-
公开(公告)号：US09224830B2
公开(公告)日：2015-12-29
申请号：US13914713
申请日：2013-06-11
Inventor： Seong-Il Kim , Jong-Won Lim , Dong Min Kang , Sang-Heung Lee , Hyung Sup Yoon , Chull Won Ju , Byoung-Gue Min , Jongmin Lee , Jae Kyoung Mun , Eun Soo Nam
IPC: H01L29/812 , H01L29/66 , H01L29/40 , H01L29/41 , H01L29/423 , H01L29/778 , H01L29/16 , H01L29/20
CPC classification number: H01L29/66477 , H01L29/1608 , H01L29/2003 , H01L29/40 , H01L29/401 , H01L29/402 , H01L29/41 , H01L29/42312 , H01L29/42316 , H01L29/42376 , H01L29/66462 , H01L29/7787 , H01L29/812
Abstract: A field effect transistor is provided. The transistor may include a source electrode and a drain electrode provided spaced apart from each other on a substrate and a ‘+’-shaped gate electrode provided on a portion of the substrate located between the source and drain electrodes.
Abstract translation: 提供场效应晶体管。 晶体管可以包括在基板上彼此间隔开设置的源电极和漏电极，以及设置在位于源极和漏极之间的基板的一部分上的“+”形栅电极。
-
公开(公告)号：US08941231B2
公开(公告)日：2015-01-27
申请号：US13938324
申请日：2013-07-10
Inventor： Young Rak Park , Sang Choon Ko , Byoung-Gue Min , Jong-Won Lim , Hokyun Ahn , Sung-Bum Bae , Jae Kyoung Mun , Eun Soo Nam
IPC: H01L23/12 , H01L29/66 , H01L23/522 , H01L23/532 , H01L23/66
CPC classification number: H01L29/66477 , H01L23/5225 , H01L23/5228 , H01L23/5329 , H01L23/66 , H01L2223/6627 , H01L2223/6683 , H01L2924/0002 , H01L2924/00
Abstract: Provided are an electronic chip and a method of fabricating the same. The semiconductor chip may include a substrate, an active device integrated on the substrate, a lower interlayered insulating layer covering the resulting structure provided with the active device, a passive device provided on the lower interlayered insulating layer, an upper interlayered insulating layer covering the resulting structure provided with the passive device, and a ground electrode provided on the upper interlayered insulating layer. The upper interlayered insulating layer may be formed of a material, whose dielectric constant may be higher than that of the lower interlayered insulating layer.
Abstract translation: 提供一种电子芯片及其制造方法。 半导体芯片可以包括衬底，集成在衬底上的有源器件，覆盖所提供的有源器件的结构的下层间绝缘层，设置在下层间绝缘层上的无源器件，覆盖所得到的上层间绝缘层 设置有无源器件的结构，以及设置在上层间绝缘层上的接地电极。 上层间绝缘层可以由其介电常数可能高于下层间绝缘层的材料的材料形成。
-
公开(公告)号：US08901608B2
公开(公告)日：2014-12-02
申请号：US13908076
申请日：2013-06-03
Inventor： Jong-Won Lim , Hokyun Ahn , Woojin Chang , Dong Min Kang , Seong-Il Kim , Sang-Heung Lee , Hyung Sup Yoon , Chull Won Ju , Hae Cheon Kim , Jae Kyoung Mun , Eun Soo Nam
IPC: H01L33/00 , H01L29/66 , H01L29/778
CPC classification number: H01L29/778 , H01L29/402 , H01L29/42316 , H01L29/66431
Abstract: A high electron mobility transistor includes a T-type gate electrode disposed on a substrate between source and drain electrodes and insulating layers disposed between the substrate and the T-type gate electrode. The insulating layers include first, second, and third insulating layers. The third insulating layer is disposed between the substrate and a head portion of the T-type gate electrode such that a portion of the third insulating layer is in contact with a foot portion of the T-type gate electrode. The second insulating layer is disposed between the substrate and the head portion of the T-type gate electrode to be in contact with the third insulating layer. The first insulating layer and another portion of the third insulating layer are sequentially stacked between the substrate and the head portion of the T-type gate electrode to be in contact with the second insulating layer.
