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公开(公告)号:US20250069856A1
公开(公告)日:2025-02-27
申请号:US18726395
申请日:2022-12-27
Applicant: JUSUNG ENGINEERING CO., LTD.
Inventor: Chul Joo HWANG , In Seo YOO , Ji Hun LEE
IPC: H01J37/32
Abstract: The present inventive concept relates to an apparatus for processing a substrate, the apparatus comprising: a chamber which includes a lid on top; a first plate which is installed under the lid and in which a plurality of gas holes is formed; a second plate coupled to the first plate and including a plurality of gas holes that communicate with some of the plurality of gas holes of the first plate; and a distance adjustment part which is connected to the second plate, adjusts the distance between the lid and the first plate, and is connected to an RF power feeding line.
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公开(公告)号:US20250034710A1
公开(公告)日:2025-01-30
申请号:US18687294
申请日:2022-09-02
Applicant: JUSUNG ENGINEERING CO., LTD.
Inventor: Jun Young KIM , Sang Yun CHA , Ji Hun LEE , Dae Soo JANG
IPC: C23C16/455 , C23C16/509
Abstract: The present inventive concept relates to a substrate processing apparatus comprising: a chamber; a substrate support part which supports at least one substrate in the chamber; a lower plate which is disposed above the substrate support part; and an upper plate which is disposed above the lower plate, wherein: the upper plate includes a first spray hole which provides a first gas and a second spray hole which provides a second gas; and the lower plate includes a first opening which is disposed under the first spray hole so as to allow the first gas provided from the first spray hole to pass therethrough and a second opening which is disposed under the second spray hole so as to allow the second gas provided from the second spray hole to pass therethrough.
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公开(公告)号:US20250017091A1
公开(公告)日:2025-01-09
申请号:US18708587
申请日:2022-12-20
Applicant: JUSUNG ENGINEERING CO., LTD.
Inventor: Jae Ho KIM , Chul Joo HWANG
IPC: H10K71/16
Abstract: The present inventive concept comprises the steps of preparing a substrate on which a first conductive charge transport layer is formed; positioning a mask having an opening pattern on the substrate; and forming a perovskite layer on the substrate and the mask.
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公开(公告)号:US12106941B2
公开(公告)日:2024-10-01
申请号:US18493618
申请日:2023-10-24
Applicant: JUSUNG ENGINEERING CO., LTD.
Inventor: Chul-Joo Hwang
IPC: C23C16/40 , C23C16/455 , C23C16/52 , H01J37/32 , H01L21/02
CPC classification number: H01J37/32449 , C23C16/45536 , C23C16/45551 , C23C16/45574 , C23C16/52 , H01L21/02274 , H01L21/0228 , H01J2237/20214 , H01J2237/332 , H01J2237/3321
Abstract: The present disclosure relates to a substrate processing device and a substrate processing method, the substrate processing device comprising: a chamber; a substrate support part installed in a processing space inside the chamber so as to enable one or more substrate to rotate; a first gas spraying part for spraying a source gas on a first area of the processing space; a second gas spraying part for spraying, on a second area of the processing space, a reactant gas reacting with the source gas on the second area; and a third gas spraying part for spraying, on a third area, a purge gas for dividing the first area and the second area.
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公开(公告)号:US12080526B2
公开(公告)日:2024-09-03
申请号:US17625730
申请日:2020-07-09
Applicant: JUSUNG ENGINEERING CO., LTD.
Inventor: Woong Kyo Oh , Young Woon Kim , Kwang Su Yoo , Do Hyung Kim , Yun Gyu Ha
IPC: H01J37/32
CPC classification number: H01J37/32559 , H01J37/3244 , H01J37/32541 , H01J37/32568 , H01J2237/332
Abstract: The present disclosure relates to a substrate processing apparatus capable of improving efficiency in a substrate processing process by adjusting a flow rate and residence time of gas and a plasma density according to process conditions. The substrate processing apparatus according to the embodiment of the present disclosure is advantageous in that it can enhance efficiency in the substrate processing process by decreasing the flow rate and increasing residence time of gas and the plasma density in the process of supplying the gas through the shape forming of the gas injection module including the first and second injection plates.
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公开(公告)号:US20240282745A1
公开(公告)日:2024-08-22
申请号:US18648334
申请日:2024-04-27
Applicant: JUSUNG ENGINEERING CO., LTD.
