Structure and formation method of semiconductor device with conductive bumps

    公开(公告)号:US11854964B2

    公开(公告)日:2023-12-26

    申请号:US17459135

    申请日:2021-08-27

    CPC classification number: H01L23/5226 H01L21/486 H01L24/14

    Abstract: A structure and a formation method of a semiconductor device are provided. The semiconductor device structure includes an interconnection structure over a semiconductor substrate. The semiconductor device structure includes a conductive pillar over the interconnection structure. The conductive pillar has a protruding portion extending towards the semiconductor substrate. The semiconductor device structure includes an upper conductive via between the conductive pillar and the interconnection structure. A center of the upper conductive via is laterally separated from a center of the protruding portion by a first distance. The semiconductor device structure includes a lower conductive via between the upper conductive via and the interconnection structure. The lower conductive via is electrically connected to the conductive pillar through the upper conductive via. A center of the lower conductive via is laterally separated from the center of the protruding portion by a second distance that is shorter than the first distance.

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