公开(公告)号：US07807984B2

公开(公告)日：2010-10-05

申请号：US12003852

申请日：2008-01-02

Applicant: Gregory Robert Alcott ,  Adrian Murrell ,  Matthew Castle ,  Martin Hilkene

Inventor： Gregory Robert Alcott ,  Adrian Murrell ,  Matthew Castle ,  Martin Hilkene

IPC: H01J37/304

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0268 ,  H01J2237/028 ,  H01J2237/24405 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: Components in an ion implanter that may see incidence of the ion beam include a chamber having an elongate slot opening defined by edges so that a central portion of the ion beam enters the component through the opening with the edges clipping at least a peripheral portion of the ion beam. The arrangement mitigates the problem of sputtered material escaping back out from the component and becoming entrained in the ion beam.

Abstract translation: 可以看到离子束的入射的离子注入机中的部件包括具有由边缘限定的细长狭缝开口的室，使得离子束的中心部分通过开口进入部件，边缘至少限定 离子束。 该装置减轻了溅射材料从组件中退出并被夹带在离子束中的问题。

公开(公告)号：US20100237231A1

公开(公告)日：2010-09-23

申请号：US12661480

申请日：2010-03-18

Applicant: Jiong Chen

Inventor： Jiong Chen

IPC: H01J37/317 ,  H01J49/26 ,  H01J37/147

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/1475 ,  H01J2237/153 ,  H01J2237/166 ,  H01J2237/24528 ,  H01J2237/24542 ,  H01J2237/30433 ,  H01J2237/30483

Abstract: An ion implantation apparatus with multiple operating modes is disclosed. The ion implantation apparatus has an ion source and an ion extraction means for forming a converging beam on AMU-non-dispersive plane therefrom. The ion implantation apparatus includes magnetic scanner prior to a magnetic analyzer for scanning the beam on the non-dispersive plane, the magnetic analyzer for selecting ions with specific mass-to-charge ratio to pass through a mass slit to project onto a substrate. A rectangular quadruple magnet is provided to collimate the scanned ion beam and fine corrections of the beam incident angles onto a target. A deceleration or acceleration system incorporating energy filtering is at downstream of the beam collimator. A two-dimensional mechanical scanning system for scanning the target is disclosed, in which a beam diagnostic means is build in.

Abstract translation: 公开了一种具有多种工作模式的离子注入装置。 离子注入装置具有离子源和用于在其AMU非分散平面上形成会聚束的离子提取装置。 离子注入装置包括在用于扫描非分散平面上的束的磁分析仪之前的磁扫描器，用于选择具有特定质荷比的离子的磁分析器通过质量狭缝以投射到基底上。 提供矩形四极磁体以准直扫描的离子束并将光束入射角精细校正到目标上。 结合能量过滤的减速或加速系统位于射束准直仪的下游。 公开了一种用于扫描目标的二维机械扫描系统，其中构建了光束诊断装置。

公开(公告)号：US07800082B2

公开(公告)日：2010-09-21

申请号：US11276128

申请日：2006-02-15

Applicant: Peter L. Kellerman ,  Keneth H. Purser

Inventor： Peter L. Kellerman ,  Keneth H. Purser

IPC: H01J37/317

CPC classification number: H01J37/05 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/3171 ,  H01J2237/0042 ,  H01J2237/057 ,  H01J2237/141 ,  H01J2237/142 ,  H01J2237/1508 ,  H01J2237/152 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and a third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.

Abstract translation: 公开了一种包括活性场容纳的电磁体和相关离子注入机系统。 电磁铁在高大的间隙内提供偶极磁场，具有最小的变形和强度的降低。 在一个实施例中，用于修改离子束的电磁体包括：包括六个边的铁磁盒结构; 所述铁磁盒结构的第一侧和第二相对侧中的每一个中的开口用于使所述离子束通过其中; 以及多个载流线，其具有沿铁磁箱结构的内表面的路径，内表面包括第一侧和第二相对侧，以及第三侧和第四相对侧，其中多个载流 电线定位成绕过第一和第二相对侧的每个开口。

公开(公告)号：US07755067B2

公开(公告)日：2010-07-13

申请号：US12100861

申请日：2008-04-10

Applicant: Mitsukuni Tsukihara ,  Takanori Yagita ,  Yoshitaka Amano ,  Mitsuaki Kabasawa

Inventor： Mitsukuni Tsukihara ,  Takanori Yagita ,  Yoshitaka Amano ,  Mitsuaki Kabasawa

IPC: H01J37/317 ,  H01J37/256 ,  H01L21/265 ,  G21K1/08

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/304 ,  H01J2237/30477

Abstract: An ion implantation apparatus reciprocally scans an ion beam extracted from an ion source and passed through a mass analysis magnet apparatus and a mass analysis slit and irradiates to a wafer. The ion beam is converged and shaped by providing a first quadrupole vertical focusing electromagnet at a section of a beam line from an outlet of the mass analysis magnet apparatus before incidence of the mass analysis slit and providing a second quadrupole vertical focusing electromagnet having an effective magnetic field effect larger than that of the first quadrupole focusing electromagnet at a section of the beam line from an outlet of the mass analysis slit before incidence on the beam scanner.

