公开(公告)号：US20220139677A1

公开(公告)日：2022-05-05

申请号：US17432434

申请日：2020-02-05

申请人： Lam Research Corporation

发明人： Gordon Wen-Yin Peng ,  Adrian Radocea ,  Yu Jiang ,  Mansa Rajagopalan ,  Nicolas Londono

IPC分类号： H01J37/32 ,  H01L21/683 ,  C23C4/11 ,  C23C4/02 ,  C25D11/16

摘要： A consumable part for a plasma processing chamber includes a plasma facing side. An engineered surface is formed into the plasma facing side of the consumable part. A plurality of raised features defines the engineered surface, wherein features are arranged in a predefined pattern, wherein each of the plurality of raised features includes a top region having an outer edge and a sidewall. A base surface of the engineered surface is configured to surround each of the plurality of raised features, such that a corresponding sidewall of a corresponding raised feature extends up at an angle from the base surface to a corresponding top region. The consumable part is configured to be installed in the plasma processing chamber. The consumable part is configured to be exposed to a plasma and byproducts of the plasma.