公开(公告)号：US11688580B2

公开(公告)日：2023-06-27

申请号：US17353790

申请日：2021-06-21

Applicant: ASML Netherlands B.V.

Inventor： Xuedong Liu ,  Weiming Ren ,  Shuai Li ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/04 ,  H01J37/153

CPC classification number: H01J37/147 ,  H01J37/04 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/061 ,  H01J2237/083 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/2817

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

公开(公告)号：US20230162946A1

公开(公告)日：2023-05-25

申请号：US18101468

申请日：2023-01-25

Applicant: TOKYO ELECTRON LIMITED

Inventor： Chishio KOSHIMIZU ,  Shin HIROTSU

IPC: H01J37/32 ,  H01J37/16 ,  H01J37/04

CPC classification number: H01J37/32027 ,  H01J37/16 ,  H01J37/32642 ,  H01J37/04 ,  H01J37/32082 ,  H01J37/241

Abstract: A plasma processing apparatus includes: a processing container; an electrode that places a workpiece thereon; a plasma generation source that supplies plasma into the processing container; a bias power supply that supplies a bias power to the electrode; an edge ring disposed at a periphery of the workpiece; a DC power supply that supplies a DC voltage to the edge ring; a controller that executes a first control procedure in which the DC voltage periodically repeats a first state having a first voltage value and a second state having a second voltage value, the first voltage value is supplied in a partial time period within each period of a potential of the electrode, and the second voltage value is supplied such that the first and second states are continuous.

公开(公告)号：US20230154719A1

公开(公告)日：2023-05-18

申请号：US18155684

申请日：2023-01-17

Applicant: ASML Netherlands B.V.

Inventor： Laura DINU-GURTLER ,  Eric Petrus HOGERVORST ,  Jurgen VAN SOEST

IPC: H01J37/04 ,  G03F7/20 ,  H01J37/10 ,  H01J37/244 ,  H01J37/317 ,  H01L21/263

CPC classification number: H01J37/04 ,  G03F7/70016 ,  H01J37/10 ,  H01J37/244 ,  H01J37/3175 ,  H01L21/263 ,  H01J2237/061

Abstract: The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.

公开(公告)号：US20190247893A1

公开(公告)日：2019-08-15

申请号：US16272147

申请日：2019-02-11

Applicant: Global Plasma Solutions, Inc.

Inventor： Charles Houston WADDELL

IPC: B08B1/04 ,  H01T23/00 ,  B01D53/32 ,  B03C3/74 ,  H01J37/04

CPC classification number: B08B1/04 ,  B01D53/32 ,  B03C3/743 ,  H01J37/04 ,  H01T23/00

Abstract: A self-cleaning ion generator device includes a first portion with a base portion that extends to an outer edge and a first pair and a second pair of opposed sidewalls extending upwardly from the outer edge and intersect at corners, forming a cavity therein. A second portion includes a base portion that extends to an outer edge selectively secured to the first portion forming a housing. At least one ion emitting device extending from the housing, and at least one cleaning apparatus for cleaning the at least one ion emitting device.

公开(公告)号：US20190074157A1

公开(公告)日：2019-03-07

申请号：US16174146

申请日：2018-10-29

Applicant: Hermes Microvision, Inc.

Inventor： Xuedong LIU ,  Weiming REN ,  Shuai LI ,  Zhongwei CHEN

IPC: H01J37/147 ,  H01J37/04 ,  H01J37/28 ,  H01J37/153

CPC classification number: H01J37/147 ,  H01J37/04 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/061 ,  H01J2237/083 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/2817

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

公开(公告)号：US20180218873A1

公开(公告)日：2018-08-02

申请号：US15936154

申请日：2018-03-26

Applicant: Applied Materials, Inc.

Inventor： Jason A. Kenney ,  James D. Carducci ,  Kenneth S. Collins ,  Richard Fovell ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: H01J37/04 ,  H05H1/46 ,  H01J37/32

CPC classification number: H01J37/04 ,  H01J37/321 ,  H01J37/3211 ,  H05H1/46 ,  H05H2001/4667

Abstract: A plasma reactor includes a window assembly, inner, middle and outer coil antennas adjacent the window assembly, inner, middle and outer current distributors respectively coupled to the inner, middle and outer coil antennas, a ceiling plate overlying the window assembly, first, second and third RF power terminals, and first, second and third axial RF power feeds connected between respective ones of the first, second and third RF power terminals and respective ones of the inner, middle and outer current distributors. The third axial RF power feed includes an outer RF power distribution cylinder surrounding the first and second RF axial power feeds. Plural spaced-apart reactance elements are electrically connected to the outer RF power distribution cylinder.

