公开(公告)号：US12220870B2

公开(公告)日：2025-02-11

申请号：US18519764

申请日：2023-11-27

Applicant: H. David Dean ,  Al Siblani ,  Eric J. Mott ,  John P. Fisher ,  Martha O. Wang ,  Antonios G. Mikos

Inventor： H. David Dean ,  Al Siblani ,  Eric J. Mott ,  John P. Fisher ,  Martha O. Wang ,  Antonios G. Mikos

IPC: C08F2/50 ,  A61L27/50 ,  A61L27/56 ,  A61L27/60 ,  B29C64/386 ,  B33Y30/00 ,  B33Y50/00 ,  B33Y70/00 ,  B33Y80/00 ,  G03F7/004 ,  G03F7/029 ,  G03F7/105 ,  G03F7/20 ,  B29C64/135 ,  G02B26/08

Abstract: A light polymerizable composition for use in the additive manufacturing of medical devices may include a first photo-initiator and a second photo-initiator. The first photo-initiator activates to initiate curing of the composition when exposed to light of a first wavelength in an additive manufacturing device and the second photo-initiator limits the transmission of the light of the first wavelength that activates the first photo-initiator in the additive manufacturing device. The second photo-initiator is activated to further cure the composition when exposed to a light of a second wavelength different from the first wavelength by activating the second photo-initiator to produce free radicals at a higher rate when exposed to the light of the second wavelength than when exposed to the light of the first wavelength.

公开(公告)号：US11945763B2

公开(公告)日：2024-04-02

申请号：US17874502

申请日：2022-07-27

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Euisoo Jeong ,  Chaewon Pak ,  Hyewon Seo ,  Myoungyoup Shin ,  Sunwoong Shin ,  Kyubuem Choi ,  Gyuseok Han

IPC: C07C211/64 ,  C07C233/77 ,  G02B5/22 ,  G03F7/00 ,  G03F7/028 ,  G03F7/032 ,  G03F7/105

CPC classification number: C07C211/64 ,  C07C233/77 ,  G02B5/223 ,  G03F7/0007 ,  G03F7/028 ,  G03F7/032 ,  G03F7/105

Abstract: A compound represented by a specific chemical formula, a core including the compound represented by the specific chemical formula, and a core-shell dye including a shell surrounding the core, a photosensitive resin composition including the compound represented by the specific chemical formula, and a color filter manufactured using the photosensitive resin composition are disclosed.

公开(公告)号：US11865785B2

公开(公告)日：2024-01-09

申请号：US15634792

申请日：2017-06-27

Applicant: H. David Dean ,  Al Siblani ,  Eric J. Mott ,  John P. Fisher ,  Martha O. Wang ,  Antonios G. Mikos

Inventor： H. David Dean ,  Al Siblani ,  Eric J. Mott ,  John P. Fisher ,  Martha O. Wang ,  Antonios G. Mikos

IPC: A61L27/56 ,  B29C64/386 ,  A61L27/50 ,  B33Y30/00 ,  B33Y80/00 ,  A61L27/60 ,  B33Y50/00 ,  B33Y70/00 ,  G03F7/105 ,  G03F7/029 ,  G03F7/20 ,  G03F7/004 ,  B29C64/135 ,  G02B26/08

CPC classification number: B29C64/386 ,  A61L27/50 ,  A61L27/56 ,  A61L27/60 ,  B33Y30/00 ,  B33Y50/00 ,  B33Y70/00 ,  B33Y80/00 ,  G03F7/0047 ,  G03F7/029 ,  G03F7/105 ,  G03F7/2008 ,  B29C64/135 ,  G02B26/0833

Abstract: A process for additive manufacturing of a resorbable implant to be implanted into a patient includes providing a biocompatible resin including a liquid light-polymerizable material that is resorbable after polymerization and an initiator. The process further includes actuating an additive manufacturing apparatus to expose an amount of the biocompatible resin to light to at least partially cure the exposed amount of biocompatible resin to form a layer of the resorbable implant and actuating the additive manufacturing apparatus to expose at least some additional amount of biocompatible resin to light to at least partially cure the exposed additional amount of biocompatible resin to form an additional layer of the resorbable implant and to at least partially overcure previously cured layers to cause at least some interlayer binding between the previously cured layers and the additional layer.

