知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

45 records (took 0.015 seconds)

    MEMORY DEVICE WITH PREDETERMINED START-UP VALUE
    4.
    发明申请
    MEMORY DEVICE WITH PREDETERMINED START-UP VALUE 有权

    公开(公告)号：US20230048507A1

    公开(公告)日：2023-02-16

    申请号：US17955450

    申请日：2022-09-28

    Applicant: ASML Netherlands B.V.

    Inventor： Marcel Nicolaas Jacobus VAN KERVINCK ,  Marco Jan-Jaco WIELAND

    IPC: H01J37/317 ,  H01J37/04 ,  H01L27/11 ,  H01L27/112

    Abstract: A method for making a semiconductor memory device comprising a plurality of memory cells for storing one or more data values, the method comprising; exposing a pattern on a wafer for creating structures for a plurality of memory cells for the semiconductor memory device, wherein the pattern is exposed by means of one or more charged particle beams; and varying an exposure dose of the one or more charged particle beams during exposure of the pattern to generate a set of one or more non-common features in one or more structures of at least one of the memory cells, so that the structures of the at least one memory cell differ from the corresponding structures of other memory cells of the semiconductor memory device.

    CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
    5.
    发明申请
    CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD 有权

    公开(公告)号：US20220392743A1

    公开(公告)日：2022-12-08

    申请号：US17891983

    申请日：2022-08-19

    Applicant: ASML Netherlands B.V.

    Inventor： Marco Jan-Jaco WIELAND

    IPC: H01J37/28 ,  H01J37/12 ,  H01J37/317

    Abstract: A charged-particle assessment tool comprising: a condenser lens array, a collimator, a plurality of objective lenses and an electric power source. The condenser lens array configured to divide a beam of charged particles into a plurality of sub-beams and to focus each of the sub-beams to a respective intermediate focus. The collimator being at each intermediate focus and configured to deflect a respective sub-beam so that it is incident on the sample substantially normally. The plurality of objective lenses, each configured to project one of the plurality of charged-particle beams onto a sample. Each objective lens comprises: a first electrode; and a second electrode that is between the first electrode and the sample. The electric power source configured to apply first and second potentials to the first and second electrodes respectively such that the respective charged-particle beam is decelerated to be incident on the sample with a desired landing energy.

    METHOD OF PROCESSING DATA DERIVED FROM A SAMPLE
    6.
    发明申请
    METHOD OF PROCESSING DATA DERIVED FROM A SAMPLE 有权

    公开(公告)号：US20250095133A1

    公开(公告)日：2025-03-20

    申请号：US18962091

    申请日：2024-11-27

    Applicant: ASML Netherlands B.V.

    Inventor： Vincent Sylvester KUIPER ,  Marco Jan-Jaco WIELAND

    IPC: G06T7/00 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

    Abstract: The embodiments of the present disclosure provide a method of processing data derived from a sample, comprising processing an initial data set of elements derived from a detection by a detector for calibration, the data set comprising elements representing nuisance signals and detection signals. The processing of the initial data set comprising: fitting a distribution model to the initial data set to create a nuisance distribution model; setting a signal strength value, and selecting elements in the initial data set having a magnitude greater than the signal strength value as a set of defect candidates; fitting a distribution model to the set of defect candidates to create a defect distribution model of detection signals; and determining a signal strength threshold dependent on at least the defect distribution model. The determining comprising correcting the defect distribution model.

    APERTURE ASSEMBLY, BEAM MANIPULATOR UNIT, METHOD OF MANIPULATING CHARGED PARTICLE BEAMS, AND CHARGED PARTICLE PROJECTION APPARATUS
    9.
    发明申请
    APERTURE ASSEMBLY, BEAM MANIPULATOR UNIT, METHOD OF MANIPULATING CHARGED PARTICLE BEAMS, AND CHARGED PARTICLE PROJECTION APPARATUS 有权

    公开(公告)号：US20230037583A1

    公开(公告)日：2023-02-09

    申请号：US17961247

    申请日：2022-10-06

    Applicant: ASML Netherlands B.V.

    Inventor： Marco Jan-Jaco WIELAND

    IPC: H01J37/09 ,  H01J37/153 ,  H01J37/12

    Abstract: The disclosure relates to apparatus and methods for manipulating charged particle beams. In one arrangement, an aperture assembly is provided that comprises a first aperture body and a second aperture body. Apertures in the first aperture body are aligned with apertures in the second aperture body. The alignment allows charged particle beams to pass through the aperture assembly. The first aperture body comprises a first electrode system for applying an electrical potential to an aperture perimeter surface of each aperture in the first aperture body. The first electrode system comprises a plurality of electrodes. Each electrode is electrically isolated from each other electrode and electrically connected simultaneously to the aperture perimeter surfaces of a different one of a plurality of groups of the apertures in the first aperture body.

    CHARGED PARTICLE-OPTICAL APPARATUS
    10.
    发明申请
    CHARGED PARTICLE-OPTICAL APPARATUS 有权

    公开(公告)号：US20250087445A1

    公开(公告)日：2025-03-13

    申请号：US18960528

    申请日：2024-11-26

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Marco Jan-Jaco WIELAND

    IPC: H01J37/22 ,  H01J37/28

    Abstract: A charged particle-optical apparatus for assessing a sample at an assessment location, the charged particle-optical apparatus comprising: an assessment charged particle-optical device configured to project an assessment charged particle beam along an assessment beam path toward an assessment location, the assessment charged particle beam for assessing a sample at the assessment location; a preparatory charged particle-optical device configured to project a preparatory charged particle beam along a preparatory beam path, the preparatory charged particle beam for preparing a sample for assessment; and a light source configured to project a light beam toward an illumination location; wherein a locational relationship between the illumination location and the assessment charged particle-optical device is different from a locational relationship between the assessment location and the assessment charged particle-optical device.

Patent Agency Ranking