公开(公告)号：US11566319B2

公开(公告)日：2023-01-31

申请号：US15844251

申请日：2017-12-15

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor ,  Biraja Prasad Kanungo ,  Tom K. Cho ,  Vedapuram S. Achutharaman ,  Ying Zhang

IPC分类号： C04B41/89 ,  C04B41/00 ,  C04B41/52 ,  C04B35/505 ,  C04B35/622 ,  C04B41/45 ,  C04B35/00 ,  C23C14/08 ,  C04B41/50 ,  C23C14/46 ,  C23C14/58 ,  H01J37/32 ,  C04B41/87

摘要： An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film consists essentially of 40 mol % to less than 100 mol % of Y2O3, over 0 mol % to 60 mol % of ZrO2, and 0 mol % to 9 mol % of Al2O3.

公开(公告)号：US20200325073A1

公开(公告)日：2020-10-15

申请号：US16912428

申请日：2020-06-25

申请人： Applied Materials, Inc.

发明人： Jennifer Sun ,  Biraja Prasad Kanungo ,  Yikai Chen ,  Vahid Firouzdor

IPC分类号： C04B35/10 ,  C04B35/515 ,  C23C4/04 ,  C23C4/02 ,  C23C4/18 ,  C23C24/10 ,  C23C28/04 ,  C23C4/11 ,  C04B35/488 ,  C04B35/505 ,  C04B35/44 ,  C04B35/50 ,  C04B35/486 ,  C04B35/16

摘要： Disclosed herein are methods for producing an ultra-dense and ultra-smooth ceramic coating. A method includes feeding a slurry of ceramic particles into a plasma sprayer. The plasma sprayer generates a stream of particles directed toward the substrate, forming a ceramic coating on the substrate upon contact.

公开(公告)号：US10730798B2

公开(公告)日：2020-08-04

申请号：US14704742

申请日：2015-05-05

申请人： Applied Materials, Inc.

发明人： Jennifer Sun ,  Biraja Prasad Kanungo ,  Yikai Chen ,  Vahid Firouzdor

IPC分类号： C23C4/02 ,  C23C4/04 ,  C23C4/10 ,  C04B35/10 ,  C04B35/515 ,  C23C4/12 ,  C23C4/18 ,  C23C24/10 ,  C23C28/04 ,  C23C4/11 ,  C04B35/488 ,  C04B35/505 ,  C04B35/44 ,  C04B35/50 ,  C04B35/486 ,  C04B35/16

摘要： Disclosed herein are methods for producing an ultra-dense and ultra-smooth ceramic coating. A method includes feeding a slurry of ceramic particles into a plasma sprayer. The plasma sprayer generates a stream of particles directed toward the substrate, forming a ceramic coating on the substrate upon contact.

公开(公告)号：US20190194817A1

公开(公告)日：2019-06-27

申请号：US16293549

申请日：2019-03-05

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor

IPC分类号： C25D11/34 ,  C25D11/04 ,  C25D11/18 ,  C23C28/00 ,  C23C24/04 ,  C25D11/26 ,  C25D11/16

CPC分类号： C25D11/34 ,  C23C24/04 ,  C23C28/321 ,  C23C28/322 ,  C23C28/345 ,  C23C28/3455 ,  C25D11/04 ,  C25D11/16 ,  C25D11/18 ,  C25D11/26 ,  Y10T428/12736 ,  Y10T428/12743 ,  Y10T428/12757 ,  Y10T428/12764

摘要： An article comprises a component for a manufacturing chamber, a coating on the component, and an anodization layer formed on the coating. The anodization layer has a thickness of about 2-10 mil, comprises a low porosity layer portion having a density of greater than 99% and a porous columnar layer portion having a higher porosity than the low porosity layer portion. The porous columnar layer portion comprises a plurality of columnar nanopores having a diameter of about 10-50 nm.

公开(公告)号：US20180151401A1

公开(公告)日：2018-05-31

申请号：US15874495

申请日：2018-01-18

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Senh Thach ,  Biraja P. Kanungo ,  Vahid Firouzdor

IPC分类号： H01L21/683 ,  H01L21/687

CPC分类号： H01L21/6831 ,  H01L21/6875 ,  H01L21/68757 ,  Y10T156/1041 ,  Y10T428/24322 ,  Y10T428/24997

摘要： A substrate support assembly comprises a ceramic body and a thermally conductive base bonded to a lower surface of the ceramic body. The substrate support assembly further comprises a protective layer covering an upper surface of the ceramic body, wherein the protective layer comprises at least one of yttrium aluminum garnet (YAG) or a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.

公开(公告)号：US09916998B2

公开(公告)日：2018-03-13

申请号：US14086799

申请日：2013-11-21

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Senh Thach ,  Biraja P. Kanungo ,  Vahid Firouzdor

IPC分类号： H01L21/683 ,  H01L21/687

CPC分类号： H01L21/6831 ,  H01L21/6875 ,  H01L21/68757 ,  Y10T156/1041 ,  Y10T428/24322 ,  Y10T428/24997

摘要： A substrate support assembly comprises a ceramic body and a thermally conductive base bonded to a lower surface of the ceramic body. The substrate support assembly further comprises a protective layer covering an upper surface of the ceramic body, wherein the protective layer comprises at least one of yttrium aluminum garnet (YAG) or a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.

