placed within a specified spatial distance from each installation position of said liquid leakage sensor, wherein after detecting any abnormal conditions of said liquid leakage sensor, a warning signal is issued at least in an audio frequency based on said warning means in order to discriminate said error-activated leakage sensor from other non-activated leakage sensors placed outside of said specified spatial distance and uniquely identify said installation position of said activated leakage sensor.

Abstract translation: 在传感器检测到任何异常的情况下，在诸如地板表面，泄漏的液体存储部分等系统的最下部的多个液体泄漏传感器中，可以容易地识别传感器的错误激活位置。 在具有至少一个液体泄漏传感器的液体泄漏检测系统中，具有至少一个检测部分，其通过空气层或液体渗透层与泄漏的液体接触，包括声音产生装置的报警装置被放置在距离 所述液体泄漏传感器的每个安装位置，其中在检测到所述液体泄漏传感器的任何异常情况之后，至少基于所述警告装置的音频频率发出警告信号，以便将所述错误激活的泄漏传感器与其他非易失性传感器 激活的泄漏传感器放置在所述指定空间距离之外，并且唯一地识别所述激活的泄漏传感器的所述安装位置。

公开(公告)号：US6015467A

公开(公告)日：2000-01-18

申请号：US859926

申请日：1997-05-21

Applicant: Koichi Nagasawa ,  Naomi Kawaguchi ,  Futoshi Shimai ,  Mitsuru Sato ,  Kouji Harada ,  Jun Koshiyama

Inventor： Koichi Nagasawa ,  Naomi Kawaguchi ,  Futoshi Shimai ,  Mitsuru Sato ,  Kouji Harada ,  Jun Koshiyama

IPC: B08B3/10 ,  B08B3/12 ,  C11D7/06 ,  C11D7/26 ,  C11D7/32 ,  C11D7/50 ,  G03F7/16 ,  G03F7/42 ,  H01L21/00 ,  B08B1/02 ,  B08B3/08

CPC classification number: C11D7/261 ,  B08B3/10 ,  B08B3/12 ,  C11D7/06 ,  C11D7/3218 ,  C11D7/3281 ,  C11D7/5022 ,  G03F7/162 ,  G03F7/425 ,  H01L21/6708 ,  C11D7/263

Abstract: In a method of removing a coating from an edge of a substrate a solvent reservoir is filled with a solvent to dissolve and remove a photoresist film, the solvent includes one of dipropylene glycol monoalkyl ether, a mixture of this ether and an easily volatile organic solvent (boiling point of 75-130.degree. C., vapor pressure of 5-75 mmHg at 20.degree. C.), and an alkaline aqueous solution, an edge of a substrate W is horizontally inserted in the reservoir, and thereafter, the edge of the substrate W is immersed in the solvent for a period of time, so as to dissolve and remove a coating such as photoresist from the edge of the substrate. The solvent may be filled into the solvent reservoir either before or after the edge of the substrate is inserted therein, and the method may further involve aspirating the solvent from the reservoir after the substrate edge has been inserted therein.

Abstract translation: 在从基材的边缘去除涂层的方法中，溶剂储存器填充有溶剂以溶解并除去光致抗蚀剂膜，溶剂包括二丙二醇单烷基醚，该醚和易挥发的有机溶剂的混合物 （沸点75-130℃，20℃蒸气压5-75mmHg）和碱性水溶液，将基材W的边缘水平地插入储存器中，然后将边缘 将衬底W浸入溶剂中一段时间​​，从而从衬底的边缘溶解并除去诸如光致抗蚀剂的涂层。 在将基材的边缘插入其中之前或之后，可以将溶剂填充到溶剂容器中，并且该方法还可以包括在衬底边缘已插入其中之后从储存器吸出溶剂。

公开(公告)号：US08807072B2

公开(公告)日：2014-08-19

申请号：US13251468

申请日：2011-10-03

Applicant: Futoshi Shimai ,  Tsutomu Sahoda ,  Akihiko Sato ,  Kenji Maruyama

Inventor： Futoshi Shimai ,  Tsutomu Sahoda ,  Akihiko Sato ,  Kenji Maruyama

IPC: B05C5/02 ,  B05B13/02 ,  B05C5/00 ,  B05B13/00 ,  H01L21/67

CPC classification number: B05C5/0208 ,  B05B13/02 ,  B05C5/02 ,  H01L21/67011 ,  H01L21/6715

Abstract: Provided is a coating device including: a rotating part which rotatably holds a substrate while the substrate is upright; a cup portion disposed to surround an outer periphery of the substrate held by the rotating part and having an opening which exposes a first surface and a second surface of the substrate; a coating part which includes a nozzle ejecting a liquid material to the first surface and to the second surface of the substrate through the opening; and a cover portion which is provided on the first surface and the second surface sides of the substrate and by which the opening is opened and closed.