公开(公告)号：US11609492B2

公开(公告)日：2023-03-21

申请号：US16566337

申请日：2019-09-10

Applicant: Ming-An Hsu

Inventor： Ming-An Hsu

IPC: H05K1/00 ,  G03F7/00 ,  G03F7/105 ,  G03F7/18 ,  G03F7/20 ,  G03F7/24 ,  G03F7/38 ,  H05K1/02 ,  H05K1/03 ,  G03F1/60

Abstract: A device having a color photo resist pattern includes a 3D substrate, at least one color photo resist layer and at least one circuit pattern layer. The at least one color photo resist layer is formed on said 3D substrate and forms a visual pattern together. The at least one circuit pattern layer is formed on said visual pattern formed by said at least one color photo resist layer.

公开(公告)号：US20230068581A1

公开(公告)日：2023-03-02

申请号：US17797007

申请日：2021-01-29

Applicant: DAI NIPPON PRINTING CO., LTD.

Inventor： Tadashi FURUKAWA ,  Koujiro OOKAWA ,  Yukio TANIGUCHI ,  Hideaki FUJISAKI ,  Keiji KASHIMA

IPC: G03F7/105 ,  G02B5/02 ,  G01B11/00

Abstract: A high-precision marker, which is easy to manufacture, has a base material layer, a first layer which is laminated onto one surface of the base material layer, and which is observed in a first color, and a second layer which is partially laminated onto the first layer, is observed in a second color different from the first color, and partially conceals the first layer, wherein the first layer is observable in a region in which the second layer is not laminated, and the second layer is formed by a resist material.

公开(公告)号：US11269255B2

公开(公告)日：2022-03-08

申请号：US16832357

申请日：2020-03-27

Applicant: Merck Patent GmbH ,  AZ Electronic Materials (Luxembourg) S.A.R.L.

Inventor： Yuki Hirayama ,  Tadashi Kishimoto ,  Masayoshi Suzuki ,  Daishi Yokoyama ,  Katsuto Taniguchi ,  Toshiaki Nonaka

IPC: G03F7/105 ,  G03F7/00 ,  G03F7/004 ,  G03F7/033 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  B82Y20/00 ,  G02F1/1335 ,  F21V8/00 ,  G02F1/13357

Abstract: The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.

公开(公告)号：US11156754B2

公开(公告)日：2021-10-26

申请号：US16131714

申请日：2018-09-14

Applicant: FUJIFILM Corporation

Inventor： Junichi Ito ,  Hideki Takakuwa ,  Daisuke Hamada ,  Yushi Kaneko

IPC: H01L27/14 ,  G03F7/004 ,  G02B5/20 ,  G03F7/038 ,  G03F7/105 ,  H01L31/0216 ,  G03F7/033 ,  G02B5/22 ,  G02B5/00 ,  G03F7/00 ,  H01L27/146 ,  H01L31/0232 ,  G03F7/16 ,  G03F7/20 ,  G03F7/30

Abstract: An object of the present invention is to provide a curable composition capable of forming a cured film having excellent linearity of a pattern, and a light-shielding film, a color filter, a solid-state imaging device, and an infrared sensor, each formed using the curable composition. Another object of the present invention is to provide a pattern forming method and a method for manufacturing a color filter, each using the curable composition.
The curable composition of the present invention is a curable composition containing a visible light-absorbing coloring agent, an infrared ray-absorbing coloring agent, a polymerizable compound, and a photopolymerization initiator, in which a minimum value in optical densities per 1 μm of a film thickness in a wavelength range of 380 to 1,100 nm of a coating film of the curable composition is 1 or more, and the Δ optical density calculated by Formula (1) is 1 or less, Δ Optical density=|OD1−OD2|  Formula (1) in Formula (1), OD1 represents a minimum value in optical densities per 1 μm of a film thickness in a wavelength range from 380 nm to 780 nm of the coating film, and OD2 represents a minimum value in optical densities per 1 μm of a film thickness in a wavelength range of more than 780 nm and 1,100 nm or less of the coating film.