公开(公告)号：US20180030589A1

公开(公告)日：2018-02-01

申请号：US15717844

申请日：2017-09-27

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Biraja P. Kanungo ,  Vahid Firouzdor

IPC分类号： C23C14/22 ,  C23C4/134 ,  H01J37/32 ,  C23C14/08 ,  C23C14/46

摘要： A chamber component comprises a body, a first protective layer and a conformal second protective layer over the first protective layer. The first protective layer comprises a plasma resistant ceramic, has a thickness of greater than approximately 50 microns and comprises a plurality of cracks and pores. The conformal second protective layer comprises a plasma resistant rare earth oxide, has a thickness of less than 50 microns, has a porosity of less than 1%, and seals the plurality of cracks and pores of the first protective layer.

公开(公告)号：US20180010235A1

公开(公告)日：2018-01-11

申请号：US15712094

申请日：2017-09-21

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor ,  Biraja Prasad Kanungo ,  Tom K. Cho ,  Vedapuram S. Achutharaman ,  Ying Zhang

IPC分类号： C23C14/08 ,  C04B35/00 ,  C04B35/505 ,  C04B35/622 ,  C04B41/50 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  H01J37/32 ,  C23C14/46 ,  C23C14/58 ,  C04B41/00

CPC分类号： C23C14/088 ,  C04B35/00 ,  C04B35/505 ,  C04B35/62222 ,  C04B41/009 ,  C04B41/4529 ,  C04B41/5045 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C04B2235/3217 ,  C04B2235/3222 ,  C04B2235/3225 ,  C04B2235/3246 ,  C04B2235/3418 ,  C04B2235/3826 ,  C04B2235/3873 ,  C04B2235/428 ,  C04B2235/445 ,  C23C14/08 ,  C23C14/083 ,  C23C14/46 ,  C23C14/5806 ,  H01J37/32477 ,  Y10T428/26 ,  Y10T428/265 ,  C04B35/10 ,  C04B35/50 ,  C04B35/14 ,  C04B35/584 ,  C04B35/565 ,  C04B41/5032 ,  C04B41/5042 ,  C04B41/5035 ,  C04B2103/54

摘要： An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film is selected from a group consisting of an Er—Y composition, an Er—Al—Y composition, an Er—Y—Zr composition, and an Er—Al composition.

公开(公告)号：US09687953B2

公开(公告)日：2017-06-27

申请号：US14318518

申请日：2014-06-27

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor ,  David Koonce ,  Biraja Prasad Kanungo

IPC分类号： B24B31/116 ,  B24B33/02 ,  B24B31/00 ,  B24B5/40

CPC分类号： B24B31/006 ,  B23B35/00 ,  B23B2220/445 ,  B23B2226/18 ,  B24B5/40 ,  B24B31/003 ,  B24B31/116 ,  B24B33/02

摘要： Disclosed herein are systems and methods for polishing internal surfaces of apertures in semiconductor processing chamber components. A method includes providing a ceramic article having at least one aperture, the ceramic article being a component for a semiconductor processing chamber. The method further includes polishing the at least one aperture based on flowing an abrasive media through the at least one aperture of the ceramic article, the abrasive media including a polymer base and a plurality of abrasive particles.

公开(公告)号：US20170130319A1

公开(公告)日：2017-05-11

申请号：US15413198

申请日：2017-01-23

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Biraja P. Kanungo ,  Vahid Firouzdor ,  Ying Zhang

IPC分类号： C23C14/00 ,  C23C14/08 ,  H01J37/32 ,  H01L21/67

CPC分类号： H01L21/67023 ,  B65D43/02 ,  C23C4/01 ,  C23C4/04 ,  C23C4/10 ,  C23C4/11 ,  C23C4/12 ,  C23C4/134 ,  C23C4/14 ,  C23C4/16 ,  C23C14/0015 ,  C23C14/0021 ,  C23C14/0031 ,  C23C14/0036 ,  C23C14/0052 ,  C23C14/0084 ,  C23C14/0094 ,  C23C14/08 ,  C23C14/081 ,  C23C14/083 ,  C23C14/088 ,  H01J37/32477 ,  H01J37/32495 ,  H01J37/32513 ,  H01J2237/334 ,  H01L21/67063 ,  H01L21/67069 ,  H01L21/6708 ,  H01L21/67086 ,  Y10T428/131 ,  Y10T428/1317 ,  Y10T428/139 ,  Y10T428/1393

摘要： A method of manufacturing an article comprises performing ion assisted deposition (IAD) to deposit a protective layer on at least one surface of the article, wherein the protective layer is a plasma resistant rare earth oxide film having a thickness of less than 300 μm and an average surface roughness of 10 micro-inches or less.