公开(公告)号：US20160091797A1

公开(公告)日：2016-03-31

申请号：US14819335

申请日：2015-08-05

Applicant: ASML Holding N.V.

Inventor： Lev RYZHIKOV

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/88 ,  G02B13/14

CPC classification number: G01N21/474 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2201/0638 ,  G02B9/64 ,  G02B13/143 ,  G02B13/16 ,  G02B13/18 ,  G02B21/02 ,  G02B27/0025 ,  G03F7/70 ,  G03F7/70058

Abstract: An objective lens system having a high numerical aperture, a large working distance, and low optical aberrations over a wide spectral band of wavelengths is disclosed. The objective lens system includes a first lens group, a second lens group, and a third lens group. The first lens group includes first and second positive meniscus lenses that are positioned at a distance from each other along an optical axis of the objective lens system. The distance may be dependent on a focal length of the objective lens system. The second lens group includes first and second meniscus lenses and a bi-convex lens. The third lens group includes a bi-concave lens and a doublet lens.

Abstract translation: 公开了一种具有高数值孔径，大工作距离以及宽波段波长频带下的低光学像差的物镜系统。 物镜系统包括第一透镜组，第二透镜组和第三透镜组。 第一透镜组包括沿着物镜系统的光轴相互间隔一定距离的第一和第二正弯月透镜。 距离可以取决于物镜系统的焦距。 第二透镜组包括第一和第二弯月透镜和双凸透镜。 第三透镜组包括双凹透镜和双透镜。

公开(公告)号：US20150277241A1

公开(公告)日：2015-10-01

申请号：US14437294

申请日：2013-09-20

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Christiaan Louis Valentin ,  Erik Roelof Loopstra ,  Christopher Charles Ward ,  Daniel Nathan Burbank ,  Mark Josef Schuster ,  Peter James Graffeo

IPC: G03F7/20

CPC classification number: G03F7/70783 ,  G03F7/70266 ,  G03F7/70433 ,  G03F7/707 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70825

Abstract: A system (300) for supporting an exchangeable object (302) can include a movable structure (304) and an object holder (306) configured to be movable relative to the movable structure. The object holder can be configured to hold the exchangeable object. The system can also include a first actuator assembly (308) and second actuator assembly (316). The first actuator assembly can be configured to apply a force to the object holder to translate the exchangeable object generally along a plane. The second actuator assembly can be configured to apply a bending moment to the object holder. The exchangeable object can be a patterning device of a lithographic apparatus.

Abstract translation: 用于支撑可更换物体（302）的系统（300）可以包括可移动结构（304）和被配置为相对于可移动结构可移动的物体保持器（306）。 对象保持器可以被配置为保持可更换对象。 系统还可以包括第一致动器组件（308）和第二致动器组件（316）。 第一致动器组件可以被配置成向对象支架施加力，以大致沿着平面平移可交换对象。 第二致动器组件可以被配置为向对象保持器施加弯矩。 可交换对象可以是光刻设备的图案形成装置。

公开(公告)号：US20150277222A1

公开(公告)日：2015-10-01

申请号：US14739886

申请日：2015-06-15

Applicant: ASML HOLDING N.V.

Inventor： Donis George FLAGELLO

IPC: G03F1/42 ,  G03F7/26 ,  G03F7/20

CPC classification number: G03F1/42 ,  G03F7/095 ,  G03F7/12 ,  G03F7/20 ,  G03F7/26 ,  G03F7/405 ,  G03F7/70325 ,  Y10T428/24479 ,  Y10T428/24802

Abstract: A lithographic method is disclosed that includes, on a substrate provided with a layer of a resist and a further layer of a material provided on the layer of resist, providing a pattern in the further layer, the pattern defining a space via which an area of the layer of resist may be exposed to radiation, a distance between features of the pattern defining the space, and exposing the layer of resist to radiation having a wavelength greater than the distance between features of the pattern defining the space, such that near-field radiation is generated which propagates into and exposes an area of the resist.

Abstract translation: 公开了一种光刻方法，其包括在设置有抗蚀剂层的基板和设置在抗蚀剂层上的另一层材料，在另一层中提供图案，该图案限定空间，通过该空间， 抗蚀剂层可以暴露于辐射，限定空间的图案的特征之间的距离，以及将抗蚀剂层暴露于波长大于限定空间的图案的特征之间的距离的辐射，使得近场 产生辐射，其传播并暴露抗蚀剂的区域。

公开(公告)号：US20150220005A1

公开(公告)日：2015-08-06

申请号：US14423082

申请日：2013-08-01

Applicant: ASML Holding N.V. ,  ASML Netherlands N.V.

Inventor： Christopher Charles Ward ,  Martinus Hendrikus Antonius Leenders ,  Mark Josef Schuster ,  Christiaan Louis Valentin

IPC: G03F7/20

CPC classification number: G03F7/70616 ,  G03F1/14 ,  G03F7/24 ,  G03F7/703 ,  G03F7/70783 ,  G03F7/7085 ,  G03F9/7026

Abstract: A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined.

