公开(公告)号：US20130009056A1

公开(公告)日：2013-01-10

申请号：US13540783

申请日：2012-07-03

Applicant: Peter A. Kropp

Inventor： Peter A. Kropp

IPC: H01J37/04 ,  G21K5/04

CPC classification number: H01J37/1475 ,  H01J37/09 ,  H01J37/1471 ,  H01J37/26

Abstract: An arrangement and a method for imaging, examining and processing a sample using electrons. The arrangement comprises an electron microscope for providing electrons, a chamber with a sample holder on which a sample is positionable such that it can be imaged, examined and processed using the electrons. A system for magnetic field compensation in at least one spatial direction, including a compensation coil, wherein a wall of the chamber has an accommodation area, in sections thereof, for a portion of the compensation coil. Generally, only the chamber in which the sample is arranged is considered as a compensation volume. It suffice to reduce the compensation volume to the sensitive region of the electron microscope, since it is in the chamber, shortly following a final focusing and filtering, where the electron beam is most sensitive in terms of image quality when subjected to external electromagnetic interference.

公开(公告)号：US20120138793A1

公开(公告)日：2012-06-07

申请号：US13313387

申请日：2011-12-07

Applicant: Mitsuru Yamada ,  Motohiro Nakamura ,  Mitsuru Sato

Inventor： Mitsuru Yamada ,  Motohiro Nakamura ,  Mitsuru Sato

IPC: H01J37/26

CPC classification number: H01J37/1471 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/1501

Abstract: A method of making axial alignment of a charged particle beam starts with obtaining at least first through sixth image data while controlling the focal position of the beam on a sample in the direction of incidence, the excitation current in a first alignment coil, and the excitation current in a second alignment coil. Then, values of the excitation currents in the first and second alignment coils for the axial alignment of the beam are calculated from the at least first through sixth image data.

Abstract translation: 使带电粒子束的轴向对准的方法从获得至少第一至第六图像数据开始，同时控制入射方向上的样品上的束的焦点位置，第一对准线圈中的激励电流和激发 电流在第二对准线圈中。 然后，从至少第一至第六图像数据计算用于光束的轴向对准的第一和第二对准线圈中的激励电流的值。

公开(公告)号：US20120091358A1

公开(公告)日：2012-04-19

申请号：US12905126

申请日：2010-10-15

Applicant: Marco Jan Jaco WIELAND ,  Alexander Hendrik Vincent VAN VEEN

Inventor： Marco Jan Jaco WIELAND ,  Alexander Hendrik Vincent VAN VEEN

IPC: G21K1/08

CPC classification number: H01J37/10 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/1471 ,  H01J37/1478 ,  H01J37/30 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/0492

Abstract: The invention relates to a charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system has a charged particle source, an aperture array, a beamlet manipulator, a beamlet blanker, and an array of projection lens systems. The charged particle source is configured to generate a charged particle beam. The aperture array is configured to define separate beamlets from the generated beam. The beamlet manipulator is configured to converge groups of the beamlets towards a common point of convergence for each group. The beamlet blanker is configured to controllably blank beamlets in the groups of beamlets. Finally, the array of projection lens systems is configured to project unblanked beamlets of the groups of beamlets on to the surface of the target. The beamlet manipulator is further adapted to converge each of the groups of beamlets towards a point corresponding to one of the projection lens systems.

Abstract translation: 本发明涉及一种用于使用多个子束曝光目标的带电粒子多子束系统。 该系统具有带电粒子源，孔径阵列，子束操纵器，子束消除器和投影透镜系统阵列。 带电粒子源被配置为产生带电粒子束。 孔径阵列被配置为从所产生的光束定义单独的子束。 子束操纵器被配置为将每个子束的组合朝向每个组的公共收敛点收敛。 子束消除器被配置为可控地遮挡子束组中的子束。 最后，投影透镜系统的阵列被配置成将子束组的未平坦的子束投影到目标的表面上。 子束操纵器还适于将每个子束组朝向对应于投影透镜系统中的一个的点聚焦。

公开(公告)号：US08101911B2

公开(公告)日：2012-01-24

申请号：US12264848

申请日：2008-11-04

Applicant: Pavel Adamec

Inventor： Pavel Adamec

IPC: H01J37/20

CPC classification number: H01J37/1471 ,  H01J2237/1501

Abstract: A charged particle gun alignment assembly for emitting a charged particle beam along an optical axis of a charged particle beam device is described. The charged particle gun alignment assembly is configured to compensate for misalignment of the charged particle beam and includes a charged particle source having an emitter with a virtual source defining a virtual source plane substantially perpendicular to the optical axis; a condenser lens for imaging the virtual source; a final beam limiting aperture adapted for shaping the charged particle beam; and a double stage deflection assembly positioned between the condenser lens and the final beam limiting aperture, wherein the working distance of the condenser lens is 15 mm or less.

