公开(公告)号：US09123522B2

公开(公告)日：2015-09-01

申请号：US14357139

申请日：2012-11-02

Applicant: BEIJING ZHONGKEXIN ELECTRONICS EQUIPMENT CO.,LTD.

Inventor： Libo Peng ,  Huiyue Long ,  Junyu Xie

IPC: H01J49/30 ,  H01J37/05 ,  H01J37/317

CPC classification number: H01J49/30 ,  H01J37/05 ,  H01J37/3171 ,  H01J2237/055 ,  H01J2237/057

Abstract: A broadband ion beam analyzer, used for isolating required ions from a broadband ion beam, comprises an upper magnetic pole (1), a lower magnetic pole (2), an upper excitation coil (3), a lower excitation coil (4), an analysis grating (7), and a magnetic yoke (5 and 6). The upper magnetic pole (1) and the lower magnetic pole (2) are both provided with a camber-shaped incident-end boundary (101) and a camber-shaped emergence side boundary (102). The camber radii (Rb) of the incident-end boundary (101) and of the emergence-end boundary (102) are equal to the deflection radius (R) of the required ions in the magnetic field. The required ions in the broadband ion beam are allowed to focus ideally at the mid-section of the magnetic field, to acquire an ideal focal spot having a size that equals to zero. This allows for acquisition of the optimal resolution by selecting an appropriate width for a minimal analysis gap (701), thus implementing complete isolation of the required ions from other ions in the broadband ion beam.

Abstract translation: 用于从宽带离子束分离所需离子的宽带离子束分析仪包括上磁极（1），下磁极（2），上激励线圈（3），下激励线圈（4） 分析光栅（7）和磁轭（5和6）。 上磁极（1）和下磁极（2）均设有弧形入射端边界（101）和弧形出射边界（102）。 入射端边界（101）和出射端边界（102）的弧度半径（Rb）等于磁场中所需离子的偏转半径（R）。 允许宽带离子束中所需的离子理想地聚焦在磁场的中间部分，以获得具有等于零的大小的理想焦斑。 这允许通过为最小分析间隙选择适当的宽度来获取最佳分辨率（701），从而实现所需离子与宽带离子束中的其它离子的完全隔离。

公开(公告)号：US20150213996A1

公开(公告)日：2015-07-30

申请号：US14496412

申请日：2014-09-25

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick

IPC: H01J37/05 ,  H01J37/317

CPC classification number: G03F1/80 ,  B24B37/04 ,  G03F1/82 ,  H01J37/05 ,  H01J37/147 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H01L21/02115 ,  H01L21/02274 ,  H01L21/26506 ,  H01L21/26513 ,  H01L21/26566 ,  H01L21/31105 ,  H01L21/31111 ,  H01L29/36 ,  H05H3/02 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: An apparatus, method and products thereof provide an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials.

Abstract translation: 其装置，方法和产品提供从用于加工材料的加速气体簇离子束衍生的加速中性束。

公开(公告)号：US09087671B2

公开(公告)日：2015-07-21

申请号：US14474776

申请日：2014-09-02

Applicant: FEI Company

Inventor： Anthony Graupera ,  Charles Otis

IPC: H01J27/16 ,  H01J27/02 ,  H01J37/05 ,  H01J37/08

CPC classification number: H01J37/05 ,  H01J37/08 ,  H01J37/317 ,  H01J2237/006 ,  H01J2237/049 ,  H01J2237/057 ,  H01J2237/08 ,  H01J2237/0817 ,  H01J2237/0827 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another.

Abstract translation: 在等离子体室中具有多个气体的电感耦合等离子体源向聚焦柱提供多个离子物质。 质量过滤器允许选择特定的离子种类并从一个物种快速变化到另一个物种。

公开(公告)号：US09053900B2

公开(公告)日：2015-06-09

申请号：US13438543

申请日：2012-04-03

Applicant: Xinrong Jiang ,  Liqun Han

Inventor： Xinrong Jiang ,  Liqun Han

IPC: G21K5/04 ,  H01J37/153 ,  H01J37/05 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/1534

Abstract: One embodiment relates to an apparatus for high-resolution electron beam imaging. The apparatus includes an energy filter configured to limit an energy spread of the electrons in the incident electron beam. The energy filter may be formed using a stigmatic Wien filter and a filter aperture. Another embodiment relates to a method of forming an incident electron beam for a high-resolution electron beam apparatus. Another embodiment relates to a stigmatic Wien filter that includes curved conductive electrodes. Another embodiment relates to a stigmatic Wien filter that includes a pair of magnetic yokes and a multipole deflector. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及用于高分辨率电子束成像的装置。 该装置包括被配置为限制入射电子束中的电子的能量扩散的能量过滤器。 能量滤波器可以使用固定的维恩滤波器和滤波器孔来形成。 另一实施例涉及形成用于高分辨率电子束装置的入射电子束的方法。 另一实施例涉及一种包括弯曲导电电极的标准维恩滤波器。 另一实施例涉及一种包括一对磁轭和多极偏转器的标准维恩滤波器。 还公开了其它实施例，方面和特征。