Abstract translation: 弯曲掩模版并实时感测弯曲掩模版的曲率的系统和方法。 该系统包括可动标线台，光罩真空夹，传感器系统和光罩弯曲机。 光罩弯曲机包括压电致动器。 传感器系统包括测量目标和相应的传感器。 传感器连接到可动标线片台上，并且测量目标附着到标线夹，标线弯曲器或掩模版表面上。 该系统被配置为确定掩模版的宽度或掩模版的相对端处的测量目标之间的距离，测量在光罩的第一端处的第一旋转角度，并且在光罩的第二端处测量第二局部旋转角度 这与第一端相反。 基于宽度或距离以及第一和第二角度，确定掩模版的场曲率。

公开(公告)号：US20150219438A1

公开(公告)日：2015-08-06

申请号：US14427287

申请日：2013-09-20

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Arie Jeffrey Den Boef ,  Justin Lloyd Kreuzer ,  Simon Gijsbert Josephus Mathijssen ,  Gerrit Johannes Nijmeijer ,  J. Christian Swindal ,  Patricius Aloysius Jacobus Tinnemans ,  Richard Johannes Franciscus Van Haren

IPC: G01B11/00 ,  G03F7/20 ,  H01L21/66

CPC classification number: G01B11/002 ,  G03F7/70775 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7088 ,  H01L22/12

Abstract: An apparatus to measure the position of a mark, the apparatus including an objective lens to direct radiation on a mark using radiation supplied by an illumination arrangement; an optical arrangement to receive radiation diffracted and specularly reflected by the mark, wherein the optical arrangement is configured to provide a first image and a second image, the first image being formed by coherently adding specularly reflected radiation and positive diffraction order radiation and the second image being formed by coherently adding specularly reflected radiation and negative diffraction order radiation; and a detection arrangement to detect variation in an intensity of radiation of the first and second images and to calculate a position of the mark in a direction of measurement therefrom.

Abstract translation: 一种用于测量标记位置的装置，该装置包括使用由照明装置提供的辐射将辐射引导到标记上的物镜; 接收由标记衍射并被镜面反射的辐射的光学装置，其中所述光学装置被配置为提供第一图像和第二图像，所述第一图像通过相干地添加镜面反射辐射和正衍射级辐射而形成，并且所述第二图像 通过相干地加入镜面反射辐射和负衍射级辐射形成; 以及检测装置，用于检测第一和第二图像的辐射强度的变化，并计算标记在测量方向上的位置。

公开(公告)号：US20150085291A1

公开(公告)日：2015-03-26

申请号：US14388322

申请日：2013-01-31

Applicant: ASML Holding N.V.

Inventor： Yuli Vladimirsky ,  Lev Ryzhikov

IPC: G01B9/021 ,  G03H1/04 ,  G03H1/00 ,  G01B9/04

CPC classification number: G01B9/021 ,  G01B9/04 ,  G02B21/14 ,  G03F1/34 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03H1/0005 ,  G03H1/041 ,  G03H1/0443 ,  G03H1/0486 ,  G03H1/0493 ,  G03H2001/005 ,  G03H2001/0447 ,  G03H2223/52

Abstract: A compact, self-contained holographic and interferometric apparatus and methods for eliminating vibration, including methods for eliminating relative displacement and vibration errors present in object and reference beam paths, are disclosed. The self-contained apparatus (600) includes an illuminated object (302) that scatters light and an objective lens (304) to form an object beam (350). The self-contained apparatus also includes a reference beam forming lens group (308) that forms a reference beam (352) from a portion of the object beam that passes through a pupil plane (306) of the objective lens (304). The object beam and the reference beam are propagated along a shared optical path, which eliminates relative displacement and vibration errors. The self-contained apparatus includes an image plane (316) where the object beam and reference beam are recombined to create an interference pattern, which is detected and analyzed. Methods for eliminating the instability, using the self-contained apparatus, are disclosed.

Abstract translation: 公开了一种紧凑的，独立的全息和干涉仪以及用于消除振动的方法，包括用于消除物体和参考光束路径中存在的相对位移和振动误差的方法。 独立装置（600）包括散射光的照明物体（302）和物镜（304）以形成物体光束（350）。 独立设备还包括参考光束形成透镜组（308），其从物镜光束的通过物镜（304）的光瞳平面（306）的部分形成参考光束（352）。 物体光束和参考光束沿共享光路传播，消除了相对位移和振动误差。 独立设备包括图像平面（316），其中物体光束和参考光束被重新组合以产生被检测和分析的干涉图案。 公开了使用独立装置消除不稳定性的方法。

公开(公告)号：US08980724B2

公开(公告)日：2015-03-17

申请号：US14202835

申请日：2014-03-10

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Harry Sewell ,  Mircea Dusa ,  Richard Johannes Franciscus Van Haren ,  Manfred Gawein Tenner ,  Maya Angelova Doytcheva