Abstract translation: 描述了一种用于沿带电粒子束装置的光轴发射带电粒子束的带电粒子枪对准组件。 带电粒子枪对准组件被配置为补偿带电粒子束的未对准，并且包括具有发射器的带电粒子源，发射器具有限定基本上垂直于光轴的虚拟源平面的虚拟源; 用于对虚拟源成像的聚光透镜; 用于对带电粒子束进行成形的最终光束限制孔; 以及位于聚光透镜和最终光束限制孔之间的双级偏转组件，其中聚光透镜的工作距离为15mm或更小。

公开(公告)号：US20110272577A1

公开(公告)日：2011-11-10

申请号：US12776980

申请日：2010-05-10

Applicant: Stefan LANIO ,  Gerald SCHOENECKER

Inventor： Stefan LANIO ,  Gerald SCHOENECKER

IPC: H01J37/147 ,  H01J3/26 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/1471 ,  H01J37/153 ,  H01J2237/1523 ,  H01J2237/1534 ,  H01J2237/244

Abstract: An electron beam device comprises: a beam emitter for emitting a primary electron beam; an objective electron lens for focusing the primary electron beam onto a specimen, the objective lens defining an optical axis; a beam separator having a first dispersion for separating a signal electron beam from the primary electron beam; and a dispersion compensation element. The dispersion compensation element has a second dispersion, the dispersion compensation element being adapted for adjusting the second dispersion independently of an inclination angle of the primary beam downstream of the dispersion compensation element, such that the second dispersion substantially compensates the first dispersion. The dispersion compensation element is arranged upstream, along the primary electron beam, of the beam separator.

Abstract translation: 电子束装置包括：用于发射一次电子束的射束发射器; 用于将一次电子束聚焦到样本上的目标电子透镜，物镜限定光轴; 具有用于从一次电子束分离信号电子束的第一色散的光束分离器; 和色散补偿元件。 色散补偿元件具有第二色散，色散补偿元件适用于独立于色散补偿元件下游的主光束的倾斜角而调节第二色散，使得第二色散基本上补偿第一色散。 色散补偿元件沿着一级电子束布置在分束器的上游。

公开(公告)号：US20100224789A1

公开(公告)日：2010-09-09

申请号：US12716453

申请日：2010-03-03

Applicant: Michihiro Sakai ,  Ryoichi Kakehi ,  Kiyoshi Hattori

Inventor： Michihiro Sakai ,  Ryoichi Kakehi ,  Kiyoshi Hattori

IPC: H01J37/30 ,  H01J37/147 ,  H01J3/26

CPC classification number: H01J37/1471 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1474 ,  H01J37/3045 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/1501 ,  H01J2237/24405

Abstract: A charged particle beam writing apparatus includes a stage on which a target object is placed; an emitting unit configured to emit a charged particle beam to the stage side; a blocking unit arranged between the emitting unit and the stage and configured to block the charged particle beam emitted; a deflector having electrodes through which a current flows by applying a voltage and configured to deflect the charged particle beam passing between the electrodes onto the blocking unit by applying a predetermined voltage across the electrodes; an optical axis adjusting unit configured to correct optical axis deviation of the charged particle beam generated by continuously repeating irradiation (beam-ON) of the charged particle beam on a target object and blocking (beam-OFF) of the beam by applying a two-step voltage to the deflector; and a control unit configured to control the optical axis adjusting unit such that an amount of the optical axis deviation is corrected.

Abstract translation: 带电粒子束写入装置包括放置目标物体的台阶; 发射单元，被配置为向舞台侧发射带电粒子束; 布置在所述发射单元和所述台之间并且被配置为阻挡所发射的带电粒子束的阻挡单元; 具有电极的偏转器，电流通过施加电压流动，并且被配置为通过在电极两端施加预定电压来将通过电极的带电粒子束偏转到阻挡单元上; 光轴调整单元，被配置为校正通过将目标物体上的带电粒子束的连续重复照射（束ON）产生的带电粒子束的光轴偏差和通过施加二维图像来阻挡（束切断） 偏转器的阶梯电压; 以及控制单元，被配置为控制光轴调节单元，使得校正光轴偏差的量。

公开(公告)号：US20100006755A1

公开(公告)日：2010-01-14

申请号：US12564511

申请日：2009-09-22

Applicant: Mitsugo Sato ,  Tadashi Otaka ,  Makoto Ezumi ,  Atsushi Takane ,  Shoji Yoshida ,  Satoru Yamaguchi ,  Yasuhiko Ozawa

Inventor： Mitsugo Sato ,  Tadashi Otaka ,  Makoto Ezumi ,  Atsushi Takane ,  Shoji Yoshida ,  Satoru Yamaguchi ,  Yasuhiko Ozawa

IPC: G01N23/22

CPC classification number: H01J37/1471 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/153

Abstract: An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.

