公开(公告)号：US12089327B2

公开(公告)日：2024-09-10

申请号：US18046280

申请日：2022-10-13

申请人： KURARAY CO., LTD.

发明人： Kikuo Arimoto ,  Takafumi Sawada ,  Yuuichi Banba ,  Shuji Nagano

IPC分类号： H05K1/03 ,  B32B15/04 ,  B32B15/08 ,  B32B15/18 ,  B32B15/20 ,  C08J5/18 ,  C09K19/00 ,  C09K19/02 ,  C23C14/20 ,  H05K1/09 ,  H05K3/02

CPC分类号： H05K1/0353 ,  B32B15/04 ,  B32B15/043 ,  B32B15/08 ,  B32B15/18 ,  B32B15/20 ,  C08J5/18 ,  C09K19/00 ,  C09K19/02 ,  C23C14/20 ,  C23C14/205 ,  H05K1/0313 ,  H05K1/09 ,  H05K3/022 ,  H05K1/0393 ,  H05K2201/0129 ,  H05K2201/0141 ,  H05K2201/0338 ,  Y10T428/12556 ,  Y10T428/12569 ,  Y10T428/1266 ,  Y10T428/12667 ,  Y10T428/12708 ,  Y10T428/12715 ,  Y10T428/12722 ,  Y10T428/12736 ,  Y10T428/12743 ,  Y10T428/1275 ,  Y10T428/12757 ,  Y10T428/12785 ,  Y10T428/12806 ,  Y10T428/12819 ,  Y10T428/12826 ,  Y10T428/12847 ,  Y10T428/12854 ,  Y10T428/12861 ,  Y10T428/12868 ,  Y10T428/12875 ,  Y10T428/12882 ,  Y10T428/12889 ,  Y10T428/12896 ,  Y10T428/12903 ,  Y10T428/1291 ,  Y10T428/12917 ,  Y10T428/12931 ,  Y10T428/12937 ,  Y10T428/12944 ,  Y10T428/12951 ,  Y10T428/26 ,  Y10T428/31678

摘要： Provide is a metal-coated liquid-crystal polymer film that is suitable for microcircuit processing and capable of reducing the transmission loss of circuits. The metal-coated liquid-crystal polymer film comprising: a polymer film comprising a polymer film main body capable of forming an optically anisotropic melt phase; a first metal layer layered on at least one side of the polymer film main body; and a second metal layer layered on the first metal layer, wherein in an analysis of oxygen concentration in a thickness direction using XPS, the average oxygen concentration of the first metal layer is 2.5 atom % or less.

公开(公告)号：US20190194817A1

公开(公告)日：2019-06-27

申请号：US16293549

申请日：2019-03-05

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor

IPC分类号： C25D11/34 ,  C25D11/04 ,  C25D11/18 ,  C23C28/00 ,  C23C24/04 ,  C25D11/26 ,  C25D11/16

CPC分类号： C25D11/34 ,  C23C24/04 ,  C23C28/321 ,  C23C28/322 ,  C23C28/345 ,  C23C28/3455 ,  C25D11/04 ,  C25D11/16 ,  C25D11/18 ,  C25D11/26 ,  Y10T428/12736 ,  Y10T428/12743 ,  Y10T428/12757 ,  Y10T428/12764

摘要： An article comprises a component for a manufacturing chamber, a coating on the component, and an anodization layer formed on the coating. The anodization layer has a thickness of about 2-10 mil, comprises a low porosity layer portion having a density of greater than 99% and a porous columnar layer portion having a higher porosity than the low porosity layer portion. The porous columnar layer portion comprises a plurality of columnar nanopores having a diameter of about 10-50 nm.

公开(公告)号：US09929187B2

公开(公告)日：2018-03-27

申请号：US14296800

申请日：2014-06-05

申请人： Shuwei Sun ,  Francois-Charles Dary ,  Marc Abouaf ,  Patrick Hogan ,  Qi Zhang

发明人： Shuwei Sun ,  Francois-Charles Dary ,  Marc Abouaf ,  Patrick Hogan ,  Qi Zhang

IPC分类号： H01B1/02 ,  H01L27/12 ,  B81C1/00 ,  C22F1/04 ,  C22F1/00 ,  C22F1/08 ,  C22F1/14 ,  C21D1/00 ,  C21D9/00 ,  H01L29/66 ,  G06F3/041 ,  H01L29/49 ,  H01L23/532 ,  H01L29/786 ,  G06F3/044

