Semiconductor package assembly
    101.
    发明授权

    公开(公告)号:US10332830B2

    公开(公告)日:2019-06-25

    申请号:US15592488

    申请日:2017-05-11

    Applicant: MediaTek Inc.

    Abstract: A semiconductor package assembly having a first semiconductor package, with a first redistribution layer (RDL) structure, a first semiconductor die having through silicon via (TSV) interconnects formed passing therethrough coupled to the first RDL structure, and a second semiconductor package stacked on the first semiconductor package with a second redistribution layer (RDL) structure. The assembly further includes a second semiconductor die without through silicon via (TSV) interconnects formed passing therethrough, coupled to the second RDL structure, and a third semiconductor package stacked on the second semiconductor package, having a third redistribution layer (RDL) structure, a third semiconductor die without through silicon via (TSV) interconnects formed passing therethrough coupled to the third RDL structure. the third semiconductor package is coupled to the second RDL structure by second vias passing through a second molding compound between the third semiconductor package and the second RDL structure.

    Semiconductor package
    102.
    发明授权

    公开(公告)号:US10109608B2

    公开(公告)日:2018-10-23

    申请号:US15189369

    申请日:2016-06-22

    Applicant: MediaTek Inc.

    Abstract: The invention provides a semiconductor package. The semiconductor package includes a semiconductor die having a central area and a peripheral area surrounding the central area. A first conductive bump is disposed on the semiconductor die in the central area. A second conductive bump is disposed on the semiconductor die in the peripheral area. An area ratio of the first conductive bump to the second conductive bump from a top view is larger than 1, and less than or equal to 3.

    Semiconductor structure
    103.
    发明授权

    公开(公告)号:US10090375B2

    公开(公告)日:2018-10-02

    申请号:US15450411

    申请日:2017-03-06

    Applicant: MediaTek Inc.

    Abstract: The invention provides a semiconductor structure. The semiconductor structure includes a substrate. A first passivation layer is disposed on the substrate. A conductive pad is disposed on the first passivation layer. A second passivation layer is disposed on the first passivation layer. A conductive structure is disposed on the conductive pad, and a passive device is also disposed on the conductive pad, wherein the passive device has a first portion located above the second passivation layer and a second portion passing through the second passivation layer. A solderability preservative film covers the first portion of the passive device, and an under bump metallurgy (UBM) layer covers the second portion of the passive device and a portion of the conductive structure.

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