公开(公告)号：US09837253B2

公开(公告)日：2017-12-05

申请号：US14813732

申请日：2015-07-30

Applicant: H.C. STARCK INC.

Inventor： Gary Alan Rozak ,  Mark E. Gaydos ,  Patrick Alan Hogan ,  Shuwei Sun

IPC: B22F7/02 ,  H01J37/34 ,  C23C14/58 ,  C23C14/54 ,  C23C14/35 ,  C23C14/34 ,  G06F3/044 ,  C03C17/40 ,  C22C1/04 ,  C22C27/04 ,  C23G1/10 ,  C23G1/20 ,  C23C14/16 ,  C23C14/06 ,  C23C14/14

CPC classification number: H01J37/3429 ,  B22F2998/10 ,  C03C17/40 ,  C22C1/045 ,  C22C27/04 ,  C23C14/0688 ,  C23C14/14 ,  C23C14/16 ,  C23C14/34 ,  C23C14/3407 ,  C23C14/3414 ,  C23C14/3492 ,  C23C14/35 ,  C23C14/548 ,  C23C14/5873 ,  C23G1/106 ,  C23G1/205 ,  G06F3/044 ,  G06F2203/04103 ,  Y10T428/12014 ,  Y10T428/12021 ,  Y10T428/12597 ,  Y10T428/31678 ,  B22F1/0003 ,  B22F3/02 ,  B22F3/18

Abstract: The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of titanium, and a third metal element of chromium or tantalum, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in titanium, and a phase that is rich in the third metal element.

公开(公告)号：US20160327817A1

公开(公告)日：2016-11-10

申请号：US15110700

申请日：2015-01-21

Applicant: ATSUMITEC CO., LTD.

Inventor： Naoki Uchiyama ,  Tomomi Kanai

IPC: G02F1/01

CPC classification number: G02F1/0147 ,  C03C17/36 ,  C03C17/3607 ,  C03C17/3615 ,  C03C17/3618 ,  C03C17/3642 ,  C03C17/3649 ,  C03C17/3657 ,  C03C17/3681 ,  C03C17/38 ,  C03C17/40 ,  E06B3/6722 ,  G02F1/0121 ,  G02F1/153 ,  G02F1/163 ,  H01L35/28 ,  H01M8/00 ,  H01M8/06 ,  H01M2250/10 ,  H05B3/86 ,  Y02B90/14

Abstract: To provide a self-dimming system including: a main body section which is configured by a pair of transparent substrates arranged to face each other and to be separated from each other, and a frame body holding the pair of transparent substrates and forming a gap together with the pair of transparent substrates; a dimming section which is arranged in the gap and provided with a dimming element whose optical properties are reversibly changed by hydrogenation and dehydrogenation of the dimming element; a power-generating equipment which is arranged in the main body section; a hydrogen suction and discharge section which, when receiving electric power generated in the power-generating equipment, generates hydrogen by performing electrolysis and supplies the hydrogen to the gap and which, when not receiving electric power generated in the power-generating equipment, generates electric power by using the hydrogen in the gap; and control means which controls whether or not electric power generated in the power-generating equipment is supplied to the hydrogen suction and discharge section.

Abstract translation: 本发明提供一种自调光系统，包括：主体部分，由一对透明基板构成，彼此相对地彼此分离并彼此分离;框架体，保持一对透明基板并形成间隙 与一对透明基板; 调光部分布置在间隙中并具有通过调光元件的氢化和脱氢可逆地改变其光学特性的调光元件; 发电设备，其布置在主体部分中; 氢吸入和排出部分，当接收到在发电设备中产生的电力时，通过进行电解产生氢气并将氢气供应到间隙，并且当不接收在发电设备中产生的电力时产生电 通过使用氢气在间隙中的功率; 以及控制装置，其控制发电设备中产生的电力是否被供应到氢吸入和排出部分。

公开(公告)号：US09448345B2

公开(公告)日：2016-09-20

申请号：US13725126

申请日：2012-12-21

Applicant: Intermolecular Inc. ,  Guardian Industries Corp.

Inventor： Mohd Fadzli Anwar Hassan ,  Brent Boyce ,  Guowen Ding ,  Minh Huu Le ,  Zhi-Wen Wen Sun ,  Yu Wang ,  Yongli Xu

IPC: G02B5/28 ,  F21V9/00 ,  G02B5/20 ,  C03C17/36

CPC classification number: G02B5/208 ,  C03C17/36 ,  C03C17/3644 ,  C03C17/3649 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/40 ,  G02B5/282

Abstract: A method for making low emissivity panels, including control the composition of a barrier layer formed on a thin conductive silver layer. The barrier structure can include an alloy of a first element having high oxygen affinity with a second element having low oxygen affinity. The first element can include Ta, Nb, Zr, Hf, Mn, Y, Si, and Ti, and the second element can include Ru, Ni, Co, Mo, and W, which can have low oxygen affinity property. The alloy barrier layer can reduce optical absorption in the visible range, can provide color-neutral product, and can improve adhesion to the silver layer.