公开(公告)号：US20150155134A1

公开(公告)日：2015-06-04

申请号：US14174651

申请日：2014-02-06

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik GmbH

Inventor： Jürgen FROSIEN ,  Dieter WINKLER ,  Benjamin John COOK

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/09 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/244 ,  H01J2237/0453 ,  H01J2237/0475 ,  H01J2237/1205 ,  H01J2237/21 ,  H01J2237/2448 ,  H01J2237/24592 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A scanning charged particle beam device configured to image a specimen is described. The scanning charged particle beam device includes a source of charged particles, a condenser lens for influencing the charged particles, an aperture plate having at least two aperture openings to generate at least two primary beamlets of charged particles, at least two deflectors, wherein the at least two deflectors are multi-pole deflectors, a multi-pole deflector with an order of poles of 8 or higher, an objective lens, wherein the objective lens is a retarding field compound lens, a beam separator configured to separate the at least two primary beamlets from at least two signal beamlets, a beam bender, or a deflector or a mirror configured to deflect the at least two signal beamlets, wherein the beam bender is a hemispherical beam bender or beam bender having at least two curved electrodes, and at least two detector elements.

Abstract translation: 描述了构造成对样本进行成像的扫描带电粒子束装置。 扫描带电粒子束装置包括带电粒子源，用于影响带电粒子的聚光透镜，具有至少两个孔径孔的孔板，以产生至少两个带电粒子的主子束，至少两个偏转器，其中， 至少两个偏转器是多极偏转器，具有8或更高的极数的多极偏转器，物镜，其中物镜是延迟场复合透镜，梁分离器，被配置为将至少两个初级 来自至少两个信号子束的子束，光束弯曲器或被配置为偏转所述至少两个信号子束的偏转器或反射镜，其中所述光束弯曲器是具有至少两个弯曲电极的半球形光束弯曲器或光束弯曲器，并且至少 两个检测元件。

公开(公告)号：US20150136967A1

公开(公告)日：2015-05-21

申请号：US14605985

申请日：2015-01-26

Applicant: Advanced Ion Beam Technology, Inc.

Inventor： Nicholas WHITE ,  Zhimin WAN ,  Erik COLLART

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/05 ,  H01J3/04 ,  H01J3/26 ,  H01J37/1472 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/04756 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/151 ,  H01J2237/303 ,  H01J2237/31701

Abstract: A deceleration apparatus capable of decelerating a short spot beam or a tall ribbon beam is disclosed. In either case, effects tending to degrade the shape of the beam profile are controlled. Caps to shield the ion beam from external potentials are provided. Electrodes whose position and potentials are adjustable are provided, on opposite sides of the beam, to ensure that the shape of the decelerating and deflecting electric fields does not significantly deviate from the optimum shape, even in the presence of the significant space-charge of high current low-energy beams of heavy ions.

Abstract translation: 公开了一种减速装置，能够使短点光束或高色带光束减速。 在任一种情况下，都会控制趋向于降低光束轮廓形状的效果。 提供了用于将离子束屏蔽到外部电位的盖子。 其位置和电位可调的电极设置在梁的相对两侧，以确保减速和偏转电场的形状不会显着偏离最佳形状，即使存在显着的空间电荷高 目前低能量的重离子束。

公开(公告)号：US20150129759A1

公开(公告)日：2015-05-14

申请号：US14474776

申请日：2014-09-02

Applicant: FEI Company

Inventor： Anthony Graupera ,  Charles Otis

IPC: H01J37/05 ,  H01J37/08

CPC classification number: H01J37/05 ,  H01J37/08 ,  H01J37/317 ,  H01J2237/006 ,  H01J2237/049 ,  H01J2237/057 ,  H01J2237/08 ,  H01J2237/0817 ,  H01J2237/0827 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another.

Abstract translation: 在等离子体室中具有多个气体的电感耦合等离子体源向聚焦柱提供多个离子物质。 质量过滤器允许选择特定的离子种类并从一个物种快速变化到另一个物种。

公开(公告)号：US08946631B2

公开(公告)日：2015-02-03

申请号：US14156140

申请日：2014-01-15

Applicant: Ebara Corporation

Inventor： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC: G01N23/225 ,  H01J37/28 ,  H01L21/683

CPC classification number: H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

Abstract: A substrate is irradiated by primary electrons and secondary electrons generated from the substrate are detected by a detector. A reference die is placed on the stage to obtain a pattern matching template image including feature coordinates of the reference die. A pattern matching is performed with an arbitrary die in a row or column including the reference die using the template image to obtain feature coordinates of the arbitrary die. An angle of misalignment is calculated between the direction of the row or column including the reference die and one of the directions of movement of the substrate on the basis of the feature coordinates of the arbitrary die and those of the reference die. The stage is rotated to correct the angle of misalignment to conform the direction of the row or column including the reference die with the one of the directions of movement of the substrate.

