METHOD AND APPARATUS OF AUTOMATIC OPTICAL INSPECTION USING SCANNING HOLOGRAPHY

    公开(公告)号:US20220221822A1

    公开(公告)日:2022-07-14

    申请号:US17608288

    申请日:2020-06-03

    发明人: Tae Geun KIM

    摘要: Disclosed are a method and apparatus of automatic optical inspection using scanning holography. The apparatus for automatic optical inspection using scanning holography includes: a hologram capturer that takes a hologram of an object existing on an objective plate using a scanning hologram camera; a depth position/rotation angle extractor that extracts a depth position and a rotation angle about an objective surface of the objective plate on the basis of the hologram or the detected monitoring-light; a rotated coordinate system generator that generates a rotated coordinate system corresponding to the objective surface using the depth position and the rotation angle; and a hologram restorer that obtains an image of the object by restoring the hologram in a plane formed in a depth direction of the rotated coordinate system.

    SYSTEMS AND METHODS FOR MEASUREMENT OF OPTICAL WAVEFRONTS

    公开(公告)号:US20210361159A1

    公开(公告)日:2021-11-25

    申请号:US17323231

    申请日:2021-05-18

    IPC分类号: A61B3/10 A61B3/15 G01B9/021

    摘要: An analytic tool for supporting alignment of an optical component in preparation for an interferometric test and performance of such a test. Apparatus and methods involve employment of the datum features on the optical component and/or metrology frame supporting such component. The metrology frame may include a secondary set of holograms (provided for use with a conventional system already employing a primary hologram that forms the testing optical wavefront). The conventional primary hologram is preferably substituted with a set of primary holograms (contained in the same, unitary or spatially-complementary housing sets) that perform different but complementary functions and that facilitate the alignment of the metrology frame with or without the tested optical component.

    METROLOGY TARGET
    4.
    发明申请
    METROLOGY TARGET 审中-公开

    公开(公告)号:US20200011650A1

    公开(公告)日:2020-01-09

    申请号:US16577588

    申请日:2019-09-20

    摘要: A metrology target having a periodic or quasi-periodic structure, which is characterized by a plurality of parameters. At least one of these parameters varies locally monotonically, wherein the maximum size of this variation over a distance of 5 μm is less than 10% of the size of the at least one parameter. In addition, the metrology target has at least one used structure and at least one auxiliary structure, wherein the auxiliary structure transitions progressively into the used structure with regard to the locally monotonically varying parameter. Also disclosed are an associated method and associated device for characterizing structured elements configured as wafers, masks or CGHs.