公开(公告)号：US11262661B2

公开(公告)日：2022-03-01

申请号：US16431833

申请日：2019-06-05

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Duygu Akbulut ,  Marinus Johannes Maria Van Dam ,  Hans Butler ,  Hugo Augustinus Joseph Cramer ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Ferry Zijp ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Marinus Petrus Reijnders

IPC: G01N21/956 ,  G03F7/20

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US10365565B2

公开(公告)日：2019-07-30

申请号：US15435593

申请日：2017-02-17

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Marinus Johannes Maria Van Dam

IPC: G03B27/72 ,  G03F7/20 ,  G01N21/47 ,  G02B5/22

Abstract: A scatterometer performs diffraction based measurements of one or more parameters of a target structure. To make two-color measurements in parallel, the structure is illuminated simultaneously with first radiation (302) having a first wavelength and a first angular distribution and with second radiation (304) having a second wavelength and a second angular distribution. The collection path (CP) includes a segmented wavelength-selective filter (21, 310) arranged to transmit wanted higher order portions of the diffracted first radiation (302X, 302Y) and of the diffracted second radiation (304X, 304Y), while simultaneously blocking zero order portions (302″, 304″) of both the first radiation and second radiation. The illumination path (IP) in one embodiment includes a matching segmented wavelength-selective filter (13, 300), oriented such that a zero order ray passing through the illumination optical system and the collection optical system will be blocked by one of said filters or the other, depending on its wavelength.

公开(公告)号：US11940739B2

公开(公告)日：2024-03-26

申请号：US17562446

申请日：2021-12-27

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Duygu Akbulut ,  Marinus Johannes Maria Van Dam ,  Hans Butler ,  Hugo Augustinus Joseph Cramer ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Ferry Zijp ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Marinus Petrus Reijnders

IPC: G03F7/20 ,  G01N21/956 ,  G03F7/00

CPC classification number: G03F7/70625 ,  G01N21/956 ,  G03F7/7015 ,  G03F7/70633

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US10809193B2

公开(公告)日：2020-10-20

申请号：US16362922

申请日：2019-03-25

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Marinus Johannes Maria Van Dam ,  Richard Carl Zimmerman

IPC: G01N21/47 ,  G03F7/20 ,  G01N21/21

Abstract: An inspection apparatus or lithographic apparatus includes an optical system and a detector. The optical system includes a non-linear prismatic optic. The optical system is configured to receive zeroth and first diffraction order beams reflected from a diffraction target and separate first and second polarizations of each diffraction order beam. The detector is configured to simultaneously detect first and second polarizations of each of the zeroth and first diffraction order beams. Based on the detected first and second polarizations of one or more diffraction orders, an operational parameter of a lithographic apparatus can be adjusted to improve accuracy or precision in the lithographic apparatus. The optical system can include a plurality of non-linear prismatic optics. For example, the optical system can include a plurality of Wollaston prisms.

公开(公告)号：US10775704B2

公开(公告)日：2020-09-15

申请号：US16524323

申请日：2019-07-29

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Marinus Johannes Maria Van Dam

IPC: G03B27/72 ,  G03F7/20 ,  G01N21/47 ,  G02B5/22

Abstract: A scatterometer performs diffraction based measurements of one or more parameters of a target structure. To make two-color measurements in parallel, the structure is illuminated simultaneously with first radiation (302) having a first wavelength and a first angular distribution and with second radiation (304) having a second wavelength and a second angular distribution. The collection path (CP) includes a segmented wavelength-selective filter (21, 310) arranged to transmit wanted higher order portions of the diffracted first radiation (302X, 302Y) and of the diffracted second radiation (304X, 304Y), while simultaneously blocking zero order portions (302″, 304″) of both the first radiation and second radiation. The illumination path (IP) in one embodiment includes a matching segmented wavelength-selective filter (13, 300), oriented such that a zero order ray passing through the illumination optical system and the collection optical system will be blocked by one of said filters or the other, depending on its wavelength.

公开(公告)号：US20150277233A1

公开(公告)日：2015-10-01

申请号：US14435450

申请日：2013-09-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Bernard Plechelmus Van Schoot ,  Sven Antoin Johan Hol ,  Edwin Johan Buis ,  Erik Maria Rekkers ,  Gosse Charles De Vries ,  Hako Botma ,  Marinus Johannes Maria Van Dam ,  Ramon Pascal Van Gorkom

IPC: G03F7/20 ,  H01F7/20 ,  G01C9/06 ,  H01F7/02

CPC classification number: G03F7/70091 ,  G01C9/06 ,  G01C2009/066 ,  G02B7/1821 ,  G03F7/70116 ,  H01F7/0231 ,  H01F7/206 ,  H01H2051/2218 ,  H02K41/00

Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.

Abstract translation: 移位的致动器，例如镜子，通过改变两个电磁体中的电流，提供具有至少两个自由度的运动。 移动部件包括具有被限制在基本上位于垂直于磁体的磁化方向的第一平面中的工作区域上移动的磁性面的永磁体。 电磁体具有基本上位于与第一平面紧密平行的第二平面中的极面，每个极面基本上填充由移动磁体的表面穿过的区域的象限。 光学位置传感器可以通过电磁体之间的中心空间来引导移动磁体上的辐射束。 瞳孔镜装置中的小平面的尺寸可以在外围区域中较小，但在中心区域较大，从而放松聚焦要求。

公开(公告)号：US11549806B2

公开(公告)日：2023-01-10

申请号：US17141698

申请日：2021-01-05

Applicant: ASML Netherlands B.V.

Inventor： Marinus Johannes Maria Van Dam ,  Arie Jeffrey Den Boef ,  Nitesh Pandey

IPC: G01B11/25 ,  G02F1/01 ,  G02F1/33

Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source configured to generate illumination radiation; at least two illumination branches comprising at least one optical fiber and configured to illuminate a structure on a substrate from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.

公开(公告)号：US10895452B2

公开(公告)日：2021-01-19

申请号：US16558457

申请日：2019-09-03

Applicant: ASML Netherlands B.V.

Inventor： Marinus Johannes Maria Van Dam ,  Arie Jeffrey Den Boef ,  Nitesh Pandey

IPC: G01B11/00 ,  G01B11/25 ,  G02F1/01 ,  G02F1/33

Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source for generating illumination radiation; at least two illumination branches for illuminating the structure on the substrate, the illumination branches being configured to illuminate the structure from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.

公开(公告)号：US20190384184A1

公开(公告)日：2019-12-19

申请号：US16431833

申请日：2019-06-05

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Duygu Akbulut ,  Marinus Johannes Maria Van Dam ,  Hans Butler ,  Hugo Augustinus Joseph Cramer ,  Engelbertus Antonius Fransiscu Van Der Pasch ,  Ferry Zijp ,  Jeroen Arnoldus Leonardus Raaymakers ,  Marinus Petrus Reijnders

IPC: G03F7/20 ,  G01N21/956

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US09927711B2

公开(公告)日：2018-03-27

申请号：US15105343

申请日：2014-12-02

Applicant: ASML Netherlands B.V.

Inventor： Sven Antoin Johan Hol ,  Andrea Lodovico Mancuso ,  Hendricus Johannes Maria Meijer ,  Erik Maria Rekkers ,  Marinus Johannes Maria Van Dam

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70758 ,  G03F7/70825 ,  G03F7/70941

Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets (370). A moving part includes a permanent magnet (362) with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. A ferromagnetic shield (820) is provided around the moving part and has at least one interruption (822) to reduce the influence of adjacent actuators or stray fields while also minimizing attraction between the permanent magnet (362) and the shield (820).