Abstract translation: 一种制造低发射率面板的方法，包括控制形成在薄导电银层上的阻挡层的组成。 阻挡结构可以包括具有高氧亲和力的第一元素与具有低氧亲合力的第二元素的合金。 第一元素可以包括Ta，Nb，Zr，Hf，Mn，Y，Si和Ti，第二元素可以包括可以具有低氧亲和性的Ru，Ni，Co，Mo和W。 合金阻挡层可以减少可见光范围内的光吸收，可以提供颜色中性的产品，并可以提高对银层的粘附性。

公开(公告)号：US09238590B2

公开(公告)日：2016-01-19

申请号：US14204009

申请日：2014-03-11

Applicant: CARL ZEISS SMT GmbH

Inventor： Wilfried Clauss

IPC: C03C23/00 ,  C03C17/00 ,  B05D3/06 ,  C03B32/00 ,  C03C17/40 ,  G02B1/12 ,  G02B5/08 ,  G02B7/18 ,  G03F7/20 ,  G21K1/06

CPC classification number: C03C23/0005 ,  C03B32/005 ,  C03B2201/42 ,  C03C17/00 ,  C03C17/40 ,  C03C2218/31 ,  G02B1/12 ,  G02B5/0891 ,  G02B7/181 ,  G03F7/70316 ,  G03F7/7095 ,  G21K1/062

Abstract: A method for the production of a mirror element (10) that has a reflective coating (10a) for the EUV wavelength range and a substrate (10b). The substrate (10b) is pre-compacted by hot isostatic pressing, and the reflective coating (10a) is applied to the pre-compacted substrate (10b). In the method, either the pre-compacting of the substrate (10b) is performed until a saturation value of the compaction of the substrate (10b) by long-term EUV irradiation is reached, or, for further compaction, the pre-compacted substrate (10b) is irradiated, preferably homogeneously, with ions (16) and/or with electrons in a surface region (15) in which the coating (10a) has been or will be applied. A mirror element (10) for the EUV wavelength range associated with the method has a substrate (10b) pre-compacted by hot isostatic pressing. Such a mirror element (10) is suitable to be provided in an EUV projection exposure system.

Abstract translation: 一种用于生产具有用于EUV波长范围的反射涂层（10a）的反射镜元件（10）的方法和一种基板（10b）。 基板（10b）通过热等静压进行预压实，并将反射涂层（10a）施加到预压实的基板（10b）上。 在该方法中，进行基板（10b）的预压实，直到达到通过长期EUV照射的基板（10b）的压实的饱和值，或者为了进一步压缩，预压实基板 （10b）在涂层（10a）已经或将被施加的表面区域（15）中与离子（16）和/或电子被优选均匀地照射。 用于与该方法相关联的EUV波长范围的镜元件（10）具有通过热等静压预压制的基底（10b）。 这种镜子元件（10）适合于设置在EUV投影曝光系统中。

公开(公告)号：US20150185370A1

公开(公告)日：2015-07-02

申请号：US14657279

申请日：2015-03-13

Applicant: Trustees of Boston University

Inventor： Bjoern Markus Reinhard ,  Luca Dal Negro

IPC: G02B5/00 ,  G01N21/65 ,  G01N21/01

CPC classification number: G02B5/008 ,  B82Y30/00 ,  C03C17/40 ,  C03C2217/255 ,  C03C2217/425 ,  G01N21/01 ,  G01N21/658 ,  G01N2201/02 ,  Y10T428/12104 ,  Y10T428/24909

Abstract: Defined nanoparticle cluster arrays (NCAs) with dimensions up to 25.4 μm square are fabricated on a 10 nm gold film using template guided self-assembly. Structural parameters are precisely controlled, allowing systematic variation of the number of nanoparticles in the clusters (n) and edge to edge separation (Λ) between 1

Abstract translation: 使用模板引导的自组装在10nm金膜上制造尺寸高达25.4μm正方形的定义的纳米颗粒簇阵列（NCAs）。 结构参数被精确控制，允许分别在1

