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公开(公告)号：US10295454B2
公开(公告)日：2019-05-21
申请号：US15786450
申请日：2017-10-17
Applicant: The University of Tokyo , NIKON CORPORATION
Inventor： Takanori Ichiki , Kuno Suzuki , Daishi Tanaka
Abstract: A microparticle detection system includes a stage unit including a mounting surface on which a fluid device having a flow path through which a sample containing microparticles is movable is capable of being mounted, an emission unit configured to emit illumination light to the flow path, an imaging unit configured to image scattered light generated from microparticles in the sample when illumination light is emitted, an identification unit configured to identify the microparticles included in the image for each of the microparticles on the basis of the image captured by the imaging unit, a particle size determination unit configured to determine a particle size of the microparticle for each of the microparticles identified by the identification unit, a zeta potential determination unit configured to determine a zeta potential of the microparticle for each of the microparticles identified by the identification unit, and a correlation unit configured to associate the particle size for each of the microparticles determined by the particle size determination unit with the zeta potential for each of the microparticles determined by the zeta potential determination unit for each of the microparticles.
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公开(公告)号：US10113948B2
公开(公告)日：2018-10-30
申请号：US15490727
申请日：2017-04-18
Applicant: The University of Tokyo , NIKON CORPORATION
Inventor： Takanori Ichiki , Kuno Suzuki , Daishi Tanaka , Jiro Inoue , Kazuya Ota
Abstract: A particle detection method in which particles in a sample are detected includes: a mounting step of mounting, on a stage portion, a fluid device including a channel through which the particles can move; an irradiation step of irradiating the channel with illumination light; and a detection step of detecting scattered light generated from the particles by irradiation with the illumination light. In the irradiation step, the illumination light is converged such as to enter the channel by passing through, among side surfaces of the channel, only the first side surface that faces an illumination light incident direction.
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公开(公告)号：US20180100793A1
公开(公告)日：2018-04-12
申请号：US15786450
申请日：2017-10-17
Applicant: The University of Tokyo , Nikon Corporation
Inventor： Takanori Ichiki , Kuno Suzuki , Daishi Tanaka
CPC classification number: G01N15/14 , G01N15/02 , G01N15/0227 , G01N15/1429 , G01N15/1484 , G01N27/26 , G01N33/53 , G01N2015/0053 , G01N2015/1006 , G01N2015/1075 , G01N2015/1486 , G01N2015/1493
Abstract: A microparticle detection system includes a stage unit including a mounting surface on which a fluid device having a flow path through which a sample containing microparticles is movable is capable of being mounted, an emission unit configured to emit illumination light to the flow path, an imaging unit configured to image scattered light generated from microparticles in the sample when illumination light is emitted, an identification unit configured to identify the microparticles included in the image for each of the microparticles on the basis of the image captured by the imaging unit, a particle size determination unit configured to determine a particle size of the microparticle for each of the microparticles identified by the identification unit, a zeta potential determination unit configured to determine a zeta potential of the microparticle for each of the microparticles identified by the identification unit, and a correlation unit configured to associate the particle size for each of the microparticles determined by the particle size determination unit with the zeta potential for each of the microparticles determined by the zeta potential determination unit for each of the microparticles.
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Patent Agency Ranking
4.发明授权Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine 有权在浸没式光刻机中的晶片更换期间将浸没流体保持在光学组件附近的装置和方法公开(公告)号：US09217933B2
公开(公告)日：2015-12-22
申请号：US14262058
申请日：2014-04-25
Applicant: NIKON CORPORATION
Inventor： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon , Daishi Tanaka
CPC classification number: G03F7/70341 , G03F7/70733
Abstract: A lithographic projection apparatus includes a stage assembly having a substrate table on which a substrate is supported and exposed with an exposure beam from a final optical element of a projection optical assembly through an immersion liquid. A confinement member encircles a portion of a path of the exposure beam and has an aperture through which the exposure beam is projected. A movable member is movable in a space between the confinement member and the substrate, the substrate table, or both, such that a first portion of the space is located between a first surface of the movable member and the confinement member, and a second portion of the space is located between a second surface of the movable member and the substrate, the substrate table, or both.