公开(公告)号：US20180174795A1

公开(公告)日：2018-06-21

申请号：US15736098

申请日：2015-06-23

Applicant: HITACHI, LTD.

Inventor： Teruo KOHASHI

IPC: H01J37/09 ,  H01J37/147 ,  H01J37/20

CPC classification number: H01J37/09 ,  H01J37/04 ,  H01J37/147 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/041

Abstract: Provided is an optical system which can adjust, including increase, a spin polarization degree of an electron beam. Disclosed is a charged particle device having a charged particle source which generates charged particles, a sample table on which a sample is placed, and a transport optical system which is disposed between the charged particle source and the sample table and transports the charged particles as charged particle flux toward the sample table. In this device, the transport optical system includes a magnetic field generating section which generates a magnetic field having a vertical component to a course of the charged particle flux, an electric field generating section which generates an electric field having a vertical component to the course of the charged particle flux, and a shielding section which shields at least a part of the charged particle flux passed through the magnetic field generating section and the electric field generating section. Moreover, the vertical component of the magnetic field has a magnetic field gradient, and the vertical component of the electric field gives an electrostatic force in a direction opposite to a Lorentz force received by the charged particle flux.

公开(公告)号：US20180158643A1

公开(公告)日：2018-06-07

申请号：US15649327

申请日：2017-07-13

Applicant: Jongchul PARK

Inventor： Jongchul PARK

IPC: H01J37/147 ,  H01J37/305 ,  H01J37/08

CPC classification number: H01J37/1471 ,  H01J37/04 ,  H01J37/08 ,  H01J37/1472 ,  H01J37/15 ,  H01J37/3053 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32513 ,  H01J2237/083

Abstract: An ion beam apparatus includes a source part generating plasma therein, a process part in which a process using an ion beam is performed, and a slit structure provided between the source part and the process part and extracting the ion beam from the plasma. The slit structure includes at least one electrode structure. The electrode structure has a slit penetrating the electrode structure and extending in a first direction. The ion beam is irradiated onto a substrate at an incident angle through the slit. The incident angle of the ion beam is adjusted by rotating the electrode structure on a rotation axis parallel to the first direction.

公开(公告)号：US09818572B2

公开(公告)日：2017-11-14

申请号：US14020669

申请日：2013-09-06

Applicant: JUSUNG ENGINEERING CO., LTD.

Inventor： Ho Chul Kang

IPC: H01J37/04 ,  C23C16/509 ,  H01J37/32

CPC classification number: H01J37/04 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/32577

Abstract: A substrate treatment apparatus includes a chamber providing a reaction region and including first and second sides facing each other, a module connected to the first side, an upper electrode in the reaction region, a substrate holder facing the upper electrode, wherein a substrate is disposed on the substrate holder, and first and second points are defined on the substrate, wherein the first point corresponds to a center of the substrate, and the second point is distant from the first point toward the first side, and a feeding line for applying an RF power, the feeding line connected to the upper electrode corresponding to the second point.

公开(公告)号：US20170281102A1

公开(公告)日：2017-10-05

申请号：US15473631

申请日：2017-03-30

Applicant: Weng-Dah Ken ,  Fang-Chi Kan

Inventor： Weng-Dah Ken ,  Fang-Chi Kan

IPC: A61B6/00 ,  H01J37/04 ,  G04F5/14 ,  G01B15/00

CPC classification number: A61B6/4258 ,  A61B5/0059 ,  A61B6/4035 ,  G01B15/00 ,  G01B2290/55 ,  G01N23/20 ,  G04F5/14 ,  H01J37/04 ,  H01J37/244 ,  H01J37/26 ,  H01J2237/06383 ,  H01J2237/24557 ,  H01J2237/24571 ,  H01J2237/24578 ,  H01J2237/24585 ,  H01J2237/2614

Abstract: A non-contact angle measuring apparatus includes a matter-wave and energy (MWE) particle source and a detector. The MWE particle source is used for generating boson or fermion particles. The detector is used for detecting a plurality peaks or valleys of an interference pattern generated by 1) the boson or fermion particles corresponding to a slit, a bump, or a hole of a first plane and 2) matter waves' wavefront-split associated with the boson or fermion particles reflected by a second plane, wherein angular locations of the plurality peaks or valleys of the interference pattern, a first distance between a joint region of the first plane and the second plane, and a second distance between the detector and the slit are used for deciding an angle between the first plane and the second plane.