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    Wafer grounding using localized plasma source
    22.
    发明授权
    Wafer grounding using localized plasma source 有权
    晶圆接地采用局部等离子体源

    公开(公告)号：US09232626B2

    公开(公告)日：2016-01-05

    申请号：US14527301

    申请日：2014-10-29

    Applicant: KLA-Tencor Corporation

    Inventor： Christopher Sears

    IPC: H01J7/24 ,  H05B31/26 ,  H05H1/46 ,  H01L21/683 ,  H05H1/48 ,  H01J37/32

    CPC classification number: H05H1/46 ,  H01J37/32091 ,  H01J37/32532 ,  H01J37/32541 ,  H01L21/683 ,  H05H1/48 ,  H05H2001/483

    Abstract: An apparatus may include a substrate support portion, a plasma generation chamber, electrodes, and a power source. The substrate support portion supports a substrate including an insulating layer and a substrate bulk. The plasma generation chamber may include chamber wall portions, a gas port, and a plasma application aperture and is configured to contain a gas. The plasma application aperture may be covered by a portion of the substrate. Each electrode may protrude into or extend into an interior portion of the plasma generation chamber. The power source may be coupled to a particular electrode, and the power source may be configured to apply a voltage to the particular electrode. Application of the voltage to the particular electrode generates a plasma within the plasma generation chamber, whereby generation of the plasma results in a conductive path through the insulating layer of the substrate between the plasma and the substrate bulk.

    Abstract translation: 设备可以包括基板支撑部分，等离子体产生室，电极和电源。 衬底支撑部分支撑包括绝缘层和衬底本体的衬底。 等离子体产生室可以包括室壁部分，气体端口和等离子体施加孔，并且构造成容纳气体。 等离子体施加孔可以被衬底的一部分覆盖。 每个电极可以突出到或延伸到等离子体产生室的内部。 电源可以耦合到特定电极，并且电源可以被配置为向特定电极施加电压。 电压施加到特定电极在等离子体产生室内产生等离子体，由此等离子体的产生导致穿过等离子体和衬底本体之间的衬底绝缘层的导电路径。

    Inspection site preparation
    23.
    发明授权
    Inspection site preparation 有权
    检验现场准备

    公开(公告)号：US09165742B1

    公开(公告)日：2015-10-20

    申请号：US14627940

    申请日：2015-02-20

    Applicant: KLA-Tencor Corporation

    Inventor： Richard Simmons ,  Douglas Masnaghetti ,  Mark McCord ,  Fred E Stanke ,  Scott Young ,  Christopher Sears

    IPC: H01J37/26 ,  H01J27/00 ,  H01J37/06 ,  H01J37/28

    CPC classification number: H01J37/06 ,  H01J37/026 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/061

    Abstract: Embodiments of the present disclosure are directed to an electron beam imaging/inspection apparatus having an electron source device to direct flood electrons on a sample immediately before image acquisition or inspection. The apparatus comprises a first device configured to charge a sample in a first mode, wherein the first device includes an electron source configured to provide a flood beam of charged particles to a first area of the sample. The apparatus also comprises a second device configured to generate a primary beam of electrons and characterize an interaction between the primary beam and a second area of the sample within the first area in a second mode. The apparatus is configured to switch from the first mode to the second mode less than 1 second.

    Abstract translation: 本公开的实施例涉及一种具有电子源装置的电子束成像/检查装置，用于在图像采集或检查之前立即将样品引导到样品上。 该装置包括被配置为以第一模式对样本进行充电的第一装置，其中第一装置包括电子源，该电子源被配置为将带电粒子的泛光束提供到样品的第一区域。 该装置还包括被配置为产生主电子束的第二装置，并且在第二模式中表征主光束和第一区域内的样品的第二区域之间的相互作用。 该装置被配置为在第一模式下切换到第二模式小于1秒。

    Asymmetric Electrostatic Quadrupole Deflector for Improved Field Uniformity
    24.
    发明申请
    Asymmetric Electrostatic Quadrupole Deflector for Improved Field Uniformity 有权
    用于改善场均匀性的不对称静电四极杆

    公开(公告)号：US20150144785A1

    公开(公告)日：2015-05-28

    申请号：US14532805

    申请日：2014-11-04

    Applicant: KLA-Tencor Corporation

    Inventor： Christopher Sears

    IPC: H01J37/147 ,  H01J37/10 ,  H01J37/153

    CPC classification number: H01J37/1472 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/153 ,  H01J2237/10 ,  H01J2237/1508 ,  H01J2237/1516 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/2602 ,  H01J2237/28

    Abstract: An electron beam device for inspecting a target substrate or specimen thereon includes a beam separator with an asymmetric quadrupole electrostatic deflector for improving field uniformity for a single direction of deflection. The asymmetric quadrupole electrostatic deflector includes two orthogonal electrode plates spanning roughly 60 degrees and two electrode plates spanning roughly 120 degrees, the two latter plates defining a unidirectional deflection field. The device generates a primary electron beam and focuses the primary electron beam along an optical axis into the target substrate. Secondary electrons detected at the target substrate are focused into a secondary electron beam. The beam separator with asymmetric quadrupole electrostatic deflector deflects the secondary electron beam away from the axis of the primary electron beam in the direction of deflection and into a detector array.

