- 专利标题： Slurry plasma spray of plasma resistant ceramic coating
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申请号： US14704742申请日： 2015-05-05
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公开(公告)号： US10730798B2公开(公告)日： 2020-08-04
- 发明人: Jennifer Sun , Biraja Prasad Kanungo , Yikai Chen , Vahid Firouzdor
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Lowenstein Sandler LLP
- 主分类号： C23C4/02
- IPC分类号： C23C4/02 ; C23C4/04 ; C23C4/10 ; C04B35/10 ; C04B35/515 ; C23C4/12 ; C23C4/18 ; C23C24/10 ; C23C28/04 ; C23C4/11 ; C04B35/488 ; C04B35/505 ; C04B35/44 ; C04B35/50 ; C04B35/486 ; C04B35/16
摘要：
Disclosed herein are methods for producing an ultra-dense and ultra-smooth ceramic coating. A method includes feeding a slurry of ceramic particles into a plasma sprayer. The plasma sprayer generates a stream of particles directed toward the substrate, forming a ceramic coating on the substrate upon contact.
公开/授权文献
- US20150321964A1 SLURRY PLASMA SPRAY OF PLASMA RESISTANT CERAMIC COATING 公开/授权日：2015-11-12
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