公开(公告)号：US09547243B2

公开(公告)日：2017-01-17

申请号：US14519573

申请日：2014-10-21

Applicant: NIKON CORPORATION

Inventor： Alex Ka Tim Poon ,  Leonard Wai Fung Kho

IPC: G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70858

Abstract: An immersion lithography system and method exposes a substrate through a liquid. The substrate is exposed through the liquid, which is provided between a final optical element of a projection lens and the substrate. The liquid is recovered from an upper surface of the substrate via a recovery opening of an immersion apparatus under which the substrate is positioned, the immersion apparatus being disposed around the final optical element of the projection lens. The a pressure for recovering the liquid from the upper surface of the substrate via the recovery opening is controlled by a pressure control system, the pressure control system having a first tank connected to the recovery opening via a recovery flow line and a vacuum regulator to control a pressure in the first tank.

Abstract translation: 浸没式光刻系统和方法通过液体暴露基底。 衬底通过设置在投影透镜的最终光学元件和衬底之间的液体曝光。 液体通过浸没设备的回收开口从基板的上表面回收，浸没设备的基板定位在该开口处，浸没设备围绕投影透镜的最终光学元件设置。 经由回收开口从基板的上表面回收液体的压力由压力控制系统控制，该压力控制系统具有通过回收流路连接到回收口的第一储罐和用于控制的回收管线 在第一个坦克的压力。

公开(公告)号：US09329492B2

公开(公告)日：2016-05-03

申请号：US13929199

申请日：2013-06-27

Applicant: NIKON CORPORATION

Inventor： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Derek Coon

IPC: G03B27/52 ,  G03B27/68 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes an aperture through which a patterned image is projected, an outlet, a first chamber into which the immersion liquid is recovered through the outlet, and a second chamber into which the immersion liquid is recovered through a porous member from the first chamber. The porous member has a first surface contacting the first chamber and a second surface contacting the second chamber. A vertical position of a first portion of the first surface is different from a vertical position of a second portion of the first surface.

Abstract translation: 浸没液体限制装置将浸没液体限制在浸没式光刻系统中包括投影系统和曝光对象之间的间隙的浸没区域中。 该设备还从浸没区域中恢复浸没液体。 该装置包括一个孔，图案化图像通过该孔，出口，浸入液体通过出口回收到其中的第一室，以及第二室，浸没液通过多孔构件从第一室回收到第二室中。 多孔构件具有接触第一室的第一表面和接触第二室的第二表面。 第一表面的第一部分的垂直位置不同于第一表面的第二部分的垂直位置。

公开(公告)号：US09217933B2

公开(公告)日：2015-12-22

申请号：US14262058

申请日：2014-04-25

Applicant: NIKON CORPORATION

Inventor： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Gaurav Keswani ,  Derek Coon ,  Daishi Tanaka

IPC: G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70733

Abstract: A lithographic projection apparatus includes a stage assembly having a substrate table on which a substrate is supported and exposed with an exposure beam from a final optical element of a projection optical assembly through an immersion liquid. A confinement member encircles a portion of a path of the exposure beam and has an aperture through which the exposure beam is projected. A movable member is movable in a space between the confinement member and the substrate, the substrate table, or both, such that a first portion of the space is located between a first surface of the movable member and the confinement member, and a second portion of the space is located between a second surface of the movable member and the substrate, the substrate table, or both.

Abstract translation: 光刻投影装置包括具有基板台的载台组件，基板被支撑并且通过浸没液体从投影光学组件的最终光学元件的曝光光束暴露在基板台上。 限制构件环绕曝光光束的路径的一部分并且具有曝光光束投射的孔。 可动构件可在限制构件与衬底，衬底台或两者之间的空间中移动，使得空间的第一部分位于可动构件的第一表面和限制构件之间，第二部分 的空间位于可移动部件的第二表面和基板，基板台之间或两者之间。

公开(公告)号：US10203610B2

公开(公告)日：2019-02-12

申请号：US15786758

申请日：2017-10-18

Applicant: NIKON CORPORATION

Inventor： Alex Ka Tim Poon ,  Leonard Wai Fung Kho

IPC: G03B27/52 ,  G03F7/20

Abstract: A liquid immersion lithography apparatus includes a projection system having a final optical element and a nozzle member having a first opening disposed on a first side of the final optical element and from which an immersion liquid is supplied, a second opening disposed on a second side of the final optical element and from which the immersion liquid is recovered, and a liquid recovery portion disposed to surround a path of an exposure beam and from which the immersion liquid is recovered. A tank is fluidicly connected to the liquid recovery portion of the nozzle member. During exposure of a substrate to the exposure beam, an upper surface of the substrate faces the liquid recovery portion, and the immersion liquid is supplied from the first opening while performing liquid recovery from the second opening and the liquid recovery portion.