CPC分类号： H01L27/1244 ,  B81C1/00 ,  B81C1/00031 ,  B81C1/00404 ,  B81C1/00523 ,  B81C1/00547 ,  C21D1/00 ,  C21D9/00 ,  C21D2201/00 ,  C21D2211/00 ,  C21D2251/00 ,  C22F1/00 ,  C22F1/04 ,  C22F1/08 ,  C22F1/14 ,  G06F3/041 ,  G06F3/0412 ,  G06F3/044 ,  G06F2203/04103 ,  H01B1/026 ,  H01L23/53238 ,  H01L29/4908 ,  H01L29/6675 ,  H01L29/78603 ,  H01L29/78666 ,  H01L2924/0002 ,  Y10T428/12611 ,  Y10T428/1266 ,  Y10T428/12681 ,  Y10T428/12687 ,  Y10T428/12694 ,  Y10T428/12708 ,  Y10T428/12715 ,  Y10T428/12722 ,  Y10T428/12743 ,  Y10T428/1275 ,  Y10T428/12806 ,  Y10T428/12812 ,  Y10T428/12819 ,  Y10T428/12826 ,  Y10T428/1284 ,  Y10T428/12847 ,  Y10T428/12861 ,  Y10T428/12868 ,  Y10T428/12875 ,  Y10T428/12882 ,  Y10T428/12889 ,  Y10T428/12896 ,  Y10T428/12903 ,  Y10T428/1291 ,  Y10T428/12931 ,  H01L2924/00

摘要： In various embodiments, electronic devices such as touch-panel displays incorporate interconnects featuring a conductor layer and, disposed above the conductor layer, a capping layer comprising an alloy of Cu and one or more refractory metal elements selected from the group consisting of Ta, Nb, Mo, W, Zr, Hf, Re, Os, Ru, Rh, Ti, V, Cr, and Ni.

公开(公告)号：US09558859B2

公开(公告)日：2017-01-31

申请号：US14183492

申请日：2014-02-18

申请人： RSM Electron Power, Inc.

发明人： Ching Au ,  Manhong Zhao ,  Robert Conte

IPC分类号： H01B1/02 ,  H05K3/24 ,  H01L23/373

CPC分类号： H01B1/02 ,  H01L23/3735 ,  H01L23/3736 ,  H01L2924/0002 ,  H05K3/244 ,  H05K2201/0341 ,  H05K2201/068 ,  Y10T428/12743 ,  Y10T428/1275 ,  Y10T428/12847 ,  Y10T428/12889 ,  Y10T428/12896 ,  Y10T428/1291 ,  H01L2924/00

摘要： The invention provides a slip layer substrate which can reduce the thermal residual stresses between components induced by their mismatch of thermal expansion, thus greatly improve the reliability of electronic packages. The slip layer substrate comprises: a base material; a first metallization layer formed on the base material; a first diffusion barrier layer formed on the first metallization layer; a slip layer formed on the first diffusion barrier layer; a second diffusion barrier layer formed on the slip layer; and a second metallization layer formed on the second diffusion barrier layer.

摘要翻译： 本发明提供了一种滑动层基材，其可以降低由它们的热膨胀失配引起的组分之间的热残余应力，从而大大提高电子封装的可靠性。 滑动层基材包括：基材; 形成在基材上的第一金属化层; 形成在第一金属化层上的第一扩散阻挡层; 形成在第一扩散阻挡层上的滑移层; 形成在滑动层上的第二扩散阻挡层; 以及形成在第二扩散阻挡层上的第二金属化层。

公开(公告)号：US09339990B2

公开(公告)日：2016-05-17

申请号：US13667947

申请日：2012-11-02

申请人： National Central University

发明人： Jason Shiang Ching Jang ,  Pei Hua Tsai ,  Jia Bin Li ,  Yi Zong Zhang ,  Chih Chiang Fu ,  Jinn. P Chu

IPC分类号： C23C14/35 ,  B32B15/01 ,  C22C45/10 ,  C23C14/02 ,  C23C14/18 ,  C22C1/00

CPC分类号： C23C14/165 ,  B32B15/017 ,  C22C1/002 ,  C22C45/10 ,  C23C14/024 ,  C23C14/028 ,  C23C14/185 ,  C23C14/3414 ,  H01J37/3426 ,  H01J2237/081 ,  H01J2237/332 ,  Y10T428/12743 ,  Y10T428/1275 ,  Y10T428/12903