Abstract translation: 光刻投影装置包括具有基板台的载台组件，基板被支撑并且通过浸没液体从投影光学组件的最终光学元件的曝光光束暴露在基板台上。 限制构件环绕曝光光束的路径的一部分并且具有曝光光束投射的孔。 可动构件可在限制构件与衬底，衬底台或两者之间的空间中移动，使得空间的第一部分位于可动构件的第一表面和限制构件之间，第二部分 的空间位于可移动部件的第二表面和基板，基板台之间或两者之间。
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公开(公告)号：US10018552B2
公开(公告)日：2018-07-10
申请号：US15210158
申请日：2016-07-14
Applicant: NIKON CORPORATION
Inventor： Daishi Tanaka , Hisao Osawa , Kuno Suzuki
CPC classification number: G01N15/1459 , G01N15/00 , G01N15/1463 , G01N15/1468 , G01N21/53 , G01N27/44721 , G01N2015/0003 , G01N2015/0038 , G01N2015/0065 , G01N2015/1075 , G01N2021/473 , G01N2021/4797 , G01N2201/12
Abstract: A particle analysis apparatus includes: an acquisition unit that acquires a plurality of images each captured at a different time in each of which a particle moving in a predetermined direction in a medium is imaged; and a determination unit that determines, based on a movement amount of a particle due to Brownian motion in the medium, whether or not an image of a first particle included in an image captured at a first time of the plurality of images acquired by the acquisition unit and an image of a second particle included in an image captured at a second time which is different from the first time of the plurality of images acquired by the acquisition unit are images indicating the same particle.
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6.发明授权Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate 有权浸没式光刻设备和方法，在浸没液体限制构件和衬底之间具有可移动的液体转向器公开(公告)号：US09176394B2
公开(公告)日：2015-11-03
申请号：US14082739
申请日：2013-11-18
Applicant: NIKON CORPORATION
Inventor： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani , Daishi Tanaka
CPC classification number: G03F7/70341 , G03B27/52
Abstract: An immersion lithography apparatus that includes a substrate holder on which a substrate is held, a projection system having a final optical element and that projects an exposure beam onto the substrate through an immersion liquid, and a liquid confinement member having an aperture through which the exposure beam is projected, a lower surface including a non-fluid removal area surrounding the aperture, and a liquid recovery outlet from which the immersion liquid is recovered, also includes a movable member. The movable member is movable relative to the liquid confinement member in a substantially horizontal direction, and has an opening through which the exposure beam is projected. The movable member has upper and lower surfaces that surround the opening, and is movable while a portion of the upper surface faces the non-fluid removal area in the lower surface of the liquid confinement member.
Abstract translation: 一种浸没式光刻设备，其包括其上保持有基板的基板保持器，具有最终光学元件的投影系统，并且通过浸没液体将曝光光束投影到所述基板上;以及液体限制部件， 射束，包括围绕孔的非流体去除区域的下表面和回收浸液的液体回收出口也包括可移动构件。 可移动部件在大致水平的方向上相对于液体限制部件是可移动的，并且具有暴露光束投射的开口。 可移动部件具有围绕开口的上表面和下表面，并且在上表面的一部分面向液体限制部件的下表面中的非流体去除区域时可移动。
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7.发明授权Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine 有权在浸没式光刻机中的晶片更换期间将浸没流体保持在光学组件附近的装置和方法公开(公告)号：US08743343B2
公开(公告)日：2014-06-03
申请号：US13754111
申请日：2013-01-30
Applicant: Nikon Corporation
Inventor： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon , Daishi Tanaka
CPC classification number: G03F7/70341 , G03F7/70733
Abstract: A lithographic projection apparatus includes a projection optical assembly having a final optical element, a stage assembly including a substrate table on which a substrate is supported, the substrate supported by the substrate table being exposed with an exposure beam from the final optical element of the projection optical assembly through an immersion liquid, a confinement member which encircles a portion of a path of the exposure beam, and a movable member which is movable in a space between the confinement member and the substrate, the substrate table, or both, the space being divided by the movable member into a first portion between the confinement member and the movable member and a second portion between the movable member and the substrate, the substrate table, or both. The movable member has a recovery outlet from which the immersion liquid in the second portion is removed.
Abstract translation: 平版印刷投影设备包括具有最终光学元件的投影光学组件，舞台组件，其包括衬底台，支撑衬底，由衬底台支撑的衬底用来自突起的最终光学元件的曝光光束曝光 通过浸没液体的光学组件，围绕曝光束的路径的一部分的限制构件，以及可移动构件，其可在限制构件和衬底，衬底台或两者之间的空间中移动，空间为 由可动构件分成限制构件和可动构件之间的第一部分和可移动构件与衬底之间的第二部分，衬底台或两者。 可移动部件具有回收出口，第二部分中的浸没液体从该回收口移除。
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公开(公告)号：US12067655B2
公开(公告)日：2024-08-20
申请号：US17576054
申请日：2022-01-14
Applicant: NIKON CORPORATION
Inventor： Yasushi Tanabe , Daishi Tanaka , Makoto Ishida , Mariko Mukai
CPC classification number: G06T11/60 , A61B3/102 , A61B3/12 , A61B5/0035 , A61B5/004 , G06T19/00 , G06T2210/41
Abstract: An image processing method includes acquiring a three-dimensional image of a subject eye and a two-dimensional image of the subject eye, specifying a first reference point in the three-dimensional image, specifying a second reference point in the two-dimensional image, and generating a superposed image. In the superposed image, the first reference point in the three-dimensional image is coordinated with the second reference point in the two-dimensional image and the two-dimensional image is superposed with at least a portion of the three-dimensional image.
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