Ion vapor deposition of aluminum on non-metallic materials

    公开(公告)号:US09909207B1

    公开(公告)日:2018-03-06

    申请号:US14828708

    申请日:2015-08-18

    发明人: Timothy Cranford

    摘要: A process to deposit a metallic coating on a non-metallic substrate by ion vapor deposition. The substrate is inserted into a stream of ions and vapor of the coating with a first side of the substrate facing a first electric grid. The substrate is at the same voltage potential as the first electric grid and a primer coating is deposited on the first side. The primer coated first side is next coated to a desired thickness by insertion into the ion stream with the substrate at a negative potential relative to the first grid. The substrate is then rotated so the second side is facing the first grid with the substrate at a negative potential relative the first grid for a time effective to deposit the coating to a desired thickness. One composite material is a laser sintered thermoplastic substrate with an aluminum or an aluminum base alloy coating.