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    Method of forming a sample image and charged particle beam apparatus
    3.
    发明授权
    Method of forming a sample image and charged particle beam apparatus 有权
    形成样品图像和带电粒子束装置的方法

    公开(公告)号：US07800059B2

    公开(公告)日：2010-09-21

    申请号：US12073359

    申请日：2008-03-04

    申请人： Mitsugu Sato ,  Atsushi Takane ,  Takashi Iizumi ,  Tadashi Otaka ,  Hideo Todokoro ,  Satoru Yamaguchi ,  Kazutaka Nimura

    发明人： Mitsugu Sato ,  Atsushi Takane ,  Takashi Iizumi ,  Tadashi Otaka ,  Hideo Todokoro ,  Satoru Yamaguchi ,  Kazutaka Nimura

    IPC分类号： G01N23/22 ,  H01J37/26 ,  H01J37/28 ,  G21K7/00

    CPC分类号： G01N23/22 ,  H01J37/222 ,  H01J37/28

    摘要： An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed.In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.

    摘要翻译： 本发明的目的是提供一种在抑制由于带电粒子束的照射引起的充电的影响被抑制的情况下，能够高精度地实现视区域位移的抑制的样本图像形成方法和带电粒子束装置 。 为了实现上述目的，本发明提供一种通过在样品上扫描带电粒子束并基于从样品发射的二次信号形成图像来形成样品图像的方法，该方法包括以下步骤：形成多个 通过叠加通过多个扫描时间获得的多个图像的合成图像; 以及通过校正多个合成图像之间的位置偏移并叠加多个合成图像来形成另一个合成图像，以及用于实现上述方法的带电粒子束装置。

    CHARGED PARTICLE BEAM ALIGNMENT METHOD AND CHARGED PARTICLE BEAM APPARATUS
    4.
    发明申请
    CHARGED PARTICLE BEAM ALIGNMENT METHOD AND CHARGED PARTICLE BEAM APPARATUS 审中-公开
    充电颗粒光束对准方法和充电颗粒光束装置

    公开(公告)号：US20100006755A1

    公开(公告)日：2010-01-14

    申请号：US12564511

    申请日：2009-09-22

    申请人： Mitsugo Sato ,  Tadashi Otaka ,  Makoto Ezumi ,  Atsushi Takane ,  Shoji Yoshida ,  Satoru Yamaguchi ,  Yasuhiko Ozawa

    发明人： Mitsugo Sato ,  Tadashi Otaka ,  Makoto Ezumi ,  Atsushi Takane ,  Shoji Yoshida ,  Satoru Yamaguchi ,  Yasuhiko Ozawa

    IPC分类号： G01N23/22

    CPC分类号： H01J37/1471 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/153

    摘要： An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.

    摘要翻译： 本发明的目的是提供一种带电粒子束装置和带电粒子束装置的对准方法，即使当带电粒子束的状态发生变化时，也能够容易地使带电粒子束的光轴对准 。 本发明包括用于计算对物镜执行轴对准的对准偏转器的偏转量的计算装置，用于计算偏转量的多种计算方法被存储在计算装置中，以及选择装置，用于至少选择 提供了一种计算方法。

    Charged particle beam equipment and charged particle microscopy
    5.
    发明授权
    Charged particle beam equipment and charged particle microscopy 有权
    带电粒子束设备和带电粒子显微镜

    公开(公告)号：US07435957B2

    公开(公告)日：2008-10-14

    申请号：US11302323

    申请日：2005-12-14

    申请人： Hiromi Inada ,  Mitsugu Sato ,  Atsushi Takane

    发明人： Hiromi Inada ,  Mitsugu Sato ,  Atsushi Takane

    IPC分类号： G01N23/00

    CPC分类号： H01J37/28 ,  H01J37/222 ,  H01J37/265 ,  H01J2237/223 ,  H01J2237/2826 ,  H01J2237/3045

    摘要： On the basis of a displacement of the field of view before and after a deflection of a charged particle beam, extracted from a first specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by a predetermined amount by a beam deflector in an image in which a specimen image is captured at a first magnification calibrated by using a specimen enlarged image of a specimen as a magnification standard, and also a displacement of the field of view before and after a deflection of the charged particle beam, extracted from a second specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by the predetermined amount by the beam deflector in an image in which a specimen image is captured at a second magnification, the second magnification is calibrated.