    Abstract translation: 用于检查目标衬底或样本的电子束装置包括具有不对称四极静电偏转器的光束分离器，用于改善单个偏转方向的场均匀性。 不对称四极静电偏转器包括跨越大约60度的两个正交电极板和跨越大约120度的两个电极板，后两个板限定单向偏转场。 器件产生一次电子束，并将一次电子束沿光轴聚焦到目标衬底中。 在目标衬底处检测到的二次电子被聚焦成二次电子束。 具有不对称四极静电偏转器的光束分离器使二次电子束在偏转方向上偏离一次电子束的轴线并且进入检测器阵列。

    Space charge insensitive electron gun designs
    26.
    发明授权
    Space charge insensitive electron gun designs 有权

    公开(公告)号：US11302510B2

    公开(公告)日：2022-04-12

    申请号：US16100812

    申请日：2018-08-10

    Applicant: KLA-TENCOR CORPORATION

    Inventor： Christopher Sears ,  Luca Grella

    IPC: H01J37/063 ,  H01J37/073 ,  H01J37/24 ,  H01J37/28 ,  H01J37/065

    Abstract: Electron gun systems with a particular inner width dimension, sweep electrodes, or a combination of a particular inner width dimension and sweep electrodes are disclosed. The inner width dimension may be less than twice a value of a Larmor radius of secondary electrons in a channel downstream of a beam limiting aperture, and a Larmor time for the secondary electrons may be greater than 1 ns. The sweep electrode can generates an electric field in a drift region, which can increase kinetic energy of secondary electrons in the channel.

    Magnetically microfocused electron emission source
    27.
    发明授权
    Magnetically microfocused electron emission source 有权

    公开(公告)号：US11037753B2

    公开(公告)日：2021-06-15

    申请号：US16450242

    申请日：2019-06-24

    Applicant: KLA-Tencor Corporation

    Inventor： Christopher Sears

    IPC: H01J37/143 ,  H01J3/24 ,  H01J3/02 ,  H01J37/28

    Abstract: A magnetically microfocused electron emission source apparatus is disclosed. The apparatus may include a magnetic emitter unit, wherein the magnetic emitter unit comprises an emitter. Further, the magnetic emitter unit may include one or more magnetic portions formed from one or more magnetic materials, wherein the one or more magnetic portions of the magnetic emitter unit are configured to generate a magnetic field proximate to a tip of the emitter of the magnetic emitter unit for enhancing focusing of the emitted electrons from the electron emitter.

    Method and system for edge-of-wafer inspection and review
    28.
    发明授权
    Method and system for edge-of-wafer inspection and review 有权

    公开(公告)号：US10770258B2

    公开(公告)日：2020-09-08

    申请号：US16105632

    申请日：2018-08-20

    Applicant: KLA-Tencor Corporation

    Inventor： Xinrong Jiang ,  Christopher Sears ,  Harsh Sinha ,  David Trease ,  David Kaz ,  Wei Ye

    IPC: H01J37/26 ,  H01J37/22 ,  H01J37/153

    Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

    POSITION FEEDBACK FOR MULTI-BEAM PARTICLE DETECTOR
    29.
    发明申请
    POSITION FEEDBACK FOR MULTI-BEAM PARTICLE DETECTOR 审中-公开

    公开(公告)号：US20190227010A1

    公开(公告)日：2019-07-25

    申请号：US15879611

    申请日：2018-01-25

    Applicant: KLA-Tencor Corporation

    Inventor： Alan D. Brodie ,  Christopher Sears

    IPC: G01N23/2251 ,  G01N23/2255

    Abstract: A multi-beam metrology system includes an illumination source configured to generate a beam array, an illumination sub-system to direct the beam array to a sample at an array of measurement locations, an imaging sub-system to image the array of measurement locations as an array of imaged spots in a detection plane, and a detection assembly to generate detection signal channels associated with each of the imaged spots. The detection assembly includes an array of detection elements configured to receive the imaged spots with separate detection elements, and one or more position detectors to measure positions of the imaged spots in the detection plane. The detection assembly further generates feedback signals for the imaging sub-system based on the measured positions of the imaged spots to adjust the positions of one or more of the imaged spots in the detection plane to maintain alignment of the array of detection elements.

    Multi-column scanning electron microscopy system
    30.
    发明授权
    Multi-column scanning electron microscopy system 有权

    公开(公告)号：US10354832B2

    公开(公告)日：2019-07-16

    申请号：US15616749

    申请日：2017-06-07

    Applicant: KLA-Tencor Corporation

    Inventor： Robert Haynes ,  John Gerling ,  Aron Welk ,  Christopher Sears ,  Felipe Fuks ,  Mehran Nasser-Ghodsi ,  Tomas Plettner

    IPC: H01J37/147 ,  H01J37/14 ,  H01J37/285 ,  H01J37/18

    Abstract: A multi-column scanning electron microscopy (SEM) system is disclosed. The SEM system includes a source assembly. The source assembly includes two or more electron beam sources configured to generate a plurality of electron beams. The source assembly also includes two or more sets of positioners configured to actuate the two or more electron beam sources. The SEM system also includes a column assembly. The column assembly includes a plurality of substrate arrays. The column assembly also includes two or more electron-optical columns formed by a set of column electron-optical elements bonded to the plurality of substrate arrays. The SEM system also includes a stage configured to secure a sample that at least one of emits or scatters electrons in response to the plurality of electron beams directed by the two or more electron-optical columns to the sample.

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