摘要： A Zr-based or Zr—Cu based metallic glass thin film (MGTF) coated on aluminum alloy substrate and a method of fabricating the metallic glass and MGTF coated on aluminum alloy substrate are disclosed. The Zr-based metallic glass thin film-coated aluminum alloy substrate of the present invention comprises: an aluminum alloy substrate; and a Zr-based metallic glass thin film located on the substrate, in which the Zr-based metallic glass is represented by the formula of (ZraCubNicAld)100-xSix, wherein 45=

摘要翻译： 公开了涂覆在铝合金基板上的Zr基或Zr-Cu基金属玻璃薄膜（MGTF）以及涂覆在铝合金基板上的金属玻璃和MGTF的制造方法。 本发明的Zr系金属玻璃薄膜包覆铝合金基板包括：铝合金基板; 和Zr基金属玻璃薄膜，其中Zr基金属玻璃由式（ZraCubNicAld）100-xSix表示，其中45 =

公开(公告)号：US08881964B2

公开(公告)日：2014-11-11

申请号：US12887056

申请日：2010-09-21

申请人： Weiju Ren

发明人： Weiju Ren

IPC分类号： B23K20/12 ,  B23K35/24 ,  C22C38/00 ,  B23K35/30 ,  C22C38/28 ,  B23K35/32 ,  B23K35/28 ,  C22C38/06

CPC分类号： B23K20/1275 ,  B23K35/286 ,  B23K35/3033 ,  B23K35/3046 ,  B23K35/3053 ,  B23K35/308 ,  B23K35/325 ,  B23K35/327 ,  C22C38/002 ,  C22C38/06 ,  C22C38/28 ,  Y10T428/12493 ,  Y10T428/12639 ,  Y10T428/12646 ,  Y10T428/12653 ,  Y10T428/12736 ,  Y10T428/12743 ,  Y10T428/1275 ,  Y10T428/12757 ,  Y10T428/12764 ,  Y10T428/12778

摘要： A method of welding including forming a filler material of a first oxide dispersoid metal, the first oxide dispersoid material having first strengthening particles that compensate for decreases in weld strength of friction stir welded oxide dispersoid metals; positioning the filler material between a first metal structure and a second metal structure each being comprised of at least a second oxide dispersoid metal; and friction welding the filler material, the first metal structure and the second metal structure to provide a weld.

摘要翻译： 一种焊接方法，包括形成第一氧化物分散相金属的填充材料，所述第一氧化物分散相材料具有补偿摩擦搅拌焊接的氧化物分散相金属的焊接强度降低的第一强化颗粒; 将填充材料定位在第一金属结构和第二金属结构之间，每个第二金属结构由至少第二氧化物分散质金属组成; 以及摩擦焊接填料，第一金属结构和第二金属结构以提供焊接。

公开(公告)号：US20140272458A1

公开(公告)日：2014-09-18

申请号：US13830531

申请日：2013-03-14

申请人： Xtalic Corporation

发明人： Shiyun Ruan ,  Witold Paw ,  John Hunter Martin ,  Alan C. Lund

IPC分类号： C25D3/44 ,  B32B15/20 ,  C25D1/00

CPC分类号： C25D3/44 ,  C22C21/00 ,  C22C22/00 ,  C23C30/00 ,  C23C30/005 ,  C25D1/02 ,  C25D1/04 ,  C25D3/56 ,  C25D3/665 ,  C25D11/04 ,  Y10T428/12 ,  Y10T428/12431 ,  Y10T428/12438 ,  Y10T428/12736 ,  Y10T428/12743 ,  Y10T428/1275 ,  Y10T428/12757 ,  Y10T428/12764 ,  Y10T428/26 ,  Y10T428/263 ,  Y10T428/264 ,  Y10T428/265

摘要： Embodiments of the current disclosure are related to electrodeposition.

摘要翻译： 本公开的实施方案涉及电沉积。

公开(公告)号：US20140102880A1

公开(公告)日：2014-04-17

申请号：US13856617

申请日：2013-04-04

申请人： H.C. STARCK, INC.

