Support for a movable element and lithography apparatus
    2.
    发明授权
    Support for a movable element and lithography apparatus 有权
    支持可移动元件和光刻设备

    公开(公告)号:US09535340B2

    公开(公告)日:2017-01-03

    申请号:US14413667

    申请日:2013-05-15

    Abstract: A support for a movable element includes a stator element, a gravity compensator field inducing element mounted on the stator element, the gravity compensator field inducing element configured to apply a translational force to the movable element by controlling a magnetic field in a gap between the stator element and the movable element, and a plurality of torque compensator field inducing elements mounted on the stator element, the torque compensator field inducing elements configured to apply a torque to the movable element by controlling a magnetic field in the gap between the stator element and the movable element, the torque being about a first axis substantially perpendicular to the direction of the translational force applied by the gravity compensator field inducing element.

    Abstract translation: 可移动元件的支撑件包括定子元件,安装在定子元件上的重力补偿器场感应元件,重力补偿器场引发元件被配置为通过控制定子之间的间隙中的磁场向可移动元件施加平移力 元件和可移动元件以及安装在定子元件上的多个扭矩补偿器场诱导元件,扭矩补偿器场诱导元件被配置为通过控制定子元件和定子元件之间的间隙中的磁场向可移动元件施加扭矩 所述扭矩大约是基本上垂直于由重力补偿器场诱导元件施加的平移力的方向的第一轴线。

    ACTUATION MECHANISM, OPTICAL APPARATUS, LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING DEVICES
    3.
    发明申请
    ACTUATION MECHANISM, OPTICAL APPARATUS, LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING DEVICES 有权
    执行机构,光学装置,光刻设备和制造装置的方法

    公开(公告)号:US20150277233A1

    公开(公告)日:2015-10-01

    申请号:US14435450

    申请日:2013-09-17

    Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.

    Abstract translation: 移位的致动器,例如镜子,通过改变两个电磁体中的电流,提供具有至少两个自由度的运动。 移动部件包括具有被限制在基本上位于垂直于磁体的磁化方向的第一平面中的工作区域上移动的磁性面的永磁体。 电磁体具有基本上位于与第一平面紧密平行的第二平面中的极面,每个极面基本上填充由移动磁体的表面穿过的区域的象限。 光学位置传感器可以通过电磁体之间的中心空间来引导移动磁体上的辐射束。 瞳孔镜装置中的小平面的尺寸可以在外围区域中较小,但在中心区域较大,从而放松聚焦要求。

    Lithographic apparatus and lorentz actuator
    8.
    发明授权
    Lithographic apparatus and lorentz actuator 有权
    光刻设备和洛伦兹致动器

    公开(公告)号:US09293951B2

    公开(公告)日:2016-03-22

    申请号:US13737848

    申请日:2013-01-09

    CPC classification number: H02K1/06 G03F7/70758

    Abstract: A lithographic apparatus includes an actuator for producing a force in a first direction between a first and a second part including a first magnet assembly and a second magnet assembly each attached opposite to each other to the first part of the apparatus, the first magnet assembly including a first main magnet system and a first outer subsidiary magnet system, and the second magnet assembly including a second main magnet system and a second outer subsidiary magnet system, the first and second main magnet system defining a space between them in a second direction perpendicular to the first direction. The actuator includes a coil attached to the second part. The distance between the first outer subsidiary magnet system and the second outer subsidiary magnet system in the second direction is substantially zero.

    Abstract translation: 光刻设备包括用于在包括第一磁体组件和第二磁体组件的第一和第二部分之间沿第一方向产生力的致动器,每个第一磁体组件和第二磁体组件彼此相对地安装到装置的第一部分,第一磁体组件包括 第一主磁体系统和第一外部辅助磁体系统,第二磁体组件包括第二主磁体系统和第二外部辅助磁体系统,第一和第二主磁体系统在垂直于第二主磁体系统的第二方向上在它们之间限定空间 第一个方向。 致动器包括附接到第二部件的线圈。 第一外辅助磁体系统和第二外辅助磁体系统在第二方向上的距离基本为零。

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