公开(公告)号：US20140199494A1

公开(公告)日：2014-07-17

申请号：US14215941

申请日：2014-03-17

Applicant: Corning Incorporated

Inventor： Michael Lucien Genier

IPC: C03C23/00 ,  B24B1/00 ,  C03C17/34

CPC classification number: C03C23/0005 ,  B24B1/00 ,  B82Y10/00 ,  B82Y40/00 ,  C03C17/3482 ,  C03C17/40 ,  C03C23/002 ,  C03C2218/31 ,  G03F1/24 ,  G03F7/70316 ,  G03F7/70958 ,  G21K1/062 ,  Y10T428/24975

Abstract: The present disclosure is directed to improved silica-titania glass articles intended for use in EUV or other high energy reflective optic systems, and to a process for producing such improved silica-titania articles. The improved silica-titania glass articles provide a more stable surface for the coatings that are used in the making of reflective optical elements for EUV applications. The stable surface is provided by densification of at least one face of the silica-titania article, the densification being accomplished by the use accelerated ions, neutrons, electrons and photons (γ-ray, X-ray or DUV lasers). After densification, the densified face of the silica-titania article can be coated with a multilayer reflective coating. The preferred reflective coating is a multilayer Mo/Si coating

Abstract translation: 本公开涉及旨在用于EUV或其它高能反射光学系统的改进的二氧化硅 - 二氧化钛玻璃制品，以及用于生产这种改进的二氧化硅 - 二氧化钛制品的方法。 改进的二氧化硅 - 二氧化钛玻璃制品为用于制造用于EUV应用的反射光学元件的涂层提供更稳定的表面。 通过二氧化硅 - 二氧化钛制品的至少一个表面的致密化提供稳定的表面，通过使用加速的离子，中子，电子和光子（γ射线，X射线或DUV激光）来实现致密化。 在致密化之后，二氧化硅 - 二氧化钛制品的致密表面可以涂覆多层反射涂层。 优选的反射涂层是多层Mo / Si涂层

公开(公告)号：US20140113158A1

公开(公告)日：2014-04-24

申请号：US14116810

申请日：2012-04-17

Applicant: Frank Brüning ,  Birgit Beck ,  Bexy Dosse ,  Johannes Etzkorn

Inventor： Frank Brüning ,  Birgit Beck ,  Bexy Dosse ,  Johannes Etzkorn

IPC: C03C17/40 ,  C03C17/10

CPC classification number: C03C17/40 ,  C03C17/10 ,  C23C18/1889 ,  C23C18/40 ,  Y10T428/12597

Abstract: The present invention discloses a method for electroless plating of a metal or metal alloy onto a metal or a metal alloy structure comprising a metal such as molybdenum or titanium and alloys containing such metals. The method comprises the steps of activation, treatment in an aqueous solution comprising at least one nitrogen-containing compound or a hydroxy carboxylic acid and electroless plating of a metal or metal alloy.

Abstract translation: 本发明公开了一种将金属或金属合金化学镀在金属或金属合金结构上的方法，所述金属或金属合金结构包括诸如钼或钛的金属和含有这些金属的合金。 该方法包括在包含至少一种含氮化合物或羟基羧酸的水溶液中进行活化，处理金属或金属合金的化学镀的步骤。

公开(公告)号：US08668787B2

公开(公告)日：2014-03-11

申请号：US12882413

申请日：2010-09-15

Applicant: Atsushi Watanabe

Inventor： Atsushi Watanabe

IPC: C23C14/34 ,  C22C5/06

CPC classification number: C23C14/3414 ,  C03C17/09 ,  C03C17/36 ,  C03C17/3647 ,  C03C17/3663 ,  C03C17/3671 ,  C03C17/3676 ,  C03C17/40 ,  C22C5/06 ,  C23C14/185 ,  C23C14/58 ,  C23C14/5806 ,  C23C14/5866

Abstract: It is an object of the present invention to provide a Ag—Pd—Cu—Ge type silver alloy which can form a reflective electrode film having such two characteristics that it is very reduced in the lowering of reflectance caused by thermal deterioration and has resistant to yellowing caused by sulfurization even after a heating step in a process of producing a color liquid crystal display. The silver alloy according to the present invention includes a composition containing at least four elements including Ag as its major component, 0.10 to 2.89 wt % of Pd, 0.10 to 2.89 wt % of Cu and 0.01 to 1.50 wt % of Ge, and the total amount of Pd, Cu and Ge is 0.21 to 3.00 wt %.

