Abstract:
A monochromator (1) for a charged particle optics, in particular, for electron microscopy, comprises at least one first deflection element (2, 3) with an electrostatic deflecting field (2′, 3′) for generating a dispersion (4) in the plane (5) of a selection aperture (6) to select charged particles of a desired energy interval (7) and at least one second deflection element (8, 9) with an electrostatic deflecting field (8′, 9′) which eliminates the dispersion (4) of the at least one first deflecting field (2′, 3′). A radiation source (17) comprises such a monochromator (1). High monchromatism without intensity contrasts caused by defects of the slit aperture is thereby achieved in that the deflection elements (2, 3, 8, 9) have a design other than spherically shaped and their electrodes (24, 25) are given a potential (φ+, φ−) such that the charged particles (xα, yβ) which virtually enter the image of the radiation source (17) at different respective angles (α, β) in different sections (x, y), are differently focused such that charged particles (xα, yβ) of one energy are point focused (10, 10′, 10″) exclusively in the plane (5) of the selection aperture (6), since zero-crossings (11, 12) of the deflections (A) of the charged particles (xα, yβ) of the different sections (x, y) only coincide there at the same axial position (z, E).
Abstract:
An examining system for imaging an object positionable in an object plane, includes an illumination device for supplying energy to a delimited field of the object such that charged particles emerge from locations of the field, the field being displaceable in the plane of the object, a first deflector for providing a variable deflection field for guiding charged particles emerging from locations of a selectable region of the object through a fixed, predetermined beam cross-section, and a position-sensitive detector disposed in the beam path such that the charged particles, after having passed through the first deflector, impinge on the position-sensitive detector, wherein particles emerging from different locations of the region are imaged on different locations of the position-sensitive detector which are allocated to the locations of emergence.
Abstract:
A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
Abstract:
A corrector (10) for an electron microscope is proposed which is less sensitive to fluctuations of the electrical power supply if a stigmatic intermediate image (9) of the axial fundamental rays (xα, yβ) is produced in the quadrupole field (1′) of a first quadrupole element (1) and this quadrupole field (1′) is set such that astigmatic intermediate images (12, 13) of the off-axial fundamental rays (xγ, yδ) are produced in the region of the center of the quadrupole fields (3′, 4′) of a third (3) and fourth multipole element (4) and there also, due to the setting of the quadrupole field (2′) of a second quadrupole element (2), the axial fundamental rays (xα, yβ) of the same section (x, y) as that, in which the intermediate images (12, 13) of the off-axial fundamental rays (xγ, yδ) are located, each exhibit a maximum.
Abstract:
A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
Abstract:
An electrostatic corrector for eliminating the chromatic aberration of particle lenses, includes a corrector having a straight optical axis and an electrostatic quadrupole for allocating to the objective lens. Two corrector pieces are positioned behind the quadrupole, along the optical axis in the direction of radiation. Each corrector piece has three electrical quadrupole fields with an overlying circular lens field. The quadrupole fields, however, are rotated 90° about the optical axis in relation to each other. This arrangement is adjusted so that the astigmatic first image of one sectional view lies in one corrector piece and the astigmatic first image perpendicular thereto, of the other sectional view, lies in the other corrector piece, with another electrostatic quadrupole being located on the output side.
Abstract:
A device for correcting third-order spherical aberration in the objective lens of an electron microscope, including an objective lens and a correction device which is formed by two hexapoles and a round-lens doublet arranged therebetween having two round lenses with the same focal length, whereby a single round lens (3) is arranged between the objective lens (2) and the correction device (1) in such a way that a parallel optical path hits the correction device (1) and the coma-free plane (6) of the objective lens is represented on the plane of the first hexapole (8) of the correction device (1) or two round lenses with different focal lengths are arranged between the objective lens and the correction device, whereby the distance between the round lens (14) close to the objective and the coma-free plane (16) of the objective and the distance between the round lens (15) close to the correction device and the coma-free plane (17) of the correction device is the same is terms of focal length and the distance between both round lenses (14, 15) is equal to the sum of their focal lengths.
Abstract:
A corrector (10) for an electron microscope is proposed which is less sensitive to fluctuations of the electrical power supply if a stigmatic intermediate image (9) of the axial fundamental rays (xα, yβ) is produced in the quadrupole field (1′) of a first quadrupole element (1) and this quadrupole field (1′) is set such that astigmatic intermediate images (12, 13) of the off-axial fundamental rays (xγ, yδ) are produced in the region of the center of the quadrupole fields (3′, 4′) of a third (3) and fourth multipole element (4) and there also, due to the setting of the quadrupole field (2′) of a second quadrupole element (2), the axial fundamental rays (xα, yβ) of the same section (x, y) as that, in which the intermediate images (12, 13) of the off-axial fundamental rays (xγ, yδ) are located, each exhibit a maximum.
Abstract:
A particle-optical corrector for eliminating both the third-order aperture aberration and the third-order extra-axial coma, using circular lenses and hexapole fields, includes three coaxially arranged hexapole fields, at least one circular lens doublet being arranged between adjacent hexapole fields and adjusted so that the center hexapole field is imaged on the hexapole fields. Between the hexapole fields, an intermediate plane prevails and the intermediate planes are conjugated with one another. The three hexapole fields are identically oriented in the Larmor reference system with the intensities of the three fields being chosen so that the image aberration coefficient of the astigmatism with three-fold symmetry becomes 0. The corrective contains two hexapole fields, in which the fields of the hexapole field pair are excited anti-symmetrically to one another, and the pairs are in each case arranged around the two intermediate planes. The orientation of the hexapole field pairs is rotated with respect to the orientation defined by the hexapole fields by a sufficient angle so that the extra-axial third order coma is corrected.
Abstract:
An electron-optical corrector for rendering superfluous both the third-order opening error and the anisotropic part of the extra-axial third-order coma, using round lenses and hexapole fields, the corrector includes at least three coaxially arranged hexapole fields with at least one round lens field is arranged between adjacent hexapole fields, so that the hexapole fields are imaged onto each other in pairs. The intensities of the hexapole fields are selected so that the image error coefficient of the three-fold astigmatism is equal to 0, and at least three hexapole fields in the Larmor reference system are rotated in relation to each other at an angle about the optical axis.