公开(公告)号：US20180005856A1

公开(公告)日：2018-01-04

申请号：US15707810

申请日：2017-09-18

Applicant: Applied Materials, Inc.

Inventor： Anzhong CHANG ,  Paul BRILLHART ,  Surajit KUMAR ,  Satheesh KUPPURAO ,  Mehmet Tugrul SAMIR ,  David K. CARLSON ,  Steve ABOAGYE ,  Anh N. NGUYEN ,  Kailash Kiran PATALAY ,  Joseph M. RANISH ,  Oleg V. SEREBRYANOV ,  Dongming IU ,  Shu-Kwan LAU ,  Zuoming ZHU ,  Herman DINIZ

IPC: H01L21/67 ,  C23C16/455

CPC classification number: H01L21/67115 ,  C23C16/45504

Abstract: Embodiments of the invention relate to a dome assembly. The dome assembly includes an upper dome comprising a central window, and an upper peripheral flange engaging the central window at a circumference of the central window, wherein a tangent line on an inside surface of the central window that passes through an intersection of the central window and the upper peripheral flange is at an angle of about 8° to about 16° with respect to a planar upper surface of the peripheral flange, a lower dome comprising a lower peripheral flange and a bottom connecting the lower peripheral flange with a central opening, wherein a tangent line on an outside surface of the bottom that passes through an intersection of the bottom and the lower peripheral flange is at an angle of about 8° to about 16° with respect to a planar bottom surface of the lower peripheral flange.

公开(公告)号：US20170362702A9

公开(公告)日：2017-12-21

申请号：US14195423

申请日：2014-03-03

Applicant: Applied Materials, Inc.

Inventor： David Keith CARLSON ,  Satheesh KUPPURAO ,  Howard BECKFORD ,  Herman DINIZ ,  Kailash Kiran PATALAY ,  Brian Hayes BURROWS ,  Jeffery Ronald CAMPBELL ,  Zuoming ZHU ,  Xiaowei LI ,  Errol Antonio SANCHEZ

IPC: C23C16/455 ,  C23C16/22 ,  C23C16/452 ,  H01L21/02

CPC classification number: C23C16/455 ,  C23C16/22 ,  C23C16/452 ,  H01L21/02532 ,  H01L21/0262 ,  Y10T137/0318

Abstract: In one embodiment, a gas distribution assembly includes an injection block having at least one inlet to deliver a precursor gas to a plurality of plenums from at least two gas sources, a perforated plate bounding at least one side of each of the plurality of plenums, at least one radiant energy source positioned within each of the plurality of plenums to provide energy to the precursor gas from one or both of the at least two gas sources and flow an energized gas though openings in the perforated plate and into a chamber, and a variable power source coupled to each of the radiant energy sources positioned within each of the plurality of plenums.

公开(公告)号：US20240318351A1

公开(公告)日：2024-09-26

申请号：US18733504

申请日：2024-06-04

Applicant: Applied Materials, Inc.

Inventor： Zhiyuan YE ,  Shu-Kwan LAU ,  Brian BURROWS ,  Lori D. WASHINGTON ,  Herman DINIZ ,  Martin A. HILKENE ,  Richard O. COLLINS ,  Nyi Oo MYO ,  Manish HEMKAR ,  Schubert S. CHU

IPC: C30B25/14 ,  C23C16/44 ,  C23C16/455 ,  C30B25/08 ,  C30B25/10 ,  H01L21/67

CPC classification number: C30B25/14 ,  C23C16/4412 ,  C23C16/455 ,  C30B25/105 ,  H01L21/6719 ,  C30B25/08

Abstract: A method and apparatus for a process chamber for thermal processing is described herein. The process chamber is a dual process chamber and shares a chamber body. The chamber body includes a first and a second set of gas inject passages. The chamber body may also include a first and a second set of exhaust ports. The process chamber may have a shared gas panel and/or a shared exhaust conduit.

公开(公告)号：US20210324514A1

公开(公告)日：2021-10-21

申请号：US17218892

申请日：2021-03-31

Applicant: Applied Materials, Inc.