Abstract translation: 用一次电子照射衬底，由检测器检测由衬底产生的二次电子。 将参考管芯放置在平台上以获得包括参考管芯的特征坐标的模式匹配模板图像。 使用模板图像，使用包含基准管芯的行或列中的任意管芯进行图案匹配，以获得任意管芯的特征坐标。 基于任意模具的特征坐标和参考模具的特征坐标，在包括基准模具的行或列的方向与基板的移动方向之间计算出未对准的角度。 旋转台阶以校正未对准的角度，以使包括基准模具的行或列的方向与衬底的运动方向之一相一致。

公开(公告)号：US20150021473A1

公开(公告)日：2015-01-22

申请号：US14341362

申请日：2014-07-25

Applicant: Peter F. Vandermeulen

Inventor： Peter F. Vandermeulen

IPC: H01J37/05 ,  H01J37/08 ,  H01J37/32

CPC classification number: H01J37/32229 ,  C23C16/511 ,  C23C16/513 ,  H01J37/05 ,  H01J37/08 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/3244 ,  H01J37/32669 ,  H01J2237/057 ,  H01J2237/0817 ,  H01J2237/3323 ,  H01P3/12 ,  H01P3/127 ,  H01Q21/0043

Abstract: An apparatus for separating ions having different mass or charge includes a waveguide conduit coupled to a microwave source for transmitting microwaves through openings in the waveguide conduit. The outlet ends of pipes are positioned at the openings for transporting material from a material source to the openings. A plasma chamber is in communication with the waveguide tube through the openings. The plasma chamber receives through the openings microwaves from the waveguide tube and material from the pipes. The plasma chamber includes magnets disposed in an outer wall thereof for forming a magnetic field in the plasma chamber. The plasma chamber includes a charged cover at a side of the chamber opposite the side containing the openings. The cover includes extraction holes through which ion beams from the plasma chamber are extracted. Deflectors coupled to one of the extraction holes receive the ion beams extracted from the plasma chamber. Each deflector bends an ion beam and provides separate passages for capturing ions following different trajectories from the bending of the ion beam based on their respective mass or charge.

Abstract translation: 用于分离具有不同质量或电荷的离子的装置包括耦合到微波源的波导导管，用于通过波导管道中的开口传输微波。 管道的出口端位于用于将材料从材料源运输到开口的开口处。 等离子体室通过开口与波导管连通。 等离子体腔室通过开口接收来自波导管的微波和来自管道的材料。 等离子体室包括设置在其外壁中的磁体，用于在等离子体室中形成磁场。 等离子体室包括在室的与包含开口的一侧相对的一侧的带电盖。 盖子包括提取来自等离子体室的离子束的抽吸孔。 与一个提取孔耦合的偏转器接收从等离子体室提取的离子束。 每个偏转器弯曲离子束，并提供单独的通道，用于根据其相应的质量或电荷离开离子束弯曲的不同轨迹之后捕获离子。

公开(公告)号：US20150001192A1

公开(公告)日：2015-01-01

申请号：US13928264

申请日：2013-06-26

Applicant: Apple Inc.

Inventor： Simon R. Lancaster-Larocque ,  Collin Chan ,  Kensuke Uemura ,  Purwadi Raharjo

IPC: H01J37/317 ,  B23K15/00

CPC classification number: B23K15/00 ,  B23K15/02 ,  B23K20/122 ,  H01J37/05 ,  H01J37/305 ,  H01J2237/05

Abstract: The described embodiments relate generally to adjusting output or conditioning of an electron beam. More specifically various configurations are disclosed that relate to maintaining a footprint of the electron beam incident to a workpiece within a defined energy level. Such a configuration allows the electron beam to heat only specific portions of the workpiece to a superheated state in which intermetallic compounds are dissolved. In one embodiment a mask is disclosed that prevents low energy portions of an electron beam from contacting the workpiece. In another embodiment the electron beam can be focused in a way that maintains the electron beam at an energy level such that substantially all of the electron beam is above a threshold energy level.

Abstract translation: 所描述的实施例一般涉及调整电子束的输出或调节。 更具体地，公开了涉及将入射到工件的电子束的覆盖区保持在限定的能级内的各种构造。 这种构造允许电子束仅将工件的特定部分加热到金属间化合物溶解的过热状态。 在一个实施例中，公开了防止电子束的低能量部分接触工件的掩模。 在另一个实施例中，电子束可以以将电子束维持在能量水平使得基本上所有的电子束都高于阈值能级的方式聚焦。