Abstract translation: 高电子迁移率晶体管包括设置在源极和漏极之间的衬底上的T型栅电极和设置在衬底和T型栅电极之间的绝缘层。 绝缘层包括第一绝缘层，第二绝缘层和第三绝缘层。 第三绝缘层设置在基板和T型栅电极的头部之间，使得第三绝缘层的一部分与T型栅极的脚部接触。 第二绝缘层设置在基板与T型栅电极的头部之间以与第三绝缘层接触。 所述第一绝缘层和所述第三绝缘层的另一部分依次层叠在所述基板与所述T型栅电极的头部之间，以与所述第二绝缘层接触。
-
公开(公告)号：US20140103539A1
公开(公告)日：2014-04-17
申请号：US14021269
申请日：2013-09-09
Inventor： Byoung-Gue MIN , Sang Choon KO , Jong-Won Lim , Hokyun AHN , Hyung Sup YOON , Jae Kyoung MUN , Eun Soo NAM
IPC: H01L21/768 , H01L23/48 , H01L21/28 , H01L21/02
CPC classification number: H01L23/535 , H01L21/02365 , H01L21/28 , H01L21/76877 , H01L21/76898 , H01L23/481 , H01L2924/0002 , H01L2924/1305 , H01L2924/13091 , H01L2924/00
Abstract: A semiconductor device may include a substrate having a lower via-hole, an epitaxial layer having an opening exposing a top surface of the substrate, a semiconductor chip disposed on the top surface of the substrate and including first, second, and third electrodes, an upper metal layer connected to the first electrode, a supporting substrate disposed on the upper metal layer and having an upper via-hole, an upper pad disposed on the substrate and extending into the upper via-hole, a lower pad connected to the second electrode in the opening, and a lower metal layer covering a bottom surface of the substrate and connected to the lower pad through the lower via-hole.
Abstract translation: 半导体器件可以包括具有下通孔的衬底，具有暴露衬底的顶表面的开口的外延层，设置在衬底的顶表面上并包括第一，第二和第三电极的半导体芯片， 连接到第一电极的上金属层，设置在上金属层上并具有上通孔的支撑基板，设置在基板上并延伸到上通孔中的上焊盘，连接到第二电极的下焊盘 以及覆盖基板的底面的下金属层，并且通过下通路孔与下焊盘连接。
-
公开(公告)号：US09837719B2
公开(公告)日：2017-12-05
申请号：US15229891
申请日：2016-08-05
Inventor： Dong-Young Kim , Dong Min Kang , Seong-Il Kim , Hae Cheon Kim , Jae Won Do , Byoung-Gue Min , Ho Kyun Ahn , Hyung Sup Yoon , Sang-Heung Lee , Jong Min Lee , Jong-Won Lim , Yoo Jin Jang , Hyun Wook Jung , Kyu Jun Cho , Chull Won Ju
CPC classification number: H01Q9/0407 , H01Q1/50 , H01Q9/0442
Abstract: Provided herein is a patch antenna including a multilayered substrate on which a plurality of dielectric layers are laminated; at least one metal pattern layer disposed between the plurality of dielectric layers outside a central area of the multilayered substrate; an antenna patch disposed on an upper surface of the multilayered substrate and within the central area; a ground layer disposed on a lower surface of the multilayered substrate; a plurality of connection via patterns penetrating the plurality of dielectric layers to connect the metal pattern layer and the ground layer, and surrounding the central area; a transmission line comprising a first transmission line unit disposed on the upper surface of the multilayered substrate and located outside the central area, and a second transmission line unit disposed on the upper surface of the multilayered substrate and located within the central area; and an impedance transformer located below the second transmission line unit within the central area of the multilayered substrate.
-
Patent Agency Ranking
公开(公告)号：US08937002B2
公开(公告)日：2015-01-20
申请号：US14230031
申请日：2014-03-31
Inventor： Sung Bum Bae , Eun Soo Nam , Jae Kyoung Mun , Sung Bock Kim , Hae Cheon Kim , Chull Won Ju , Sang Choon Ko , Jong-Won Lim , Ho Kyun Ahn , Woo Jin Chang , Young Rak Park
IPC: H01L21/20 , H01L29/66 , H01L21/8252 , H01L27/06 , H01L27/088 , H01L21/02
CPC classification number: H01L29/66446 , H01L21/0242 , H01L21/02458 , H01L21/0254 , H01L21/02647 , H01L21/8252 , H01L27/0605 , H01L27/0883
Abstract: The present disclosure relates to a nitride electronic device and a method for manufacturing the same, and particularly, to a nitride electronic device and a method for manufacturing the same that can implement various types of nitride integrated structures on the same substrate through a regrowth technology (epitaxially lateral over-growth: ELOG) of a semi-insulating gallium nitride (GaN) layer used in a III-nitride semiconductor electronic device including Group III elements such as gallium (Ga), aluminum (Al) and indium (In) and nitrogen.
