RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND
    10.
    发明申请
    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND 有权
    耐蚀组合物,形成耐蚀图案和聚合物的方法

    公开(公告)号:US20140221673A1

    公开(公告)日:2014-08-07

    申请号:US14175449

    申请日:2014-02-07

    摘要: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below (R1 represents a sulfur atom or an oxygen atom; R2 represents a single bond or a divalent linking group; and Y represents an aromatic hydrocarbon group or an aliphatic hydrocarbon group having a polycyclic group, provided that the aromatic hydrocarbon group or the aliphatic hydrocarbon may have a carbon atom or a hydrogen atom thereof substituted with a substituent.

    摘要翻译: 一种抗蚀剂组合物,其包含在酸作用下在显影液中显示出改变的溶解度的碱成分(A)和暴露时产生酸的酸产生剂组分(B),含有高分子化合物(A1)的碱成分(A) 具有下述通式(a5-0)表示的结构单元(a5)(R1表示硫原子或氧原子; R2表示单键或二价连接基团; Y表示芳香族烃基或脂肪族 具有多环基团的烃基,条件是芳族烃基或脂族烃可以具有被取代基取代的碳原子或氢原子。