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    High efficacy antisense RIαPKA poly-DNP oligoribonucleotides
    11.
    发明授权
    High efficacy antisense RIαPKA poly-DNP oligoribonucleotides 失效
    高效反义RIalphaPKA多聚DNP寡核糖核苷酸

    公开(公告)号：US07528117B2

    公开(公告)日：2009-05-05

    申请号：US10728491

    申请日：2003-12-05

    申请人： Jui H. Wang ,  Long Shen ,  Xiaolan Chen

    发明人： Jui H. Wang ,  Long Shen ,  Xiaolan Chen

    IPC分类号： A01N43/04 ,  C12Q1/68 ,  C12P19/34 ,  C07H21/02 ,  C07H21/04

    CPC分类号： C12N15/113 ,  A61K38/00 ,  C12N15/1137 ,  C12N2310/321 ,  C12N2310/3529

    摘要： The present invention discloses antisense poly-2′-O-(2,4-dinitrophenyl) oligoribonucleotides which are capable of down regulating the expression of the RIα subunit of protein kinase A. An example is 5′-GGCUGCGUGCCUCCUCACUGG (named antisense poly-DNP RNA-21) or a sequence which has a one-base mismatch therewith. The antisense oligoribonucleotide can be synthesized by in vitro transcription followed by chemical derivatization. The base sequence of the oligoribonucleotides is complementary to that of nt 110 to 130 in RIα/PKA mRNA. The antisense poly-DNP RNA-21 was found to inhibit cell growth with IC50 values in the nanomolar range. These oligonucleotides can be used as effective anti-cancer agents.

    摘要翻译： 本发明公开了能够下调蛋白激酶A的RIalpha亚基表达的反式多聚-2'-O-（2,4-二硝基苯基）寡核糖核苷酸。一个实例是5'-GGCUGCGUGCCUCCUCACUGG（命名为反义多聚DNP RNA-21）或与其单碱基错配的序列。 反义寡核苷酸可以通过体外转录，然后进行化学衍生化合成。 寡核糖核苷酸的碱基序列与RIalpha / PKA mRNA中的nt 110至130的碱基序列互补。 发现反义多聚DNP RNA-21抑制细胞生长，其IC50值在纳摩尔范围内。 这些寡核苷酸可以用作有效的抗癌剂。

    Diamond supported photocathodes for electron sources
    12.
    发明授权
    Diamond supported photocathodes for electron sources 失效
    用于电子源的金刚石负载光电阴极

    公开(公告)号：US06759800B1

    公开(公告)日：2004-07-06

    申请号：US09363926

    申请日：1999-07-29

    申请人： Andres Fernandez ,  Timothy Thomas ,  Xiaolan Chen ,  Steven T. Coyle ,  Ming Yu ,  Marian Mankos

    发明人： Andres Fernandez ,  Timothy Thomas ,  Xiaolan Chen ,  Steven T. Coyle ,  Ming Yu ,  Marian Mankos

    IPC分类号： H01J4006

    CPC分类号： B82Y10/00 ,  H01J1/34

    摘要： A photocathode as a source of electron beams, having a substrate of optically transmissive diamond and a photoemitter. A photocathode with a single emitting region provides a single electron beam; a photocathode with multiple emitting regions provides multiple electron beams. The photoemitter is positioned on the side of the diamond substrate opposite the surface on which the illumination is incident, and has an irradiation region at the contact with the optically transmissive diamond, and an emission region opposite the irradiation region, these regions being defined by the path of the illumination. The diamond substrate at the irradiation region/emission region interface conducts heat away from this focused region of illumination on the photocathode. Alternately, a diamond film is used for heat conduction, while another material is used as a substrate to provide structural support. The thermal conductivity of diamond is at least three orders of magnitude greater than that of fused silica, which is an alternative substrate material for photocathodes. This allows for efficient conduction of heat away from the irradiation region/emission region interface, and therefore allows higher currents to be achieved from the photocathode. This, in turn, permits higher throughput rates in applications including electron beam lithography.

