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公开(公告)号：US20240337986A1
公开(公告)日：2024-10-10
申请号：US18747167
申请日：2024-06-18
Applicant: Apple Inc.
Inventor： Jozef M. Matlak , Brian S. Tryon , Lijie Bao , Maruwada Sukanya Sharma , Shiva K. Mandepudi , Sonja R. Postak
CPC classification number: G04G17/08 , C23C14/0015 , C23C14/025 , C23C14/0641 , C23C14/0664 , C23C14/35 , C23C28/34
Abstract: An electronic device may include conductive structures such as conductive housing structures. A high-brightness, visible-light-reflecting coating may be formed on the conductive structures. The coating may have adhesion and transition layers and an uppermost coloring layer on the adhesion and transition layers. At least the uppermost coloring layer may be deposited using a high impulse magnetron sputtering (HiPIMS) process. The uppermost coloring layer may include a TiCrN film, a TiCrCN film, a TiCN film, or a metal nitride film that contains Ti, Zr, Hf, or Cr. The coating may exhibit a high-brightness gold color.
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2.发明公开公开(公告)号：US20240287669A1
公开(公告)日：2024-08-29
申请号：US18652130
申请日：2024-05-01
Applicant: Wilsonart LLC
Inventor： Muyuan M. Ma
CPC classification number: C23C14/0688 , B30B15/062 , B32B15/00 , B32B15/01 , B32B15/012 , B32B37/0046 , C23C14/025 , C23C14/067 , C23C14/352
Abstract: A method for coating stainless steel press plates includes preparing the stainless steel press plate for coating and coating the stainless steel press plate with a diboride doped with 1%-5% by weight aluminum to produce a diboride-aluminum coating. The step of coating includes applying the diboride-aluminum coating to a stainless steel press plate using a magnetron sputter coating system.
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公开(公告)号：US20240209493A1
公开(公告)日：2024-06-27
申请号：US18557430
申请日：2022-03-21
Applicant: Hydromecanique Et Frottement
Inventor： Christophe Heau , Maxime Villard
IPC: C23C14/34 , C23C14/00 , C23C14/02 , C23C14/06 , C23C14/35 , C23C14/50 , G21C3/07 , G21C21/02 , H01J37/32 , H01J37/34
CPC classification number: C23C14/345 , C23C14/0036 , C23C14/025 , C23C14/0641 , C23C14/357 , C23C14/505 , G21C3/07 , G21C21/02 , H01J37/3244 , H01J37/3405 , H01J37/3426 , H01J2237/332
Abstract: The invention relates to a method for depositing a chromium-based material from a target onto a metal substrate, by continuous magnetron sputtering, using a plasma generated in a gas.
According to the invention:
the ratio between the flow of gaseous ions directed toward the substrate and the flow of neutral chromium atoms directed toward the substrate is adjusted to between 0.5 and 1.7; and
a bias voltage of between −50V and −100V is applied to the substrates.-
公开(公告)号：US20240197253A1
公开(公告)日：2024-06-20
申请号：US18287536
申请日：2021-12-16
Applicant: ALBITI INC.
Inventor： JUN YOUNG AHN , Eun Hee JANG
CPC classification number: A61B5/685 , A61B5/14532 , C23C14/025 , C23C14/042 , C23C14/205 , C25D3/50 , C25D7/00 , A61B2562/028 , A61B2562/125
Abstract: Disclosed is a microneedle biosensor and a manufacturing method for same, the microneedle biosensor comprising: a working electrode that comprises a circular thin-film first base, a plurality of microneedles protruding vertically upwards from the first base, and first wiring extending from one side of the circumference of the first base; a counter electrode that comprises a second base which is a three-quarter circle strip thin-film that is concentric with the first base and separated by a set distance from the circumference of the first base, a plurality of microneedles protruding vertically upwards from the second base, and second wiring extending from one side of the second base so as to be disposed on a level with the first wiring; and a reference electrode that comprises a third base which is a quarter circle strip thin-film that is separated by a set difference from the other side of the second base, is concentric with the first base and is separated by a set distance from the circumference of the first base, a plurality of microneedles protruding vertically upwards from the third base, and third wiring extending from one side of the third base.
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公开(公告)号：US20240158905A1
公开(公告)日：2024-05-16
申请号：US18546897
申请日：2022-02-16
Applicant: COEURDOR
Inventor： Nicolas BAILLY , Frederic CHEMERY , Etienne FIZAINE , Jean-Marc CATTENOT
CPC classification number: C23C14/025 , C23C14/021 , C23C14/16 , C23C14/34 , C23C14/5853
Abstract: A protective coating for a copper alloy substrate includes a layer of a transition metal, referred to as primer layer, and a corrosion protection layer formed by at least one portion of the primer layer. The primer layer includes the transition metal combined with an oxidized transition metal. A process for depositing the protective coating is by physical vapor deposition (PVD) technology. The substrate is positioned in a chamber, with a target made of a transition metal, the chamber being supplied with various gases. The substrate is dehumidified and descaled. A thin primer layer of transition metal is deposited on substrate and bombarded with a mixture of argon ions and oxygen ions. A corrosion protection layer is formed by oxidizing the transition metal of the primer layer.