发明人： Gary Alan Rozak ,  Mark E. Gaydos ,  Patrick Alan Hogan ,  Shuwei Sun

IPC分类号： C23C14/34

CPC分类号： C23C14/185 ,  B22F2998/10 ,  C22C1/045 ,  C22C27/04 ,  C23C14/3407 ,  C23C14/3414 ,  C23C14/5873 ,  G06F3/041 ,  G06F2203/04103 ,  Y10T428/12743 ,  Y10T428/12826 ,  Y10T428/265 ,  Y10T428/31678 ,  B22F1/0003 ,  B22F3/15

摘要： The invention relates to sputter targets and methods for depositing a layer from a sputter target. The method preferably includes the steps of: placing a sputter target in a vacuum chamber; placing a substrate having a substrate surface in the vacuum chamber; reducing the pressure in the vacuum chamber to about 100 Torr or less; removing atoms from the surface of the sputter target while the sputter target is in the vacuum chamber (e.g., using a magnetic field and/or an electric field). The deposited layer preferably is a molybdenum containing alloy including about 50 atomic percent or more molybdenum, 0.5 to 45 atomic percent of a second metal element selected from the group consisting of niobium and vanadium; and 0.5 to 45 atomic percent of a third metal element selected from the group consisting of tantalum, chromium, vanadium, niobium, and titanium.

摘要翻译： 本发明涉及用于从溅射靶沉积层的溅射靶和方法。 该方法优选包括以下步骤：将溅射靶放置在真空室中; 将具有基板表面的基板放置在所述真空室中; 将真空室中的压力降低至约100托或更低; 当溅射靶位于真空室（例如，使用磁场和/或电场）时，从溅射靶的表面去除原子。 沉积层优选是包含约50原子％或更多的钼，0.5至45原子％的选自铌和钒的第二金属元素的含钼合金; 和0.5〜45原子％的选自钽，铬，钒，铌和钛的第三金属元素。

公开(公告)号：US08697249B1

公开(公告)日：2014-04-15

申请号：US13864647

申请日：2013-04-17

申请人： Shenzhen Futaihong Precision Industry Co., Ltd. ,  FIH (Hong Kong) Limited

发明人： Chun-Jie Zhang

IPC分类号： B32B15/04 ,  B32B15/18 ,  B32B15/20

CPC分类号： C23C14/0682 ,  C23C14/0015 ,  C23C14/024 ,  C23C14/025 ,  C23C28/322 ,  C23C28/34 ,  C23C28/341 ,  Y10T428/12576 ,  Y10T428/12583 ,  Y10T428/12743 ,  Y10T428/12847 ,  Y10T428/12854 ,  Y10T428/12993 ,  Y10T428/24967 ,  Y10T428/265

摘要： A coated article includes a substrate and a color layer formed on the substrate. The color layer is a chromium-aluminum-silicon layer containing chromium atoms, aluminum atoms and silicon atoms. The color layer has an L* value between about 25 to about 28, an a* value between about −1 to about −6, and a b* value between about −5 to about −9 in the CIE L*a*b* (CIE LAB) color space. A method for making the coated article is also described.

摘要翻译： 涂覆制品包括基材和形成在基材上的着色层。 着色层是含有铬原子，铝原子和硅原子的铬铝硅层。 彩色层的L *值在约25至约28之间，a *值在约-1至约-6之间，而ab *值在约5至约-9之间的CIE L * a * b *（ CIE LAB）颜色空间。 还描述了制造涂覆制品的方法。

公开(公告)号：US08679642B2

公开(公告)日：2014-03-25

申请号：US14037850

申请日：2013-09-26

申请人： The United States of America as represented by the Administrator of the National Aeronautics and Space Administration

发明人： Stephen W. Smith ,  John A. Newman ,  Robert S. Piascik ,  Edward H. Glaessgen

IPC分类号： B32B15/00 ,  B32B3/30

CPC分类号： B23P6/04 ,  B23P6/045 ,  B32B15/01 ,  C22C14/00 ,  C22C21/00 ,  C23C4/01 ,  C23C14/046 ,  C23C14/16 ,  C23C26/02 ,  Y10T29/49718 ,  Y10T29/49732 ,  Y10T29/49746 ,  Y10T29/49764 ,  Y10T29/49771 ,  Y10T29/49885 ,  Y10T29/4998 ,  Y10T29/49982 ,  Y10T428/12451 ,  Y10T428/12472 ,  Y10T428/12493 ,  Y10T428/12681 ,  Y10T428/12708 ,  Y10T428/12736 ,  Y10T428/12743 ,  Y10T428/12806

摘要： A first material with a known maximum temperature of operation is coated with a second material on at least one surface of the first material. The coating has a melting temperature that is greater than the maximum temperature of operation of the first material. The coating is heated to its melting temperature until the coating flows into any cracks in the first material's surface.

摘要翻译： 具有已知最高操作温度的第一材料在第一材料的至少一个表面上涂覆有第二材料。 涂层的熔化温度大于第一材料的最高工作温度。 将涂层加热至其熔融温度，直到涂层流入第一材料表面的任何裂纹。