    摘要翻译： 作为电子束源的光电阴极，具有透光金刚石和光电发射体的基底。 具有单个发射区域的光电阴极提供单个电子束; 具有多个发射区域的光电阴极提供多个电子束。 光发射器位于与照射入射的表面相对的金刚石基底的一侧，并且具有与光学透射金刚石接触的照射区域和与照射区域相对的发射区域，这些区域由 照明路径。 在照射区域/发射区域界面处的金刚石基底将热量远离该聚焦照明区域在光电阴极上。 或者，金刚石膜用于热传导，而另一种材料用作基底以提供结构支撑。 金刚石的热导率比熔融石英的热导率高至少三个数量级，熔融石英是光电阴极的替代基材。 这允许热量从照射区域/发射区域界面有效地传导，因此允许从光电阴极获得更高的电流。 这反过来又允许在包括电子束光刻的应用中更高的生产率。

    Method and apparatus for improving pattern fidelity in diffraction-limited imaging
    13.
    发明授权
    Method and apparatus for improving pattern fidelity in diffraction-limited imaging 有权
    用于改善衍射极限成像中图案保真度的方法和装置

    公开(公告)号：US06320648B1

    公开(公告)日：2001-11-20

    申请号：US09414861

    申请日：1999-10-12

    申请人： Steven R. J. Brueck ,  Xiaolan Chen

    发明人： Steven R. J. Brueck ,  Xiaolan Chen

    IPC分类号： G03B2742

    CPC分类号： G03F7/70091 ,  G03F7/70308 ,  G03F7/70425

    摘要： The present invention involves the use of pupil plane filters to enhance optical imaging for both lithography and microscopy. The present invention includes numerous pupil plane filter strategies for enhancing optical lithography. A square pupil plane filter suitably restricts the imaging to a nearly diffraction limited regime. Moreover, pupil plane filters are suitably used in off-axis illumination (OAI) and imaging interferometric lithography (ILL). The techniques of OAI and ILL along with the use of pupil-plane filters are applicable in, for example, any diffraction-limited situation where the limit is imposed by the characteristics of the optical system rather than the transmission medium and where the illumination system is under the control of the experimenter.

    摘要翻译： 本发明涉及使用光瞳平面滤光片来增强光刻和显微镜两者的光学成像。 本发明包括用于增强光学光刻的许多光瞳平面滤波器策略。 平方瞳平面滤光片适当地将成像限制在接近衍射限制的状态。 此外，瞳孔平面滤光片适用于离轴照明（OAI）和成像干涉光刻（ILL）。 OAI和ILL的技术以及使用光瞳平面滤波器的技术适用于例如任何衍射限制的情况，其中限制是由光学系统的特性而不是传输介质施加的，而照明系统是 在实验者的控制下。

    Methods and apparatus for lithography of sparse arrays of sub-micrometer features
    15.
    发明授权
    Methods and apparatus for lithography of sparse arrays of sub-micrometer features 失效
    亚微米特征稀疏阵列光刻的方法和装置

    公开(公告)号：US5759744A

    公开(公告)日：1998-06-02

    申请号：US407067

    申请日：1995-03-16

    申请人： Steven R.J. Brueck ,  Xiaolan Chen ,  Saleem Zaidi ,  Daniel J. Devine

    发明人： Steven R.J. Brueck ,  Xiaolan Chen ,  Saleem Zaidi ,  Daniel J. Devine

    IPC分类号： G03F7/20 ,  G03F7/22

    CPC分类号： G03F7/70408 ,  G03F7/70466

    摘要： Methods and apparatuses are disclosed for the exposure of sparse hole and/or mesa arrays with line:space ratios of 1:3 or greater and sub-micrometer hole and/or mesa diameters in a layer of photosensitive material atop a layered material. Methods disclosed include: double exposure interferometric lithography pairs in which only those areas near the overlapping maxima of each single-period exposure pair receive a clearing exposure dose; double interferometric lithography exposure pairs with additional processing steps to transfer the array from a first single-period interferometric lithography exposure pair into an intermediate mask layer and a second single-period interferometric lithography exposure to further select a subset of the first array of holes; a double exposure of a single period interferometric lithography exposure pair to define a dense array of sub-micrometer holes and an optical lithography exposure in which only those holes near maxima of both exposures receive a clearing exposure dose; combination of a single-period interferometric exposure pair, processing to transfer resulting dense array of sub-micrometer holes into an intermediate etch mask, and an optical lithography exposure to select a subset of initial array to form a sparse array; combination of an optical exposure, transfer of exposure pattern into an intermediate mask layer, and a single-period interferometric lithography exposure pair; three-beam interferometric exposure pairs to form sparse arrays of sub-micrometer holes; five- and four-beam interferometric exposures to form a sparse array of sub-micrometer holes in a single exposure. Apparatuses disclosed include arrangements for the three-beam, five-beam and four-beam interferometric exposures.