公开(公告)号：US09176394B2

公开(公告)日：2015-11-03

申请号：US14082739

申请日：2013-11-18

Applicant: NIKON CORPORATION

Inventor： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Derek Coon ,  Gaurav Keswani ,  Daishi Tanaka

IPC: G03F7/20 ,  G03B27/52

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: An immersion lithography apparatus that includes a substrate holder on which a substrate is held, a projection system having a final optical element and that projects an exposure beam onto the substrate through an immersion liquid, and a liquid confinement member having an aperture through which the exposure beam is projected, a lower surface including a non-fluid removal area surrounding the aperture, and a liquid recovery outlet from which the immersion liquid is recovered, also includes a movable member. The movable member is movable relative to the liquid confinement member in a substantially horizontal direction, and has an opening through which the exposure beam is projected. The movable member has upper and lower surfaces that surround the opening, and is movable while a portion of the upper surface faces the non-fluid removal area in the lower surface of the liquid confinement member.

Abstract translation: 一种浸没式光刻设备，其包括其上保持有基板的基板保持器，具有最终光学元件的投影系统，并且通过浸没液体将曝光光束投影到所述基板上;以及液体限制部件， 射束，包括围绕孔的非流体去除区域的下表面和回收浸液的液体回收出口也包括可移动构件。 可移动部件在大致水平的方向上相对于液体限制部件是可移动的，并且具有暴露光束投射的开口。 可移动部件具有围绕开口的上表面和下表面，并且在上表面的一部分面向液体限制部件的下表面中的非流体去除区域时可移动。

公开(公告)号：US08743343B2

公开(公告)日：2014-06-03

申请号：US13754111

申请日：2013-01-30

Applicant: Nikon Corporation

Inventor： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Gaurav Keswani ,  Derek Coon ,  Daishi Tanaka

IPC: G03B27/32 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70733

Abstract: A lithographic projection apparatus includes a projection optical assembly having a final optical element, a stage assembly including a substrate table on which a substrate is supported, the substrate supported by the substrate table being exposed with an exposure beam from the final optical element of the projection optical assembly through an immersion liquid, a confinement member which encircles a portion of a path of the exposure beam, and a movable member which is movable in a space between the confinement member and the substrate, the substrate table, or both, the space being divided by the movable member into a first portion between the confinement member and the movable member and a second portion between the movable member and the substrate, the substrate table, or both. The movable member has a recovery outlet from which the immersion liquid in the second portion is removed.

Abstract translation: 平版印刷投影设备包括具有最终光学元件的投影光学组件，舞台组件，其包括衬底台，支撑衬底，由衬底台支撑的衬底用来自突起的最终光学元件的曝光光束曝光 通过浸没液体的光学组件，围绕曝光束的路径的一部分的限制构件，以及可移动构件，其可在限制构件和衬底，衬底台或两者之间的空间中移动，空间为 由可动构件分成限制构件和可动构件之间的第一部分和可移动构件与衬底之间的第二部分，衬底台或两者。 可移动部件具有回收出口，第二部分中的浸没液体从该回收口移除。

公开(公告)号：US09817319B2

公开(公告)日：2017-11-14

申请号：US15394016

申请日：2016-12-29

Applicant: NIKON CORPORATION

Inventor： Alex Ka Tim Poon ,  Leonard Wai Fung Kho

IPC: G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70858

Abstract: A liquid immersion lithography apparatus includes a projection system having a final optical element and a nozzle member having a first opening disposed on a first side of the final optical element and from which an immersion liquid is supplied, a second opening disposed on a second side of the final optical element and from which the immersion liquid is recovered, and a liquid recovery portion disposed to surround a path of an exposure beam and from which the immersion liquid is recovered. A tank is fluidicly connected to the liquid recovery portion of the nozzle member. During exposure of a substrate to the exposure beam, an upper surface of the substrate faces the liquid recovery portion, and the immersion liquid is supplied from the first opening while performing liquid recovery from the second opening and the liquid recovery portion.

公开(公告)号：US08896807B2

公开(公告)日：2014-11-25

申请号：US13944281

申请日：2013-07-17

Applicant: Nikon Corporation

Inventor： Alex Ka Tim Poon ,  Leonard Wai Fung Kho

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70858

Abstract: A liquid immersion lithography apparatus includes a projection system having a final optical element via which a substrate is exposed to an exposure beam through an immersion liquid located between the final optical element and the substrate, and a nozzle member. The nozzle member has a first opening on one side of the final optical element and from which the immersion liquid is supplied, a second opening on a second side of the final optical element and from which the immersion liquid is collected, and a liquid recovery portion that surrounds a path of the exposure beam and from which the immersion liquid is collected. During exposure, an upper surface of the substrate faces the liquid recovery portion, and the immersion liquid is supplied from the first opening while the immersion liquid supplied from the first opening is recovered from the second opening and the liquid recovery portion.

Abstract translation: 液浸式光刻设备包括具有最终光学元件的投影系统，通过该最终光学元件将基板暴露于通过位于最终光学元件和基板之间的浸没液体的曝光光束和喷嘴构件。 喷嘴构件在最终光学元件的一侧上具有第一开口，并且供应浸没液体，在最终光学元件的第二侧上具有第二开口，并且从其收集浸没液体，并且液体回收部分 其围绕曝光束的路径并从中收集浸液。 在曝光期间，基板的上表面面向液体回收部分，并且从第一开口提供的浸液从第二开口和液体回收部分回收从第一开口供给浸渍液。