Abstract translation: 本发明涉及一种氮化物电子器件及其制造方法，特别涉及一种氮化物电子器件及其制造方法，该氮化物电子器件及其制造方法可通过再生技术在同一衬底上实现各种氮化物一体化结构（ 用于包括III族元素如镓（Ga），铝（Al）和铟（In））和氮（III）的III族氮化物半导体电子器件中的半绝缘氮化镓（GaN）层的外延横向过度生长：ELOG） 。
-
17.发明授权公开(公告)号：US08841154B2
公开(公告)日：2014-09-23
申请号：US13916006
申请日：2013-06-12
Inventor： Hyung Sup Yoon , Byoung-Gue Min , Jong-Won Lim , Ho Kyun Ahn , Jong Min Lee , Seong-il Kim , Jae Kyoung Mun , Eun Soo Nam
CPC classification number: H01L21/28008 , H01L21/28587 , H01L29/42316 , H01L29/66863
Abstract: Disclosed is a method of manufacturing a field effect type compound semiconductor device in which leakage current of a device is decreased and breakdown voltage is enhanced. The method of manufacturing a field effect type compound semiconductor device includes: stacking an active layer and an ohmic layer on a substrate and forming a first oxide layer on the ohmic layer; forming a mesa region in predetermined regions of the first oxide layer, the ohmic layer, and the active layer; planarizing the mesa region after forming a nitride layer by evaporating a nitride on the mesa region; forming an ohmic electrode on the first oxide layer; forming a minute gate resist pattern after forming a second oxide layer on a semiconductor substrate in which the ohmic electrode is formed and forming a minute gate pattern having a under-cut shaped profile by dry-etching the first oxide layer, the nitride layer, and the second oxide layer; forming a gate recess region by forming a head pattern of a gamma gate electrode on the semiconductor substrate; and forming the gamma gate electrode by evaporating refractory metal on the semiconductor substrate in which the gate recess region is formed.
Abstract translation: 公开了一种制造场效应型化合物半导体器件的方法，其中器件的漏电流降低并且击穿电压增强。 制造场效应型化合物半导体器件的方法包括：在衬底上堆叠有源层和欧姆层，并在欧姆层上形成第一氧化物层; 在所述第一氧化物层，所述欧姆层和所述有源层的预定区域中形成台面区域; 通过在台面区域上蒸发氮化物，在形成氮化物层之后使台面区域平坦化; 在所述第一氧化物层上形成欧姆电极; 在形成欧姆电极的半导体衬底上形成第二氧化物层之后形成微小栅极抗蚀剂图案，并通过干蚀刻第一氧化物层，氮化物层和形成具有下切形状轮廓的微小栅极图案 第二氧化物层; 通过在所述半导体衬底上形成伽马栅电极的头部图形来形成栅极凹部区域; 以及通过在形成有所述栅极凹部的所述半导体衬底上蒸发难熔金属而形成所述γ栅电极。
-
公开(公告)号：US20140167806A1
公开(公告)日：2014-06-19
申请号：US14020931
申请日：2013-09-09
Inventor： Chul Won JU , Hyung Sup Yoon , Jong-Won Lim , Sang-Heung Lee , Seong-il Kim , Dong Min Kang , Eun Soo Nam , Jae Kyoung Mun
IPC: G01R1/04
CPC classification number: G01R1/0466 , G01R1/0458
Abstract: Provided is a semiconductor device testing apparatus including a first socket configured to load a package, on which a semiconductor device to be tested may be mounted, and a second socket coupled to the first socket. The first socket may include an upper part including a hole configured to accommodate the package and a terminal pad provided at both side edges of the hole to hold input and output terminals of the package, and a lower part including a heating room, in which a heater and a temperature sensing part may be provided, the heater being configured to heat the semiconductor device and the temperature sensing part being configured to measure temperature of the semiconductor device. The second socket may include a probe card with a pattern that may be configured to receive test signals from an external power source.
