VAPOR DELIVERY METHODS AND APPARATUS

    公开(公告)号:US20210069745A1

    公开(公告)日:2021-03-11

    申请号:US17013462

    申请日:2020-09-04

    Abstract: Embodiments of the present disclosure generally relate to organic vapor deposition systems and substrate processing methods related thereto. In one embodiment, a processing system comprises a lid assembly and a plurality of material delivery systems. The lid assembly includes lid plate having a first surface and a second surface disposed opposite of the first surface and a showerhead assembly coupled to the first surface. The showerhead assembly comprises a plurality of showerheads. Individual ones of the plurality of material delivery systems are fluidly coupled to one or more of the plurality of showerheads and are disposed on the second surface of the lid plate. Each of the material delivery systems comprise a delivery line, a delivery line valve disposed on the delivery line, a bypass line fluidly coupled to the delivery line at a point disposed between the delivery line valve and the showerhead, and a bypass valve disposed on the bypass line.

    SOL GEL COATED SUPPORT RING
    3.
    发明申请

    公开(公告)号:US20180211865A1

    公开(公告)日:2018-07-26

    申请号:US15935469

    申请日:2018-03-26

    Inventor: Joseph M. RANISH

    Abstract: A support member for a thermal processing chamber is described. The support member has a sol coating on at least one surface. The sol coating contains a material that blocks a desired wavelength or spectrum of radiation from being transmitted by the material of the support member. The sol coating may be a multi-layer structure that may include adhesion layers, transition layers, and cap layers, in addition to radiation-blocking layers.

    ROTATING SUBSTRATE LASER ANNEAL
    5.
    发明申请
    ROTATING SUBSTRATE LASER ANNEAL 审中-公开
    旋转底片激光天线

    公开(公告)号:US20170032865A1

    公开(公告)日:2017-02-02

    申请号:US15213844

    申请日:2016-07-19

    CPC classification number: G21K5/10 H01L21/67115

    Abstract: Embodiments of the present disclosure relate to thermal processing of substrates. More specifically, embodiments described herein relate to flash on spike annealing processes and apparatus suitable for performing such processes. In one embodiment, a thermal processing apparatus may include a lamp radiation source, a laser source, and a reflector plate disposed between the lamp radiation source and the laser source. One or more apertures may be formed in the reflector plate and the laser source may be positioned adjacent to the reflector plate such that a laser beam emitted from the laser source propagates through the one or more apertures. In one embodiment, the reflector plate may be substantially circular and the one or more apertures may approximate a sector of the reflector plate.

    Abstract translation: 本公开的实施例涉及基板的热处理。 更具体地说,本文描述的实施例涉及闪光退火工艺和适于执行这些工艺的装置。 在一个实施例中,热处理设备可以包括灯辐射源,激光源和设置在灯辐射源和激光源之间的反射板。 可以在反射板中形成一个或多个孔,并且激光源可以邻近反射板定位,使得从激光源发射的激光束传播通过一个或多个孔。 在一个实施例中,反射板可以是基本上圆形的并且一个或多个孔可以接近反射板的扇形。

    LINEAR HIGH PACKING DENSITY FOR LED ARRAYS

    公开(公告)号:US20160231055A1

    公开(公告)日:2016-08-11

    申请号:US15130751

    申请日:2016-04-15

    CPC classification number: F26B3/30 F21K9/20 H01L21/67115

    Abstract: Apparatus for providing energy to a process chamber are provided herein. In one embodiment, the apparatus include a supporting substrate, a first plurality of solid state light sources disposed on a first surface of the supporting substrate, and a second plurality of solid state light sources disposed on the top surface of the supporting substrate, wherein the first and second plurality of solid state light sources are aligned and electrically isolated from each other, and the first plurality of solid state light sources is in physical contact with the second plurality of solid state light sources.

    EASY ACCESS LAMPHEAD
    8.
    发明申请
    EASY ACCESS LAMPHEAD 有权
    轻松访问灯

    公开(公告)号:US20150147053A1

    公开(公告)日:2015-05-28

    申请号:US14507304

    申请日:2014-10-06

    CPC classification number: H01L21/67115 H05B3/0047

    Abstract: Embodiments described herein generally relate to an improved power distribution assembly for a lamphead assembly used in a thermal processing chamber. In one embodiment, the lamphead assembly includes a plurality of lamps for thermal processing of semiconductor substrates, and a power distribution assembly having a plurality of openings, the power distribution assembly provides power to the plurality of lamps, and each opening is sized to allow passage of the lamp therethough.

    Abstract translation: 本文描述的实施例通常涉及用于热处理室中的灯头组件的改进的功率分配组件。 在一个实施例中,灯头组件包括用于半导体衬底的热处理的多个灯,以及具有多个开口的配电组件,所述配电组件向多个灯提供电力,并且每个开口的尺寸设置成允许通过 的灯。

    SOL GEL COATED SUPPORT RING
    9.
    发明申请
    SOL GEL COATED SUPPORT RING 有权
    SOL胶涂层支撑环

    公开(公告)号:US20150123337A1

    公开(公告)日:2015-05-07

    申请号:US14521545

    申请日:2014-10-23

    Inventor: Joseph M. RANISH

    Abstract: A support member for a thermal processing chamber is described. The support member has a sol coating on at least one surface. The sol coating contains a material that blocks a desired wavelength or spectrum of radiation from being transmitted by the material of the support member. The sol coating may be a multi-layer structure that may include adhesion layers, transition layers, and cap layers, in addition to radiation-blocking layers.

    Abstract translation: 描述了用于热处理室的支撑构件。 支撑构件在至少一个表面上具有溶胶涂层。 溶胶涂层含有阻挡所需波长或辐射光谱的材料被支撑构件的材料传输。 除了辐射阻挡层之外,溶胶涂层可以是可以包括粘附层,过渡层和盖层的多层结构。

    LIGHT PIPE WINDOW STRUCTURE FOR THERMAL CHAMBER APPLICATIONS AND PROCESSES
    10.
    发明申请
    LIGHT PIPE WINDOW STRUCTURE FOR THERMAL CHAMBER APPLICATIONS AND PROCESSES 审中-公开
    用于热室应用和过程的光管窗结构

    公开(公告)号:US20140376897A1

    公开(公告)日:2014-12-25

    申请号:US14297240

    申请日:2014-06-05

    Abstract: A processing chamber is described. The processing chamber includes a chamber having an interior volume, a light pipe window structure coupled to the chamber, the light pipe window structure having a first transparent plate disposed within the interior volume of the chamber, and a radiant heat source coupled to a second transparent plate of the light pipe window structure in a position outside of the interior volume of the chamber, wherein the light pipe window structure includes a plurality of light pipe structures disposed between the first transparent plate and the second transparent plate.

    Abstract translation: 描述处理室。 处理室包括具有内部容积的室,耦合到室的光管窗结构,光管窗结构具有设置在室的内部空间内的第一透明板,以及耦合到第二透明层的辐射热源 所述光管窗结构包括设置在所述第一透明板和所述第二透明板之间的多个光管结构。

Patent Agency Ranking