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公开(公告)号：US11621142B2
公开(公告)日：2023-04-04
申请号：US16992058
申请日：2020-08-12
Applicant: ASML Netherlands B.V.
Inventor： Marcel Koenraad Marie Baggen , Peter Paul Hempenius , Maarten Frans Janus Kremers , Robertus Jacobus Theodorus Van Kempen , Sven Antoin Johan Hol , Henricus Martinus Johannes Van De Groes , Johannes Hubertus Antonius Van De Rijdt , Niels Johannes Maria Bosch , Maarten Hartger Kimman
Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.
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公开(公告)号：US09535340B2
公开(公告)日：2017-01-03
申请号：US14413667
申请日：2013-05-15
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70833 , F16C32/0459 , G03F7/70058 , G03F7/704 , G03F7/70816
Abstract: A support for a movable element includes a stator element, a gravity compensator field inducing element mounted on the stator element, the gravity compensator field inducing element configured to apply a translational force to the movable element by controlling a magnetic field in a gap between the stator element and the movable element, and a plurality of torque compensator field inducing elements mounted on the stator element, the torque compensator field inducing elements configured to apply a torque to the movable element by controlling a magnetic field in the gap between the stator element and the movable element, the torque being about a first axis substantially perpendicular to the direction of the translational force applied by the gravity compensator field inducing element.
Abstract translation: 可移动元件的支撑件包括定子元件，安装在定子元件上的重力补偿器场感应元件，重力补偿器场引发元件被配置为通过控制定子之间的间隙中的磁场向可移动元件施加平移力 元件和可移动元件以及安装在定子元件上的多个扭矩补偿器场诱导元件，扭矩补偿器场诱导元件被配置为通过控制定子元件和定子元件之间的间隙中的磁场向可移动元件施加扭矩 所述扭矩大约是基本上垂直于由重力补偿器场诱导元件施加的平移力的方向的第一轴线。
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3.发明申请ACTUATION MECHANISM, OPTICAL APPARATUS, LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING DEVICES 有权执行机构，光学装置，光刻设备和制造装置的方法公开(公告)号：US20150277233A1
公开(公告)日：2015-10-01
申请号：US14435450
申请日：2013-09-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Jan Bernard Plechelmus Van Schoot , Sven Antoin Johan Hol , Edwin Johan Buis , Erik Maria Rekkers , Gosse Charles De Vries , Hako Botma , Marinus Johannes Maria Van Dam , Ramon Pascal Van Gorkom
CPC classification number: G03F7/70091 , G01C9/06 , G01C2009/066 , G02B7/1821 , G03F7/70116 , H01F7/0231 , H01F7/206 , H01H2051/2218 , H02K41/00
Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.
Abstract translation: 移位的致动器，例如镜子，通过改变两个电磁体中的电流，提供具有至少两个自由度的运动。 移动部件包括具有被限制在基本上位于垂直于磁体的磁化方向的第一平面中的工作区域上移动的磁性面的永磁体。 电磁体具有基本上位于与第一平面紧密平行的第二平面中的极面，每个极面基本上填充由移动磁体的表面穿过的区域的象限。 光学位置传感器可以通过电磁体之间的中心空间来引导移动磁体上的辐射束。 瞳孔镜装置中的小平面的尺寸可以在外围区域中较小，但在中心区域较大，从而放松聚焦要求。
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4.发明申请LITHOGRAPHIC APPARATUS COMPRISING AN ACTUATOR, AND METHOD FOR PROTECTING SUCH ACTUATOR 有权包括执行器的平面设备和用于保护执行器的方法公开(公告)号：US20150070678A1
公开(公告)日：2015-03-12
申请号：US14395454
申请日：2013-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria Cadee , Sander Christiaan Broers , Sven Antoin Johan Hol , Yang-Shan Huang , Antonius Franciscus Johannes De Groot , Bastiaan Lambertus Wilhelmus Marinus Van De Ven
IPC: G03F7/20
CPC classification number: G03F7/70766 , G03F7/70533 , G03F7/70758 , G03F7/709
Abstract: A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.
Abstract translation: 光刻设备包括一个系统。 该系统包括第一部分，第二部分和能量吸收元件。 第二部分被配置为相对于第一部分移动。 该系统在系统的操作模式期间具有位于第一部分和第二部分之间的间隙。 当第一部分和第二部分在系统的故障模式下彼此碰撞时，能量吸收元件用于在第一部分和第二部分之间吸收能量。 能量吸收元件在间隙之外。
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公开(公告)号：US20140340666A1
公开(公告)日：2014-11-20
申请号：US14357530
申请日：2012-12-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Butler , Arno Jan Bleeker , Pieter Renaat Marie Hennus , Martinus Hendricus Henricus Hoeks , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Ruud Antonius Catharina Maria Beerens , Olof Martinus Josephus Fischer , Wilhelmus Henricus Theodorus Maria Aangenent , Niels Johannes Maria Bosch
IPC: G03F7/20
CPC classification number: G03F7/70258 , G03F7/70275 , G03F7/70366 , G03F7/70391 , G03F7/704 , G03F7/70558 , G03F7/70816 , G03F7/709
Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
Abstract translation: 一种曝光装置，包括被配置为将多个辐射束投影到目标上的投影系统; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。
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Patent Agency Ranking
公开(公告)号：US20200176215A1
公开(公告)日：2020-06-04
申请号：US16698677
申请日：2019-11-27
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Gosen , Sven Antoin Johan Hol , Martijn Petrus Christianus Van Heumen , Dennis Herman Caspar Van Banning , Naseh Hosseini
IPC: H01J37/141
Abstract: Systems and methods for cooling an objective lens of a charged-particle beam system are disclosed. According to certain embodiments, the method for cooling an objective lens of a charged-particle beam system comprises receiving a fluid via a fluid input port of a bobbin, circulating the fluid that absorbs heat generated by a plurality of electromagnetic coils of the objective lens, via a plurality of channels distributed in the bobbin, and dispensing the fluid circulated by the plurality of channels via a fluid output port of the bobbin. The bobbin may further comprise a bottom flange proximal to a wafer and a top flange distal from the wafer. The bobbin having the plurality of channels may comprise an additively manufactured monolithic structure.