Abstract translation: 提供一种半导体器件测试装置，包括：第一插座，被配置为加载可以安装待测试的半导体器件的封装，以及耦合到第一插座的第二插座。 第一插座可以包括上部，其包括被配置为容纳封装的孔和设置在孔的两个侧边缘处的端子垫，以保持封装的输入和输出端子，以及包括加热室的下部，其中 加热器和温度检测部件，加热器被配置为加热半导体器件，并且温度检测部分被配置为测量半导体器件的温度。 第二插座可以包括具有可被配置为从外部电源接收测试信号的模式的探针卡。
-
19.发明申请公开(公告)号：US20140017885A1
公开(公告)日：2014-01-16
申请号：US13916006
申请日：2013-06-12
Inventor： Hyung Sup YOON , Byoung-gue Min , Jong-Won Lim , Ho Kyun Ahn , Jong Min Lee , Seong-il Kim , Jae Kyoung Mun , Eun Soo Nam
IPC: H01L21/28
CPC classification number: H01L21/28008 , H01L21/28587 , H01L29/42316 , H01L29/66863
Abstract: Disclosed is a method of manufacturing a field effect type compound semiconductor device in which leakage current of a device is decreased and breakdown voltage is enhanced. The method of manufacturing a field effect type compound semiconductor device includes: stacking an active layer and an ohmic layer on a substrate and forming a first oxide layer on the ohmic layer; forming a mesa region in predetermined regions of the first oxide layer, the ohmic layer, and the active layer; planarizing the mesa region after forming a nitride layer by evaporating a nitride on the mesa region; forming an ohmic electrode on the first oxide layer; forming a minute gate resist pattern after forming a second oxide layer on a semiconductor substrate in which the ohmic electrode is formed and forming a minute gate pattern having a under-cut shaped profile by dry-etching the first oxide layer, the nitride layer, and the second oxide layer; forming a gate recess region by forming a head pattern of a gamma gate electrode on the semiconductor substrate; and forming the gamma gate electrode by evaporating refractory metal on the semiconductor substrate in which the gate recess region is formed.
Abstract translation: 公开了一种制造场效应型化合物半导体器件的方法，其中器件的漏电流降低并且击穿电压增强。 制造场效应型化合物半导体器件的方法包括：在衬底上堆叠有源层和欧姆层，并在欧姆层上形成第一氧化物层; 在所述第一氧化物层，所述欧姆层和所述有源层的预定区域中形成台面区域; 通过在台面区域上蒸发氮化物，在形成氮化物层之后使台面区域平坦化; 在所述第一氧化物层上形成欧姆电极; 在形成欧姆电极的半导体衬底上形成第二氧化物层之后形成微小栅极抗蚀剂图案，并通过干蚀刻第一氧化物层，氮化物层和形成具有下切形状轮廓的微小栅极图案 第二氧化物层; 通过在所述半导体衬底上形成伽马栅电极的头部图形来形成栅极凹部区域; 以及通过在形成有所述栅极凹部的所述半导体衬底上蒸发难熔金属而形成所述γ栅电极。
-
公开(公告)号：US20130169365A1
公开(公告)日：2013-07-04
申请号：US13670016
申请日：2012-11-06
Inventor： Sang-Heung LEE , Seong-Il Kim , Dong Min Kang , Jong-Won Lim , Hyung Sup Yoon , Chull Won Ju , Jae Kyoung Mun , Eun Soo Nam
IPC: H03G3/00
CPC classification number: H03G1/0082 , H03G1/0088 , H03G3/3084
Abstract: Disclosed is an automatic gain control feedback amplifier that can arbitrarily control a gain even when a difference in input signal is large. The automatic gain control feedback amplifier includes: an amplification circuit unit configured to amplify voltage input from an input terminal and output the amplified voltage to an output terminal; a feedback circuit unit connected between the input terminal and the output terminal and including a feedback resistor unit of which a total resistance value is determined by one or more control signals and a feedback transistor connected to the feedback resistor unit in parallel; and a bias circuit unit configured to supply predetermined bias voltage to the feedback transistor.
Abstract translation: 公开了一种自动增益控制反馈放大器，即使当输入信号的差异大时也可以任意地控制增益。 自动增益控制反馈放大器包括：放大电路单元，被配置为放大从输入端输入的电压，并将放大的电压输出到输出端; 连接在输入端子和输出端子之间的反馈电路单元，包括反馈电阻器单元，其总电阻值由一个或多个控制信号确定，反馈晶体管并联连接到反馈电阻器单元; 以及偏置电路单元，被配置为向所述反馈晶体管提供预定的偏置电压。
-
-
-
-
-
-
-
-
-
Search Results
28
records
(took 0.03 seconds)
