公开(公告)号：US06605810B1

公开(公告)日：2003-08-12

申请号：US09601053

申请日：2000-09-05

Applicant: Maximilian Haider ,  Stephan Uhlemann

Inventor： Maximilian Haider ,  Stephan Uhlemann

IPC: H01J3710

CPC classification number: H01J37/153

Abstract: A device for correcting third-order spherical aberration in the objective lens of an electron microscope, including an objective lens and a correction device which is formed by two hexapoles and a round-lens doublet arranged therebetween having two round lenses with the same focal length, whereby a single round lens (3) is arranged between the objective lens (2) and the correction device (1) in such a way that a parallel optical path hits the correction device (1) and the coma-free plane (6) of the objective lens is represented on the plane of the first hexapole (8) of the correction device (1) or two round lenses with different focal lengths are arranged between the objective lens and the correction device, whereby the distance between the round lens (14) close to the objective and the coma-free plane (16) of the objective and the distance between the round lens (15) close to the correction device and the coma-free plane (17) of the correction device is the same is terms of focal length and the distance between both round lenses (14, 15) is equal to the sum of their focal lengths.

Abstract translation: 一种用于校正电子显微镜的物镜中的三阶球面像差的装置，包括物镜和由两个六极体形成的校正装置和设置在其间的圆形透镜双面镜，具有两个具有相同焦距的圆形透镜， 由此在物镜（2）和校正装置（1）之间设置单个圆形透镜（3），使得平行光路撞击校正装置（1）和无偏转平面（6）， 物镜被表示在校正装置（1）的第一六极（8）的平面上，或者在物镜和校正装置之间布置具有不同焦距的两个圆形透镜，由此圆形透镜（14） ）接近目标的物体，并且物镜的无昏暗平面（16）和靠近校正装置的圆形透镜（15）与校正装置的无昏暗平面（17）之间的距离是相同的 的焦点 并且两个圆形透镜（14,15）之间的距离等于它们的焦距的总和。

公开(公告)号：US06646267B1

公开(公告)日：2003-11-11

申请号：US09508239

申请日：2000-04-24

Applicant: Maximilian Haider ,  Stephan Uhlemann

Inventor： Maximilian Haider ,  Stephan Uhlemann

IPC: H01J3710

CPC classification number: H01J37/153

Abstract: The invention relates to a method for eliminating axial image deformations &agr;n in electron optical systems, where the extra-axial image deformation of the order n+m with the same behavior in &agr;n, which thus has the form &agr;n&ggr;m, is modified by shifting or tilting the beam path towards the optical axis until compensation of the axial image deformation has been achieved, whereby &ggr; describes the extra-axial image coordinate as a complex number in both sections. The invention also relates to an adjustment method for eliminating all first-, second- and third-order axial image deformations during correction of the third-order spherical aberration in electron optical systems with hexapoles.

Abstract translation: 本发明涉及一种用于消除电子光学系统中的轴向图像变形αn的方法，其中n + m阶的异轴图像变形具有相同的α的行为，因此具有α< 通过将光束路径朝向光轴移动或倾斜直到轴向图像变形的补偿已被实现来修改，由此γ在两个部分中将异轴图像坐标描述为复数。 本发明还涉及一种用于消除在具有六极的电子光学系统中校正三次球面像差期间的所有第一，第二和第三阶轴向图像变形的调整方法。

公开(公告)号：US06642518B1

公开(公告)日：2003-11-04

申请号：US10176873

申请日：2002-06-21

Applicant: Fred Y. Clark ,  James D. Krouse ,  Ping Jiang ,  Robyn R. Carlson

Inventor： Fred Y. Clark ,  James D. Krouse ,  Ping Jiang ,  Robyn R. Carlson

IPC: H01J3710

CPC classification number: G01N23/225 ,  H01J2237/004 ,  H01J2237/2809 ,  H01J2237/2814

Abstract: An assembly and method for improved scanning electron microscope analysis of semiconductor devices include a structure including a first layer and a second layer, the second layer shrinking substantially when the structure is examined with a scanning electron microscope having a beam energy of at least 1.5 KeV, and at least part of the surface of the structure coated with a material composed of Iridium, wherein the coating is of sufficient thickness to reduce shrinkage of the second layer to approximately a predetermined amount when the structure is examined with a scanning electron microscope having a beam energy of at least 1.5 KeV.