Abstract translation: 本发明的目的是提供一种带电粒子束装置和带电粒子束装置的对准方法，即使当带电粒子束的状态发生变化时，也能够容易地使带电粒子束的光轴对准 。 本发明包括用于计算对物镜执行轴对准的对准偏转器的偏转量的计算装置，用于计算偏转量的多种计算方法被存储在计算装置中，以及选择装置，用于至少选择 提供了一种计算方法。

公开(公告)号：US20090032693A1

公开(公告)日：2009-02-05

申请号：US12182704

申请日：2008-07-30

Applicant: Junichi Kakuta ,  Kazuhiro Ueda ,  Tatsuya Maeda ,  Hiroyuki Saito ,  Katsuhiro Sasada

Inventor： Junichi Kakuta ,  Kazuhiro Ueda ,  Tatsuya Maeda ,  Hiroyuki Saito ,  Katsuhiro Sasada

IPC: G01D18/00 ,  G01N23/00

CPC classification number: G01N23/225 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/1532

Abstract: The present invention aims to provide an axis alignment method, astigmatism correction method and SEM for implementing these methods, which can prevent an alignment or correction error attributable to conditions of a specimen. A first aspect is to obtain the difference between the optimal values acquired from an automatic axis alignment result on a standard sample and from each of automatic axis alignment results on a observation target sample, and to correct an optimal value adjusted using the standard sample by use of the difference thus obtained. A second aspect is to acquire an optimal stigmator value (astigmatism correction signal) by using the standard sample, to store the optimal stigmator value as a default value, to add the optimal stigmator value and the default value depending on the height of an observation target sample pattern, and to perform an astigmatism correction on the basis of the resultant stigmator value.

Abstract translation: 本发明旨在提供一种用于实现这些方法的轴对准方法，像散校正方法和SEM，其可以防止由于样品的条件引起的对准或校正误差。 第一方面是获得从标准样品的自动轴对准结果获取的最佳值与观察目标样品上的自动轴对准结果中的每一种之间的差异，并且通过使用校正使用标准样品调整的最佳值 的差异。 第二方面是通过使用标准样本来获取最佳标称值（像散校正信号），以将最佳标称值作为默认值来存储，以根据观察目标的高度添加最优标示符值和默认值 样本图案，并且基于得到的标记值进行散光校正。

公开(公告)号：US20080315112A1

公开(公告)日：2008-12-25

申请号：US12146331

申请日：2008-06-25

Applicant: John C. Wiesner

Inventor： John C. Wiesner

IPC: H01J3/14 ,  G03F7/20

CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/1472 ,  H01J37/244 ,  H01J37/3045 ,  H01J37/3174 ,  H01J2237/2025 ,  H01J2237/20292 ,  H01J2237/2485 ,  H01J2237/30438 ,  H01J2237/3045 ,  H01J2237/30455

Abstract: The invention provides a method for patterning a resist coated substrate carried on a stage, where the patterning utilizes a charged particle beam. The method comprises the steps of: moving the stage at a nominally constant velocity in a first direction; while the stage is moving, deflecting the charged particle beam in the first direction to compensate for the movement of the stage, the deflecting including: (a) compensating for an average velocity of the stage; and (b) separately compensating for the difference between an instantaneous position of the stage and a calculated position based on the average velocity. The separately compensating step uses a bandwidth of less than 10 MHz. The invention also provides a deflector control circuit for implementing the separate compensation functions.

Abstract translation: 本发明提供了一种用于图案化承载在载物台上的抗蚀剂涂覆的基底的方法，其中图案化使用带电粒子束。 该方法包括以下步骤：在第一方向以标称恒定的速度移动舞台; 当舞台正在移动时，使带电粒子束沿第一方向偏转以补偿舞台的移动，偏转包括：（a）补偿舞台的平均速度; 和（b）基于平均速度分别补偿载物台的瞬时位置与计算的位置之间的差。 单独的补偿步骤使用小于10MHz的带宽。 本发明还提供一种用于实现单独补偿功能的偏转器控制电路。

公开(公告)号：US07375323B2

公开(公告)日：2008-05-20

申请号：US11655946

申请日：2007-01-22

Applicant: Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

Inventor： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

IPC: G21K1/08 ,  H01J3/14

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1501 ,  H01J2237/1534 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/31793

Abstract: An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

Abstract translation: 提供具有使用多极透镜的像差校正器的电子束装置。 电子束装置具有能够进行像差校正器的操作的扫描模式和用于禁止像差校正器的操作的扫描模式，并且每个像差校正器，聚光透镜等的操作被控制，使得 物镜的物体在任一种扫描模式下都不会改变。 如果在两种模式中的样本的二次电子图像之间进行比较，则图像缩放因子和焦点保持不变，并且可以通过清楚地仅识别像差校正器的效果来进行评估和调整。 这减少了由于像差校正器固有的轴向对准缺陷而长时间调整光轴所需的时间以及像差校正器之外的不同于彼此混合的部分的轴向对准缺陷所需的时间。