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Patent Agency Ranking
公开(公告)号：US20240150887A1
公开(公告)日：2024-05-09
申请号：US18053836
申请日：2022-11-09
Applicant: TRUSVAL TECHNOLOGY CO., LTD.
Inventor： SHIH-PAO CHIEN
CPC classification number: C23C14/3414 , C01B32/16 , C01B32/184 , C01B32/21 , C23C14/021 , C23C14/025 , C23C14/028 , C23C14/0605 , C23C14/35
Abstract: The present invention relates to a method of manufacturing ordered arrangement of graphene-carbon nano tube of metal substrate and composite coatings for carbon deposit. The method comprises the steps of placing both sputtering targets and penetrating fluid into an evacuated penetrating oven; allowing the penetrating fluid to penetrate into the sputtering targets; placing each of the penetrated sputtering targets into an evacuated magnetic control sputtering machine; controlling the cooling water in the evacuated magnetic control sputtering machine, that is, performing an evacuated magnetic control sputtering process on a metal substrate, using the organometallic salt of the penetrating fluid to maintain non-magnetic properties before being decomposed below 150° C.; and decomposing particles of nano-organometallic salts at high temperature area after sputtering and depositing on the metal substrate, as a carbon catalyst, forming a carbon structure layer on the uneven rough parts of the metal substrate with carbon from the sputtering target.
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公开(公告)号：US11905586B2
公开(公告)日：2024-02-20
申请号：US17240075
申请日：2021-04-26
Applicant: AISIN CORPORATION , TOHKEN THERMO TECH CO., LTD
Inventor： Chengji Jin , Hodo Suzuki , Masaki Kajino , Kazuya Kitamura , Naoyuki Omori
CPC classification number: C23C14/025 , C23C14/0605 , C23C14/0635 , C23C14/165 , C23C14/34
Abstract: A low friction wear film includes a chromium layer provided on a surface of a metal substrate, a tungsten carbide layer provided on a surface of the chromium layer, and a diamond-like carbon layer as a top layer provided on a surface of the tungsten carbide layer. The tungsten carbide layer includes a chromium-tungsten carbide gradient layer and a tungsten carbide uniform layer. In the tungsten carbide layer, a tungsten-concentrated layer in which a tungsten simple substance is present is not provided at a boundary between the chromium-tungsten carbide gradient layer and the tungsten carbide uniform layer.
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公开(公告)号：US20240006216A1
公开(公告)日：2024-01-04
申请号：US18255394
申请日：2021-12-02
Applicant: Oerlikon Surface Solutions AG, Pfäffikon
Inventor： Matthew Paul KIRK
IPC: H01L21/683 , H01J37/32 , C23C14/02 , C23C14/35 , C23C16/02
CPC classification number: H01L21/6833 , H01J37/32697 , H01J37/32715 , C23C14/025 , H01J37/32495 , C23C14/35 , C23C16/0281 , H01J2237/3341
Abstract: A device to be used within a plasma etching chamber for the manufacturing of semiconductor components, including providing a body forming the substrate of the device, applying a first coating on the surface of the body, wherein the first coating includes a metal and/or a metal alloy thin film coating layer in order to form a metal coated body, applying a second coating on the metal coated body, wherein the second coating includes a ceramic coating layer, wherein the second coating at least partially overlaps with the first coating.
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公开(公告)号：US20230399735A1
公开(公告)日：2023-12-14
申请号：US18447605
申请日：2023-08-10
Applicant: Medtronic MiniMed, Inc.
Inventor： Kelly Lu , Lea Ann Nygren
CPC classification number: C23C14/14 , C23C14/34 , C23C14/205 , C23C14/025 , C23C14/083 , C23C14/562 , C23C14/08 , A61B5/14532
Abstract: Systems and methods for forming probes for a biosensor. In the systems and methods disclosed herein, a base substrate is provided; and a platinum layer is formed on the base substrate by sputtering platinum in the absence of oxygen. The platinum layer is formed using a sputtering pressure of at least 30 mtorr.
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公开(公告)号：US20230193447A1
公开(公告)日：2023-06-22
申请号：US17555170
申请日：2021-12-17
Applicant: Adam Trexler , Laurie Johansen , Paul Diffendaffer
Inventor： Adam Trexler , Laurie Johansen , Paul Diffendaffer
CPC classification number: C23C14/025 , C23C14/021 , C23C14/14 , C23C14/24 , C23C14/34 , C23C14/5873
Abstract: A precious metallic laminate may include a first transparent substrate, a transparent transition layer deposited on the first transparent substrate, and a metallic layer deposited on the transparent transition layer. The metallic layer may include a precious metal. The laminate may include a second transparent substrate covering the metallic layer.
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