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    Device for correcting third-order spherical aberration in a lens, especially the objective lens of an electronic microscope
    2.
    发明授权
    Device for correcting third-order spherical aberration in a lens, especially the objective lens of an electronic microscope 有权
    用于校正透镜中的三阶球面像差的装置，特别是电子显微镜的物镜

    公开(公告)号：US06605810B1

    公开(公告)日：2003-08-12

    申请号：US09601053

    申请日：2000-09-05

    Applicant: Maximilian Haider ,  Stephan Uhlemann

    Inventor： Maximilian Haider ,  Stephan Uhlemann

    IPC: H01J3710

    CPC classification number: H01J37/153

    Abstract: A device for correcting third-order spherical aberration in the objective lens of an electron microscope, including an objective lens and a correction device which is formed by two hexapoles and a round-lens doublet arranged therebetween having two round lenses with the same focal length, whereby a single round lens (3) is arranged between the objective lens (2) and the correction device (1) in such a way that a parallel optical path hits the correction device (1) and the coma-free plane (6) of the objective lens is represented on the plane of the first hexapole (8) of the correction device (1) or two round lenses with different focal lengths are arranged between the objective lens and the correction device, whereby the distance between the round lens (14) close to the objective and the coma-free plane (16) of the objective and the distance between the round lens (15) close to the correction device and the coma-free plane (17) of the correction device is the same is terms of focal length and the distance between both round lenses (14, 15) is equal to the sum of their focal lengths.

    Abstract translation: 一种用于校正电子显微镜的物镜中的三阶球面像差的装置，包括物镜和由两个六极体形成的校正装置和设置在其间的圆形透镜双面镜，具有两个具有相同焦距的圆形透镜， 由此在物镜（2）和校正装置（1）之间设置单个圆形透镜（3），使得平行光路撞击校正装置（1）和无偏转平面（6）， 物镜被表示在校正装置（1）的第一六极（8）的平面上，或者在物镜和校正装置之间布置具有不同焦距的两个圆形透镜，由此圆形透镜（14） ）接近目标的物体，并且物镜的无昏暗平面（16）和靠近校正装置的圆形透镜（15）与校正装置的无昏暗平面（17）之间的距离是相同的 的焦点 并且两个圆形透镜（14,15）之间的距离等于它们的焦距的总和。

    Electron/ion gun for electron or ion beams with high monochromasy or high current density
    6.
    发明授权
    Electron/ion gun for electron or ion beams with high monochromasy or high current density 有权
    用于具有高单色或高电流密度的电子或离子束的电子/离子枪

    公开(公告)号：US06770878B2

    公开(公告)日：2004-08-03

    申请号：US10258486

    申请日：2002-10-25

    Applicant: Stephan Uhlemann ,  Maximilian Haider

    Inventor： Stephan Uhlemann ,  Maximilian Haider

    IPC: H01J4000

    CPC classification number: H01J37/05 ,  H01J49/46 ,  H01J2237/2602 ,  H01J2237/2823

    Abstract: The invention relates to an electron/ion gun for electron or ion beams, including a beam source and a monochromator. According to the invention, the monochromator is equipped with an additional beam guidance system and a switchover element which are provided at the input of the monochromator, and which convey the particles coming from the beam source to either the monochromator or the rest of the beam guidance system.

    Abstract translation: 本发明涉及一种用于电子或离子束的电子/离子枪，包括光束源和单色器。 根据本发明，单色仪配备有附加的光束引导系统和切换元件，其设置在单色器的输入端处，并且将来自光束源的粒子传送到单色器或者其余的光束引导 系统。

    Method for eliminating first, second and third-order axial image deformations during correction of the third-order spherical aberration in electron optical systems
    7.
    发明授权
    Method for eliminating first, second and third-order axial image deformations during correction of the third-order spherical aberration in electron optical systems 有权
    用于在电子光学系统中校正三次球面像差期间消除第一，第二和第三阶轴向图像变形的方法

