Method for forming wiring on insulating resin layer
    8.
    发明授权
    Method for forming wiring on insulating resin layer 有权
    在绝缘树脂层上形成布线的方法

    公开(公告)号:US07955454B2

    公开(公告)日:2011-06-07

    申请号:US11516737

    申请日:2006-09-07

    摘要: The method for forming wiring includes: laminating a thermosetting resin film and a metallic foil on an insulating substrate where base-layer wiring is formed, a mat surface of the metallic foil facing the resin film, pressing the film and the foil with application of heat; forming an opening in the metallic foil to expose a part of the insulating resin layer in which a via hole is to be formed; forming the via hole in the insulating resin layer by using as a mask the metallic foil; performing a desmear process of the via hole via the opening of the metallic foil; removing the metallic foil; forming an electroless-plated layer that covers the top surface of the insulating resin layer, a side surface of the via hole and a top surface of the base-layer wiring; and forming wiring including an electroplated layer on the electroless-plated layer.

    摘要翻译: 形成布线的方法包括:在形成基底布线的绝缘基板上层叠热固性树脂膜和金属箔,金属箔的面向树脂膜的垫表面,施加热量来压制膜和箔 ; 在所述金属箔中形成开口以暴露要形成通孔的绝缘树脂层的一部分; 通过使用金属箔作为掩模在绝缘树脂层中形成通孔; 经由金属箔的开口进行通孔的去污处理; 去除金属箔; 形成覆盖绝缘树脂层的顶面,通孔的侧面和基底布线的顶面的无电镀层; 以及在所述化学镀层上形成包括电镀层的布线。

    Method for forming wiring on insulating resin layer
    10.
    发明申请
    Method for forming wiring on insulating resin layer 有权
    在绝缘树脂层上形成布线的方法

    公开(公告)号:US20070051459A1

    公开(公告)日:2007-03-08

    申请号:US11516737

    申请日:2006-09-07

    IPC分类号: H05K3/46 B32B38/04 B32B38/00

    摘要: The method for forming wiring includes: laminating a thermosetting resin film in a semi-cured state and a metallic foil in this order on an insulating substrate where base-layer wiring is formed, a mat surface of the metallic foil facing the resin film, pressing the film and the foil with application of heat; forming an opening in the metallic foil so as to expose a part of the insulating resin layer in which a via hole is to be formed; forming the via hole in the insulating resin layer by irradiating high-energy beams on to insulating resin layer by using as a mask the metallic foil in which the opening is formed; performing a desmear process of the via hole via the opening of the metallic foil; removing the metallic foil by etching; forming an electroless-plated layer that continuously covers the top surface of the insulating resin layer, a side surface of the via hole and a top surface of the base-layer wiring corresponding to the bottom of the via hole; and forming wiring including an electroplated layer on the electroless-plated layer by a semi-additive process.

    摘要翻译: 形成布线的方法包括:在形成基底布线的绝缘基板上依次层叠半固化状态的热固性树脂膜和金属箔,金属箔的面向树脂膜的垫表面,压制 薄膜和箔片应用热量; 在金属箔中形成开口以露出要形成通孔的绝缘树脂层的一部分; 通过使用形成开口的金属箔作为掩模,将高能束照射到绝缘树脂层上,从而在绝缘树脂层中形成通孔; 经由金属箔的开口进行通孔的去污处理; 通过蚀刻去除金属箔; 形成连续地覆盖绝缘树脂层的顶面,通路孔的侧面和与通孔的底部对应的基底布线的顶面的无电解镀层; 以及通过半添加工艺在所述化学镀层上形成包括电镀层的布线。