Inventor: Jung Bae KIM , Min Jong KEUM , Young Tae YOON , Kyung Guk LEE
IPC: H01L23/00 , H10K59/131
CPC classification number: H01L24/73 , H01L24/16 , H01L24/72 , H01L24/81 , H01L24/90 , H01L24/92 , H10K59/131 , H01L2224/16225 , H01L2224/73201 , H01L2224/9212
Abstract: The present disclosure relates to an electrode connection element, a light emitting apparatus including the same, and a method for manufacturing the light emitting apparatus, and more particularly, to an electrode connection element, a light emitting apparatus including the same, and a method for manufacturing the light emitting apparatus, which are for electrically connecting an electrode terminal and an external drive circuit. An electrode connection element according to an exemplary embodiment includes: an upper connection member coming into contact with an upper surface of an electrode terminal formed on a substrate; a lower connection member configured to support a lower surface of the substrate; a connection member configured to connect the upper connection member and the lower connection member to each other.
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公开(公告)号:US12032013B2
公开(公告)日:2024-07-09
申请号:US18216470
申请日:2023-06-29
Applicant: JUSUNG ENGINEERING CO., LTD.
Inventor: Gu Hyun Jung , Young Rok Kim , Se Yong Oh , Chul Joo Hwang , Jin An Jung
IPC: G01R31/26 , G01R1/04 , G01R31/265
CPC classification number: G01R31/2601 , G01R1/04 , G01R31/265
Abstract: Provided are a device and a method for monitoring substrates to determine a processed state of the substrates and inspecting presence of abnormality in the processed substrates. A device for inspecting substrates includes a substrate mounting part moving relative to the substrate and for mounting a substrate, a measurement part for monitoring the substrate, a control part configured to control a movement path of the measurement part so that at least some regions are monitored from positions different from each other with respect to a plurality of substrates, and an analysis part configured to determine presence of abnormality from monitoring information about the plurality of substrates.
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公开(公告)号:US20240055233A1
公开(公告)日:2024-02-15
申请号:US18493618
申请日:2023-10-24
Applicant: JUSUNG ENGINEERING CO., LTD.
Inventor: Chul-Joo HWANG
IPC: H01J37/32 , C23C16/455 , C23C16/52 , H01L21/02
CPC classification number: H01J37/32449 , C23C16/45536 , C23C16/45551 , C23C16/45574 , C23C16/52 , H01L21/02274 , H01L21/0228 , H01J2237/3321 , H01J2237/20214 , H01J2237/332
Abstract: The present disclosure relates to a substrate processing device and a substrate processing method, the substrate processing device comprising: a chamber; a substrate support part installed in a processing space inside the chamber so as to enable one or more substrate to rotate; a first gas spraying part for spraying a source gas on a first area of the processing space; a second gas spraying part for spraying, on a second area of the processing space, a reactant gas reacting with the source gas on the second area; and a third gas spraying part for spraying, on a third area, a purge gas for dividing the first area and the second area.
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公开(公告)号:US20230361230A1
公开(公告)日:2023-11-09
申请号:US18225076
申请日:2023-07-21
Applicant: JUSUNG ENGINEERING CO., LTD.
Inventor: Hyun Kyo SHIN , Duck Ho KIM , Yong Hyun KIM , Chang Su MHA , Kyung In MIN , Chang Kyun PARK , Jung Kyun LEE
IPC: H01L31/0468 , H01L31/0465
CPC classification number: H01L31/0468 , H01L31/0465
Abstract: The present inventive concept relates to a thin film type solar cell including a plurality of unit cells serially connected to one another on a substrate; and a light transmission part provided in the plurality of unit cells, wherein the light transmission part is provided in a discontinuous rectilinear structure including at least one disconnection part.
According to the present inventive concept, since the light transmission part is discontinuously formed, the repetition characteristic of the light transmission part including a plurality of dot patterns may be reduced, thereby effectively solving a problem where a wave pattern such as a moire phenomenon occurs when light is passing through the light transmission part.-
公开(公告)号:US20230341454A1
公开(公告)日:2023-10-26
申请号:US18216470
申请日:2023-06-29
Applicant: JUSUNG ENGINEERING CO., LTD.
Inventor: Gu Hyun JUNG , Young Rok KIM , Se Yong OH , Chul Joo HWANG , Jin An JUNG
CPC classification number: G01R31/2601 , G01R1/04 , G01R31/265
Abstract: Provided are a device and a method for monitoring substrates to determine a processed state of the substrates and inspecting presence of abnormality in the processed substrates.
A device for inspecting substrates includes a substrate mounting part moving relative to the substrate and for mounting a substrate, a measurement part for monitoring the substrate, a control part configured to control a movement path of the measurement part so that at least some regions are monitored from positions different from each other with respect to a plurality of substrates, and an analysis part configured to determine presence of abnormality from monitoring information about the plurality of substrates.
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