Inventor： Zhiyuan YE ,  Shu-Kwan Danny LAU ,  Brian H. BURROWS ,  Lori WASHINGTON ,  Herman DINIZ ,  Martin A. HILKENE ,  Richard O. COLLINS ,  Nyi O. MYO ,  Manish HEMKAR ,  Schubert S. CHU

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/458 ,  C23C16/48 ,  H01L21/67

Abstract: A method and apparatus for a process chamber for thermal processing is described herein. The process chamber is a dual process chamber and shares a chamber body. The chamber body includes a first and a second set of gas inject passages. The chamber body may also include a first and a second set of exhaust ports. The process chamber may have a shared gas panel and/or a shared exhaust conduit. The process chamber described herein enables for the processing of multiple substrates simultaneously with improved process gas flow and heat distribution.

公开(公告)号：US20140199056A1

公开(公告)日：2014-07-17

申请号：US14132215

申请日：2013-12-18

Applicant: APPLIED MATERIALS, INC.

Inventor： Anzhong CHANG ,  Paul BRILLHART ,  Surajit KUMAR ,  Satheesh KUPPURAO ,  Mehmet Tugrul SAMIR ,  David K. CARLSON ,  Steve ABOAGYE ,  Anh N. NGUYEN ,  Kailash Kiran PATALAY ,  Joseph M. RANISH ,  Oleg SEREBRYANOV ,  Dongming IU ,  Shu-Kwan LAU ,  Zuoming ZHU ,  Herman DINIZ

IPC: H01L21/67

CPC classification number: H01L21/67115 ,  C23C16/45504

Abstract: Embodiments of the invention relate to a dome assembly. The dome assembly includes an upper dome comprising a central window, and an upper peripheral flange engaging the central window at a circumference of the central window, wherein a tangent line on an inside surface of the central window that passes through an intersection of the central window and the upper peripheral flange is at an angle of about 8° to about 16° with respect to a planar upper surface of the peripheral flange, a lower dome comprising a lower peripheral flange and a bottom connecting the lower peripheral flange with a central opening, wherein a tangent line on an outside surface of the bottom that passes through an intersection of the bottom and the lower peripheral flange is at an angle of about 8° to about 16° with respect to a planar bottom surface of the lower peripheral flange.

Abstract translation: 本发明的实施例涉及一种圆顶组件。 圆顶组件包括上拱顶，其包括中心窗，以及在中心窗的圆周处接合中心窗的上周缘，其中中心窗的内表面上的切线穿过中心窗的交点 并且上周缘相对于周缘凸缘的平面上表面成大约8°至大约16°的​​角度，下圆顶包括下周边凸缘和将下周边凸缘连接到中心开口的底部， 其中穿过底部和下部周边凸缘的交叉点的底部外表面上的切线相对于下部周边凸缘的平坦底面成约8°至约16°的​​角度。

公开(公告)号：US20140175054A1

公开(公告)日：2014-06-26

申请号：US14195423

申请日：2014-03-03

Applicant: Applied Materials, Inc.

Inventor： David Keith CARLSON ,  Satheesh KUPPURAO ,  Howard BECKFORD ,  Herman DINIZ ,  Kailash Kiran PATALAY ,  Brian Hayes BURROWS ,  Jeffery Ronald CAMPBELL ,  Zuoming ZHU ,  Xiaowei LI ,  Errol Antonio SANCHEZ

IPC: C23C16/455 ,  C23C16/22

CPC classification number: C23C16/455 ,  C23C16/22 ,  C23C16/452 ,  H01L21/02532 ,  H01L21/0262 ,  Y10T137/0318

Abstract: In one embodiment, a gas distribution assembly includes an injection block having at least one inlet to deliver a precursor gas to a plurality of plenums from at least two gas sources, a perforated plate bounding at least one side of each of the plurality of plenums, at least one radiant energy source positioned within each of the plurality of plenums to provide energy to the precursor gas from one or both of the at least two gas sources and flow an energized gas though openings in the perforated plate and into a chamber, and a variable power source coupled to each of the radiant energy sources positioned within each of the plurality of plenums.

Abstract translation: 在一个实施例中，气体分配组件包括注入块，其具有至少一个入口，以将前体气体从至少两个气体源输送到多个增压室，多孔板限定多个通气室中的每一个的至少一侧， 至少一个辐射能源，其定位在所述多个增压室的每一个内，以从所述至少两个气体源中的一个或两个向所述前体气体提供能量，并且使通电气体通过所述多孔板中的开口并进入腔室，并且 可变电源耦合到位于多个通风室中的每一个内的每个辐射能源。