    摘要翻译： 基于从包括通过使带电粒子束偏转预定量而记录的视野的位移的第一标本图像提取的带电粒子束的偏转之前和之后的视场位移的基础上， 通过在通过使用样本的样本放大图像作为放大标准校准的第一倍率捕获样本图像的图像中的光束偏转器，以及在充电的偏转之前和之后的视场位移 从第二标本图像中提取出的粒子束，包括通过使带电粒子束在第二放大倍数下拍摄样本图像的图像中的光束偏转器偏转预定量而记录的视野的位移， 校准第二放大倍数。

    Charged particle beam apparatus and dimension measuring method
    7.
    发明申请
    Charged particle beam apparatus and dimension measuring method 有权
    带电粒子束装置和尺寸测量方法

    公开(公告)号：US20080100832A1

    公开(公告)日：2008-05-01

    申请号：US11723457

    申请日：2007-03-20

    申请人： Mitsugu Sato ,  Katsuhiko Sakai ,  Atsushi Takane ,  Yoshihiko Nakayama

    发明人： Mitsugu Sato ,  Katsuhiko Sakai ,  Atsushi Takane ,  Yoshihiko Nakayama

    IPC分类号： G01N21/00 ,  G01N23/00

    CPC分类号： H01J37/244 ,  H01J37/21 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/21 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2816 ,  H01J2237/2817

    摘要： There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose focus widths are varied in correspondence with the focal depths, a determination unit for determining, from the plurality of SEM images acquired, a SEM image for which the image sharpness degree of the partial domain including a dimension-measuring domain becomes the maximum value, and a measurement unit for measuring the dimension of the predetermined domain from the SEM image whose image sharpness degree is the maximum value.

    摘要翻译： 提供了一种带电粒子束装置，即使在样品的表面上存在高差也允许实现高可靠性和高精度尺寸测量。 带电粒子束装置包括以下配置部件：用于获取与焦点深度相对应的聚焦宽度变化的多个SEM图像的获取单元，确定单元，用于从所获取的多个SEM图像中确定SEM图像 包括尺寸测量区域的部分域的图像清晰度变为最大值;以及测量单元，用于从图像锐度度为最大值的SEM图像测量预定域的尺寸。

    Charged particle beam apparatus
    9.
    发明申请
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US20070120065A1

    公开(公告)日：2007-05-31

    申请号：US11599611

    申请日：2006-11-15

    申请人： Atsushi Takane ,  Satoru Yamaguchi ,  Mitsugu Sato

    发明人： Atsushi Takane ,  Satoru Yamaguchi ,  Mitsugu Sato

    IPC分类号： G01K1/08

    CPC分类号： H01J37/1471 ,  H01J37/265 ,  H01J2237/1501 ,  H01J2237/216 ,  H01J2237/28

    摘要： A charged particle beam apparatus is provided which can prevent the accuracy of positional shift detection from being degraded owing to differences in picture quality, so that even when the state of a charged particle beam is changed at the time that optical conditions are changed or the optical axis changes with time, an auto adjustment of the optical axis can be realized easily and highly accurately. In the charged particle beam apparatus, evaluation or adjustment of focusing is conducted before the deflection condition of an alignment deflector for optical axis adjustment is changed or a table of focus adjustment amounts in correspondence with deflection conditions of the alignment deflector is provided, whereby when the deflection condition of the alignment deflector is changed, a focus adjustment is carried out in accordance with the table.

    摘要翻译： 提供一种带电粒子束装置，其可以防止由于图像质量的差异而导致的位置偏移检测的精度降低，使得即使当光学条件改变时带电粒子束的状态改变或光学条件改变时， 轴随时间变化，可以容易且高精度地实现光轴的自动调节。 在带电粒子束装置中，在用于光轴调节的对准偏转器的偏转状态改变之前进行聚焦的评估或调整，或者提供与对准偏转器的偏转条件相对应的焦点调整量表， 改变对准偏转器的偏转状态，根据该表进行焦点调整。

    Charged particle beam apparatus and dimension measuring method
    10.
    发明授权
    Charged particle beam apparatus and dimension measuring method 有权
    带电粒子束装置和尺寸测量方法

    公开(公告)号：US07214936B2

    公开(公告)日：2007-05-08

    申请号：US11242129

    申请日：2005-10-04

    申请人： Mitsugu Sato ,  Katsuhiko Sakai ,  Atsushi Takane ,  Yoshihiko Nakayama

    发明人： Mitsugu Sato ,  Katsuhiko Sakai ,  Atsushi Takane ,  Yoshihiko Nakayama

    IPC分类号： H01J37/21

    CPC分类号： H01J37/244 ,  H01J37/21 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/21 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2816 ,  H01J2237/2817

    摘要： There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose focus widths are varied in correspondence with the focal depths, a determination unit for determining, from the plurality of SEM images acquired, a SEM image for which the image sharpness degree of the partial domain including a dimension-measuring domain becomes the maximum value, and a measurement unit for measuring the dimension of the predetermined domain from the SEM image whose image sharpness degree is the maximum value.

    摘要翻译： 提供了一种带电粒子束装置，即使在样品的表面上存在高差也允许实现高可靠性和高精度尺寸测量。 带电粒子束装置包括以下配置部件：用于获取与焦点深度相对应的聚焦宽度变化的多个SEM图像的获取单元，确定单元，用于从所获取的多个SEM图像中确定SEM图像 包括尺寸测量区域的部分域的图像清晰度变为最大值;以及测量单元，用于从图像锐度度为最大值的SEM图像测量预定域的尺寸。