公开(公告)号：US20140319342A1

公开(公告)日：2014-10-30

申请号：US14260053

申请日：2014-04-23

Applicant: KLA-Tencor Corporation

Inventor： Gary Fan ,  David Chen ,  Vivekanand Kini ,  Hong Xiao

IPC: H01J37/28 ,  G01N23/225

CPC classification number: H01J37/28 ,  G01N23/2251 ,  H01J37/04 ,  H01J37/147 ,  H01J37/261 ,  H01J2237/04 ,  H01J2237/24592 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A system for adaptive electron beam scanning may include an inspection sub-system configured to scan an electron beam across the surface of a sample. The inspection sub-system may include an electron beam source, a sample stage, a set of electron-optic elements, a detector assembly and a controller communicatively coupled to one or more portions of the inspection sub-system. The controller may assess one or more characteristics of one or more portions of an area of the sample for inspection and, responsive to the assessed one or more characteristics, adjust one or more scan parameters of the inspection sub-system.

Abstract translation: 用于自适应电子束扫描的系统可以包括配置成扫描横跨样品表面的电子束的检查子系统。 检查子系统可以包括电子束源，样本台，一组电子元件，检测器组件和通信地耦合到检查子系统的一个或多个部分的控制器。 控制器可以评估样品区域的一个或多个部分的一个或多个特征以进行检查，并且响应于所评估的一个或多个特性来调整检查子系统的一个或多个扫描参数。

公开(公告)号：US20140239175A1

公开(公告)日：2014-08-28

申请号：US13779142

申请日：2013-02-27

Applicant: FEI COMPANY

Inventor： Mostafa Maazouz

IPC: H01J3/02 ,  H01J37/04

CPC classification number: H01J37/07 ,  H01J3/026 ,  H01J37/04 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/21 ,  H01J37/248 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/0473 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/1518 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/31749

Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.

Abstract translation: 本发明提供了一种带电粒子束系统，其中聚焦离子束列的中间部分被偏压到高的负电压，允许光束以比该塔的该部分内的最终光束能量更高的电位移动。 在低kV电位下，像差和库仑相互作用减小，这导致光斑尺寸的显着改善。

公开(公告)号：US08729466B1

公开(公告)日：2014-05-20

申请号：US13804066

申请日：2013-03-14

Applicant: Marian Mankos

Inventor： Marian Mankos

IPC: H01J37/05 ,  G01N23/225 ,  H01J37/29 ,  H01J37/153

CPC classification number: H01J37/026 ,  H01J37/04 ,  H01J37/285 ,  H01J37/29 ,  H01J2237/0042 ,  H01J2237/0044 ,  H01J2237/0492 ,  H01J2237/05 ,  H01J2237/1534 ,  H01J2237/2538

Abstract: One embodiment relates to an apparatus for correcting aberrations introduced when an electron lens forms an image of a specimen and simultaneously forming an electron image using electrons with a narrow range of electron energies from an electron beam with a wide range of energies. A first electron beam source is configured to generate a lower energy electron beam, and a second electron beam source is configured to generate a higher energy electron beam. The higher energy beam is passed through a monochromator comprising an energy-dispersive beam separator, an electron mirror and a knife-edge plate that removes both the high and low energy tail from the propagating beam. Both the lower and higher energy electron beams are deflected by an energy-dispersive beam separator towards the specimen and form overlapping illuminating electron beams. An objective lens accelerates the electrons emitted or scattered by the sample. The electron beam leaving the specimen is deflected towards a first electron mirror by an energy-dispersive beam separator, which introduces an angular dispersion that disperses the electron beam according to its energy. A knife-edge plate, located between the beam separator and first electron mirror, is inserted that removes all of the beam with energy larger and smaller than a selected energy and filters the beam according to energy. One or more electron lenses focus the electron beam at the reflection surface of the first electron mirror so that after the reflection and another deflection by the same energy-dispersive beam separator the electron beam dispersion is removed. The dispersion-free and energy-filtered electron beam is then reflected in a second electron mirror which corrects one or more aberrations of the objective lens. After the second reflection, electrons are deflected by the magnetic beam separator towards the projection optics which forms a magnified, aberration-corrected, energy-filtered image on a viewing screen.

公开(公告)号：US20140087063A1

公开(公告)日：2014-03-27

申请号：US14094132

申请日：2013-12-02

Applicant: SHIMADZU RESEARCH LABORATORY (SHANGHAI) CO. LTD.

