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公开(公告)号：US10818481B2
公开(公告)日：2020-10-27
申请号：US15215382
申请日：2016-07-20
Applicant: APPLIED MATERIALS, INC.
Inventor： Jennifer Sun , Yikai Chen , Biraja Kanungo , Vahid Firouzdor
Abstract: Embodiments involve smart device fabrication for semiconductor processing tools via precision patterning. In one embodiment, a method of manufacturing a semiconductor processing tool component includes providing a substrate of the semiconductor processing tool component, patterning the substrate to form a sensor directly on the substrate, and depositing a top layer over the sensor. The sensor may include, for example, a temperature or strain sensor. The method can also include patterning the substrate to form one or more of: heaters, thermistors, and electrodes on the substrate. In one embodiment, the method involves patterning a surface of the component oriented towards a plasma region inside of the semiconductor processing tool.
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公开(公告)号：US20190157047A1
公开(公告)日：2019-05-23
申请号：US16192610
申请日：2018-11-15
Applicant: Applied Materials, Inc.
Inventor： Yikai Chen , Shyh-Nung Steve Lin
Abstract: A method for forming a ceramic coating on an article includes placing the article into a chamber or spray cell of a plasma spraying system. A first ceramic powder is then fed into the plasma spraying system at a first powder feed rate, and a first layer of a plasma resistant ceramic coating is deposited onto at least one surface of the article in a plasma spray process by the plasma spray system. The powder feed rate is adjusted to a second powder feed rate, and a second layer of the plasma resistant ceramic coating is deposited onto the at least one surface of the article in the plasma spray process by the plasma spray system.
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公开(公告)号：US09420639B2
公开(公告)日：2016-08-16
申请号：US14077043
申请日：2013-11-11
Applicant: Applied Materials, Inc.
Inventor： Jennifer Sun , Yikai Chen , Biraja Kanungo , Vahid Firouzdor
CPC classification number: H01J37/32935 , C23C4/01 , C23C4/134 , H01J37/32495 , H01J37/32522 , H01J37/32724 , H01J2237/244 , H01J2237/332 , H01J2237/334 , H01L21/67069 , H05B1/0233 , H05B3/265 , H05B2203/013
Abstract: Embodiments involve smart device fabrication for semiconductor processing tools via precision patterning. In one embodiment, a method of manufacturing a semiconductor processing tool component includes providing a substrate of the semiconductor processing tool component, patterning the substrate to form a sensor directly on the substrate, and depositing a top layer over the sensor. The sensor may include, for example, a temperature or strain sensor. The method can also include patterning the substrate to form one or more of: heaters, thermistors, and electrodes on the substrate. In one embodiment, the method involves patterning a surface of the component oriented towards a plasma region inside of the semiconductor processing tool.
Abstract translation: 实施例涉及通过精密图案化的半导体加工工具的智能装置制造。 在一个实施例中，制造半导体处理工具部件的方法包括提供半导体加工工具部件的基板，图案化基板以在基板上直接形成传感器，以及在传感器上沉积顶层。 传感器可以包括例如温度或应变传感器。 该方法还可以包括图案化衬底以形成衬底上的一个或多个：加热器，热敏电阻和电极。 在一个实施例中，该方法包括图案化部件的表面朝向半导体处理工具内部的等离子体区域。
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公开(公告)号：US20150321964A1
公开(公告)日：2015-11-12
申请号：US14704742
申请日：2015-05-05
Applicant: Applied Materials, Inc.
Inventor： Jennifer Sun , Biraja Prasad Kanungo , Yikai Chen , Vahid Firouzdor
IPC: C04B35/50 , C04B35/10 , C23C4/04 , C04B35/48 , C23C4/12 , C04B35/505 , C04B35/515
Abstract: Disclosed herein are methods for producing an ultra-dense and ultra-smooth ceramic coating. A method includes feeding a slurry of ceramic particles into a plasma sprayer. The plasma sprayer generates a stream of particles directed toward the substrate, forming a ceramic coating on the substrate upon contact.
Abstract translation: 本文公开了用于生产超致密和超平滑陶瓷涂层的方法。 一种方法包括将陶瓷颗粒的浆料进料到等离子喷涂机中。 等离子体喷雾器产生指向衬底的颗粒流，在接触时在衬底上形成陶瓷涂层。
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公开(公告)号：US11578398B2
公开(公告)日：2023-02-14
申请号：US16794634
申请日：2020-02-19
Applicant: Applied Materials, Inc.
Inventor： Jennifer Y. Sun , Yikai Chen , Biraja Prasad Kanungo
IPC: C23C4/134 , C23C4/11 , C04B35/10 , C04B35/48 , C04B35/505
Abstract: An article includes a body having a plasma-sprayed ceramic coating on a surface thereof. The body can be formed of at one least one of the following materials: Al, Al2O3, AlN, Y2O3, YSZ, or SiC. The plasma-sprayed ceramic coating can include at least one of Y2O3, Y4Al2O9, Y3Al5O12 or a solid-solution of Y2O3 mixed with at least one of ZrO2, Al2O3, HfO2, Er2O3, Nd2O3, Nb2O5, CeO2, Sm2O3 or Yb2O3. The plasma-sprayed ceramic coating can further include splats.