Abstract translation: 本发明的目的是提供一种Ag-Pd-Cu-Ge型银合金，其可以形成具有这样两个特性的反射电极膜，其在由热劣化引起的反射率的降低中被极大地降低，并且具有耐 即使在制造彩色液晶显示器的过程中的加热步骤之后，由硫化引起的黄变。 根据本发明的银合金包括含有至少四种元素的组合物，包括Ag作为其主要成分，0.10至2.89重量％的Pd，0.10至2.89重量％的Cu和0.01至1.50重量％的Ge， Pd，Cu和Ge的含量为0.21〜3.00重量％。

公开(公告)号：US08526104B2

公开(公告)日：2013-09-03

申请号：US13081966

申请日：2011-04-07

Applicant: Horst Schreiber ,  Jue Wang

Inventor： Horst Schreiber ,  Jue Wang

IPC: G02B5/08 ,  G02B5/28 ,  C03C17/36

CPC classification number: G02B5/283 ,  B82Y10/00 ,  B82Y40/00 ,  C03C17/3636 ,  C03C17/40 ,  C03C2218/32 ,  C23C14/22 ,  C23C14/5833 ,  C23C14/5873 ,  G02B5/0891 ,  G03F1/24

Abstract: The disclosure is directed to multilayer Mo/Si coatings for reflective mirrors used in extreme ultraviolet lithographic systems and to a method of making such mirrors using plasma ion assisted deposition (PIAD) techniques. The coating are deposited on a substrate suitable for EUV lithography, and are Mo/Si coating consisting of 40-100 Mo/Si periods, each period consisting on a Mo layer followed by a Si layer. Each of the individual Mo and Si layers is deposited to a specified or target thickness in the range of 2 nm to 5 nm, and the thicknesses are controlled to ±0.1 nm. A plasma from a plasma source is used to densify and smooth the substrate prior to deposition of the coating, and each layer of the coating is plasma densified and smoothed.

Abstract translation: 本公开涉及用于极紫外光刻系统的反射镜的多层Mo / Si涂层以及使用等离子体离子辅助沉积（PIAD）技术制造这种反射镜的方法。 涂层沉积在适用于EUV光刻的基板上，并且是由40-100Mo / Si周期组成的Mo / Si涂层，每个周期由Mo层和Si层组成。 将各个Mo和Si层分别沉积到2nm至5nm范围内的规定或目标厚度，并将其厚度控制在±0.1nm。 使用来自等离子体源的等离子体在沉积涂层之前使衬底致密化和平滑化，并且涂层的每层是等离子体致密化和平滑化的。

公开(公告)号：US20130224422A1

公开(公告)日：2013-08-29

申请号：US13857508

申请日：2013-04-05

Applicant: H.C. STARCK, INC.

Inventor： Gary Alan Rozak ,  Mark E. Gaydos ,  Patrick Alan Hogan ,  Shuwei Sun

IPC: C23C14/34

CPC classification number: H01J37/3429 ,  B22F2998/10 ,  C03C17/40 ,  C22C1/045 ,  C22C27/04 ,  C23C14/0688 ,  C23C14/14 ,  C23C14/16 ,  C23C14/34 ,  C23C14/3407 ,  C23C14/3414 ,  C23C14/3492 ,  C23C14/35 ,  C23C14/548 ,  C23C14/5873 ,  C23G1/106 ,  C23G1/205 ,  G06F3/044 ,  G06F2203/04103 ,  Y10T428/12014 ,  Y10T428/12021 ,  Y10T428/12597 ,  Y10T428/31678 ,  B22F1/0003 ,  B22F3/02 ,  B22F3/18

Abstract: The invention relates to sputter targets and methods for depositing a layer from a sputter target. The method preferably includes the steps of: placing a sputter target in a vacuum chamber; placing a substrate having a substrate surface in the vacuum chamber; reducing the pressure in the vacuum chamber to about 100 Torr or less; removing atoms from the surface of the sputter target white the sputter target is in the vacuum chamber (e.g., using a magnetic field and/or an electric field). The deposited layer preferably includes a molybdenum containing alloy including about 50 atomic percent or more molybdenum, 0.1 to 45 atomic percent titanium; and 0.1 to 40 atomic percent of a third metal element that is tantalum or chromium.

Abstract translation: 本发明涉及用于从溅射靶沉积层的溅射靶和方法。 该方法优选包括以下步骤：将溅射靶放置在真空室中; 将具有基板表面的基板放置在所述真空室中; 将真空室中的压力降低至约100托或更低; 从溅射靶的表面去除原子时，溅射靶在真空室中（例如，使用磁场和/或电场）。 沉积层优选包括含钼的合金，包括约50原子％或更多的钼，0.1至45原子％的钛; 和0.1〜40原子％的作为钽或铬的第三金属元素。