Inventor： Hui Mu ,  Gongyu Jiang ,  Li Ding ,  Jianliang Li ,  Wenjian Sun

IPC: H05K3/10

CPC classification number: H05K3/107 ,  B05D3/002 ,  B05D5/12 ,  C23C14/0021 ,  C23C14/046 ,  C23C14/34 ,  C23C18/1806 ,  H01J37/04 ,  H01J49/063 ,  H01J49/421 ,  H05K1/119 ,  H05K3/0014 ,  H05K3/14

Abstract: The present invention provides a method for preparing an ion optical device. A substrate is fabricated with a hard material adapted for a grinding process, the substrate at least including a planar surface, and including at least one insulating material layer. Next, one or more linear grooves are cut on the planar surface, to form multiple discrete ion optical electrode regions on the planar surface separated by the linear grooves. Then, conductive leads are fabricated on other substrate surfaces than the planar surface and in a through hole inside the substrate, to provide voltages required on ion optical electrodes. By using high-hardness materials in cooperation with high-precision machining, higher precision and a desired discrete electrode contour can be obtained.

Abstract translation: 本发明提供了一种离子光学器件的制备方法。 用适于磨削工艺的硬质材料制造衬底，所述衬底至少包括平坦表面，并且包括至少一个绝缘材料层。 接下来，在平坦表面上切割一个或多个线性沟槽，以在由线性沟槽分隔开的平面上形成多个离散的离子光电极区域。 然后，在平坦表面和衬底内的通孔中的其它衬底表面上制造导电引线，以提供离子光电电极所需的电压。 通过与高精度加工配合使用高硬度材料，可以获得更高精度和期望的分立电极轮廓。

公开(公告)号：US08680462B2

公开(公告)日：2014-03-25

申请号：US13370513

申请日：2012-02-10

Applicant: Stephen Zanon ,  Roy P Moeller ,  Urs Steiner ,  Felician Muntean

Inventor： Stephen Zanon ,  Roy P Moeller ,  Urs Steiner ,  Felician Muntean

IPC: H01J49/06

CPC classification number: H01J37/04 ,  H01J49/0468 ,  H01J49/063 ,  H01J49/068 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/1516

Abstract: An ion optics assembly is formed by four quarter-circular profile elements, all of which are attach to the same reference plate. Consequently, all four elements remain aligned to the same reference plate. The four elements form a quarter-circular channel with quarter-circular quad electrodes. The quad electrodes receive electrical potential to form the field required to focus and maintain the ions at the center of the channel. Quarter-circular insulators are provided on all sides of the channel so as to seal the channel over its length from the interior of the mass spectrometer. A heater is provided at the entrance to the ion transfer optics, to prevent accumulation of ions on the poles. A thermal break is provided in the quad, so as to enable maintaining the front of the quad heated and the rest of the quad cooler.

Abstract translation: 离子光学组件由四个四分之一圆形的轮廓元件形成，所有元件都附着在相同的参考板上。 因此，所有四个元件保持与相同的参考板对准。 四个元件形成四分之一圆形四通道四通道。 四极电极接收电势以形成将离子聚焦并保持在通道中心所需的场。 在通道的所有侧面都设有四分之一圆形的绝缘体，以便从质谱仪的内部将通道密封在其长度上。 在离子转移光学器件的入口处设置加热器，以防止离子在极上的积聚。 在四边形中提供热断裂，以便能够保持四边形的前部被加热并且四分之一冷却器的其余部分。

公开(公告)号：US20140077684A1

公开(公告)日：2014-03-20

申请号：US13512396

申请日：2012-05-04

Applicant: Huarong Liu ,  Ping Chen

Inventor： Huarong Liu ,  Ping Chen

IPC: H01J37/04 ,  H01J9/02

CPC classification number: H01J37/04 ,  B82Y40/00 ,  H01J9/02 ,  H01J9/025 ,  H01J27/26 ,  H01J37/073 ,  H01J37/08 ,  H01J2237/06341 ,  H01J2237/0807 ,  H01J2237/2623 ,  H01L21/31116

Abstract: The present disclosure provides a method for manufacturing a particle source comprising: placing a metal wire in vacuum, introducing active gas, adjusting a temperature of the metal wire and applying a positive high voltage V to the metal wire to generate at a side of the head of the metal wire an etching zone in which field induced chemical etching (FICE) is performed; increasing by the FICE a surface electric field at the top of the metal wire head to be greater than a field evaporation electric field of material for the metal wire, so that metal atoms at the top of the metal wire are evaporated off; after the field evaporation is activated by the FICE, causing mutual adjustment between the FICE and the field evaporation, until the head of the metal wire has a shape of combination of a base and a tip on the base; and stopping the FICE and the field evaporation when the head of the metal wire takes a predetermine shape.