Abstract translation: 离子注入装置相互扫描从离子源提取的离子束并通过质量分析磁体装置和质量分析狭缝并照射到晶片。 通过在质量分析用狭缝入射之前从质量分析磁体装置的出口在梁线的一部分处设置第一四极杆垂直聚焦电磁体并提供具有有效磁性的第二四极杆垂直聚焦电磁体，离子束会聚并成形 在光束扫描器上入射之前，在质量分析狭缝的出口处的光束线的一部分处的第一四极聚焦电磁体的场效应大于第一四极聚焦电磁体。

公开(公告)号：US07750322B2

公开(公告)日：2010-07-06

申请号：US12418237

申请日：2009-04-03

Applicant: Thomas Parrill ,  Aditya Agarwal

Inventor： Thomas Parrill ,  Aditya Agarwal

IPC: H01J37/317 ,  H01J37/30 ,  H01L21/265

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/20 ,  H01J2237/2007

Abstract: Ion implanters are especially suited to meet process dose and energy demands associated with fabricating photovoltaic devices by ion implantation followed by cleaving.

Abstract translation: 离子注入机特别适用于通过离子注入和裂解来与制造光伏器件相关的工艺剂量和能量需求。

公开(公告)号：US07745783B2

公开(公告)日：2010-06-29

申请号：US12153455

申请日：2008-05-20

Applicant: Stephan Uhlemann

Inventor： Stephan Uhlemann

IPC: G21K1/06 ,  G21K5/02

CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/26 ,  H01J49/48 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/1538

Abstract: A monochromator (1) for a charged particle optics, in particular, for electron microscopy, comprises at least one first deflection element (2, 3) with an electrostatic deflecting field (2′, 3′) for generating a dispersion (4) in the plane (5) of a selection aperture (6) to select charged particles of a desired energy interval (7) and at least one second deflection element (8, 9) with an electrostatic deflecting field (8′, 9′) which eliminates the dispersion (4) of the at least one first deflecting field (2′, 3′). A radiation source (17) comprises such a monochromator (1). High monchromatism without intensity contrasts caused by defects of the slit aperture is thereby achieved in that the deflection elements (2, 3, 8, 9) have a design other than spherically shaped and their electrodes (24, 25) are given a potential (φ+, φ−) such that the charged particles (xα, yβ) which virtually enter the image of the radiation source (17) at different respective angles (α, β) in different sections (x, y), are differently focused such that charged particles (xα, yβ) of one energy are point focused (10, 10′, 10″) exclusively in the plane (5) of the selection aperture (6), since zero-crossings (11, 12) of the deflections (A) of the charged particles (xα, yβ) of the different sections (x, y) only coincide there at the same axial position (z, E).

Abstract translation: 用于带电粒子光学器件的单色仪（1），特别是用于电子显微镜的装置包括至少一个具有用于产生分散体（4）的静电偏转场（2'，3'）的第一偏转元件（2,3） 选择孔径（6）的平面（5）以选择具有期望能量间隔（7）的带电粒子和至少一个具有静电偏转场（8'，9'）的第二偏转元件（8,9） 所述至少一个第一偏转场（2'，3'）的色散（4）。 辐射源（17）包括这样的单色仪（1）。 因此，由于偏转元件（2,3,8,9）具有除球形之外的设计，并且它们的电极（24,25）被赋予电位（＆phgr），因此实现了由狭缝孔径的缺陷引起的没有强度对比度的高单色差 ; +，＆phgr; - ），使得实际上在不同部分（x，y）中以不同的各个角度（α，＆bgr））进入辐射源（17）的图像的带电粒子（xα，y和bgr） 不同的聚焦使得一个能量的带电粒子（xα，y和bgr）专门在选择孔径（6）的平面（5）中点聚焦（10,10'，10“），因为过零点（11,12 不同部分（x，y）的带电粒子（xα，y＆bgr）的偏转（A）的位移仅在相同的轴向位置（z，E）处重合。

公开(公告)号：US20100148060A1

公开(公告)日：2010-06-17

申请号：US11917663

申请日：2006-06-16

Applicant: Peter Panayi

Inventor： Peter Panayi

IPC: H01J49/40

CPC classification number: H01J37/05 ,  G01N2001/045 ,  H01J37/285 ,  H01J49/0004 ,  H01J49/405 ,  H01J2237/0535

Abstract: Aspects of the present invention are directed generally toward atom probe and three-dimensional atom probe microscopes. For example, certain aspects of the invention are directed-toward an atom probe or a three-dimensional atom probe that includes a sub-nanosecond laser to evaporate ions from a specimen under analysis and a reflectron for reflecting the ions. In further aspects of the invention, the reflectron can include a front electrode and a back electrode. At least one of the front and back electrodes can be capable of generating a curved electric field. Additionally, the front electrode and back electrodes can be configured to perform time focusing and resolve an image of a specimen.