Abstract translation: 提供一种涂布装置，包括：旋转部，其在基板垂直的状态下可旋转地保持基板; 杯部，其设置成包围由所述旋转部保持的所述基板的外周，并具有露出所述基板的第一表面和第二表面的开口; 涂料部分，其包括通过所述开口将液体材料喷射到所述第一表面和所述基板的第二表面的喷嘴; 以及设置在基板的第一表面和第二表面侧上并且开口被打开和关闭的盖部分。

公开(公告)号：US08667924B2

公开(公告)日：2014-03-11

申请号：US12824006

申请日：2010-06-25

Applicant: Tsutomu Sahoda ,  Futoshi Shimai ,  Akihiko Sato

Inventor： Tsutomu Sahoda ,  Futoshi Shimai ,  Akihiko Sato

IPC: B05C11/02 ,  B05B15/02 ,  B05B7/06 ,  B05C5/00

CPC classification number: H01L21/67751 ,  H01L21/6715 ,  H01L21/68764

Abstract: A coating device including a coating mechanism which includes nozzles for ejecting a liquid material onto front and rear surfaces of the substrate while rotating a substrate in an upright state, and a nozzle managing mechanism which manages the state of the nozzles, in which the nozzle managing mechanism includes a soaking portion which dips the front end of the nozzle in a soak solution, and a discharging portion which discharges at least the soak solution, and a nozzle managing method.

Abstract translation: 一种涂布装置，包括涂布机构，其包括用于在直立状态下旋转基板的同时将液体材料喷射到基板的前表面和后表面上的喷嘴;以及喷嘴管理机构，其管理喷嘴的状态，其中喷嘴管理 机构包括在浸泡溶液中浸渍喷嘴的前端的浸泡部分和至少排出浸泡溶液的排出部分和喷嘴管理方法。

公开(公告)号：US08567342B2

公开(公告)日：2013-10-29

申请号：US12847912

申请日：2010-07-30

Applicant: Tsutomu Sahoda ,  Futoshi Shimai ,  Akihiko Sato

Inventor： Tsutomu Sahoda ,  Futoshi Shimai ,  Akihiko Sato

IPC: B05C11/02 ,  B05C5/00 ,  B05B7/06

CPC classification number: H01L21/67751 ,  H01L21/67051 ,  H01L21/67086 ,  H01L21/6715

Abstract: A coating device includes a coating mechanism which includes nozzles for ejecting a liquid material onto front and rear surfaces of a substrate while rotating the substrate; and an adjusting mechanism which adjusts the coating state of the liquid material at the outer periphery of the substrate; wherein the adjusting mechanism includes a dip portion which dips the outer periphery of the substrate in a solution while rotating the substrate and dissolves and removes a thin film formed on the outer periphery of the substrate; and a suction portion which suctions the vicinity of the outer periphery of the substrate after dipping in the solution.

Abstract translation: 涂覆装置包括涂覆机构，其包括用于在旋转衬底的同时将液体材料喷射到衬底的前表面和后表面上的喷嘴; 以及调节机构，其调节在所述基板的外周的液体材料的涂布状态; 其中所述调节机构包括在旋转所述基板的同时在溶液中浸渍所述基板的外周的浸渍部，并且溶解并除去形成在所述基板的外周上的薄膜; 以及在浸渍在溶液中后吸附基板外周附近的抽吸部分。

公开(公告)号：US08387556B2

公开(公告)日：2013-03-05

申请号：US12824025

申请日：2010-06-25

Applicant: Tsutomu Sahoda ,  Futoshi Shimai ,  Akihiko Sato

Inventor： Tsutomu Sahoda ,  Futoshi Shimai ,  Akihiko Sato

IPC: B05C11/02 ,  B05C5/00 ,  B05B7/06

CPC classification number: H01L21/6715 ,  H01L21/67751

Abstract: A coating device includes a coating mechanism which includes nozzles for ejecting a liquid material onto front and rear surfaces of the substrate while rotating a substrate in an upright state at a predetermined coating position, a carrying mechanism which carries the substrate between a substrate loading position, the coating position, and a substrate unloading position, and a dummy substrate holding mechanism which holds a dummy substrate at a holding position which is a position different from the substrate loading position, the coating position, and the substrate unloading position, and at which the carrying mechanism is allowed to connect with the dummy substrate.

Abstract translation: 涂覆装置包括涂覆机构，其包括用于将液体材料喷射到基板的前表面和后表面上的喷嘴，同时在预定涂覆位置处以直立状态旋转基板;承载机构，其将基板承载在基板装载位置， 涂布位置和基板卸载位置，以及虚设基板保持机构，其将虚设基板保持在与基板装载位置，涂布位置和基板卸载位置不同的保持位置的保持位置， 允许携带机构与虚拟基板连接。