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    A PROCESS TO PROTECT LIGHT METAL SUBSTRATES
    2.
    发明公开
    A PROCESS TO PROTECT LIGHT METAL SUBSTRATES 审中-公开

    公开(公告)号：US20240229286A9

    公开(公告)日：2024-07-11

    申请号：US18547933

    申请日：2022-03-02

    申请人： CIRRUS MATERIALS SCIENCE LIMITED

    发明人： Christopher William Goode ,  Fengyan Hou

    IPC分类号： C25D11/16 ,  C25D11/10 ,  C25D11/30

    CPC分类号： C25D11/16 ,  C25D11/10 ,  C25D11/30

    摘要： There is disclosed a method of placing a substrate into a controlled conductivity plasma electrolytic oxidation (PEO) bath configured for the substrate; wherein the PEO bath includes a nitrogen containing organic compound, and applying a voltage for a period of time to produce a substantially continuous nitride or nitrogen compound containing PEO layer of between about 1 to about 100 microns thick on the substrate. The substrates are preferably magnesium, titanium, or aluminium. The PEO process is preferably carried out under alkaline conditions and at voltages of less than about 160 volts.

    SURFACE TREATMENT METHOD OF ALUMINUM MATERIAL
    3.
    发明公开
    SURFACE TREATMENT METHOD OF ALUMINUM MATERIAL 审中-公开

    公开(公告)号：US20240035188A1

    公开(公告)日：2024-02-01

    申请号：US18377658

    申请日：2023-10-06

    申请人： SAMSUNG ELECTRONICS CO., LTD.

    发明人： Jinju KIM ,  Kyunghwan LEE ,  Cheolhee CHO ,  Youngdeog KOH ,  Kwangjoo KIM

    IPC分类号： C25D11/24 ,  C23F1/20 ,  C25D11/16

    CPC分类号： C25D11/246 ,  C23F1/20 ,  C25D11/16 ,  C25D11/243

    摘要： Disclosed is a method of treating a surface of an aluminum material, the method including: degreasing an aluminum material; etching the degreased aluminum material; performing a first desmutting treatment by immersing the etched aluminum material in a 25-35 wt % nitric acid solution at a temperature in a range of 25 to 30° C. for at least 60 seconds; performing a second desmutting treatment by immersing the first desmutting-treated aluminum material in a 5-15 wt % nitric acid solution at a temperature in a range of 25 to 30° C. for a time in a range of 30 seconds to 60 seconds; anodizing the second desmutting-treated aluminum material; coloring the anodized aluminum material; and sealing the colored aluminum material.

    METHOD OF MANUFACTURING AN ALUMINIUM ALLOY PLATE FOR VACUUM CHAMBER ELEMENTS
    6.
    发明公开
    METHOD OF MANUFACTURING AN ALUMINIUM ALLOY PLATE FOR VACUUM CHAMBER ELEMENTS 审中-公开

    公开(公告)号：US20230220522A1

    公开(公告)日：2023-07-13

    申请号：US17999988

    申请日：2021-06-07

    申请人： Novelis Koblenz GmbH

    发明人： Dennis Aust ,  Fabian Ritz ,  Bernd Jacoby

    IPC分类号： C22C21/08 ,  C22F1/00 ,  C22F1/05 ,  C22C21/02 ,  C25D11/16

    CPC分类号： C22C21/08 ,  C22F1/002 ,  C22F1/05 ,  C22C21/02 ,  C25D11/16

    摘要： Described herein is a method of manufacturing an aluminium alloy plate for vacuum chamber elements, valves, or total assemblies, the method comprising the steps of: (a) providing a rolling feedstock material of an Al—Mg—Si aluminium alloy having a composition comprising of, in wt. %, Mg 0.80%-1.05%, Si 0.70%-1.0%, Mn 0.70%-0.90%, Fe up to 0.20%, Zn up to 0.08%, Cu up to 0.05%, Cr up to 0.03%, Ti up to 0.06%, unavoidable impurities and balance aluminium; (b) homogenizing of the rolling feedstock at a temperature in a range of 550-595° C.; (c) hot-rolling of the homogenized rolling feedstock in one or more rolling steps to a hot-rolled plate having a thickness of at least 10 mm; (d) solution heat-treatment (SHT″) of the hot rolled plate at a temperature in a range of 540-590° C.; (e) rapid cooling the SHT plate; (f) stretching of the cooled SHT plate to obtain a permanent elongation from 1-5%; (g) artificial ageing of the stretched plate.

    Transparent and colorless hardcoating films for optical materials with a tunable index of refraction and scratch resistance, as formed from anodic aluminum films
    9.
    发明授权
    Transparent and colorless hardcoating films for optical materials with a tunable index of refraction and scratch resistance, as formed from anodic aluminum films 有权

    公开(公告)号：US11359301B2

    公开(公告)日：2022-06-14

    申请号：US16262338

    申请日：2019-01-30

    申请人： David Roberts Winn

    发明人： David Roberts Winn

    IPC分类号： C25D11/04 ,  C25D11/24 ,  C25D11/00 ,  C25D11/16 ,  G02B1/115 ,  B29C64/20 ,  B33Y30/00

    摘要： The invention relates to a method of processing of materials using a moving interface, the method comprising: providing a working material, the working material comprising a substrate with a metallic film on at least one side of the substrate; providing an energy source adjacent to the working material, where the energy source is electrical current between a cathode and the working material as an anode; providing for relative controlled movement between the working material and the energy source, where the relative controlled movement is a motor attached to the working material via a linkage; activating the energy source such that the energy processes the working material; moving the energy source and/or the working material relative to the other to control the amount of processing of the working material achieved by the energy, where the processing of the working material is anodization; immersing the working material at a controlled speed into an anodizing bath equipped with a cathode; starting anodization of the metallic film at the edge of the metallic film furthest from the anode connection and just below the anodization bath, and immersing the working material into the bath such that the anodization is moved up the metallic film towards the edge nearest the anode connection, resulting in a complete conversion to oxide, except for a non-anodized small metal or conductive edge where the anode voltage is connected to the workpiece.

    MACROSCOPIC TEXTURING FOR ANODIZED AND COATED SURFACES
    10.
    发明申请
    MACROSCOPIC TEXTURING FOR ANODIZED AND COATED SURFACES 有权

    公开(公告)号：US20220139677A1

    公开(公告)日：2022-05-05

    申请号：US17432434

    申请日：2020-02-05

    申请人： Lam Research Corporation

    发明人： Gordon Wen-Yin Peng ,  Adrian Radocea ,  Yu Jiang ,  Mansa Rajagopalan ,  Nicolas Londono

    IPC分类号： H01J37/32 ,  H01L21/683 ,  C23C4/11 ,  C23C4/02 ,  C25D11/16

    摘要： A consumable part for a plasma processing chamber includes a plasma facing side. An engineered surface is formed into the plasma facing side of the consumable part. A plurality of raised features defines the engineered surface, wherein features are arranged in a predefined pattern, wherein each of the plurality of raised features includes a top region having an outer edge and a sidewall. A base surface of the engineered surface is configured to surround each of the plurality of raised features, such that a corresponding sidewall of a corresponding raised feature extends up at an angle from the base surface to a corresponding top region. The consumable part is configured to be installed in the plasma processing chamber. The consumable part is configured to be exposed to a plasma and byproducts of the plasma.