公开(公告)号：US20150029593A1

公开(公告)日：2015-01-29

申请号：US14338542

申请日：2014-07-23

Applicant: JEOL Ltd.

Inventor： Hidetaka Sawada ,  Yu Jimbo

IPC: G02B27/00

CPC classification number: G02B27/0037 ,  G01N23/20 ,  G02B27/42 ,  G02B27/4205 ,  G21K1/08 ,  H01J3/04 ,  H01J3/12 ,  H01J3/26 ,  H01J37/05 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/1534

Abstract: A spherical aberration corrector is offered which permits a correction of deviation of the circularity of at least one of an image and a diffraction pattern and a correction of on-axis aberrations to be carried out independently. The spherical aberration corrector (100) is for use with a charged particle beam instrument (1) for obtaining the image and the diffraction pattern and has a hexapole field generating portion (110) for producing plural stages of hexapole fields, an octopole field superimposing portion (120) for superimposing an octopole on at least one of the plural stages of hexapole fields to correct deviation of the circularity of at least one of the image and diffraction pattern, and a deflection portion (130) for deflecting a charged particle beam.

Abstract translation: 提供了一种球面像差校正器，其允许校正图像和衍射图案中的至少一个的圆度的偏差和单独进行的轴上像差校正。 球面像差校正器（100）用于带电粒子束仪器（1），用于获得图像和衍射图案，并具有用于产生多级六极场的六极场产生部分（110），八极场叠加部分 （120），用于将至少一个六极场中的至少一个叠加八极杆，以校正图像和衍射图案中的至少一个的圆度的偏差，以及用于偏转带电粒子束的偏转部分（130）。

公开(公告)号：US08716672B2

公开(公告)日：2014-05-06

申请号：US13835154

申请日：2013-03-15

Applicant: Canon Kabushiki Kaisha

Inventor： Kentaro Sano ,  Masato Muraki ,  Akira Miyake ,  Yoshikiyo Yui

IPC: H01J3/14 ,  H01J3/12 ,  H01J1/46

CPC classification number: H01J3/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/121

Abstract: The present invention provides a charged particle optical system which emits a charged particle beam, the system including an electrostatic lens, and a grid electrode opposed to the electrostatic lens along an optical axis of the electrostatic lens, and configured to form an electrostatic field in cooperation with the electrostatic lens, wherein the grid electrode is configured such that an electrode surface, opposed to the electrostatic lens, of the grid electrode has a distance, from the electrostatic lens in a direction of the optical axis, which varies with a position in the electrode surface.

Abstract translation: 本发明提供了一种发射带电粒子束的带电粒子光学系统，该系统包括静电透镜，以及沿着静电透镜的光轴与静电透镜相对的栅格电极，并配置为在合成中形成静电场 其中所述栅极与所述静电透镜相对的所述电极表面与所述静电透镜在所述光轴方向上具有距所述静电透镜的距离随着所述静电透镜的位置而变化的距离 电极表面。

公开(公告)号：US07612346B2

公开(公告)日：2009-11-03

申请号：US11968833

申请日：2008-01-03

Applicant: Ronak J. Bhatt ,  Chiping Chen ,  Jing Zhou

Inventor： Ronak J. Bhatt ,  Chiping Chen ,  Jing Zhou

IPC: B01D59/44 ,  H01J49/00

CPC classification number: H01J27/02 ,  G21K1/093 ,  H01J3/02 ,  H01J3/12 ,  H01J3/20 ,  H01J29/64

Abstract: The charged-particle beam system includes a non-axisymmetric diode forms a non-axisymmetric beam having an elliptic cross-section. A focusing element utilizes a magnetic field for focusing and transporting the non-axisymmetric beam, wherein the non-axisymmetric beam is approximately matched with the channel of the focusing element.