    摘要翻译： 公开了用于暴露具有1:3或更大的线：空间比的稀疏孔和/或台面阵列的方法和装置，并且在分层材料的顶层中的感光材料层中的亚微米孔和/或台面直径。 公开的方法包括：双曝光干涉光刻对，其中仅每个单周期曝光对的重叠最大值附近的区域接收清除曝光剂量; 双重干涉光刻曝光对，其具有附加处理步骤，以将阵列从第一单周期干涉光刻曝光对转移到中间掩模层和第二单周期干涉光刻曝光中，以进一步选择第一阵列孔的子集; 单周期干涉光刻曝光对的双重曝光以限定亚微米孔的密集阵列和光学曝光曝光，其中只有两个曝光的最大值附近的那些孔接收清除曝光剂量; 单周期干涉曝光对的组合，将所产生的紧密阵列的亚微米孔转移到中间蚀刻掩模中的处理，以及光学曝光以选择初始阵列的子集以形成稀疏阵列; 光学曝光的组合，曝光图案转印到中间掩模层中，以及单周期干涉光刻曝光对; 三光束干涉曝光对形成亚微米孔的稀疏阵列; 五光束和四光束干涉曝光以在单次曝光中形成稀疏阵列的亚微米孔。 公开的装置包括用于三光束，五光束和四光束干涉曝光的布置。

    Hydrogen peroxide complexes of inorganic salts and synthesis thereof
    19.
    发明授权
    Hydrogen peroxide complexes of inorganic salts and synthesis thereof 失效
    无机盐的过氧化氢配合物及其合成

    公开(公告)号：US5820841A

    公开(公告)日：1998-10-13

    申请号：US716055

    申请日：1996-09-19

    申请人： Xiaolan Chen ,  Paul Taylor Jacobs ,  Szu-Min Lin

    发明人： Xiaolan Chen ,  Paul Taylor Jacobs ,  Szu-Min Lin

    IPC分类号： A61L2/16 ,  A01N59/00 ,  A61L2/20 ,  C01B15/04 ,  C01B15/055 ,  C01B15/06 ,  C01B15/14 ,  C01B15/16 ,  C01B15/08

    CPC分类号： A61L2/208 ,  A01N59/00 ,  C01B15/06 ,  C01B15/14 ,  C01B15/16 ,  A61L2202/24

    摘要： A method of making an inorganic salt-hydrogen peroxide complex includes the following steps: (a) mixing the inorganic salt with sufficient water for a time sufficient to form a soft paste, (b) mixing the paste with an aqueous hydrogen peroxide solution to form a hydrogen peroxide-containing paste, and (c) drying the hydrogen peroxide-containing paste. A hydrate method of making Na.sub.4 P.sub.2 O.sub.7.3H.sub.2 O.sub.2 includes the steps of: mixing sodium pyrophosphate decahydrate solid with an aqueous solution of hydrogen peroxide having a concentration of less than 30%, and drying the mixture. Compositions of matter include K.sub.2 HPO.sub.4.3H.sub.2 O.sub.2, KH.sub.2 PO.sub.4.H.sub.2 O.sub.2 Ca.sub.2 P.sub.2 O.sub.7.nH.sub.2 O.sub.2, Ca.sub.2 P.sub.2 O.sub.4.nH.sub.2 O.sub.2, Na.sub.2 SO.sub.4.nH.sub.2 O.sub.2, K.sub.2 SO.sub.4.nH.sub.2 O.sub.2, Na.sub.2 SiO.sub.3.nH.sub.2 O.sub.2 and Na.sub.2 SiO.sub.7.nH.sub.2 O.sub.2.

    摘要翻译： 制备无机盐 - 过氧化氢络合物的方法包括以下步骤：（a）将无机盐与足够的水混合足以形成软糊剂的时间，（b）将糊料与过氧化氢水溶液混合以形成 含有过氧化氢的糊剂，（c）干燥含过氧化氢的糊剂。 制备Na4P2O7.3H2O2的水合物方法包括以下步骤：将焦磷酸十水合物固体与浓度小于30％的过氧化氢水溶液混合，并干燥该混合物。 物质组成包括K2HPO4.3H2O2，KH2PO4H2O2 Ca2P2O7.nH2O2，Ca2P2O4.nH2O2，Na2SO4·nH2O2，K2SO4·nH2O2，Na2SiO3·nH2O2和Na2SiO7·nH2O2。