SUBSTRATE AND METHOD OF FORMING THE SAME
    12.
    发明申请
    SUBSTRATE AND METHOD OF FORMING THE SAME 审中-公开
    基板及其形成方法

    公开(公告)号:US20150206812A1

    公开(公告)日:2015-07-23

    申请号:US14263823

    申请日:2014-04-28

    Abstract: Methods and apparatus for cavity formation in a semiconductor package substrate are provided. In one embodiment, a method for producing at least one cavity within a semiconductor package substrate includes etching the semiconductor package substrate from a surface of the semiconductor package substrate at least one intended cavity location in order to obtain at least one cavity. The method includes depositing a copper portion on a substrate in a cavity location. Next, the method includes masking the substrate while keeping the copper portion exposed. Lastly, the method includes etching the substrate to form a cavity by etching away the copper portion. The structure formed includes a cavity that extends partially through the substrate without damaging a glass fabric embedded in the substrate.

    Abstract translation: 提供了半导体封装基板中的空腔形成方法和装置。 在一个实施例中,一种用于在半导体封装衬底内产生至少一个空腔的方法包括从半导体封装衬底的表面至少一个预定的腔位置蚀刻半导体封装衬底,以便获得至少一个空腔。 该方法包括在空腔位置的基板上沉积铜部分。 接下来,该方法包括在保持铜部分暴露的同时掩蔽基板。 最后,该方法包括通过蚀刻掉铜部分来蚀刻基板以形成空腔。 所形成的结构包括部分地延伸穿过基底的空腔,而不会损害嵌入在基底中的玻璃织物。

    INTERPOSER CONNECTION STRUCTURES BASED ON WIRE BONDING

    公开(公告)号:US20250125234A1

    公开(公告)日:2025-04-17

    申请号:US18486970

    申请日:2023-10-13

    Abstract: In an aspect, an integrated circuit (IC) package includes a base structure, an IC component disposed on the base structure, a plurality of interposer connection structures disposed on the base structure, and an interposer structure disposed over the IC component and the plurality of interposer connection structures. The plurality of interposer connection structures is configured to connect the base structure and the interposer structure. Each interposer connection structure of the plurality of interposer connection structures includes a bond ball portion that is connected to the base structure, and a bond wire portion that is coupled to the bond ball portion and extends toward the interposer structure. A width of the bond ball portion is greater than a width of the bond wire portion.

    PACKAGE COMPRISING AN INTERCONNECTION DIE LOCATED BETWEEN METALLIZATION PORTIONS

    公开(公告)号:US20230369230A1

    公开(公告)日:2023-11-16

    申请号:US17742001

    申请日:2022-05-11

    Abstract: A package comprising a first metallization portion, a first integrated device, an interconnection die, a second metallization portion, and an encapsulation layer. The first metallization portion includes at least one first dielectric layer and a first plurality of metallization interconnects. The first integrated device is coupled to the first metallization portion. The interconnection die is coupled to the first metallization portion. The second metallization portion coupled to the first metallization portion through the interconnection die such that the first integrated device and the interconnection die are located between the first metallization portion and the second metallization portion. The second metallization portion includes at least one second dielectric layer and a second plurality of metallization interconnects. The encapsulation layer coupled to the first metallization portion and the second metallization portion, wherein the encapsulation layer is located between the first metallization portion and the second metallization portion.

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