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公开(公告)号：US09921494B2
公开(公告)日：2018-03-20
申请号：US14395454
申请日：2013-04-12
Applicant: ASML Netherlands B.V.
Inventor： Theodorus Petrus Maria Cadee , Sander Christiaan Broers , Sven Antoin Johan Hol , Yang-Shan Huang , Antonius Franciscus Johannes De Groot , Bastiaan Lambertus Wilhelmus Marinus Van De Ven
CPC classification number: G03F7/70766 , G03F7/70533 , G03F7/70758 , G03F7/709
Abstract: A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.
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公开(公告)号：US09293951B2
公开(公告)日：2016-03-22
申请号：US13737848
申请日：2013-01-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Fidelus Adrianus Boon , Hendrikus Pascal Gerardus Johannes Van Agtmaal , Abdelhamid Kechroud , Sven Antoin Johan Hol , Peter Michel Silvester Maria Heijmans
CPC classification number: H02K1/06 , G03F7/70758
Abstract: A lithographic apparatus includes an actuator for producing a force in a first direction between a first and a second part including a first magnet assembly and a second magnet assembly each attached opposite to each other to the first part of the apparatus, the first magnet assembly including a first main magnet system and a first outer subsidiary magnet system, and the second magnet assembly including a second main magnet system and a second outer subsidiary magnet system, the first and second main magnet system defining a space between them in a second direction perpendicular to the first direction. The actuator includes a coil attached to the second part. The distance between the first outer subsidiary magnet system and the second outer subsidiary magnet system in the second direction is substantially zero.
Abstract translation: 光刻设备包括用于在包括第一磁体组件和第二磁体组件的第一和第二部分之间沿第一方向产生力的致动器，每个第一磁体组件和第二磁体组件彼此相对地安装到装置的第一部分，第一磁体组件包括 第一主磁体系统和第一外部辅助磁体系统，第二磁体组件包括第二主磁体系统和第二外部辅助磁体系统，第一和第二主磁体系统在垂直于第二主磁体系统的第二方向上在它们之间限定空间 第一个方向。 致动器包括附接到第二部件的线圈。 第一外辅助磁体系统和第二外辅助磁体系统在第二方向上的距离基本为零。
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9.发明申请公开(公告)号：US20150234297A1
公开(公告)日：2015-08-20
申请号：US14428287
申请日：2013-08-26
Applicant: ASML Netherlands B.V.
Inventor： Johannes Antonius Gerardus Akkermans , Bas Pieter Lemmen , Sjoerd Martijn Huiberts , Joeri Lof , Petrus Theodorus Rutgers , Sven Antoin Johan Hol , Harmeet Singh , Peter Michel Silvester Maria Heijmans
CPC classification number: G03F7/70725 , G03F7/22 , G03F7/70758 , H01F7/081 , H01F7/1646 , H02K11/20 , H02K41/025 , H02K41/03 , H02K41/033 , H02P6/16 , H02P25/034 , H02P25/06 , H02P25/08 , H02P25/092
Abstract: A reluctance actuator assembly comprising a reluctance actuator, a flux sensor to measure a magnetic flux in a gap of the reluctance actuator, and a flux amplifier to drive an actuator coil of the reluctance actuator based on a flux set point and the flux measured by the flux sensor. A method comprising providing to the flux amplifier a flux setpoint, the flux setpoint comprising a time constant component and a sinusoidally varying component at an excitation frequency, measuring a force generated by the reluctance actuator in response to the flux setpoint, and calibrating the reluctance actuator assembly from the measured force.
Abstract translation: 一种磁阻致动器组件，包括磁阻致动器，用于测量磁阻致动器的间隙中的磁通量的磁通传感器，以及基于磁通量设定点和磁通量测量的磁通量来驱动磁阻致动器的致动器线圈的磁通放大器 通量传感器 一种方法，包括向所述通量放大器提供磁通设定点，所述通量设定点包括在激励频率处的时间常数分量和正弦变化分量，以响应于所述通量设定点测量由所述磁阻致动器产生的力，以及校准所述磁阻致动器 从测量力组装。
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公开(公告)号：US11764027B2
公开(公告)日：2023-09-19
申请号：US16698677
申请日：2019-11-27
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Gerard Gosen , Sven Antoin Johan Hol , Martijn Petrus Christianus Van Heumen , Dennis Herman Caspar Van Banning , Naseh Hosseini
IPC: H01J37/141
CPC classification number: H01J37/141 , H01J2237/002
Abstract: Systems and methods for cooling an objective lens of a charged-particle beam system are disclosed. According to certain embodiments, the method for cooling an objective lens of a charged-particle beam system comprises receiving a fluid via a fluid input port of a bobbin, circulating the fluid that absorbs heat generated by a plurality of electromagnetic coils of the objective lens, via a plurality of channels distributed in the bobbin, and dispensing the fluid circulated by the plurality of channels via a fluid output port of the bobbin. The bobbin may further comprise a bottom flange proximal to a wafer and a top flange distal from the wafer. The bobbin having the plurality of channels may comprise an additively manufactured monolithic structure.
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