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Patent Agency Ranking
公开(公告)号：US20190136360A1
公开(公告)日：2019-05-09
申请号：US16231139
申请日：2018-12-21
Applicant: Applied Materials, Inc.
Inventor： Jennifer Y. Sun , Yikai Chen , Biraja Prasad Kanungo
IPC: C23C4/134 , C23C4/11 , C04B35/10 , C04B35/505 , C04B35/48
Abstract: A ceramic coating is coated on a body of an article, wherein the ceramic coating includes Y2O3, Y4Al2O9, Y3Al5O12, or a solid-solution of Y2O3 mixed with at least one of ZrO2, Al2O3, HfO2, Er2O3, Nd2O3, Nb2O5, CeO2, Sm2O3 or Yb2O3. The ceramic coating is applied to the body by a method including providing a plasma spraying system having a plasma current in the range of between about 100 A to about 1000 A, positioning a torch standoff of the plasma spraying system a distance from the body between about 60 mm and about 250 mm, flowing a first gas through the plasma spraying system at a rate of between about 30 L/min and about 400 L/min, and plasma spray coating the body to form a ceramic coating, wherein splats of the coating are amorphous and have a pancake shape.
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公开(公告)号：US20180366302A1
公开(公告)日：2018-12-20
申请号：US16109248
申请日：2018-08-22
Applicant: Applied Materials, Inc.
Inventor： Jennifer Y. Sun , Yikai Chen , Biraja P. Kanungo
Abstract: A method of plasma spraying an article comprises providing an article, feeding a liquid precursor solution into a plasma spray deposition system, and generating, with the plasma spray deposition system, a stream directed toward the article. The stream forms a ceramic coating on the article upon contact therewith. The ceramic coating comprises Y2O3 and one or more of ZrO2, Al2O3, Er2O3, Gd2O3, SiO2, or YF3.
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公开(公告)号：US20170301520A1
公开(公告)日：2017-10-19
申请号：US15640274
申请日：2017-06-30
Applicant: Applied Materials, Inc.
Inventor： Jennifer Y. Sun , Yikai Chen , Biraja P. Kanungo
CPC classification number: H01J37/32495 , C23C4/10 , C23C4/11 , C23C4/134 , C23C4/18 , H01J37/32477 , Y10T428/24967 , Y10T428/249981
Abstract: A method of plasma spraying an article comprises inserting the article into a vacuum chamber for a low pressure plasma spraying system. A low pressure plasma spray process is then performed by the low pressure plasma spraying system to form a first plasma resistant layer having a thickness of 20-500 microns and a porosity of over 1%. A plasma spray thin film, plasma spray chemical vapor deposition or plasma spray physical vapor deposition process is then performed by the low pressure plasma spraying system to deposit a second plasma resistant layer on the first plasma resistant layer, the second plasma resistant layer having a thickness of less than 50 microns and a porosity of less than 1%.
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9.发明申请公开(公告)号：US20150075714A1
公开(公告)日：2015-03-19
申请号：US14462271
申请日：2014-08-18
Applicant: Applied Materials, Inc.
Inventor： Jennifer Y. Sun , Yikai Chen , Biraja P. Kanungo
CPC classification number: H01J37/32495 , C23C4/10 , C23C4/11 , C23C4/134 , C23C4/18 , H01J37/32477 , Y10T428/24967 , Y10T428/249981
Abstract: A method for forming a plasma resistant ceramic coating on an article includes placing the article into a chamber or spray cell of a plasma spraying system. A ceramic powder is then fed into the plasma spraying system at a powder feed rate, and a plasma resistant ceramic coating is deposited onto at least one surface of the article in a plasma spray process by the plasma spray system. The plasma spray system is then used to perform an in-situ plasma flame heat treatment of the plasma resistant ceramic coating to form crust on the plasma resistant ceramic coating.
Abstract translation: 在制品上形成耐等离子体陶瓷涂层的方法包括将制品放置在等离子喷涂系统的室或喷雾池中。 然后以粉末进料速率将陶瓷粉末进料到等离子喷涂系统中，并且等离子体喷涂系统以等离子体喷涂方法将等离子体耐磨陶瓷涂层沉积在制品的至少一个表面上。 然后使用等离子喷涂系统进行耐等离子体陶瓷涂层的原位等离子体火焰热处理，以在耐等离子体陶瓷涂层上形成外壳。
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公开(公告)号：US20230141782A1
公开(公告)日：2023-05-11
申请号：US18093442
申请日：2023-01-05
Applicant: Applied Materials, Inc.
Inventor： David Fenwick , Chengtsin Lee , Jennifer Y. Sun , Yikai Chen
CPC classification number: C23C14/0694 , C23C16/4404 , H01J37/32559 , H01J37/32477 , H01J37/3441 , C23C14/083 , C23C14/08 , C23C14/081 , C23C14/082 , C23C14/0021 , C23C14/46 , H01J37/32495 , C23C14/30
Abstract: An article has a body having a protective coating. The protective coating is a thin film that includes a metal oxy-fluoride. The metal oxy-fluoride has an empirical formula of MxOyFz, where M is a metal, y has a value of 0.1 to 1.9 times a value of x and z has a value of 0.1 to 3.9 times the value of x. The protective coating has a thickness of 1 to 30 microns and a porosity of less than 0.1%.
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