公开(公告)号：US11118059B2

公开(公告)日：2021-09-14

申请号：US16052051

申请日：2018-08-01

Applicant: FUJIFILM Corporation

Inventor： Kazuya Oota ,  Kyohei Arayama ,  Daisuke Sasaki ,  Tokihiko Matsumura ,  Shunsuke Kitajima

IPC: G02B5/22 ,  C09B11/28 ,  G03F7/038 ,  C09B57/00 ,  G02B5/20 ,  G02B3/00 ,  G03F7/00 ,  C09B11/24 ,  C09B11/12 ,  C09B23/01 ,  G03F7/105 ,  C09B23/00 ,  C09B57/10 ,  G03F7/38 ,  G02B1/11 ,  C09D11/328

Abstract: Provided are a film having excellent heat resistance and a film forming method. In addition, provided are an optical filter, a laminate, a solid image pickup element, an image display device, and an infrared sensor. The film includes an aggregate of a dye and a resin, in which an average particle size of the aggregate of the dye is 30 to 450 nm.

公开(公告)号：US11112693B2

公开(公告)日：2021-09-07

申请号：US16058441

申请日：2018-08-08

Applicant: FUJIFILM Corporation

Inventor： Yoshinori Taguchi ,  Naotsugu Muro ,  Yousuke Murakami ,  Seongmu Bak ,  Akiko Yoshii

IPC: G02B5/20 ,  G03F7/004 ,  G03F7/00 ,  C09B47/04 ,  C08K5/23 ,  C08K5/3417 ,  C08F2/50 ,  C08K5/3447 ,  C08L101/00 ,  C08G59/32 ,  C09B69/10 ,  G03F7/105 ,  C08K5/00 ,  C08G59/68 ,  G03F7/038 ,  G03F7/027 ,  G03F7/40 ,  G02B1/04 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  H01L27/32 ,  C08F220/34 ,  C08F220/38 ,  G02F1/1335 ,  H01L27/30

Abstract: Provided are a curable coloring composition which is suitable for the production of a cured film in cyan color, having good moisture resistance, a color filter, an image sensor, and a method for producing a cured film. The curable coloring composition includes a coloring agent including a phthalocyanine pigment having Al as a central metal, a basic pigment derivative, and a curable compound, in which the coloring agent includes 80% by mass or more of the phthalocyanine pigments, and the content of the phthalocyanine pigment having Al as a central metal among the phthalocyanine pigments is 30% by mass or more.

公开(公告)号：US11045834B2

公开(公告)日：2021-06-29

申请号：US16011939

申请日：2018-06-19

Applicant: FUJIFILM Corporation

Inventor： Yoshinori Taguchi

IPC: B05D3/02 ,  C08F2/44 ,  G03F7/033 ,  C08F220/06 ,  C09D4/06 ,  C08F220/28 ,  G03F7/105 ,  G03F7/16 ,  C08F2/50 ,  C08F2/48 ,  G03F7/004 ,  G03F7/38 ,  B05D3/00 ,  B05D7/24 ,  C08K3/22 ,  C08F222/10 ,  C08K3/26 ,  C08K3/30

Abstract: A method for producing a film comprises preserving a composition including a pigment, a resin, and a solvent under a condition of a viscosity ranging from 30 mPa·s to 150 mPa·s, and heating the composition to 40° C. to 70° C. so as to be applied during the application of the composition.