Abstract translation: 用于改进半导体器件的扫描电子显微镜分析的组件和方法包括包括第一层和第二层的结构，当使用具有至少1.5KeV的束能的扫描电子显微镜检查结构时，第二层基本上收缩， 并且涂覆有由铱构成的材料的结构的表面的至少一部分，其中当使用具有光束的扫描电子显微镜检查结构时，涂层具有足够的厚度以减小第二层的收缩至约预定量 至少1.5 KeV的能量。

公开(公告)号：US06570162B2

公开(公告)日：2003-05-27

申请号：US09926744

申请日：2001-12-11

Applicant: Masahiro Kiga ,  Atsushi Nakamura

Inventor： Masahiro Kiga ,  Atsushi Nakamura

IPC: H01J3710

CPC classification number: H01J33/00 ,  H01J33/02

Abstract: A method and apparatus (11) for irradiating an electron beam, wherein a triangular wave generator (22) provides a triangular wave current to a scanning coil (17) to move the electron beam in a first scanning direction (Y), while a square wave generator (21) provides a square wave current to a deflecting coil (16) to move the electron beam in a second scanning direction (X) orthogonal to the first scanning direction (Y). The triangular wave current provided from the triangular wave generator is modulated to cancel the effects of hysteresis in the scanning coil. Further, the rise of the square wave current is synchronized and shifted a prescribed interval in relation to the peak values of the triangular wave current in order to distribute the reversing points on the electron beam path along the second scanning direction.

公开(公告)号：US06555818B1

公开(公告)日：2003-04-29

申请号：US09595870

申请日：2000-06-16

Applicant: Fumio Hosokawa

Inventor： Fumio Hosokawa

IPC: H01J3710

CPC classification number: H01J37/26 ,  H01J37/153 ,  H01J2237/1534

Abstract: There is disclosed a transmission electron microscope that uses an accelerating voltage on the order of 200 kV but is capable of correcting spherical aberration. This microscope has an illumination lens and an auxiliary illumination lens that are interlocked to form an electron diffraction image of a specimen at a fixed position independent of the current density on the specimen. A first hexapole element is mounted at the position where the electron diffraction image is formed. A second hexapole element is placed in a position conjugate with the first hexapole element. A doublet lens is disposed between these two hexapole elements.

Abstract translation: 公开了使用大约200kV的加速电压但能够校正球面像差的透射电子显微镜。 该显微镜具有互锁的照明透镜和辅助照明透镜，以在固定位置形成试样的电子衍射图像，与试样上的电流密度无关。 第一六极元件安装在形成电子衍射图像的位置。 将第二六极元件放置在与第一六极元件共轭的位置。 在这两个六极元件之间设置双透镜。

公开(公告)号：US06825475B2

公开(公告)日：2004-11-30

申请号：US10247104

申请日：2002-09-19

Applicant: Igor Petrov ,  Igor Krivts ,  Zvika Rosenberg ,  Pavel Adamec

Inventor： Igor Petrov ,  Igor Krivts ,  Zvika Rosenberg ,  Pavel Adamec

IPC: H01J3710

CPC classification number: H01J37/1475

Abstract: A deflection system is presented for use in a lens arrangement of a charged particle beam column for inspecting a sample. The system comprises a magnetic deflector operable to create a magnetic field, and a pole piece assembly at least partly accommodated within the magnetic field. The pole piece assembly has a portion made of a soft magnetic material and is formed with an opening for a charged particle beam propagation therethrough. The deflection system allows for conducting the magnetic field created by the magnetic deflector through the pole piece assembly towards the opening in the pole piece assembly. This enables to increase the magnetic field value in the vicinity of the sample at the optical axis of the lens arrangement at a given electric current through the excitation coils of the magnetic deflector, without a need to increase a working distance.

Abstract translation: 呈现偏转系统用于带电粒子束柱的透镜布置，用于检查样品。 该系统包括可操作以产生磁场的磁偏转器和至少部分地容纳在磁场内的极片组件。 极片组件具有由软磁材料制成的部分，并且形成有用于带电粒子束传播的开口。 偏转系统允许通过磁极组件朝磁极组件的开口传导由磁偏转器产生的磁场。 这样就能够使透镜装置的光轴附近的样品在通过磁导流板的激励线圈的给定电流上增加磁场值，而不需要增加工作距离。

公开(公告)号：US06747279B2

公开(公告)日：2004-06-08

申请号：US10182437

申请日：2002-10-03

Applicant: Pavel Adamec

Inventor： Pavel Adamec

IPC: H01J3710

CPC classification number: H01J37/1471 ,  H01J37/141 ,  H01J37/28

Abstract: An improved objective lens for a charged particle beam device is constituted by, among other things, a magnetic lens that creates a first magnetic field for focussing the charged particle beam onto the specimen. Furthermore, a deflector is integrated into the magnetic lens by providing at least one additional coil arrangement that creates a second magnetic field used to deflect the charged particle beam. Thereby, the second magnetic field is guided through at least one of the pole pieces of the magnetic lens. The present invention also provides an improved column for a charged particle beam device including the improved objective lens.

Abstract translation: 用于带电粒子束装置的改进的物镜由除其他之外的磁性透镜构成，该磁透镜产生用于将带电粒子束聚焦到样本上的第一磁场。 此外，偏转器通过提供至少一个额外的线圈装置而被集成到磁性透镜中，该线圈装置产生用于偏转带电粒子束的第二磁场。 由此，第二磁场被引导通过磁性透镜的极片中的至少一个。 本发明还提供了一种用于包括改进的物镜的带电粒子束装置的改进的列。