Abstract translation: 带电粒子束系统包括非轴对称二极管形成具有椭圆截面的非轴对称束。 聚焦元件利用磁场来聚焦和传送非轴对称光束，其中非轴对称光束与聚焦元件的通道近似匹配。

公开(公告)号：US20060017002A1

公开(公告)日：2006-01-26

申请号：US11145804

申请日：2005-06-06

Applicant: Ronak Bhatt ,  Chiping Chen ,  Jing Zhou

Inventor： Ronak Bhatt ,  Chiping Chen ,  Jing Zhou

IPC: H01J1/50

CPC classification number: H01J27/02 ,  G21K1/093 ,  H01J3/02 ,  H01J3/12 ,  H01J3/20 ,  H01J29/64

Abstract: The charged-particle beam system includes a non-axisymmetric diode forms a non-axisymmetric beam having an elliptic cross-section. A focusing element utilizes a magnetic field for focusing and transporting the non-axisymmetric beam, wherein the non-axisymmetric beam is approximately matched with the channel of the focusing element.

公开(公告)号：US3209147A

公开(公告)日：1965-09-28

申请号：US26305763

申请日：1963-03-05

Applicant: CENTRE NAT RECH SCIENT

Inventor： DUPOUY GASTON L ,  PERRIER FRANTZ R ,  BERNARD MARAIS

IPC: G01Q30/06 ,  H01J3/12

CPC classification number: H01J3/12

公开(公告)号：US20160300690A1

公开(公告)日：2016-10-13

申请号：US15035265

申请日：2014-11-05

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Akira IKEGAMI ,  Hideto DOHI ,  Hideyuki KAZUMI ,  Yoichi OSE ,  Naomasa SUZUKI ,  Momoyo ENYAMA ,  Ryuji NISHI ,  Akio TAKAOKA

IPC: H01J37/28 ,  H01J37/153 ,  H01J3/12 ,  H01J37/14

CPC classification number: H01J37/28 ,  H01J3/12 ,  H01J37/14 ,  H01J37/147 ,  H01J37/153 ,  H01J2237/15 ,  H01J2237/2611 ,  H01J2237/2814

Abstract: Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.

Abstract translation: 提供一种带电粒子束装置，其能够同时消除由打开角度的非均匀分布和带电粒子束的能量引起的多个像差。 带电粒子束装置设有像差产生透镜，用于产生由于穿过离轴的带电粒子束造成的像差，以及校正透镜，用于使带电粒子束的轨迹会聚在 物镜不管带电粒子束的能量如何。 校正透镜的主表面设置在交叉位置，在该交叉位置处，具有不同开口角度的多个带电粒子束在通过像差产生透镜之后会聚。

公开(公告)号：US20140224997A1

公开(公告)日：2014-08-14

申请号：US14180350

申请日：2014-02-13

Applicant: Industry-University Cooperation Foundation Sunmoon University

Inventor： Tae Sik OH ,  Ho Seob KIM ,  Dae Wook KIM ,  Seung Joon AHN

IPC: H01J3/26 ,  H01J3/14

CPC classification number: H01J3/26 ,  H01J3/021 ,  H01J3/12 ,  H01J3/14 ,  H01J3/18 ,  H01J3/30 ,  H01J37/04 ,  H01J2237/1205

Abstract: An ultra-miniaturized electron optical microcolumn is provided. The electron optical microcolumn includes an electron-emitting source emitting electrons using a field emission principle, an extraction electrode causing the emission of electrons from the electron-emitting source, a focusing electrode to which voltage is flexibly applied in response to a working distance to a target for regulating a focusing force of electron beams emitted from the electron-emitting source, an acceleration electrode accelerating electrons emitted by the extraction electrode, a limit electrode regulating an amount and a size of electron beams using electrons accelerated by the acceleration electrode, and a deflector deflecting electron beams towards the target.