IPC: H01L21/76 ,  G03F9/00 ,  G03F7/00 ,  G03F7/105 ,  G03F7/20 ,  H01L21/027 ,  H01L21/3213

CPC classification number: G03F9/7046 ,  G03F7/0035 ,  G03F7/105 ,  G03F7/70466 ,  G03F9/7076 ,  H01L21/0273 ,  H01L21/32139

Abstract: A system and method of manufacturing a semiconductor device lithographically and an article of manufacture involving a lithographic double patterning process having a dye added to either the first or second lithographic pattern are provided. The dye is used to detect the location of the first lithographic pattern and to directly align the second lithographic pattern to it. The dye may be fluorescent, luminescent, absorbent, or reflective at a specified wavelength or a given wavelength band. The wavelength may correspond to the wavelength of an alignment beam. The dye allows for detection of the first lithographic pattern even when it is over coated with a radiation sensitive-layer (e.g., resist).

Abstract translation: 提供光刻制造半导体器件的系统和方法以及涉及具有添加到第一或第二光刻图案上的染料的光刻双重图案化工艺的制品。 该染料用于检测第一光刻图案的位置，并将第二光刻图案直接对准。 染料可以是在指定波长或给定波长带处的荧光，发光，吸收或反射。 波长可对应于对准光束的波长。 染料允许检测第一光刻图案，即使当其涂覆有辐射敏感层（例如抗蚀剂）时。

公开(公告)号：US08730476B2

公开(公告)日：2014-05-20

申请号：US13898973

申请日：2013-05-21

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Arie Jeffrey Den Boef ,  Earl William Ebert ,  Harry Sewell ,  Keith Andersen ,  Sanjeev K. Singh

IPC: G01B11/00

CPC classification number: G03F7/70141 ,  G01B11/14 ,  G02F1/116 ,  G03F7/70191 ,  G03F9/7065

Abstract: A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.

Abstract translation: 光刻设备具有对准系统，其包括被配置为将窄带辐射转换成连续，平坦和宽带辐射的辐射源。 声可调窄带通滤波器将宽带辐射滤波成窄带线偏振辐射。 窄带辐射可以聚焦在晶片的对准目标上，以便能够对准晶片。 在一个实施例中，滤波器被配置为调制由辐射源产生的辐射的强度和波长并且具有多个同时的通带。 辐射源产生具有高空间相干性和低时间相干性的辐射。

公开(公告)号：US20130278915A1

公开(公告)日：2013-10-24

申请号：US13861053

申请日：2013-04-11

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Christopher Charles WARD ,  Mark Henricus Wilhelmus VAN GERVEN ,  Bram Paul Theodor VAN GOCH

IPC: G03F7/20

CPC classification number: G03F7/709 ,  F16F15/002 ,  G03F7/70525 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70775

Abstract: A lithographic apparatus can include a component and a positioning system operatively coupled and configured to move the component along a first axis. The positioning system can be configured to measure a position of the component along a second axis or a third axis. The positioning system can also be configured to control movement of the component so as to compensate for an effect of eigenmode coupling between the movement of the component along the first axis and the measured position of the component along the second axis or the third axis. In some embodiments, the component is a reticle stage or a wafer stage.

Abstract translation: 光刻设备可以包括可操作地联接和配置成沿着第一轴线移动部件的部件和定位系统。 定位系统可以被配置成沿着第二轴线或第三轴线测量部件的位置。 定位系统还可以被配置为控制部件的移动，以便补偿沿着第一轴线的部件的运动与沿着第二轴线或第三轴线的部件的测量位置之间的本征模式耦合的影响。 在一些实施例中，组件是掩模版阶段或晶片台。

公开(公告)号：US20040257554A1

公开(公告)日：2004-12-23

申请号：US10896057

申请日：2004-07-22

Applicant: ASML Holding N.V.

Inventor： Santiago E. del Puerto ,  Stephen Roux ,  Justin L. Kreuzer

IPC: G03B027/58

CPC classification number: H01L21/67225 ,  G03F7/707 ,  G03F7/7075 ,  G03F7/70808 ,  G03F9/7011 ,  G03F9/7096 ,  H01L21/67201 ,  H01L21/681

Abstract: A method utilizing a lithography system comprises a lithography patterning chamber, a wafer exchange chamber separated from the lithography patterning chamber by a first gate valve, and at least one alignment load-lock separated from the wafer exchange chamber by a second gate valve. The alignment load-lock includes an alignment stage that aligns a wafer during pump-down. The alignment load-lock can be uni-directional or bi-directional. The lithography system can include one or multiple alignment load-locks.

Abstract translation: 使用光刻系统的方法包括光刻图案化室，通过第一闸阀与光刻图案化室分离的晶片交换室以及通过第二闸阀与晶片交换室分离的至少一个对准负载锁定。 对准负载锁定包括在抽空期间对准晶片的对准级。 对齐负载锁定可以是单向的或双向的。 光刻系统可以包括一个或多个对准加载锁。