Abstract translation: 本公开提供了一种制造颗粒源的方法，包括：将金属丝放置在真空中，引入活性气体，调节金属丝的温度并向金属丝施加正高电压V以在头的一侧产生 的金属线，其中执行场诱导化学蚀刻（FICE）的蚀刻区域; 通过FICE增加金属线头顶部的表面电场比金属线材料的场蒸发电场大，金属线顶部的金属原子被蒸发掉; 在通过FICE激活场蒸发之后，引起FICE和场蒸发之间的相互调节，直到金属丝的头部具有基部和底部的尖端的组合的形状; 并且当金属丝的头部具有预定形状时，停止FICE和场蒸发。

公开(公告)号：US08659243B2

公开(公告)日：2014-02-25

申请号：US13268193

申请日：2011-10-07

Applicant: Hiroshi Morita ,  Ryozo Takeuchi ,  Toshiyuki Yokosuka

Inventor： Hiroshi Morita ,  Ryozo Takeuchi ,  Toshiyuki Yokosuka

IPC: H05H9/00

CPC classification number: H05H7/00 ,  H01J37/026 ,  H01J37/04 ,  H01J2237/004 ,  H01J2237/0203 ,  H01J2237/04735

Abstract: In a charged particle accelerator, voltage of several tens of kV is applied between accelerating electrodes. In such a case, electric discharge is sometimes generated between the accelerating electrodes. In the charged particle accelerator, part or entirety of the accelerating electrodes is coated with an electric discharge suppressing layer made of ceramics or alloy having a high melting point as compared with metal. When impurity fine particles are accelerated by an electric field and collide with the electrodes, the electric discharge suppressing layer made of ceramics or alloy prevents metal vapor from being easily generated from the electrodes and an ionized plasma from being easily produced, thus suppressing electric discharge between the electrodes.

Abstract translation: 在带电粒子加速器中，在加速电极之间施加几十kV的电压。 在这种情况下，有时会在加速电极之间产生放电。 在带电粒子加速器中，加速电极的一部分或全部涂覆有与金属相比具有高熔点的陶瓷或合金制成的放电抑制层。 当杂质微粒被电场加速并与电极碰撞时，由陶瓷或合金制成的放电抑制层防止金属蒸气容易地从电极产生，并且电离等离子体容易产生，从而抑制 电极。

公开(公告)号：US08637834B2

公开(公告)日：2014-01-28

申请号：US13342017

申请日：2011-12-31

Applicant: Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximillian Haider ,  Antonio Casares ,  Steven Rogers

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximillian Haider ,  Antonio Casares ,  Steven Rogers

IPC: H01J37/28 ,  H01J3/14 ,  H01J1/50

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

公开(公告)号：US20140020839A1

公开(公告)日：2014-01-23

申请号：US13897592

申请日：2013-05-20

Applicant: APPLIED MATERIALS, INC.

Inventor： Jason A. Kenney ,  James D. Carducci ,  Kenneth S. Collins ,  Richard Fovell ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: H01J37/04

CPC classification number: H01J37/04 ,  H01J37/321 ,  H01J37/3211 ,  H05H1/46 ,  H05H2001/4667

Abstract: A plasma reactor has an overhead multiple coil inductive plasma source with RF feeds arranged in equilateral symmetry.

Abstract translation: 等离子体反应器具有架空多线圈感应等离子体源，RF等离子体源以等边对称排列。

公开(公告)号：US08618480B2

公开(公告)日：2013-12-31

申请号：US13848854

申请日：2013-03-22

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Xiaoli Guo ,  Xuedong Liu ,  Zhongwei Chen

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/141

CPC classification number: H01J37/261 ,  H01J37/04 ,  H01J37/28 ,  H01J2237/0475 ,  H01J2237/0492 ,  H01J2237/1538 ,  H01J2237/2449

Abstract: The present invention provides a charged particle beam apparatus which employs LVSEM to inspect sample surface with a throughput much higher than the prior art. The high throughput is realized by providing a probe current and a FOV both several times of those of the prior art. Accordingly several means are proposed to avoid obvious degradation of image resolution due to the increases in Coulomb effect and geometric aberrations, and increase efficiency and uniformity of secondary charged particle collection.

Abstract translation: 本发明提供了一种带电粒子束装置，其使用LVSEM来检查样品表面，其生产量远高于现有技术。 通过提供几倍于现有技术的探针电流和FOV来实现高通量。 因此，提出了几种方法来避免由于库仑效应和几何像差的增加而引起的图像分辨率的明显降低，并且提高了二次带电粒子收集的效率和均匀性。