Abstract translation: 本发明的方面通常涉及原子探针和三维原子探针显微镜。 例如，本发明的某些方面涉及一种原子探针或三维原子探针，其包括亚纳秒级激光以从分析中的样品蒸发离子和用于反射离子的反射器。 在本发明的其它方面中，反射器可以包括前电极和后电极。 前电极和后电极中的至少一个能够产生弯曲的电场。 此外，前电极和背电极可以被配置为执行时间聚焦并且解析样本的图像。

公开(公告)号：US07675050B2

公开(公告)日：2010-03-09

申请号：US11759876

申请日：2007-06-07

Applicant: Jiong Chen

Inventor： Jiong Chen

IPC: H01J37/317 ,  H01J37/28

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/08 ,  H01J37/1472 ,  H01J2237/04756 ,  H01J2237/057 ,  H01J2237/083 ,  H01J2237/1503 ,  H01J2237/201 ,  H01J2237/20221 ,  H01J2237/30472 ,  H01J2237/31701

Abstract: An ion implantation apparatus with multiple operating modes is disclosed. The ion implantation apparatus has an ion source and an ion extraction means for extracting a ribbon-shaped ion beam therefrom. The ion implantation apparatus includes a magnetic analyzer for selecting ions with specific mass-to-charge ratio to pass through a mass slit to project onto a substrate. Multipole lenses are provided to control beam uniformity and collimation. A two-path beamline in which a second path incorporates a deceleration or acceleration system incorporating energy filtering is disclosed. Finally, methods of ion implantation are disclosed in which the mode of implantation may be switched from one-dimensional scanning of the target to two-dimensional scanning.

Abstract translation: 公开了一种具有多种工作模式的离子注入装置。 离子注入装置具有离子源和用于从其提取带状离子束的离子提取装置。 离子注入装置包括用于选择具有特定质荷比的离子的磁分析器，以通过质量狭缝投影到基底上。 提供多极镜头以控制光束的均匀性和准直。 公开了一种二路光束线，其中第二路径包括并入能量过滤的减速或加速系统。 最后，公开了离子注入的方法，其中注入模式可以从目标的一维扫描切换到二维扫描。

公开(公告)号：US20100051805A1

公开(公告)日：2010-03-04

申请号：US12548764

申请日：2009-08-27

Applicant: FHM-Faridur Rahman ,  Louis S. Farkas, III ,  John A. Notte, IV

Inventor： FHM-Faridur Rahman ,  Louis S. Farkas, III ,  John A. Notte, IV

IPC: G01N23/00 ,  G21K5/00

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/08 ,  H01J37/265 ,  H01J2237/057 ,  H01J2237/0807 ,  H01J2237/24514

Abstract: Ion microscope methods and systems are disclosed. In general, the systems and methods provide high ion beam stability.

Abstract translation: 公开了离子显微镜的方法和系统。 通常，这些系统和方法提供了高离子束稳定性。

公开(公告)号：US20090309023A1

公开(公告)日：2009-12-17

申请号：US12482577

申请日：2009-06-11

Applicant: Simon Page

Inventor： Simon Page

IPC: G01N23/00

CPC classification number: H01J37/05 ,  G01N23/2273 ,  H01J37/08 ,  H01J37/295 ,  H01J37/30 ,  H01J2237/05 ,  H01J2237/08 ,  H01J2237/0815

Abstract: The present invention provides an electron spectroscopy apparatus (12) comprising a high energy particle source (12) for irradiating a sample, an electron detector system (16) (e.g. including a delay line detector) for detecting electrons emitted from the sample and an ion gun (8) for delivering a polycyclic aromatic hydrocarbon (PAH) ion beam to the sample, wherein the ion gun comprises a polycyclic aromatic hydrocarbon ion source, for example comprising coronene. In an embodiment, the PAH is located in a heated chamber (22) and vaporised to produce gas phase PAH. The gas phase PAH molecules are then ionised by electron impact, extracted from the ion source via an extraction field and focussed using ion optics. The PAH ion beam can be used for surface cleaning and depth analysis.

Abstract translation: 本发明提供了一种包括用于照射样品的高能粒子源（12），用于检测从样品发射的电子的电子检测器系统（16）（例如包括延迟线检测器）的电子分光装置（12） 用于将多环芳烃（PAH）离子束输送到样品的枪（8），其中所述离子枪包括多环芳族烃离子源，例如包含芳烃。 在一个实施方案中，PAH位于加热室（22）中并蒸发以产生气相PAH。 气相PAH分子然后通过电子轰击电离，通过提取场从离子源提取，并使用离子光学聚焦。 PAH离子束可用于表面清洁和深度分析。