Abstract translation: 提供超小型电子光学微柱。 电子光学微柱包括使用场致发射原理发射电子的电子发射源，引起来自电子发射源的电子的引出电极，响应于工作距离而被柔性施加电压的聚焦电极 用于调节从电子发射源发射的电子束的聚焦力的目标，加速由引出电极发射的电子的加速电极，限制电极使用由加速电极加速的电子来调节电子束的量和尺寸，以及 偏转器偏转电子束朝向目标。

公开(公告)号：US20130273478A1

公开(公告)日：2013-10-17

申请号：US13835154

申请日：2013-03-15

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kentaro Sano ,  Masato Muraki ,  Akira Miyake ,  Yoshikiyo Yui

IPC: H01J3/12

CPC classification number: H01J3/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/121

Abstract: The present invention provides a charged particle optical system which emits a charged particle beam, the system including an electrostatic lens, and a grid electrode opposed to the electrostatic lens along an optical axis of the electrostatic lens, and configured to form an electrostatic field in cooperation with the electrostatic lens, wherein the grid electrode is configured such that an electrode surface, opposed to the electrostatic lens, of the grid electrode has a distance, from the electrostatic lens in a direction of the optical axis, which varies with a position in the electrode surface.

Abstract translation: 本发明提供了一种发射带电粒子束的带电粒子光学系统，该系统包括静电透镜，以及沿着静电透镜的光轴与静电透镜相对的栅格电极，并配置为在合成中形成静电场 其中所述栅极与所述静电透镜相对的所述电极表面与所述静电透镜在所述光轴方向上具有距所述静电透镜的距离随着所述静电透镜的位置而变化的距离 电极表面。

公开(公告)号：US20130256555A1

公开(公告)日：2013-10-03

申请号：US13850626

申请日：2013-03-26

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Takahito NAKAYAMA

IPC: H01J3/12

CPC classification number: H01J3/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/30433 ,  H01J2237/31776

Abstract: A shaping offset adjustment method, comprising: checking a reference point formed by an overlap of first and second shaping apertures included in a charged particle beam drawing apparatus; changing a position of the first shaping aperture by deflecting a charged particle beam so that an overlap area of the first and second shaping apertures has a predetermined shot size; measuring a current value of the charged particle beam passing through the overlap area; performing fitting on a relationship between the shot size and the corresponding current value using a cubic polynomial to calculate coefficients of the cubic polynomial achieving best fit; and correcting a shaping offset amount using the calculated coefficients of the cubic polynomial.

Abstract translation: 一种成形偏移调整方法，包括：检查由包含在带电粒子束描绘装置中的第一和第二成形孔的重叠形成的参考点; 通过偏转带电粒子束来改变第一成形孔的位置，使得第一和第二成形孔的重叠区域具有预定的射出尺寸; 测量通过重叠区域的带电粒子束的电流值; 使用三次多项式对拍摄尺寸和对应的当前值之间的关系进行拟合，以计算实现最佳拟合的三次多项式的系数; 以及使用所计算的三次多项式的系数来校正整形偏移量。

公开(公告)号：US20130043389A1

公开(公告)日：2013-02-21

申请号：US13587598

申请日：2012-08-16

Applicant: Patrick SCHIAVONE ,  Thiago Figueiro

Inventor： Patrick SCHIAVONE ,  Thiago Figueiro

IPC: G21K5/00 ,  H01J37/26

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/2061 ,  H01J3/12 ,  H01J37/222 ,  H01J2229/563 ,  H01J2237/226 ,  H01J2237/31769

Abstract: A method for projecting an electron beam, used notably in direct or indirect writing lithography and in electronic microscopy. Proximity effects created by the forward and backward scattering of the electrons of the beam in interaction with the target must be corrected. For this, the convolution of a point spread function with the geometry of the target is conventionally used. At least one of the components of the point spread function has its maximum value not located on the center of the beam. Preferably, the maximum value is instead located on the backward scattering peak. Advantageously, the point spread function uses gamma distribution laws.

Abstract translation: 一种用于投射电子束的方法，特别用于直接或间接写入光刻和电子显微镜。 必须校正通过与靶相互作用的光束的电子的向前和向后散射产生的接近效应。 为此，通常使用点扩散函数与目标几何的卷积。 点扩散函数的至少一个分量的最大值不在波束的中心。 优选地，最大值代替地位于后向散射峰上。 有利地，点扩散函数使用伽马分布规律。