Positioning system for a lithographic apparatus

    公开(公告)号:US11156925B2

    公开(公告)日:2021-10-26

    申请号:US16976326

    申请日:2019-02-14

    IPC分类号: G03F7/20 H02K41/035 H02K11/21

    摘要: A positioning system to position a structure comprises an actuator and a control unit to control the actuator in response to a position setpoint received by the control unit. The actuator comprises a magnet assembly comprises a magnet configured to provide a magnetic flux, and a coil assembly, wherein the coil assembly and the magnet assembly are movable relative to each other, the coil assembly comprising a coil, an actuation of the coil by a drive current providing for a force between the magnet assembly and the coil assembly. The magnet assembly comprises a further electric conductor, the further electric conductor comprising a non-ferromagnetic electrically conductive material, wherein the further electric conductor is magnetically coupled to the coil of the coil assembly and forms a short circuit path for an inductive electrical current induced in the further electric conductor as a result of an actuator current in the coil.