    公开(公告)号：US06646267B1

    公开(公告)日：2003-11-11

    申请号：US09508239

    申请日：2000-04-24

    Applicant: Maximilian Haider ,  Stephan Uhlemann

    Inventor： Maximilian Haider ,  Stephan Uhlemann

    IPC: H01J3710

    CPC classification number: H01J37/153

    Abstract: The invention relates to a method for eliminating axial image deformations &agr;n in electron optical systems, where the extra-axial image deformation of the order n+m with the same behavior in &agr;n, which thus has the form &agr;n&ggr;m, is modified by shifting or tilting the beam path towards the optical axis until compensation of the axial image deformation has been achieved, whereby &ggr; describes the extra-axial image coordinate as a complex number in both sections. The invention also relates to an adjustment method for eliminating all first-, second- and third-order axial image deformations during correction of the third-order spherical aberration in electron optical systems with hexapoles.

    Abstract translation: 本发明涉及一种用于消除电子光学系统中的轴向图像变形αn的方法，其中n + m阶的异轴图像变形具有相同的α的行为，因此具有α< 通过将光束路径朝向光轴移动或倾斜直到轴向图像变形的补偿已被实现来修改，由此γ在两个部分中将异轴图像坐标描述为复数。 本发明还涉及一种用于消除在具有六极的电子光学系统中校正三次球面像差期间的所有第一，第二和第三阶轴向图像变形的调整方法。

    Monochromator and radiation source with monochromator
    8.
    发明申请
    Monochromator and radiation source with monochromator 有权
    单色仪和辐射源

    公开(公告)号：US20080290273A1

    公开(公告)日：2008-11-27

    申请号：US12153455

    申请日：2008-05-20

    Applicant: Stephan Uhlemann

    Inventor： Stephan Uhlemann

    IPC: H01J47/00

    CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/26 ,  H01J49/48 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/1538

    Abstract: A monochromator (1) for a charged particle optics, in particular, for electron microscopy, comprises at least one first deflection element (2, 3) with an electrostatic deflecting field (2′, 3′) for generating a dispersion (4) in the plane (5) of a selection aperture (6) to select charged particles of a desired energy interval (7) and at least one second deflection element (8, 9) with an electrostatic deflecting field (8′, 9′) which eliminates the dispersion (4) of the at least one first deflecting field (2′, 3′). A radiation source (17) comprises such a monochromator (1). High monchromatism without intensity contrasts caused by defects of the slit aperture is thereby achieved in that the deflection elements (2, 3, 8, 9) have a design other than spherically shaped and their electrodes (24, 25) are given a potential (φ+, φ−) such that the charged particles (xα, yβ) which virtually enter the image of the radiation source (17) at different respective angles (α, β) in different sections (x, y), are differently focused such that charged particles (xα, yβ) of one energy are point focused (10, 10′, 10″) exclusively in the plane (5) of the selection aperture (6), since zero-crossings (11, 12) of the deflections (A) of the charged particles (xα, yβ) of the different sections (x, y) only coincide there at the same axial position (z, E).

    Abstract translation: 用于带电粒子光学器件的单色仪（1），特别是用于电子显微镜的装置包括至少一个具有用于产生分散体（4）的静电偏转场（2'，3'）的第一偏转元件（2,3） 选择孔径（6）的平面（5）以选择具有期望能量间隔（7）的带电粒子和至少一个具有静电偏转场（8'，9'）的第二偏转元件（8,9） 所述至少一个第一偏转场（2'，3'）的色散（4）。 辐射源（17）包括这样的单色仪（1）。 因此，由于偏转元件（2,3,8,9）具有除球形之外的设计，并且它们的电极（24,25）被赋予电位（phi + ，phi），使得在不同部分（x，y）中以不同的相应角度（α，β）实际进入辐射源（17）的图像的带电粒子（xalpha，ybeta）被不同地聚焦，使得带电 一个能量的粒子（xalpha，ybeta）专门在选择孔径（6）的平面（5）中点聚焦（10,10'，10“），因为偏转的零交叉（11,12） A）的不同部分（x，y）的带电粒子（xalpha，ybeta）仅在相同的轴向位置（z，E）处重合。

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